JP4789798B2 - 散乱計測を用いてオーバレイ誤差を検出する装置および方法 - Google Patents
散乱計測を用いてオーバレイ誤差を検出する装置および方法 Download PDFInfo
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- JP4789798B2 JP4789798B2 JP2006503834A JP2006503834A JP4789798B2 JP 4789798 B2 JP4789798 B2 JP 4789798B2 JP 2006503834 A JP2006503834 A JP 2006503834A JP 2006503834 A JP2006503834 A JP 2006503834A JP 4789798 B2 JP4789798 B2 JP 4789798B2
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Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US44949603P | 2003-02-22 | 2003-02-22 | |
| US60/449,496 | 2003-02-22 | ||
| US49852403P | 2003-08-27 | 2003-08-27 | |
| US60/498,524 | 2003-08-27 | ||
| US50409303P | 2003-09-19 | 2003-09-19 | |
| US60/504,093 | 2003-09-19 | ||
| US10/729,838 | 2003-12-05 | ||
| US10/729,838 US7317531B2 (en) | 2002-12-05 | 2003-12-05 | Apparatus and methods for detecting overlay errors using scatterometry |
| PCT/US2004/005419 WO2004076963A2 (en) | 2003-02-22 | 2004-02-23 | Apparatus and method for detecting overlay errors using scatterometry |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011103027A Division JP4932949B2 (ja) | 2003-02-22 | 2011-05-02 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
Publications (3)
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| JP2006518942A JP2006518942A (ja) | 2006-08-17 |
| JP2006518942A5 JP2006518942A5 (cg-RX-API-DMAC7.html) | 2007-07-26 |
| JP4789798B2 true JP4789798B2 (ja) | 2011-10-12 |
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| JP2006503834A Expired - Fee Related JP4789798B2 (ja) | 2003-02-22 | 2004-02-23 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| JP2011103027A Expired - Lifetime JP4932949B2 (ja) | 2003-02-22 | 2011-05-02 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| JP2011245169A Expired - Lifetime JP5280507B2 (ja) | 2003-02-22 | 2011-11-09 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| JP2012023385A Expired - Fee Related JP5469688B2 (ja) | 2003-02-22 | 2012-02-06 | 散乱計測マーク、ターゲット構造、計測用システム、およびオーバーレイ誤差等の決定方法 |
| JP2013235636A Expired - Lifetime JP5675936B2 (ja) | 2003-02-22 | 2013-11-14 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| JP2014202945A Pending JP2015052602A (ja) | 2003-02-22 | 2014-10-01 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| JP2016038645A Pending JP2016106269A (ja) | 2003-02-22 | 2016-03-01 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| JP2017194325A Expired - Lifetime JP6553145B2 (ja) | 2003-02-22 | 2017-10-04 | オーバレイ誤差を決定する方法 |
| JP2019043804A Expired - Lifetime JP6668533B2 (ja) | 2003-02-22 | 2019-03-11 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
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| JP2011103027A Expired - Lifetime JP4932949B2 (ja) | 2003-02-22 | 2011-05-02 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| JP2011245169A Expired - Lifetime JP5280507B2 (ja) | 2003-02-22 | 2011-11-09 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| JP2012023385A Expired - Fee Related JP5469688B2 (ja) | 2003-02-22 | 2012-02-06 | 散乱計測マーク、ターゲット構造、計測用システム、およびオーバーレイ誤差等の決定方法 |
| JP2013235636A Expired - Lifetime JP5675936B2 (ja) | 2003-02-22 | 2013-11-14 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| JP2014202945A Pending JP2015052602A (ja) | 2003-02-22 | 2014-10-01 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| JP2016038645A Pending JP2016106269A (ja) | 2003-02-22 | 2016-03-01 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| JP2017194325A Expired - Lifetime JP6553145B2 (ja) | 2003-02-22 | 2017-10-04 | オーバレイ誤差を決定する方法 |
| JP2019043804A Expired - Lifetime JP6668533B2 (ja) | 2003-02-22 | 2019-03-11 | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
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| Country | Link |
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| US (13) | US7317531B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP1601931B1 (cg-RX-API-DMAC7.html) |
| JP (9) | JP4789798B2 (cg-RX-API-DMAC7.html) |
| AT (1) | ATE504862T1 (cg-RX-API-DMAC7.html) |
| DE (1) | DE602004032117D1 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2004076963A2 (cg-RX-API-DMAC7.html) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2017227934A (ja) * | 2003-02-22 | 2017-12-28 | ケーエルエー−テンカー コーポレイション | 散乱計測を用いてオーバレイ誤差を検出する装置および方法 |
| CN110470618A (zh) * | 2019-07-10 | 2019-11-19 | 中国科学院上海技术物理研究所 | 基于大气选择透过特性的单色仪光波长偏移量的检测方法 |
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| US6483580B1 (en) * | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
| US7541201B2 (en) | 2000-08-30 | 2009-06-02 | Kla-Tencor Technologies Corporation | Apparatus and methods for determining overlay of structures having rotational or mirror symmetry |
| US7068833B1 (en) * | 2000-08-30 | 2006-06-27 | Kla-Tencor Corporation | Overlay marks, methods of overlay mark design and methods of overlay measurements |
| IL138552A (en) | 2000-09-19 | 2006-08-01 | Nova Measuring Instr Ltd | Lateral shift measurement using an optical technique |
| US6743646B2 (en) * | 2001-10-22 | 2004-06-01 | Timbre Technologies, Inc. | Balancing planarization of layers and the effect of underlying structure on the metrology signal |
| US7170604B2 (en) * | 2002-07-03 | 2007-01-30 | Tokyo Electron Limited | Overlay metrology method and apparatus using more than one grating per measurement direction |
| US7046376B2 (en) * | 2002-07-05 | 2006-05-16 | Therma-Wave, Inc. | Overlay targets with isolated, critical-dimension features and apparatus to measure overlay |
| US7869057B2 (en) | 2002-09-09 | 2011-01-11 | Zygo Corporation | Multiple-angle multiple-wavelength interferometer using high-NA imaging and spectral analysis |
| US7139081B2 (en) | 2002-09-09 | 2006-11-21 | Zygo Corporation | Interferometry method for ellipsometry, reflectometry, and scatterometry measurements, including characterization of thin film structures |
| US7440105B2 (en) * | 2002-12-05 | 2008-10-21 | Kla-Tencor Technologies Corporation | Continuously varying offset mark and methods of determining overlay |
| US20080246951A1 (en) * | 2007-04-09 | 2008-10-09 | Phillip Walsh | Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work-pieces |
| US7126131B2 (en) * | 2003-01-16 | 2006-10-24 | Metrosol, Inc. | Broad band referencing reflectometer |
| US8564780B2 (en) | 2003-01-16 | 2013-10-22 | Jordan Valley Semiconductors Ltd. | Method and system for using reflectometry below deep ultra-violet (DUV) wavelengths for measuring properties of diffracting or scattering structures on substrate work pieces |
| US7352453B2 (en) * | 2003-01-17 | 2008-04-01 | Kla-Tencor Technologies Corporation | Method for process optimization and control by comparison between 2 or more measured scatterometry signals |
| US7106454B2 (en) | 2003-03-06 | 2006-09-12 | Zygo Corporation | Profiling complex surface structures using scanning interferometry |
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| CN110470618A (zh) * | 2019-07-10 | 2019-11-19 | 中国科学院上海技术物理研究所 | 基于大气选择透过特性的单色仪光波长偏移量的检测方法 |
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