KR100817343B1 - 반도체 집적회로장치 - Google Patents
반도체 집적회로장치 Download PDFInfo
- Publication number
- KR100817343B1 KR100817343B1 KR1020077023259A KR20077023259A KR100817343B1 KR 100817343 B1 KR100817343 B1 KR 100817343B1 KR 1020077023259 A KR1020077023259 A KR 1020077023259A KR 20077023259 A KR20077023259 A KR 20077023259A KR 100817343 B1 KR100817343 B1 KR 100817343B1
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- KR
- South Korea
- Prior art keywords
- circuit
- nonvolatile memory
- flash memory
- memory cell
- data
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
- G11C16/0408—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors
- G11C16/0441—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells containing floating gate transistors comprising cells containing multiple floating gate devices, e.g. separate read-and-write FAMOS transistors with connected floating gates
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B28/00—Compositions of mortars, concrete or artificial stone, containing inorganic binders or the reaction product of an inorganic and an organic binder, e.g. polycarboxylate cements
- C04B28/02—Compositions of mortars, concrete or artificial stone, containing inorganic binders or the reaction product of an inorganic and an organic binder, e.g. polycarboxylate cements containing hydraulic cements other than calcium sulfates
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- G—PHYSICS
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- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/04—Detection or location of defective memory elements, e.g. cell constructio details, timing of test signals
- G11C29/08—Functional testing, e.g. testing during refresh, power-on self testing [POST] or distributed testing
- G11C29/12—Built-in arrangements for testing, e.g. built-in self testing [BIST] or interconnection details
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- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/70—Masking faults in memories by using spares or by reconfiguring
- G11C29/78—Masking faults in memories by using spares or by reconfiguring using programmable devices
- G11C29/785—Masking faults in memories by using spares or by reconfiguring using programmable devices with redundancy programming schemes
- G11C29/789—Masking faults in memories by using spares or by reconfiguring using programmable devices with redundancy programming schemes using non-volatile cells or latches
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- G—PHYSICS
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- G11C29/00—Checking stores for correct operation ; Subsequent repair; Testing stores during standby or offline operation
- G11C29/70—Masking faults in memories by using spares or by reconfiguring
- G11C29/78—Masking faults in memories by using spares or by reconfiguring using programmable devices
- G11C29/84—Masking faults in memories by using spares or by reconfiguring using programmable devices with improved access time or stability
- G11C29/848—Masking faults in memories by using spares or by reconfiguring using programmable devices with improved access time or stability by adjacent switching
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- H01L22/22—Connection or disconnection of sub-entities or redundant parts of a device in response to a measurement
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- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
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- G—PHYSICS
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- G11C—STATIC STORES
- G11C2216/00—Indexing scheme relating to G11C16/00 and subgroups, for features not directly covered by these groups
- G11C2216/02—Structural aspects of erasable programmable read-only memories
- G11C2216/10—Floating gate memory cells with a single polysilicon layer
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- Nanotechnology (AREA)
