JP5675936B2 - 散乱計測を用いてオーバレイ誤差を検出する装置および方法 - Google Patents
散乱計測を用いてオーバレイ誤差を検出する装置および方法 Download PDFInfo
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Description
Xb=−F+f0(ターゲットBについて)、
Xc=+F−f0(ターゲットCについて)、および
Xd=−F−f0(ターゲットDについて)。
XaからXdについてのこれらオフセットは、本発明の技術を実施してオーバレイを決定するための任意の適切な値でありえる。例えばXaおよびXbは、XcおよびXdとは異なるf0の値を持ちえる。
1.異なる特性の2つ以上のサイトが画像化システムの視野内に配置される。
2.1つ以上のスペクトル範囲にわたって画像がキャプチャされる。
3.その視野内のそれぞれの計測サイトについて、そのサイト内にあると決定された全てまたは一部の画素が加算され、または結合されて、そのスペクトル範囲における、そのサイトの測光特性を特徴付ける。
4.ステップ3がそれぞれのスペクトル範囲について反復される。
5.その試料の特性を決定するために、それぞれのスペクトル範囲にわたる、それぞれのサイトについての結果が処理される。例えば、上述のスペクトル分析技術(すなわちF+f0)は、それぞれのターゲットについて得られたスペクトルに対して用いられる。
6.ウェーハにわたって所望の複数の計測サイトについて、ステップ1から5が反復される。
本発明のある実施形態によれば、スペクトルAからD(およびもし存在すればさらなるスペクトル)の獲得は、以下の任意のもの、または以下の装置の任意の組み合わせを備えうる光学装置を用いて実行される。すなわち、画像化反射率計、画像化分光反射率計、偏光分光画像化反射率計、走査型反射率計システム、パラレルデータ獲得が可能な2つ以上の反射率計を持つシステム、パラレルデータ獲得が可能な2つ以上の分光反射率計を持つシステム、パラレルデータ獲得が可能な2つ以上の偏光分光反射率計を持つシステム、ウェーハステージを移動させることなく、または他の光学要素または反射率計ステージを移動させることなくシリアルデータ獲得が可能な2つ以上の偏光分光反射率計を持つシステム、画像化分光計、波長フィルタを持つ画像化システム、ロングパス波長フィルタを持つ画像化システム、ショートパス波長フィルタを持つ画像化システム、波長フィルタを持たない画像化システム、干渉計測画像化システム(例えばLinnik顕微鏡、例えばカリフォルニア州、サンノゼのKLA−Tencorから入手可能なKLA−Tencorオーバレイ計測ツールモデル5100、5200、5300、Archer10などにおいて実現されるようなLinnik顕微鏡)、画像化偏光解析装置、画像化分光偏光解析装置、走査型偏光解析装置システム、パラレルデータ獲得が可能な2つ以上の偏光解析装置を持つシステム、ウェーハステージを移動させることなく、または他の光学要素または反射率計ステージを移動させることなくシリアルデータ獲得が可能な2つ以上の偏光解析装置を持つシステム、Michelson干渉計、Mach-Zehnder干渉計、またはSagnac干渉計、走査入射角システム、走査アジマス角システムである。
」える。この場合、画像化計測ツールが用いられえるが、一方、散乱計測は画像化リソグラフィから形成されたターゲットについて用いられる。このシナリオにおいて、画像化および散乱法計測の両方を組み込むシステムが好ましく、それにより異なるツールの仕様について適切な計測法を素速く選びえる。
Claims (10)
- 散乱計測マークのオーバレイ誤差、限界寸法またはプロファイルを決定するための散乱計測マークであって、
第1レイヤ上に配置される複数の第1周期的構造と、
第2レイヤ上に配置される複数の第2周期的構造と、
前記第1レイヤおよび前記第2レイヤの下に位置する第3レイヤ上に配置される複数の第3周期的構造と、を備え、
前記第3周期的構造は、前記第1周期的構造および前記第2周期的構造に垂直であり、
