JPWO2006100968A1 - 成膜方法及び成膜装置並びに永久磁石及び永久磁石の製造方法 - Google Patents
成膜方法及び成膜装置並びに永久磁石及び永久磁石の製造方法 Download PDFInfo
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
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- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
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- H01F10/08—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers
- H01F10/10—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition
- H01F10/12—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys
- H01F10/126—Thin magnetic films, e.g. of one-domain structure characterised by magnetic layers characterised by the composition being metals or alloys containing rare earth metals
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- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
- H01F41/0293—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets diffusion of rare earth elements, e.g. Tb, Dy or Ho, into permanent magnets
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- H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
- H01F41/20—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by evaporation
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- H—ELECTRICITY
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- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
- H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
- H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
- H01F1/032—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials
- H01F1/04—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of hard-magnetic materials metals or alloys
- H01F1/047—Alloys characterised by their composition
- H01F1/053—Alloys characterised by their composition containing rare earth metals
- H01F1/055—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5
- H01F1/057—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B
- H01F1/0571—Alloys characterised by their composition containing rare earth metals and magnetic transition metals, e.g. SmCo5 and IIIa elements, e.g. Nd2Fe14B in the form of particles, e.g. rapid quenched powders or ribbon flakes
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Abstract
Description
Improvement of coercivity on thin Nd2Fe14B sintered permanent magnets(薄型Nd2Fe14B系焼結磁石における保磁力の向上)/ 朴起兌、東北大学 博士論文 平成12年3月23日)
(比較例)
2 処理室
3 準備室
5 遮蔽手段
6 保持手段
7 搬送手段
S マグネット(被成膜物)
Claims (21)
- 処理室を加熱し、この処理室内に予め配置した金属蒸発材料を蒸発させて金属蒸気雰囲気を処理室内に形成する第一工程と、処理室内の温度より低く保持した被成膜物をこの処理室に搬入し、処理室内と被成膜物との間の温度差によって被成膜物の表面に前記金属蒸発材料を選択的に付着堆積させる第二工程とを含むことを特徴とする成膜方法。
- 前記金属蒸気雰囲気が、前記処理室内で飽和状態であることを特徴とする請求項1記載の成膜方法。
- 加熱手段によって内部を略均一に高温加熱できるように構成した処理室と、この処理室に連通する準備室と、処理室及び準備室を所定の真空度に保持する真空排気手段と、処理室と準備室とを連通した開位置及び処理室を密閉する閉位置との間で移動自在な遮蔽手段と、被成膜物を処理室と準備室との間で移動可能とし、遮蔽手段の開位置で被成膜物を処理室に移動させたときこの処理室の密閉を可能とする搬送手段とを備え、前記遮蔽手段の閉位置で処理室を加熱し、予め処理室内に配置した金属蒸発材料を蒸発させて金属蒸気雰囲気を形成し、遮蔽手段を開位置に移動して、搬送手段によって準備室内の被成膜物を処理室に移動させ、処理室内と被成膜物との温度差によって、被成膜物の表面に前記金属蒸発材料を選択的に付着堆積させるように構成したことを特徴とする成膜装置。
