JP2019513189A5 - - Google Patents

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JP2019513189A5
JP2019513189A5 JP2018550811A JP2018550811A JP2019513189A5 JP 2019513189 A5 JP2019513189 A5 JP 2019513189A5 JP 2018550811 A JP2018550811 A JP 2018550811A JP 2018550811 A JP2018550811 A JP 2018550811A JP 2019513189 A5 JP2019513189 A5 JP 2019513189A5
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substrate
support roller
precursor
thin film
zone
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JP2018550811A
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Priority claimed from PCT/US2017/024096 external-priority patent/WO2017172531A1/en
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Claims (14)

  1. 基材の第1表面上にある第1の縁部領域を第1の支持ローラに係合することであって、前記第1の支持ローラはシャフトの第1の端部を中心として回転可能であり、前記基材はその幅よりもかなり長い長さを有する、係合することと、
    前記基材の前記第1表面上にある第2の縁部領域を第2の支持ローラに係合することであって、前記第2の支持ローラは前記その第1の端部とは反対側の前記シャフトの第2の端部を中心として回転可能であり、前記第1のローラと前記第2のローラとの間にあり前記基材の幅の少なくとも約50%で構成される中央領域はローラによる支持がない、係合することと、
    前記第1の支持ローラ及び前記第2の支持ローラ上で前記基材を運搬することと、
    前記基材上に薄膜を形成するのに十分な回数、
    (a)前記基材を第1の前駆体に暴露するステップ及び
    (b)前記基材を前記第1の前駆体に暴露した後、反応種を前記基材に供給して前記第1の前駆体と反応させるステップの、
    シーケンスを繰り返すことであって、
    前記薄膜を、前記第1の前駆体と前記反応種との反応生成物として形成する、繰り返すことと、
    前記薄膜上に蒸気を堆積させて前記薄膜上にコーティングを形成することと、
    を含む、方法。
  2. 前記薄膜上に前記蒸気を堆積させる前に前記基材を冷却すること、を更に含む、請求項1に記載の方法。
  3. 前記基材を前記第1の前駆体に暴露する前に前記基材を加熱すること、を含む、請求項1又は2に記載の方法。
  4. 前記その第1表面とは反対側の前記基材の第2表面が、前記反応種と実質的に接触しない、請求項1〜3のいずれか一項に記載の方法。
  5. 前記蒸気を前記薄膜上に堆積することが、前記薄膜が前記基材の幅の50%より広く覆う固体表面に接触する前に起こる、請求項1〜4のいずれか一項に記載の方法。
  6. 前記薄膜は3nm〜20nmの厚さを有する、請求項1〜5のいずれか一項に記載の方法。
  7. 前記繰り返すステップは、(c)ステップ(b)の後に、前記基材を第2の前駆体に暴露することと、(d)前記基材を前記第2の前駆体に暴露した後に反応種を前記基材に供給することと、を更に含む、請求項1〜6のいずれか一項に記載の方法。
  8. 前記支持ローラのうちの少なくとも一方を前記基材の運動方向に対してある角度に向けること、を更に含む、請求項1〜7のいずれか一項に記載の方法
  9. 第1の前駆体が導入されている第1のゾーンと、
    第2の前駆体が導入されている第2のゾーンと、
    前記第1のゾーンと前記第2のゾーンとの間にあり、反応種が発生している第3のゾーンと、
    前記基材の単一の主表面に接触している少なくとも2つの支持ローラを備える基材運搬機構であって、
    前記基材は第1の縁部及び第2の縁部を有し、前記支持ローラは、
    前記基材の第1の縁部領域に接触している第1の支持ローラ及び
    前記基材の第2の縁部領域に接触している第2の支持ローラを備え、
    前記基材は前記基材の幅の少なくとも約50%で構成され、前記第1の支持ローラと前記第2の支持ローラとの間の非接触領域を含む基材運搬機構と、
    蒸気を発生させる蒸気源を備える蒸気処理システムと、
    を備える、システム。
  10. 前記基材を加熱する加熱システムを更に備える、請求項に記載のシステム。
  11. 前記基材を冷却する冷却システムを更に備える、請求項又は10に記載のシステム。
  12. 前記蒸気から前記基材上に堆積された液体モノマー又は液体オリゴマーの重合を開始するために構成された硬化源を更に備える、請求項11のいずれか一項に記載のシステム。
  13. 反応種を前記第3のゾーンに供給するフリーラジカル発生器を更に備える、請求項12のいずれか一項に記載のシステム。
  14. 前記基材の運動方向の変化中に前記基材を支持するアイドルローラを更に備える、請求項13のいずれか一項に記載のシステム。
JP2018550811A 2016-04-01 2017-03-24 ロールツーロール原子層堆積装置及び方法 Pending JP2019513189A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201662316886P 2016-04-01 2016-04-01
US62/316,886 2016-04-01
PCT/US2017/024096 WO2017172531A1 (en) 2016-04-01 2017-03-24 Roll-to-roll atomic layer deposition apparatus and method

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JP2019513189A JP2019513189A (ja) 2019-05-23
JP2019513189A5 true JP2019513189A5 (ja) 2020-04-30

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US (1) US20190112711A1 (ja)
EP (1) EP3436620A1 (ja)
JP (1) JP2019513189A (ja)
KR (1) KR20180130548A (ja)
CN (1) CN108884567A (ja)
SG (1) SG11201808424UA (ja)
TW (1) TW201802291A (ja)
WO (1) WO2017172531A1 (ja)

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