JP6058431B2 - 樹脂モールド装置、および樹脂モールド方法 - Google Patents
樹脂モールド装置、および樹脂モールド方法 Download PDFInfo
- Publication number
- JP6058431B2 JP6058431B2 JP2013046759A JP2013046759A JP6058431B2 JP 6058431 B2 JP6058431 B2 JP 6058431B2 JP 2013046759 A JP2013046759 A JP 2013046759A JP 2013046759 A JP2013046759 A JP 2013046759A JP 6058431 B2 JP6058431 B2 JP 6058431B2
- Authority
- JP
- Japan
- Prior art keywords
- mold
- resin
- cavity
- workpiece
- block
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011347 resin Substances 0.000 title claims description 305
- 229920005989 resin Polymers 0.000 title claims description 305
- 238000000465 moulding Methods 0.000 title claims description 152
- 238000000034 method Methods 0.000 title claims description 62
- 239000000758 substrate Substances 0.000 claims description 84
- 229920001187 thermosetting polymer Polymers 0.000 claims description 10
- 238000012545 processing Methods 0.000 claims description 6
- 230000000149 penetrating effect Effects 0.000 claims description 3
- 239000000047 product Substances 0.000 claims 3
- 230000000903 blocking effect Effects 0.000 claims 1
- 239000013067 intermediate product Substances 0.000 claims 1
- 230000007246 mechanism Effects 0.000 description 39
- 239000004065 semiconductor Substances 0.000 description 18
- 238000004891 communication Methods 0.000 description 16
- 239000002184 metal Substances 0.000 description 14
- 229910052751 metal Inorganic materials 0.000 description 14
- 230000008569 process Effects 0.000 description 12
- 239000011159 matrix material Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 230000002093 peripheral effect Effects 0.000 description 8
- 238000007789 sealing Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 6
- 238000003860 storage Methods 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 230000000717 retained effect Effects 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- 238000002360 preparation method Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000013007 heat curing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 239000011800 void material Substances 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 241000255777 Lepidoptera Species 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920009441 perflouroethylene propylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- -1 polypropylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000012858 resilient material Substances 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000003826 tablet Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/02—Transfer moulding, i.e. transferring the required volume of moulding material by a plunger from a "shot" cavity into a mould cavity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/563—Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/565—Moulds
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3121—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
- B29C45/26—Moulds
- B29C45/2669—Moulds with means for removing excess material, e.g. with overflow cavities
- B29C2045/2671—Resin exit gates or bleeder passages
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
- B29C45/26—Moulds
- B29C45/2669—Moulds with means for removing excess material, e.g. with overflow cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C45/00—Injection moulding, i.e. forcing the required volume of moulding material through a nozzle into a closed mould; Apparatus therefor
- B29C45/17—Component parts, details or accessories; Auxiliary operations
- B29C45/26—Moulds