- 前記処理室は、他の真空排気手段を設けた真空チャンバ内に配置され、一面が開口するように形成した均熱板で画成され、この開口面を除くこの均熱板の周囲を囲うように断熱材を設けると共に、均熱板と断熱材との間に加熱手段を設け、加熱手段によって均熱板を加熱するようにしたものであることを特徴とする請求項3記載の成膜装置。
- 前記準備室に不活性ガスの導入を可能とするガス導入手段を設け、このガス導入手段を介して準備室内に不活性ガスを導入して、処理室が準備室に対して負圧になるようにしたことを特徴とする請求項3または請求項4記載の成膜装置。
- 前記準備室にHeガスの導入を可能とするガス導入手段を設け、このガス導入手段を介して準備室内にHeガスを導入して、処理室が準備室に対して略同圧になるようにしたことを特徴とする請求項3または請求項4記載の成膜装置。
- 前記処理室を前記準備室の下方に配置したことを特徴とする請求項6記載の成膜装置。
- 前記処理室内での金属蒸発材料の配置を可能とする配置手段を設け、搬送手段によって被処理物を処理室に移動させたとき、被成膜物の周囲を囲って金属蒸発材料が配置されるように、配置手段を環状に形成したことを特徴とする請求項3乃至請求項7のいずれかに記載の成膜装置。
- 前記準備室にプラズマ発生手段を設け、プラズマによる被成膜物表面のクリーニングを可能としたことを特徴とする請求項3乃至請求項8のいずれかに記載の成膜装置。
- 前記準備室に他の加熱手段を設け、真空雰囲気またはこの準備室に接続したガス導入手段から不活性ガスを導入して、熱処理による被成膜物表面のクリーニングを可能としたことを特徴とする請求項3乃至請求項9のいずれかに記載の成膜装置。
- 前記金属蒸発材料は、Dy、Tbのいずれか一方またはDy、Tbの少なくとも一方を含有する合金であり、被成膜物が所定形状を有する鉄−ホウ素−希土類系の焼結磁石であることを特徴とする請求項3乃至請求項10のいずれかに記載の成膜装置。
- 所定形状を有する鉄−ホウ素−希土類系の磁石の表面に、Dy、Tbの少なくとも一方を含有する金属蒸発材料を成膜する成膜工程と、所定温度下で熱処理を施して表面に成膜した前記金属蒸発材料を焼結磁石の結晶粒界相に拡散させる拡散工程とを含む永久磁石の製造方法であって、前記成膜工程は、この成膜工程を実施する処理室を加熱し、この処理室内に予め配置した前記金属蒸発材料を蒸発させて金属蒸気雰囲気を処理室内に形成する第一工程と、処理室内の温度より低く保持した磁石をこの処理室に搬入し、この磁石が所定温度に達するまでに、処理室内と磁石との間の温度差によって磁石表面に前記金属蒸発材料を選択的に付着堆積させる第二工程とを含むことを特徴とする永久磁石の製造方法。
- 前記金属蒸気雰囲気が、前記処理室内で飽和状態であることを特徴とする請求項12記載の永久磁石の製造方法。
- 前記金属蒸発材料は、Nd、Pr、Al、Cu、Ga、Taのうち少なくとも1種類をさらに含有することを特徴とする請求項12または請求項13記載の永久磁石の製造方法。
- 前記第二工程において、前記磁石の所定温度を、250℃以下または450℃以上としたことを特徴とする請求項12乃至請求項14のいずれかに記載の永久磁石の製造方法。
- 処理室内の温度より低く保持した磁石を処理室に搬入するのに先立って、この磁石の表面を真空雰囲気内でクリーニングする工程をさらに含むことを特徴とする請求項12乃至請求項15のいずれかに記載の永久磁石の製造方法。
- 前記第一工程において、処理室内の温度を1000℃〜1700℃の範囲に設定することを特徴とする請求項12乃至請求項16のいずれかに記載の永久磁石の製造方法。
- 前記成膜工程において、処理室内に配置される金属蒸発材料の粒径が10〜1000μmの範囲であることを特徴とする請求項12乃至請求項17のいずれかに記載の永久磁石の製造方法。
- 所定形状を有する鉄−ホウ素−希土類系の磁石を有し、この磁石表面に、Dy、Tbの少なくとも一方を含有する金属蒸発材料を蒸発させて金属蒸気雰囲気を処理室内に形成し、処理室内の温度より低く保持した磁石をこの処理室に搬入して、この磁石が所定温度に達するまでに、処理室内と磁石との間の温度差によって磁石表面に前記金属蒸発材料を選択的に付着堆積させた後、熱処理を施して磁石表面のDy、Tbの少なくとも一方を磁石の結晶粒界相に拡散させてなることを特徴とする永久磁石。
- 前記磁石の表面、結晶粒界に、Dy、Tbの少なくとも一方を含有するリッチ相を有することを特徴とする請求項19記載の永久磁石。
- 前記磁石の表面が前記リッチ相で覆われ、結晶粒界に、前記リッチ相を1〜50%の範囲で含むことを特徴とする請求項19または請求項20記載の永久磁石。
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JP5339722B2 (ja) | 2013-11-13 |
RU2401881C2 (ru) | 2010-10-20 |
US20100159129A1 (en) | 2010-06-24 |
JP2012211395A (ja) | 2012-11-01 |
CN102242342B (zh) | 2014-10-01 |
KR101316803B1 (ko) | 2013-10-11 |
US8771422B2 (en) | 2014-07-08 |
RU2010125813A (ru) | 2011-12-27 |
RU2007138551A (ru) | 2009-04-27 |
WO2006100968A1 (ja) | 2006-09-28 |
CN101660126B (zh) | 2012-10-10 |
JP2012188761A (ja) | 2012-10-04 |
US8075954B2 (en) | 2011-12-13 |
TW200643996A (en) | 2006-12-16 |
US20110293829A1 (en) | 2011-12-01 |
US20080257716A1 (en) | 2008-10-23 |
KR20130070657A (ko) | 2013-06-27 |
RU2447189C2 (ru) | 2012-04-10 |
KR20080019199A (ko) | 2008-03-03 |
CN101660126A (zh) | 2010-03-03 |
TWI430294B (zh) | 2014-03-11 |
JP5433732B2 (ja) | 2014-03-05 |
CN102242342A (zh) | 2011-11-16 |
CN101660127A (zh) | 2010-03-03 |
RU2010125811A (ru) | 2011-12-27 |
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