NO20005980L - Ferroelektrisk minnekrets og fremgangsmåte ved dens fremstilling - Google Patents

Ferroelektrisk minnekrets og fremgangsmåte ved dens fremstilling

Info

Publication number
NO20005980L
NO20005980L NO20005980A NO20005980A NO20005980L NO 20005980 L NO20005980 L NO 20005980L NO 20005980 A NO20005980 A NO 20005980A NO 20005980 A NO20005980 A NO 20005980A NO 20005980 L NO20005980 L NO 20005980L
Authority
NO
Norway
Prior art keywords
contact layer
ferroelectric memory
ferroelectric
conductive polymer
electrodes
Prior art date
Application number
NO20005980A
Other languages
English (en)
Other versions
NO20005980D0 (no
Inventor
Nicklas Johansson
Lichun Chen
Original Assignee
Thin Film Electronics Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thin Film Electronics Ab filed Critical Thin Film Electronics Ab
Priority to NO20005980A priority Critical patent/NO20005980L/no
Publication of NO20005980D0 publication Critical patent/NO20005980D0/no
Priority to JP2002544725A priority patent/JP2004515055A/ja
Priority to US10/169,064 priority patent/US6734478B2/en
Priority to AT01997814T priority patent/ATE290713T1/de
Priority to HK04106412.3A priority patent/HK1063688B/xx
Priority to PCT/NO2001/000473 priority patent/WO2002043071A1/en
Priority to KR10-2003-7007038A priority patent/KR100504612B1/ko
Priority to AU2316502A priority patent/AU2316502A/xx
Priority to DE60109325T priority patent/DE60109325T2/de
Priority to AU2002223165A priority patent/AU2002223165B2/en
Priority to CNB018222080A priority patent/CN100342453C/zh
Priority to CA002429887A priority patent/CA2429887C/en
Priority to RU2003119441/09A priority patent/RU2259605C2/ru
Priority to EP01997814A priority patent/EP1346367B1/en
Priority to ES01997814T priority patent/ES2236361T3/es
Publication of NO20005980L publication Critical patent/NO20005980L/no
Priority to NO20023051A priority patent/NO319548B1/no

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10B—ELECTRONIC MEMORY DEVICES
    • H10B53/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H10D1/682—Capacitors having no potential barriers having dielectrics comprising perovskite structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00—Resistors, capacitors or inductors
    • H10D1/60—Capacitors
    • H10D1/68—Capacitors having no potential barriers
    • H10D1/692—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • H10K85/1135—Polyethylene dioxythiophene [PEDOT]; Derivatives thereof

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Theoretical Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Semiconductor Memories (AREA)
  • Non-Volatile Memory (AREA)
  • Dram (AREA)
  • Liquid Crystal (AREA)
  • Static Random-Access Memory (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

En ferroelektrisk minnekrets (C) omfatter en ferroelektrisk minnecelle i form av en ferroelektnsk polymertynnfilm (F) og henholdsvis første og andre elektroder (E,;E2) som kontaktorer den ferroelektriske minnecelle (F) ved motsatte overflater derav, hvorved en polarisasjonstilstand i cellen (F) kan innstilles, svitsjes eller detekteres ved å påtrykke passende spenninger til elektrodene (E];E2). Minst en av elektrodene (Ei;E2) omfatter minst et kontaktsjikt (Pi;P2) idet minst ett kontaktsjikt (Pi;P2) omfatter en ledende polymer som kontakterer minnecellen (C), og etter valg et annet sjikt (M^M^ av en metallfilm som kontakterer den ledende polymer (Pi;P2), hvorved minst en av elektrodene (Ei;E2) enten omfatter bare et ledende polymerkontaktsjikt (Pt;P2) eller en kombinasjon av et ledende polymerkontaktsjikt (P,;P2) og et metallfilmsjikt (Mi;M2). - En fremgangsmåte i fremstillingen av en ferroelektrisk minnekrets av denne art omfatter suksessive trinn for å avsette et første kontaktsjikt av ledende polymertynnfilm på substratet, og å avsette en ferroelektrisk polymertynnfilm på det første kontaktsjikt, og å avsette et annet kontaktsjikt på toppen av den ferroelektriske polymertynnfilm.
NO20005980A 2000-11-27 2000-11-27 Ferroelektrisk minnekrets og fremgangsmåte ved dens fremstilling NO20005980L (no)

Priority Applications (16)