- B29C45/34—Moulds having venting means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Injection Moulding Of Plastics Or The Like (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013046759A JP6058431B2 (ja) | 2013-03-08 | 2013-03-08 | 樹脂モールド装置、および樹脂モールド方法 |
KR1020157024568A KR102162395B1 (ko) | 2013-03-08 | 2014-01-31 | 수지 몰드 금형, 수지 몰드 장치, 수지 몰드 방법, 및 수지 몰드 금형의 평가 방법 |
PCT/JP2014/052227 WO2014136509A1 (ja) | 2013-03-08 | 2014-01-31 | 樹脂モールド金型、樹脂モールド装置、樹脂モールド方法、および樹脂モールド金型の評価方法 |
TW106127191A TWI634627B (zh) | 2013-03-08 | 2014-02-07 | 樹脂成型裝置、樹脂成型方法以及樹脂成型模具 |
TW103104058A TWI604576B (zh) | 2013-03-08 | 2014-02-07 | 樹脂成型裝置與樹脂成型方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2013046759A JP6058431B2 (ja) | 2013-03-08 | 2013-03-08 | 樹脂モールド装置、および樹脂モールド方法 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016236322A Division JP6353890B2 (ja) | 2016-12-06 | 2016-12-06 | 樹脂モールド装置および樹脂モールド方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2014172287A JP2014172287A (ja) | 2014-09-22 |
JP6058431B2 true JP6058431B2 (ja) | 2017-01-11 |
Family
ID=51491035
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2013046759A Active JP6058431B2 (ja) | 2013-03-08 | 2013-03-08 | 樹脂モールド装置、および樹脂モールド方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6058431B2 (zh) |
KR (1) | KR102162395B1 (zh) |
TW (2) | TWI604576B (zh) |
WO (1) | WO2014136509A1 (zh) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2767931C1 (ru) * | 2021-04-12 | 2022-03-22 | Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" | Способ экстракционной очистки экстракта урана от технеция |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6320172B2 (ja) * | 2014-05-29 | 2018-05-09 | Towa株式会社 | 電子部品の樹脂封止方法及び樹脂封止装置 |
JP6423677B2 (ja) * | 2014-10-02 | 2018-11-14 | アピックヤマダ株式会社 | 成形金型、成形装置および成形品の製造方法 |
KR102376487B1 (ko) * | 2015-02-12 | 2022-03-21 | 삼성전자주식회사 | 반도체 패키지의 제조 장치 및 그 제조 방법 |
JP6020667B1 (ja) * | 2015-06-19 | 2016-11-02 | 第一精工株式会社 | トランスファー成形機および電子部品を製造する方法 |
JP2017034238A (ja) * | 2015-07-30 | 2017-02-09 | 第一精工株式会社 | 電子部品封止装置およびこれを用いた電子部品の封止方法 |
JP6499105B2 (ja) * | 2016-03-11 | 2019-04-10 | 東芝メモリ株式会社 | 金型 |
JP6576862B2 (ja) | 2016-03-16 | 2019-09-18 | 東芝メモリ株式会社 | トランスファ成型装置 |
WO2017203888A1 (ja) * | 2016-05-26 | 2017-11-30 | アピックヤマダ株式会社 | 樹脂供給方法、樹脂供給装置、樹脂成形装置、樹脂セット方法および樹脂成形方法 |
JP6730206B2 (ja) * | 2017-02-23 | 2020-07-29 | アピックヤマダ株式会社 | 樹脂供給装置、樹脂供給方法および樹脂成形装置 |
JP6546879B2 (ja) * | 2016-05-26 | 2019-07-17 | アピックヤマダ株式会社 | 樹脂成形金型および樹脂成形方法 |
JP6431871B2 (ja) * | 2016-05-26 | 2018-11-28 | アピックヤマダ株式会社 | 樹脂供給方法および樹脂供給装置 |
JP6721525B2 (ja) | 2017-03-03 | 2020-07-15 | キオクシア株式会社 | 金型 |
JP6721526B2 (ja) * | 2017-03-03 | 2020-07-15 | アピックヤマダ株式会社 | モールド金型、モールドプレス、およびモールド装置 |
JP2019171629A (ja) * | 2018-03-27 | 2019-10-10 | 住友重機械工業株式会社 | 金型システム |
TWI769288B (zh) * | 2018-08-08 | 2022-07-01 | 揚明光學股份有限公司 | 射出成型模具及製造高分子材料元件的方法 |
JP7068094B2 (ja) * | 2018-08-10 | 2022-05-16 | アピックヤマダ株式会社 | ワーク搬送装置、樹脂搬送装置及び樹脂モールド方法 |
JP6981935B2 (ja) * | 2018-08-23 | 2021-12-17 | アピックヤマダ株式会社 | モールド金型及びそれを備えた樹脂モールド装置 |
KR102019005B1 (ko) * | 2019-01-24 | 2019-09-05 | 심완보 | 반도체 패키지용 이중 몰드 금형 |
US12044962B2 (en) * | 2019-04-19 | 2024-07-23 | Canon Kabushiki Kaisha | Forming apparatus, forming method, and article manufacturing method |
JP7084348B2 (ja) * | 2019-04-25 | 2022-06-14 | Towa株式会社 | 樹脂成形装置及び樹脂成形品の製造方法 |
JP2020185754A (ja) * | 2019-05-17 | 2020-11-19 | Towa株式会社 | 成形型、樹脂成形装置及び樹脂成形品の製造方法 |
JP7327224B2 (ja) * | 2020-03-13 | 2023-08-16 | オムロン株式会社 | 金型交換装置、成形装置および成形方法 |
KR102322411B1 (ko) * | 2020-11-02 | 2021-11-05 | 재단법인 한국탄소산업진흥원 | 항공기 날개 끝단 복합재 구조물 제조장치 |
JP7447050B2 (ja) * | 2021-04-21 | 2024-03-11 | Towa株式会社 | 成形型、樹脂成形装置及び樹脂成形品の製造方法 |