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- Inorganic Chemistry (AREA)
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- Mathematical Physics (AREA)
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2000-00038167 | 2000-02-10 | ||
| JP2000038167A JP4191355B2 (ja) | 2000-02-10 | 2000-02-10 | 半導体集積回路装置 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020027006867A Division KR100816924B1 (ko) | 2000-02-10 | 2001-02-08 | 반도체 집적회로장치 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20070108570A KR20070108570A (ko) | 2007-11-12 |
| KR100817343B1 true KR100817343B1 (ko) | 2008-03-27 |
Family
ID=18561945
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020077023259A Expired - Lifetime KR100817343B1 (ko) | 2000-02-10 | 2001-02-08 | 반도체 집적회로장치 |
| KR1020027006867A Expired - Lifetime KR100816924B1 (ko) | 2000-02-10 | 2001-02-08 | 반도체 집적회로장치 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020027006867A Expired - Lifetime KR100816924B1 (ko) | 2000-02-10 | 2001-02-08 | 반도체 집적회로장치 |
Country Status (9)
| Country | Link |
|---|---|
| US (3) | US6611458B2 (enExample) |
| EP (1) | EP1262996B1 (enExample) |
| JP (1) | JP4191355B2 (enExample) |
| KR (2) | KR100817343B1 (enExample) |
| CN (2) | CN101916591B (enExample) |
| AU (1) | AU2001232248A1 (enExample) |
| DE (1) | DE60143643D1 (enExample) |
| TW (1) | TW506135B (enExample) |
| WO (1) | WO2001059789A1 (enExample) |
Families Citing this family (53)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| HUP0101186A3 (en) * | 1997-11-28 | 2002-03-28 | Abb Ab | Method and device for controlling the magnetic flux with an auxiliary winding in a rotaing high voltage electric alternating current machine |
| US6829737B1 (en) | 2000-08-30 | 2004-12-07 | Micron Technology, Inc. | Method and system for storing device test information on a semiconductor device using on-device logic for determination of test results |
| JP4043703B2 (ja) * | 2000-09-04 | 2008-02-06 | 株式会社ルネサステクノロジ | 半導体装置、マイクロコンピュータ、及びフラッシュメモリ |
| DE10120670B4 (de) * | 2001-04-27 | 2008-08-21 | Qimonda Ag | Verfahren zur Reparatur von Hardwarefehlern in Speicherbausteinen |
| US6963103B2 (en) * | 2001-08-30 | 2005-11-08 | Micron Technology, Inc. | SRAM cells with repressed floating gate memory, low tunnel barrier interpoly insulators |
| US7087954B2 (en) * | 2001-08-30 | 2006-08-08 | Micron Technology, Inc. | In service programmable logic arrays with low tunnel barrier interpoly insulators |
| US7135734B2 (en) * | 2001-08-30 | 2006-11-14 | Micron Technology, Inc. | Graded composition metal oxide tunnel barrier interpoly insulators |
| US7075829B2 (en) * | 2001-08-30 | 2006-07-11 | Micron Technology, Inc. | Programmable memory address and decode circuits with low tunnel barrier interpoly insulators |
| US7068544B2 (en) | 2001-08-30 | 2006-06-27 | Micron Technology, Inc. | Flash memory with low tunnel barrier interpoly insulators |
| US7476925B2 (en) * | 2001-08-30 | 2009-01-13 | Micron Technology, Inc. | Atomic layer deposition of metal oxide and/or low asymmetrical tunnel barrier interploy insulators |
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Also Published As
| Publication number | Publication date |
|---|---|
| EP1262996A1 (en) | 2002-12-04 |
| JP2001229690A (ja) | 2001-08-24 |
| US6611458B2 (en) | 2003-08-26 |
| US7149113B2 (en) | 2006-12-12 |
| TW506135B (en) | 2002-10-11 |
| US6894944B2 (en) | 2005-05-17 |
| WO2001059789A1 (en) | 2001-08-16 |
| KR100816924B1 (ko) | 2008-03-26 |
| EP1262996B1 (en) | 2010-12-15 |
| EP1262996A4 (en) | 2007-06-27 |
| JP4191355B2 (ja) | 2008-12-03 |
| KR20020080340A (ko) | 2002-10-23 |
| US20010019499A1 (en) | 2001-09-06 |
| AU2001232248A1 (en) | 2001-08-20 |
| CN101916591A (zh) | 2010-12-15 |
| CN100590739C (zh) | 2010-02-17 |
| US20050152186A1 (en) | 2005-07-14 |
| CN101916591B (zh) | 2014-05-07 |
| KR20070108570A (ko) | 2007-11-12 |
| CN1398407A (zh) | 2003-02-19 |
| DE60143643D1 (de) | 2011-01-27 |
| US20040004879A1 (en) | 2004-01-08 |
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