WO2015024339A1 - 基板干燥装置及基板清洗系统 - Google Patents

基板干燥装置及基板清洗系统 Download PDF

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Publication number
WO2015024339A1
WO2015024339A1 PCT/CN2013/089484 CN2013089484W WO2015024339A1 WO 2015024339 A1 WO2015024339 A1 WO 2015024339A1 CN 2013089484 W CN2013089484 W CN 2013089484W WO 2015024339 A1 WO2015024339 A1 WO 2015024339A1
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WIPO (PCT)
Prior art keywords
substrate
drying
air
chamber
cleaning system
Prior art date
Application number
PCT/CN2013/089484
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English (en)
French (fr)
Inventor
朱攀
王涛
陈启超
关江兵
吴磊
Original Assignee
京东方科技集团股份有限公司
北京京东方显示技术有限公司
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Publication of WO2015024339A1 publication Critical patent/WO2015024339A1/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Definitions

  • the present invention relates to the field of display technology, and in particular to a substrate drying apparatus and a substrate cleaning system. Background technique
  • a glass substrate is generally used as a substrate to form a color film substrate and an array substrate, and the glass substrate is washed by a substrate cleaning system before the color film substrate is formed, so that the surface of the substrate is kept high. Cleanliness.
  • the current substrate cleaning system uses a conveyor belt to transport the glass substrate, and the glass substrate is sequentially cleaned by a brush cleaning device, a high pressure jet cleaning device, a shower device, a rinsing device, and the glass substrate is dried by the air knife device after cleaning. .
  • the invention provides a substrate drying device and a substrate cleaning system for improving the cleanliness of the substrate, thereby improving the coating effect of the photoresist coated on the substrate in the subsequent process.
  • the invention provides a substrate drying device, comprising:
  • a first drying member for drying the upper surface of the substrate and a second drying member for drying the lower surface of the substrate are provided.
  • the cleaned substrate is dried by the substrate drying device, so that the water remaining on the substrate after the cleaning is evaporated, thereby improving the cleanliness of the substrate, thereby improving the lithography in the subsequent process.
  • the coating effect of the glue thereby improving the product quality of the produced display device.
  • each of the first drying member and the second drying member is an electric heating member for baking the upper surface and the lower surface of the substrate.
  • each of the first drying member and the second drying member is a blowing device having a plurality of air outlets for blowing heated gas to the upper surface and the lower surface of the substrate.
  • the first drying component is a blowing device having an air inlet and a plurality of air outlets for sending hot air to the upper surface. The remaining water is dried by the hot air sent out.
  • the second drying component comprises a chamber through which the heating gas flows, and at least one heating unit disposed in the chamber; the air outlet of the chamber is in gas communication with the air inlet of the air blowing device.
  • the water generated by the second drying member dries the water on the lower surface of the substrate, and the second drying member heats the hot air flowing into the air blowing device.
  • a plurality of heating units are disposed in the chamber of the second drying member, and the plurality of heating units are staggered on the upper surface and the lower surface of the chamber to form a curved airflow in the chamber. aisle.
  • a plurality of heating units staggered on the upper surface and the lower surface of the chamber are used to form a tortuous air flow passage, which improves the heat of the gas blown by the air blowing device and more thoroughly dries the substrate.
  • the second drying component further includes a plurality of flaps disposed in the chamber, the plurality of flaps being staggered on the upper surface and the lower surface of the chamber to form a curved chamber Air flow channel.
  • the spacers disposed on the upper and lower surfaces of the chamber further increase the contact of the gas with the heating unit in the flow, thereby improving the heating effect of the gas.
  • the substrate drying device further includes an air pump, and the air pump is connected to an air inlet of the chamber of the second drying component, and is configured to pump airflow into the chamber to improve the first drying component.
  • the drying effect is connected to an air inlet of the chamber of the second drying component, and is configured to pump airflow into the chamber to improve the first drying component. The drying effect.
  • the heating unit is a ceramic heating sheet or a metal heating sheet.
  • the use of metal heating sheets or ceramic heating sheets has the advantages of faster temperature rise and high energy utilization.