前記第1周期的構造および前記第2周期的構造から検出される複数の散乱信号であって、前記第1周期的構造および/または前記第2周期的構造のオーバレイ誤差、限界寸法またはプロファイルを決定するための複数の散乱信号のスペクトルの少なくとも一部、または前記検出される複数の散乱信号の少なくとも1つに、大きく影響しないよう、前記第3周期的構造の下に位置する複数の下部構造を遮蔽するように、前記第3周期的構造は1つ以上の特性を備える、散乱計測マーク。 - 請求項1に記載の散乱計測マークであって、
前記第3周期的構造が銅ダマシン材料を備える、散乱計測マーク。 - 請求項2に記載の散乱計測マークであって、
前記第3周期的構造の前記1つ以上の特性は、前記検出される複数の散乱信号のスペクトルの少なくとも一部、または前記検出される複数の散乱信号の少なくとも1つに、大きく影響しないよう、前記第3周期的構造によって前記下部構造を遮蔽するように選択される値を有するピッチと線幅とを含む、散乱計測マーク。 - 請求項2に記載の散乱計測マークであって、
前記第3周期的構造の前記1つ以上の特性は、前記検出される複数の散乱信号のスペクトルの少なくとも一部、または前記検出される複数の散乱信号の少なくとも1つに、大きく影響しないよう、前記第3周期的構造によって前記下部構造を遮蔽するように選択されるピッチ値を含む、散乱計測マーク。 - 請求項2に記載の散乱計測マークであって、
前記第3周期的構造の前記1つ以上の特性は、前記検出される複数の散乱信号のスペクトルの少なくとも一部、または前記検出される複数の散乱信号の少なくとも1つに、大きく影響しないよう、前記第3周期的構造によって前記下部構造を遮蔽するように選択される線幅値を含む、散乱計測マーク。 - 請求項2に記載の散乱計測マークであって、
前記第3周期的構造の前記1つ以上の特性は、前記検出される複数の散乱信号のスペクトルの少なくとも一部、または前記検出される複数の散乱信号の少なくとも1つに、大きく影響しないよう、前記第3周期的構造によって前記下部構造を遮蔽するように選択される高さ値を含む、散乱計測マーク。 - 請求項2に記載の散乱計測マークであって、
前記第3周期的構造の前記1つ以上の特性は、前記検出される複数の散乱信号のスペクトルの少なくとも一部、または前記検出される複数の散乱信号の少なくとも1つに、大きく影響しないよう、前記第3周期的構造によって前記下部構造を遮蔽するように選択される値を有するピッチ、線幅および線の高さを含む、散乱計測マーク。 - 請求項1に記載の散乱計測マークであって、
異なるセットの前記第1周期的構造と前記第2周期的構造との間に複数の異なる所定のオフセットが存在し、前記異なるセットの前記第1周期的構造および前記第2周期的構造からの複数の散乱信号を解析することによって、前記第1周期的構造と前記第2周期的構造との間のオーバレイ誤差を決定することができ、前記検出される複数の散乱信号は、+1および−1の回折次数を含む、散乱計測マーク。 - 請求項1のターゲットのオーバレイ誤差、限界寸法またはプロファイルを決定するための計測ツールの使用方法。
- 散乱計測ターゲットの限界寸法、またはプロファイルを決定する方法であって、
第1レイヤ上に配置される複数の第1周期的構造と、前記第1レイヤの下に位置する第2レイヤ上に配置される複数の第2周期的構造と、を備える散乱計測ターゲットを準備する工程であって、
前記第2周期的構造は、前記第1周期的構造に垂直であり、
前記第2周期的構造が存在しない場合に前記第1周期的構造から検出される複数の散乱信号と比較して、前記第1周期的構造から検出される散乱信号であって、前記第1周期的構造の限界寸法またはプロファイルを決定するための散乱信号の、前記第2周期的構造の下に位置する複数の下部構造に対する感度が低くなるように、前記第2周期的構造は1つ以上の特性を備える、散乱計測ターゲットの準備工程と、
計測ツールを用いて、前記ターゲットに照射する工程と、
計測ツールを用いて、前記ターゲットからの複数の散乱信号を検出する工程であって、
前記第2周期的構造は、前記第2周期的構造の下に位置する下部構造の上にバリアを形成し、これにより、前記下部構造は、前記第1周期的構造からの前記検出される複数の散乱信号に大きく影響しない、散乱信号の検出工程と、
前記検出される複数の散乱信号に基づいて、前記第1周期的構造の限界寸法またはプロファイルを決定する工程と、を備える方法。
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