JP5737922B2 - 半導体デバイスの製造方法 - Google Patents
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- JP5737922B2 JP5737922B2 JP2010278137A JP2010278137A JP5737922B2 JP 5737922 B2 JP5737922 B2 JP 5737922B2 JP 2010278137 A JP2010278137 A JP 2010278137A JP 2010278137 A JP2010278137 A JP 2010278137A JP 5737922 B2 JP5737922 B2 JP 5737922B2
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- H—ELECTRICITY
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- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31144—Etching the insulating layers by chemical or physical means using masks
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
- H01L21/321—After treatment
- H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
- H01L21/32139—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer using masks
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76816—Aspects relating to the layout of the pattern or to the size of vias or trenches
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
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- H—ELECTRICITY
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- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/544—Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/09—Manufacture or treatment with simultaneous manufacture of the peripheral circuit region and memory cells
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/30—DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
- H10B12/48—Data lines or contacts therefor
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76804—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics by forming tapered via holes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/5442—Marks applied to semiconductor devices or parts comprising non digital, non alphanumeric information, e.g. symbols
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
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- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54426—Marks applied to semiconductor devices or parts for alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2223/00—Details relating to semiconductor or other solid state devices covered by the group H01L23/00
- H01L2223/544—Marks applied to semiconductor devices or parts
- H01L2223/54453—Marks applied to semiconductor devices or parts for use prior to dicing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Description
半導体基板上に第1の被加工膜を形成する工程と、
前記第1の被加工膜に第1のパターンを形成する工程と、
前記第1のパターンにおける所定の方向の寸法である第1の距離を測定する第1の測定工程と、
前記第1のパターン上に第2の被加工膜を形成する工程と、
前記第2の被加工膜上に形成したフォトレジストに第2のパターンを形成する工程と、
前記第2のパターンにおける所定の方向の寸法である第2の距離を測定する第2の測定工程と、
少なくとも前記第1および第2の距離を用いて、予め決められた重ね合わせ範囲から前記第1および第2のパターンの重ね合わせ範囲を修正する工程と、
前記フォトレジストと前記第1のパターン間の重ね合わせ値を測定する工程と、
測定された重ね合わせ値が修正された重ね合わせ範囲内かどうかを判定する工程と、
を有することを特徴とする。
20 第4の層間絶縁膜
20D ホールパターン
27A シリンダホール
100 DRAM
130 パーソナルコンピュータ(PC)
200 カメラ部
Claims (6)
- 半導体基板上に第1の被加工膜を形成する工程と、
前記第1の被加工膜に第1のパターンを形成する工程と、
前記第1のパターンにおける所定の方向の寸法である第1の距離を測定する第1の測定工程と、
前記第1のパターン上に第2の被加工膜を形成する工程と、
前記第2の被加工膜上に形成したフォトレジストに第2のパターンを形成する工程と、
前記第2のパターンにおける所定の方向の寸法である第2の距離を測定する第2の測定工程と、
少なくとも前記第1および第2の距離を用いて、予め決められた重ね合わせ範囲から前記第1および第2のパターンの重ね合わせ範囲を修正する工程と、
前記フォトレジストおよび前記第1のパターン間の重ね合わせ値を測定する工程と、
測定された重ね合わせ値が修正された重ね合わせ範囲内かどうかを判定する工程と、
を有することを特徴とする、半導体デバイスの製造方法。 - 請求項1記載の半導体デバイスの製造方法において、