  • the present invention also provides a backwashing system comprising: a transfer device for transferring a substrate; an air knife device sequentially disposed in a direction in which the transfer device transports the substrate; and any one of the above substrates is dried Device.
  • the substrate is cleaned during the conveying process of the conveying device, and is dried by the substrate drying device after passing through the air knife device, so that the water remaining on the substrate after the cleaning is evaporated, thereby improving the cleanliness of the substrate. Moreover, the coating effect of the photoresist in the subsequent process is improved, thereby improving the product quality of the produced display device.
  • a partition plate is disposed between the air knife device and the substrate drying device. Through the partition plate, the airflow blown by the air knife device and the air blowing device is prevented from intersecting, thereby affecting the treatment effect of the reverse.
  • the substrate cleaning system further includes: a baffle disposed on both sides of the conveying device, wherein the air blown by the air knife device and the air blowing device flows in the direction of the substrate, thereby improving energy utilization. rate.
  • the backwashing system further comprises: a heat exhaust duct located on a leeward side of the air outlet of the air blowing device.
  • the airflow containing water vapor is carried away through the hot exhaust duct provided to prevent the water vapor from being cooled and attached to the substrate again.
  • the air inlet of the hot air exhaust duct has a flared structure.
  • the flaring structure improves the contact area between the hot exhaust duct and the airflow, and improves the effect of exhausting air.
  • the conveying device is a conveyor belt having a supporting gap.
  • the support substrate can be smoothly transferred by the belt, and the support gap on the conveyor belt enables the heat of the second heating member to be quickly dissipated to the substrate and to dry the substrate.
  • FIG. 1 is a top perspective view of a poor cleaning system according to an embodiment of the present invention.
  • FIG. 2 is a side perspective view of a back cleaning system according to an embodiment of the present invention.
  • FIG. 3 is a schematic structural view of a reverse drying device according to an embodiment of the present invention.
  • FIG. 4 is a schematic structural view of a second drying component of the anti-drying device according to an embodiment of the present invention.
  • the present invention provides a substrate drying device and a substrate cleaning system.
  • the upper surface and the lower surface of the cleaned substrate are respectively dried by using a substrate drying device, thereby improving the cleanliness of the substrate, thereby improving the coating effect of the photoresist, and the production.
  • the product quality of the display device In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be further described in detail by way of non-limiting example.
  • FIG. 1 is a top perspective view of a substrate cleaning system according to an embodiment of the present invention
  • FIG. 2 is a side perspective view of a back cleaning system according to an embodiment of the present invention
  • It is a schematic structural diagram of a substrate drying device provided by an embodiment of the present invention.
  • a substrate drying device 30 according to an embodiment of the invention includes:
  • the substrate 70 is cleaned by a brush cleaning device, a high-pressure jet cleaning device, a shower device, a rinsing device, and then passed through the air knife device 20 to the substrate before being dried by the substrate drying device 30. 70 is blown dry. Thereafter, the water remaining on the substrate 70 is dried by the substrate drying device 30. Specifically, the upper surface of the substrate 70 is dried by the first drying member 31, and the lower surface of the substrate 70 is dried by the second drying member 32. Thereby, the cleanliness of the substrate 70 is improved. Further, the coating effect of the photoresist in the subsequent process is improved, and the product quality of the produced display device is improved.
  • FIG. 3 is a schematic structural diagram of a reverse drying device 30 according to an embodiment of the present invention.
  • the first drying member 31 and the second drying member 32 may adopt the same or different structures, such as:
  • the drying member 31 and the second drying member 32 are both electrically heated members, respectively baking the upper surface and the lower surface of the substrate 70; or the first drying member 31 and the second drying member 32 each have a plurality of air outlets
  • the air blowing device, the blown gas is a gas heated by the heating device; or one of the first drying member 31 and the second drying member 32 is an electric heating member with a gas flow passage, and the other drying
  • the dry member is a blowing device that communicates with the air flow passage to dry one side of the substrate 70 by the heated gas blown from the air blowing device, and to dry the other side of the substrate 70 by baking of the electric heating member. .
  • the first drying member 31 is a blower having an air inlet and a plurality of air outlets for sending heated gas to the upper surface of the y 355.
  • 4 is a schematic structural view of a second drying member 32 of the anti-drying device according to an embodiment of the present invention.
  • the second drying member 32 includes a chamber 33 through which hot gas can flow, and a plurality of heating units 34 disposed in the chamber 33; an air outlet of the chamber 33 and the first drying member 31 The air inlet of the air supply device is connected.
  • An air flow passage 35 is formed between the plurality of heating units 34 in the chamber 34.
  • the air flow passage 35-end is in communication with the air pump, and the other end of the air flow passage 35 and the air supply device as the first drying member 31 are advanced.
  • the first drying member 31 employs a blower that blows gas from a plurality of air outlets thereof.
  • the gas is heated by the heating unit 34 of the second drying member 32, and the water remaining in the substrate 70 is cleaned by the flow rate of the gas and the heat, and the water remaining on the lower surface of the substrate 70 is baked by the second drying member 32. dry. Therefore, the substrate 70 is cleaned by using a substrate drying device having a different structure for the pre-treatment result of the substrate 70, thereby achieving the drying effect and saving energy.
  • a plurality of heating units 34 are disposed on the inner wall of the chamber 33, and a plurality of heating units 34 are in the chamber. 33 is interlaced on the inner wall.
  • a plurality of heating units 34 are alternately disposed on the upper and lower surfaces of the chamber 33 to form a tortuous air flow passage 35 for sufficiently passing the gas flowing through the air flow passage 35 with the heating unit. The contact of 34 increases the heat of the gas blown by the air blowing means, thereby drying the liquid crystal substrate 70 more thoroughly.
  • the second drying member 32 may further include a plurality of flaps (not shown) disposed in the chamber 33, the plurality of flaps being staggered in the cavity
  • a curved air flow passage is formed in the chamber, which increases the flow time of the gas in the chamber 33, and facilitates sufficient heating of the gas.
  • the heating unit 34 may be a ceramic heating sheet or a metal heating sheet, but the invention is not limited thereto, as long as it is a heating sheet capable of having a relatively rapid temperature rise and a high energy utilization rate.
  • the embodiment of the invention further provides an anti-cleaning system, comprising:
  • Transfer device for transferring the substrate 10
  • the air knife device 20 and the above-described substrate drying device 30 are sequentially disposed in the direction in which the transfer device transports the substrate 70. Among them, the first drying member 31 is located above the conveying device 10, and the second drying member 32 is located below the conveying device 10.
  • the first drying member 31 and the second drying member 32 simultaneously act to dry the water remaining on the substrate 70.
  • the substrate cleaning system of the above embodiment further includes a spacer 40 disposed between the air knife device 20 and the substrate drying device 30.
  • a spacer 40 disposed between the air knife device 20 and the substrate drying device 30.
  • the substrate cleaning system further includes: a baffle 60 disposed on both sides of the conveying device 10. The gas blown by the air knife device 20 and the air blowing device is caused to flow in the direction of the substrate 70 by the baffle 60, thereby improving the utilization of energy.
  • the hot air exhaust duct 50 is provided on the leeward side of the air outlet of the air blowing means.
  • the airflow containing water vapor is carried away through the set hot exhaust duct 50 to prevent the water vapor from being cooled and attached to the substrate 70 again, thereby improving the drying effect of the substrate drying device 30.
  • the air inlet of the hot exhaust duct 50 has a flared structure (not shown). The flaring structure improves the contact area between the hot exhaust duct 50 and the airflow, and improves the effect of exhausting air.
  • the conveying device 10 is a conveyor belt having a supporting gap. Adopting a belt to transmit a smooth branch The substrate 70 is supported, and the support gap on the conveyor belt enables the heat of the second heating member to be quickly dissipated to the substrate 70, and the substrate 70 is dried.
  • the spirit and scope of the Ming Thus, it is intended that the present invention cover the modifications and the modifications of the invention

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Solid Materials (AREA)
  • Liquid Crystal (AREA)
  • Cleaning In General (AREA)

Abstract

一种基板干燥装置（30）及基板清洗系统。所述基板干燥装置（30）包括：用于烘干基板（70）上表面的第一烘干部件（31）以及用于烘干基板（70）下表面的第二烘干部件（32）。清洗后的基板（70），通过基板干燥装置（30）进行烘干，使清洗完后残存在基板（70）上的水泽蒸发掉，提高了基板（70）的清洁度，进而改善了后续工序中光刻胶的涂覆效果，从而提高了生产出的显示装置的产品质量。

Description

基板干燥装置及基板清洗系统 技术领域
本发明涉及显示技术领域， 特别涉及到一种基板干燥装置及基板清洗系 统。 背景技术
在液晶显示设备的制作过程中，通常采用玻璃基板作为衬底来制作彩膜基 板和阵列基板， 在制作彩膜基板之前需通过基板清洗系统将玻璃基板冲洗干 净， 使基板的表面保持较高的清洁度。
目前的基板清洗系统采用传送带传送玻璃基板，使玻璃基板依次通过毛刷 清扫装置、 高压喷气清扫装置、 喷淋装置、 冲洗装置进行清洗， 并在清洗完后 通过风刀装置对玻璃基板进行吹干。
然而， 随着液晶面板的精度及分辨率不断增加， 同时， 在生产加工时玻璃 基板不断增大， 采用现有技术中的基板清洗系统清洗的玻璃基板上会轻微残存 一些水泽， 从而造成后续工序中涂覆的光刻胶发生脱落， 影响到生产出的液晶 显示装置的产品质量。 发明内容
本发明提供了一种基板干燥装置及基板清洗系统， 用以提高基板的清洁 度， 进而提高后续工序中涂覆在基板上的光刻胶的涂覆效果。
本发明提供了一种基板干燥装置， 包括：
用于烘干基板上表面的第一烘干部件以及用于烘干基板下表面的第二烘 干部件。
在上述技术方案中， 通过基板干燥装置烘干清洗后的基板， 使清洗完后残 存在基板上的水泽蒸发掉， 提高了基板的清洁度， 进而改善了后续工序中光刻 胶的涂覆效果， 从而提高了生产出的显示装置的产品质量。
优选的， 所述第一烘干部件和所述第二烘干部件中的每一个均为电加热部 件， 用以对基板的上表面和下表面进行烘烤。
优选的， 所述第一烘干部件和第二烘干部件中的每一个均为具有多个出风 口的送风装置， 用于向基板的上表面和下表面吹出经过加热的气体。
优选的， 所述第一烘干部件为具有进风口和多个出风口的送风装置， 用于 向_1 ^反上表面送出热风。 通过送出的热气流吹干_1 ^反上残存的水泽。
优选的， 所述第二烘干部件包括供热气体流通的腔室， 以及设置在腔室内 的至少一个加热单元； 所述腔室的出风口与所述送风装置的进风口气体连通。 通过第二烘干部件产生的热量将基板下表面的水泽烘干， 同时， 第二烘干部件 对进入到送风装置的热气流进行加热。
优选的， 所述第二烘干部件的所述腔室内设置多个加热单元， 所述多个加 热单元交错设置在所述腔室的上表面和下表面，使所述腔室内形成弯曲的气流 通道。 采用在所述腔室上表面和下表面交错设置的多个加热单元， 从而形成曲 折的气流通道， 提高了送风装置吹出的气体的热量， 更加彻底的烘干基板。
优选的， 所述第二烘干部件还包括设置在所述腔室内的多个挡片， 所述多 个挡片交错设置在腔室的上表面和下表面， 使所述腔室内形成弯曲的气流通 道。通过交错设置在腔室的上表面和下表面上的挡片进一步增加了气体在流动 中与加热单元的接触， 提高了气体的加热效果。