Application Number Priority Date Filing Date Title
NO20005980A NO20005980L (no) 2000-11-27 2000-11-27 Ferroelektrisk minnekrets og fremgangsmåte ved dens fremstilling
ES01997814T ES2236361T3 (es) 2000-11-27 2001-11-27 Circuito de memoria ferroelectrica y metodo para su fabricacion.
KR10-2003-7007038A KR100504612B1 (ko) 2000-11-27 2001-11-27 강유전성 메모리 회로 및 그의 제조 방법
DE60109325T DE60109325T2 (de) 2000-11-27 2001-11-27 Ferroelektrische speicherschaltung und verfahren zu ihrer herstellung
AT01997814T ATE290713T1 (de) 2000-11-27 2001-11-27 Ferroelektrische speicherschaltung und verfahren zu ihrer herstellung
HK04106412.3A HK1063688B (en) 2000-11-27 2001-11-27 A ferroelectric memory circuit and method for its fabrication
PCT/NO2001/000473 WO2002043071A1 (en) 2000-11-27 2001-11-27 A ferroelectric memory circuit and method for its fabrication
JP2002544725A JP2004515055A (ja) 2000-11-27 2001-11-27 強誘電性メモリ回路及びその製造方法
AU2316502A AU2316502A (en) 2000-11-27 2001-11-27 A ferroelectric memory circuit and method for its fabrication
US10/169,064 US6734478B2 (en) 2000-11-27 2001-11-27 Ferroelectric memory circuit and method for its fabrication
AU2002223165A AU2002223165B2 (en) 2000-11-27 2001-11-27 A ferroelectric memory circuit and method for its fabrication
CNB018222080A CN100342453C (zh) 2000-11-27 2001-11-27 铁电存储电路及其制造方法
CA002429887A CA2429887C (en) 2000-11-27 2001-11-27 A ferroelectric memory circuit and method for its fabrication
RU2003119441/09A RU2259605C2 (ru) 2000-11-27 2001-11-27 Ферроэлектрический запоминающий контур и способ его изготовления
EP01997814A EP1346367B1 (en) 2000-11-27 2001-11-27 A ferroelectric memory circuit and method for its fabrication
NO20023051A NO319548B1 (no) 2000-11-27 2002-06-24 Ferroelektrisk minnekrets og fremgangsmate ved dens fremstilling

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NO20005980A NO20005980L (no) 2000-11-27 2000-11-27 Ferroelektrisk minnekrets og fremgangsmåte ved dens fremstilling

Publications (2)

Publication Number Publication Date
NO20005980D0 NO20005980D0 (no) 2000-11-27
NO20005980L true NO20005980L (no) 2002-05-28

Family

ID=19911842

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20005980A NO20005980L (no) 2000-11-27 2000-11-27 Ferroelektrisk minnekrets og fremgangsmåte ved dens fremstilling

Country Status (13)

Country Link
US (1) US6734478B2 (no)
EP (1) EP1346367B1 (no)
JP (1) JP2004515055A (no)
KR (1) KR100504612B1 (no)
CN (1) CN100342453C (no)
AT (1) ATE290713T1 (no)
AU (2) AU2002223165B2 (no)
CA (1) CA2429887C (no)
DE (1) DE60109325T2 (no)
ES (1) ES2236361T3 (no)
NO (1) NO20005980L (no)
RU (1) RU2259605C2 (no)
WO (1) WO2002043071A1 (no)

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US20030056078A1 (en) 2003-03-20
ATE290713T1 (de) 2005-03-15
US6734478B2 (en) 2004-05-11
AU2316502A (en) 2002-06-03
KR100504612B1 (ko) 2005-08-01
WO2002043071A1 (en) 2002-05-30
EP1346367B1 (en) 2005-03-09
JP2004515055A (ja) 2004-05-20
ES2236361T3 (es) 2005-07-16
NO20005980D0 (no) 2000-11-27
DE60109325T2 (de) 2006-04-13
EP1346367A1 (en) 2003-09-24
KR20030059272A (ko) 2003-07-07
CA2429887A1 (en) 2002-05-30
CA2429887C (en) 2005-03-29
AU2002223165B2 (en) 2005-02-17
HK1063688A1 (zh) 2005-01-07
RU2259605C2 (ru) 2005-08-27
CN1488148A (zh) 2004-04-07
CN100342453C (zh) 2007-10-10

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