前記予め決められた重ね合わせ範囲は、前記第1の距離の下限値と前記第2の距離の上限値の組み合わせによって最適化されていることを特徴とする、半導体デバイスの製造方法。 - 請求項1または2記載の半導体デバイスの製造方法において、
前記第2のパターンをエッチングマスクとして前記第2の被加工膜に第3のパターンを形成する工程と、
前記第3のパターンにおける所定の方向の寸法である第3の距離を測定する第3の測定工程と、をさらに有し、
前記第3の測定工程における前記第3の距離を測定するための領域である測定エリアが、前記第1の距離と前記修正された重ね合わせ範囲とのうち、少なくとも一方によって決定されることを特徴とする、半導体デバイスの製造方法。 - 請求項3記載の半導体デバイスの製造方法において、
前記修正された重ね合わせ範囲が、前記第2の距離に係数をかけた値と前記第1の距離との差を2等分した値であり、
前記係数は、前記第2の被加工膜の膜厚および前記第3のパターンを形成する際の加工条件に基づいて決定されることを特徴とする、半導体デバイスの製造方法。 - 請求項3または4記載の半導体デバイスの製造方法において、
前記第3の距離が測定できる範囲で、平面座標における前記第1のパターンの中心を基準にした前記第3のパターンの位置が異なる複数の画像を準備する工程をさらに有し、
前記測定エリアを決定する際、前記第1および前記第3のパターンを前記複数の画像と比較し、該第1および該第3のパターンの位置が実質的に一致する画像を該第1および該第3のパターンを囲む領域として前記測定エリアに決定することを特徴とする、半導体デバイスの製造方法。 - 請求項3から5のいずれか1項記載の半導体デバイスの製造方法において、
前記測定エリアが、前記第1の距離に対応する長さの複数の辺で、前記第1および前記第3のパターンを囲んだ領域となっていることを特徴とする、半導体デバイスの製造方法。
Priority Applications (2)
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JP2010278137A JP5737922B2 (ja) | 2010-12-14 | 2010-12-14 | 半導体デバイスの製造方法 |
US13/311,193 US20120149135A1 (en) | 2010-12-14 | 2011-12-05 | Semiconductor device manufacturing method that allows rework rate in manufacturing step to decrease |
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JP2010278137A JP5737922B2 (ja) | 2010-12-14 | 2010-12-14 | 半導体デバイスの製造方法 |
Publications (2)
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JP2012129303A JP2012129303A (ja) | 2012-07-05 |
JP5737922B2 true JP5737922B2 (ja) | 2015-06-17 |
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JP2010278137A Expired - Fee Related JP5737922B2 (ja) | 2010-12-14 | 2010-12-14 | 半導体デバイスの製造方法 |
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JP (1) | JP5737922B2 (ja) |
Families Citing this family (13)
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KR20140049313A (ko) * | 2012-10-17 | 2014-04-25 | 에스케이하이닉스 주식회사 | 반도체 소자의 정렬 키 및 이의 형성 방법 |
CN105143987B (zh) | 2013-03-12 | 2017-10-20 | 麦克罗尼克迈达塔有限责任公司 | 机械制造的对准基准方法和对准系统 |
WO2014140047A2 (en) | 2013-03-12 | 2014-09-18 | Micronic Mydata AB | Method and device for writing photomasks with reduced mura errors |
JP6208451B2 (ja) * | 2013-03-29 | 2017-10-04 | 国立大学法人東北大学 | 回路基板、電子ビーム発生装置、電子ビーム照射装置、電子ビーム露光装置、および製造方法 |
JP2014197652A (ja) * | 2013-03-29 | 2014-10-16 | 国立大学法人東北大学 | 回路基板、電子ビーム発生装置、電子ビーム照射装置、電子ビーム露光装置、および製造方法 |
WO2014156171A1 (ja) * | 2013-03-29 | 2014-10-02 | 国立大学法人東北大学 | 複数の電子ビームを制御する際に確実に動作する回路基板 |
JP6394491B2 (ja) | 2014-06-03 | 2018-09-26 | 株式会社デンソー | 熱電変換素子シートの製造方法、熱電変換装置の製造方法 |
JP2016180783A (ja) * | 2015-03-23 | 2016-10-13 | ルネサスエレクトロニクス株式会社 | 半導体装置および半導体装置の製造方法、パターンの重ね合わせ検査方法 |
JP6730851B2 (ja) * | 2016-06-01 | 2020-07-29 | キヤノン株式会社 | 決定方法、形成方法、プログラム、および物品の製造方法 |
US10373962B2 (en) * | 2017-05-26 | 2019-08-06 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device including trimmed-gates and method for generating layout of same |
KR102499041B1 (ko) * | 2019-01-10 | 2023-02-14 | 삼성전자주식회사 | 반도체 소자 형성 방법 |
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2010
- 2010-12-14 JP JP2010278137A patent/JP5737922B2/ja not_active Expired - Fee Related
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2011
- 2011-12-05 US US13/311,193 patent/US20120149135A1/en not_active Abandoned
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JP2012129303A (ja) | 2012-07-05 |
US20120149135A1 (en) | 2012-06-14 |
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