优选的， 所述基板干燥装置还包括气泵， 所述气泵与所述第二烘干部件的 所述腔室的进风口连接， 用于向所述腔室泵入气流， 提高第一烘干部件的烘干 效果。
可选择的， 所述加热单元为陶瓷加热片或金属加热片。 采用金属加热片或 陶瓷加热片， 具有较快的温升且能量利用率高的优点。
本发明还提供了一种 反清洗系统， 包括： 传送基板的传送装置； 沿传送装置传送基板的方向依次设置的风刀装置和上述任一种基板干燥 装置。
在上述技术方案中， 基板在传送装置传送的过程中进行清洗， 并在经过风 刀装置后通过基板干燥装置烘干， 使清洗完后残存在基板上的水泽蒸发掉， 提 高了基板的清洁度， 进而改善了后续工序中光刻胶的涂覆效果， 从而提高了生 产出的显示装置的产品质量。
优选的， 所述风刀装置和基板干燥装置之间设有隔板。 通过隔板避免风刀 装置和送风装置吹出的气流出现交叉从而影响到对^反的处理效果。
优选的， 所述基板清洗系统还包括： 设置于所述传送装置两侧的挡板， 用 以使所述风刀装置和所述送风装置吹出的气体沿基板方向流动，提高了能量的 利用率。
优选的， 所述 反清洗系统还包括： 热排风管道， 位于所述送风装置出风 口的下风侧。 通过设置的热排风管道将含有水蒸气的气流带走， 避免水蒸气冷 却后再次附着到基板上。
优选的， 所述热风排风管道的进风口具有扩口结构。 通过扩口结构提高了 热排风管道与气流的接触面积， 提高了排风的效果。
优选的， 所述传送装置为具有支撑间隙的传送带。 采用带传送能够平稳的 支撑基板，且传送带上的支撑间隙使得第二加热部件的热量能够快速的散发到 基板， 并对基板烘干。 附图说明
图 1为本发明实施例提供的差 清洗系统的俯视透视图；
图 2为本发明实施例提供的^反清洗系统的侧视透视图；
图 3为本发明实施例提供的^反干燥装置的结构示意图；
图 4为本发明实施例提供的 反干燥装置的第二烘干部件的结构示意图。 附图标记：
10-传送装置 20-风刀装置 30-基板干燥装置 31-第一烘干部件 32-第二烘干部件 33-腔室
34-加热单元 35-气流通道 40-隔板
50-热排风管道 60-挡板 70-基板 具体实施方式
为了提高基板的清洁效果， 从而改善后续工序中光刻胶的涂覆效果， 进而 提高生产出的液晶显示装置的产品质量， 本发明提供了一种基板干燥装置及基 板清洗系统。 在本发明提供的技术方案中， 通过采用基板干燥装置分别对清洗 后的基板的上表面和下表面进行烘干， 提高了基板的清洁度， 进而提高了光刻 胶的涂覆效果， 以及生产出的显示装置的产品质量。 为使本发明的目的、 技术 方案和优点更加清楚， 以下以非限制性的实施例为例对本发明作进一步详细说 明。
如图 1、 图 2和图 3所示， 图 1为本发明实施例提供的基板清洗系统的俯 视透视图； 图 2为本发明实施例提供的^反清洗系统的侧视透视图； 图 3为本 发明实施例提供的基板干燥装置的结构示意图。
本发明实施例提供的一种基板干燥装置 30, 包括：
用于烘干基板 70上表面的第一烘干部件 31以及用于烘干基板下表面的第 二烘干部件 32。
在该实施例中， 基板 70在经基板干燥装置 30烘干之前， 通过毛刷清扫装 置、 高压喷气清扫装置、 喷淋装置、 冲洗装置进行清洗， 并在清洗完后通过风 刀装置 20对基板 70进行吹干。 之后， 再通过基板干燥装置 30烘干残存在基 板 70上的水泽。 具体的， 通过第一烘干部件 31来烘干基板 70的上表面， 通 过第二烘干部件 32来烘干基板 70的下表面。 从而提高基板 70的清洁度。 进 而改善后续工序中光刻胶的涂覆效果， 提高了生产出的显示装置的产品质量。
如图 3所示， 图 3为本发明实施例提供的 反干燥装置 30的结构示意图。 第一烘干部件 31和第二烘干部件 32可以采用相同的或不同的结构， 如： 第一 烘干部件 31和第二烘干部件 32均为电加热部件， 分别烘烤基板 70的上表面 和下表面； 或第一烘干部件 31和第二烘干部件 32均为具有多个出风口的送风 装置， 吹出的气体为经过加热装置加热过的气体； 或第一烘干部件 31和第二 烘干部件 32中的一个烘干部件为带有气流通道的电加热部件， 另一个烘干部 件为与所述气流通道连通的送风装置， 以通过从送风装置吹出的加热过的气体 来烘干基板 70的一面， 以及通过电加热部件的烘烤来烘干基板 70的另一面。
作为一种优选方案， 第一烘干部件 31 为具有进风口和多个出风口的送风 装置， 用于向 _ί ^反 70上表面送出加热过的气体。 图 4为本发明实施例提供的 反干燥装置的第二烘干部件 32的结构示意图。所述第二烘干部件 32包括可 供热气体流通的腔室 33 , 以及设置在腔室 33内的多个加热单元 34; 所述腔室 33的出风口与作为第一烘干部件 31的送风装置的进风口连通。 其中， 腔室 34 内的多个加热单元 34之间形成气流通道 35,所述气流通道 35—端与气泵连通， 气流通道 35的另一端与作为第一烘干部件 31的送风装置的进风口连通。 由于 在清洗基板 70时， 喷淋装置等都是从上方喷淋到基板 70上， 因此， 第一烘干 部件 31采用送风装置， 该送风装置将气体从其多个出风口吹出前要经第二烘 干部件 32的加热单元 34对气体进行加热，通过气体的流速以及热量对基板 70 残存的水泽进行清洗， 对于残存在基板 70下表面的水泽， 通过第二烘干部件 32进行烘干。 从而针对基板 70的前期处理结果采用不同结构的基板干燥装置 对基板 70进行清洗， 既达到了烘干的效果， 又节约了能源。
继续参考图 4,上述实施例中，为了使经过第二烘干部件 32的气体能够充 分加热，在腔室 33内壁上设置了多个加热单元 34,且多个加热单元 34在所述 腔室 33内壁上交错设置。 在图 4所示的实施中， 多个加热单元 34交错设置在 所述腔室 33的上表面和下表面上， 从而形成曲折的气流通道 35, 使流经气流 通道 35的气体充分与加热单元 34接触， 提高了送风装置吹出的气体的热量， 从而更加彻底的烘干液晶基板 70。 更进一步的， 第二烘干部件 32还可以包括 设置在所述腔室 33内的多个挡片 （图中未示出）， 所述多个挡片交错设置在腔 室 33内壁上， 使所述腔室内形成弯曲的气流通道， 增加了气体在腔室 33内的 流动时间， 便于气体的充分加热。 其中， 加热单元 34可以为陶瓷加热片或金 属加热片， 但是本发明不限于此， 只要为能够具有较快的温升和较高的能量利 用率的加热片即可。
本发明实施例还提供了一种 反清洗系统， 包括：
传送基板的传送装置 10;
沿传送装置传送基板 70的方向依次设置的风刀装置 20和上述任一种基板 干燥装置 30。其中， 第一烘干部件 31位于传送装置 10的上方， 第二烘干部件 32位于传送装置 10的下方。
在基板 70经过基板烘干装置 30时， 通过第一烘干部件 31和第二烘干部 件 32同时作用， 烘干残存在基板 70上的水泽。
继续参考图 1 , 上述实施例中的基板清洗系统还包括设置于风刀装置 20 和基板干燥装置 30之间的隔板 40。 通过设置隔板 40来避免风刀装置 20和作 为基板干燥装置 30中的第一烘干部件 31和 /或第二烘干部件 32的送风装置吹 出的气流出现交叉形成乱流影响到对 反 70的处理效果。
继续参考图 1 , 为了进一步提高基板干燥装置 30对基板 70的烘干效果， 较佳的， 基板清洗系统还包括： 设置于所述传送装置 10两侧的挡板 60。 通过 挡板 60使风刀装置 20和送风装置吹出的气体沿基板 70方向流动， 提高了能 量的利用率。
此外， 为了避免对基板 70进行处理后送风装置吹出的热气流携带的水蒸 气在基板 70上再次冷凝， 在送风装置出风口的下风侧设置热排风管道 50。 通 过设置的热排风管道 50将含有水蒸气的气流带走， 避免水蒸气冷却后再次附 着到基板 70上， 提高了基板干燥装置 30的烘干效果。 更佳的， 热排风管道 50 的进风口具有扩口结构（图中未示出）。 通过扩口结构提高了热排风管道 50与 气流的接触面积， 提高了排风的效果。
其中， 传送装置 10为具有支撑间隙的传送带。 采用带传送能够平稳的支 撑基板 70,且传送带上的支撑间隙使得第二加热部件的热量能够快速的散发到 基板 70, 并对基板 70烘干。 明的精神和范围。 这样， 倘若本发明的这些修改和变型属于本发明权利要求及 其等同技术的范围之内， 则本发明也意图包含这些改动和变型在内。

Claims

权 利 要 求 书
1、 一种基板干燥装置， 其特征在于， 包括：
用于烘干基板上表面的第一烘干部件以及用于烘干基板下表面的第二烘 干部件。
2、 如权利要求 1所述的基板干燥装置， 其特征在于， 所述第一烘干部件 和所述第二烘干部件中的每一个均为电加热部件， 用以对基板的上表面和下表 面进行烘烤。
3、 如权利要求 1所述的基板干燥装置， 其特征在于， 所述第一烘干部件 和第二烘干部件中的每一个均为具有多个出风口的送风装置， 用于向基板的上 表面和下表面吹出经过加热的气体。
4、 如权利要求 1所述的基板干燥装置， 其特征在于， 所述第一烘干部件 为具有进风口和多个出风口的送风装置， 用于向 ¾ 上表面送出热风。
5、 如权利要求 4所述的基板干燥装置， 其特征在于， 所述第二烘干部件 包括供热气体流通的腔室， 以及设置在腔室内的至少一个加热单元； 所述腔室 的出风口与所述送风装置的进风口气体连通。
6、 如权利要求 5所述的基板干燥装置， 其特征在于， 所述第二烘干部件 的所述腔室内设置多个加热单元， 所述多个加热单元交错设置在所述腔室内壁 的上表面和下表面， 使所述腔室内形成弯曲的气流通道。
7、 如权利要求 6所述的基板干燥装置， 其特征在于， 所述第二烘干部件 还包括设置在所述腔室内的多个挡片， 所述多个挡片交错设置在所述腔室的上 表面和下表面， 使所述腔室内形成弯曲的气流通道。
8、 如权利要求 7所述的基板干燥装置， 其特征在于， 还包括气泵， 所述 气泵与所述第二烘干部件的所述腔室的进风口连接， 用于向所述腔室泵入气 流。
9、 如权利要求 5~8任一项所述的基板干燥装置， 其特征在于， 所述加热 单元为陶瓷加热片或金属加热片。
10、 一种 反清洗系统， 其特征在于， 包括：
传送基板的传送装置；
沿传送装置传送基板的方向依次设置的风刀装置和如权利要求 1~3任一项 所述的基板干燥装置。
11、 如权利要求 10任一项所述的基板清洗系统， 其特征在于， 所述传送 装置为具有支撑间隙的传送带。
12、 一种 反清洗系统， 其特征在于， 包括：
传送基板的传送装置；
沿传送装置传送基板的方向依次设置的风刀装置和如权利要求 4~9任一项 所述的基板干燥装置。
13、 如权利要求 12所述的基板清洗系统， 其特征在于， 所述风刀装置和 所述基板干燥装置之间设有隔板。
14、 如权利要求 12所述的基板清洗系统， 其特征在于， 还包括： 设置于 所述传送装置两侧的挡板， 以使所述风刀装置和所述送风装置吹出的气体沿基 板方向流动'
15、 如权利要求 12所述的基板清洗系统， 其特征在于， 还包括： 热排风 管道， 位于所述送风装置出风口的下风侧。
16、 如权利要求 15所述的基板清洗系统， 其特征在于， 所述热风排风管 道的进风口具有扩口结构。
17、 如权利要求 12~16任一项所述的基板清洗系统， 其特征在于， 所述传 送装置为具有支撑间隙的传送带。
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