JP2023092241A (ja) * | 2021-12-21 | 2023-07-03 | I-Pex株式会社 | 樹脂封止装置 |
CN117790397B (zh) * | 2024-02-26 | 2024-05-10 | 湖南酷牛存储科技有限公司 | 一种多层存储芯片封装设备及其工作方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2936669B2 (ja) * | 1990-08-07 | 1999-08-23 | 株式会社デンソー | 樹脂封止型半導体装置 |
JPH05230175A (ja) * | 1992-02-24 | 1993-09-07 | Toshiba Chem Corp | エポキシ樹脂組成物および半導体封止装置 |
JP3435271B2 (ja) * | 1995-11-30 | 2003-08-11 | 三菱電機株式会社 | 半導体装置 |
JP2001079901A (ja) * | 1999-09-14 | 2001-03-27 | Mitsubishi Electric Corp | 半導体封止装置及び半導体装置の製造方法 |
JP2004207290A (ja) * | 2002-12-24 | 2004-07-22 | Seiko Epson Corp | 半導体装置の製造方法及び製造装置 |
JP2008235489A (ja) * | 2007-03-19 | 2008-10-02 | Fujitsu Ltd | 樹脂封止方法、樹脂封止用金型、及び樹脂封止装置 |
JP5138470B2 (ja) * | 2008-06-06 | 2013-02-06 | アピックヤマダ株式会社 | トランスファモールド装置とこれを用いたトランスファモールド方法 |
JP5185069B2 (ja) * | 2008-10-31 | 2013-04-17 | アピックヤマダ株式会社 | トランスファモールド金型およびトランスファモールド装置とこれを用いた樹脂成形方法 |
JP5499986B2 (ja) * | 2010-08-11 | 2014-05-21 | 富士通セミコンダクター株式会社 | 半導体装置の製造方法及び半導体製造装置 |
JP5776094B2 (ja) * | 2011-03-15 | 2015-09-09 | アピックヤマダ株式会社 | 樹脂モールド方法および樹脂モールド装置 |
-
2013
- 2013-03-08 JP JP2013046759A patent/JP6058431B2/ja active Active
-
2014
- 2014-01-31 KR KR1020157024568A patent/KR102162395B1/ko active IP Right Grant
- 2014-01-31 WO PCT/JP2014/052227 patent/WO2014136509A1/ja active Application Filing
- 2014-02-07 TW TW103104058A patent/TWI604576B/zh active
- 2014-02-07 TW TW106127191A patent/TWI634627B/zh active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2767931C1 (ru) * | 2021-04-12 | 2022-03-22 | Российская Федерация, от имени которой выступает Государственная корпорация по атомной энергии "Росатом" | Способ экстракционной очистки экстракта урана от технеция |
Also Published As
Publication number | Publication date |
---|---|
TW201436127A (zh) | 2014-09-16 |
TW201742201A (zh) | 2017-12-01 |
KR102162395B1 (ko) | 2020-10-06 |
TWI634627B (zh) | 2018-09-01 |
WO2014136509A1 (ja) | 2014-09-12 |
KR20150126360A (ko) | 2015-11-11 |
JP2014172287A (ja) | 2014-09-22 |
TWI604576B (zh) | 2017-11-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6058431B2 (ja) | 樹脂モールド装置、および樹脂モールド方法 | |
KR102301482B1 (ko) | 수지 몰드 금형 및 수지 몰드 장치 | |
JP6444381B2 (ja) | 樹脂モールド金型および樹脂モールド方法 | |
JP6137679B2 (ja) | 樹脂モールド装置および樹脂モールド方法 | |
CN108688050B (zh) | 成型模、树脂成型装置、树脂成型方法及树脂成型品的制造方法 | |
JP6598642B2 (ja) | 樹脂封止装置及び樹脂封止方法 | |
KR20050030865A (ko) | 반도체장치의 제조방법 | |
JP5799422B2 (ja) | 樹脂モールド方法および樹脂モールド装置 | |
JP2020026088A (ja) | ワーク搬送装置、樹脂搬送装置及び樹脂モールド装置 | |
TW202039200A (zh) | 樹脂成形裝置以及樹脂成形品的製造方法 | |
JP6438794B2 (ja) | モールド金型、樹脂モールド装置及び樹脂モールド方法 | |
JP6867229B2 (ja) | 樹脂モールド金型 | |
JP3897565B2 (ja) | 樹脂封止装置及び樹脂封止方法 | |
JP2007036273A (ja) | 半導体集積回路装置の製造方法 | |
KR101052324B1 (ko) | 봉지재 성형 방법 | |
JP5958505B2 (ja) | 樹脂封止装置およびその封止方法 | |
JP6353890B2 (ja) | 樹脂モールド装置および樹脂モールド方法 | |
JP6397808B2 (ja) | 樹脂成形金型および樹脂成形方法 | |
WO2023067878A1 (ja) | 樹脂成形用成形型、樹脂成形装置、及び樹脂成形品の製造方法 | |
JP6096081B2 (ja) | 樹脂封止金型、樹脂封止方法、および樹脂封止金型のクリーニング方法 | |
JP2007288110A (ja) | 樹脂封止型及び樹脂封止方法 | |
KR100456082B1 (ko) | 반도체패키지의제조방법 | |
JP2005150476A (ja) | 電子部品の樹脂封止成形方法及び金型 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20151112 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20160719 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20160912 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20161011 |
|
A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20161108 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20161207 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 6058431 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |