CY1121199T1 - Μεθοδος για την εφαρμογη επικαλυψεων λεπτου υμενιου και γραμμη παραγωγης για την εκτελεση της μεθοδου - Google Patents

Μεθοδος για την εφαρμογη επικαλυψεων λεπτου υμενιου και γραμμη παραγωγης για την εκτελεση της μεθοδου

Info

Publication number
CY1121199T1
CY1121199T1 CY20181101223T CY181101223T CY1121199T1 CY 1121199 T1 CY1121199 T1 CY 1121199T1 CY 20181101223 T CY20181101223 T CY 20181101223T CY 181101223 T CY181101223 T CY 181101223T CY 1121199 T1 CY1121199 T1 CY 1121199T1
Authority
CY
Cyprus
Prior art keywords
roller
thin film
film coatings
chamber
production line
Prior art date
Application number
CY20181101223T
Other languages
English (en)
Inventor
Ayrat Khamitovich Khisamov
Original Assignee
The Batteries spólka z ograniczona odpowiedzialnoscia
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by The Batteries spólka z ograniczona odpowiedzialnoscia filed Critical The Batteries spólka z ograniczona odpowiedzialnoscia
Publication of CY1121199T1 publication Critical patent/CY1121199T1/el

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
  • Surface Treatment Of Optical Elements (AREA)

Abstract

Η ομάδα εφευρέσεων αναφέρεται σε γραμμές παραγωγής, ιδιαιτέρως σε εγκαταστάσεις επεξεργασίας υπό κενό, και σε μια μέθοδο για την εφαρμογή επικαλύψεων λεπτών υμενίων με δεδομένα οπτικά, ηλεκτρικά και άλλα χαρακτηριστικά. Η προαναφερόμενη γραμμή παραγωγής για την εφαρμογή επικαλύψεων λεπτών υμενίων περιέχει έναν θάλαμο υδατοφράκτη εισόδου, έναν θάλαμο επεξεργασίας που έχει, διαδοχικά παρεχόμενα σε αυτόν: τουλάχιστον μια διάταξη επεξεργασίας, η οποία σχηματίζει μια περιοχή επεξεργασίας, έναν θάλαμο πρόσκρουσης εξόδου, ένα σύστημα μεταφοράς και μια βάση υποστρώματος, η οποία μπορεί να κινείται κατά μήκος των θαλάμων. Η βάση υποστρώματος είναι στη μορφή ενός φορείου που έχει έναν κύλινδρο εγκατεστημένο σε αυτό, με τον εν λόγω κύλινδρο να διευθετείται ομοαξονικά στην κατεύθυνση κίνησης του φορείου και να μπορεί να περιστρέφεται. Η γωνιακή ταχύτητα περιστροφής του κυλίνδρου και η γραμμική ταχύτητα μετατόπισης του φορείου είναι σταθερές κατά τη διάρκεια της διαδικασίας επεξεργασίας και επιλέγονται έτσι ώστε κάθε σημείο στην επιφάνεια του κυλίνδρου να εκτελεί δυο πλήρεις περιστροφές ενώ περνά μέσα από την περιοχή επεξεργασίας. Έτσι, καθίσταται δυνατό να υποβάλλονται σε επεξεργασία μεγάλα εύκαμπτα υποστρώματα και επίσης μικρά υποστρώματα με υψηλό βαθμό ομοιομορφίας κάλυψης και υψηλή αποτελεσματικότητα της χρήσιμης αξιοποίησης των εφαρμοζόμενων υλικών.
CY20181101223T 2014-01-14 2018-11-20 Μεθοδος για την εφαρμογη επικαλυψεων λεπτου υμενιου και γραμμη παραγωγης για την εκτελεση της μεθοδου CY1121199T1 (el)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/RU2014/000010 WO2015108432A1 (ru) 2014-01-14 2014-01-14 Способ нанесения тонкопленочных покрытий и технологическая линия для его осуществления

Publications (1)

Publication Number Publication Date
CY1121199T1 true CY1121199T1 (el) 2020-05-29

Family

ID=53543223

Family Applications (1)

Application Number Title Priority Date Filing Date
CY20181101223T CY1121199T1 (el) 2014-01-14 2018-11-20 Μεθοδος για την εφαρμογη επικαλυψεων λεπτου υμενιου και γραμμη παραγωγης για την εκτελεση της μεθοδου

Country Status (17)

Country Link
US (1) US10385446B2 (el)
EP (1) EP3095890B1 (el)
JP (1) JP6534390B2 (el)
KR (1) KR102092815B1 (el)
CN (1) CN105980594B (el)
CY (1) CY1121199T1 (el)
DK (1) DK3095890T3 (el)
ES (1) ES2699888T3 (el)
HR (1) HRP20181983T1 (el)
HU (1) HUE040753T2 (el)
IL (1) IL246666B (el)
LT (1) LT3095890T (el)
PL (1) PL3095890T3 (el)
PT (1) PT3095890T (el)
RS (1) RS58180B1 (el)
SI (1) SI3095890T1 (el)
WO (1) WO2015108432A1 (el)

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CN106893993B (zh) * 2017-03-08 2019-01-25 深圳先进技术研究院 溅射镀膜设备及其镀膜腔室
CN107794508A (zh) * 2017-11-15 2018-03-13 中山市创科科研技术服务有限公司 一种光学镀膜装置基板承载机构
DE102018115404A1 (de) 2018-06-27 2020-01-02 Schaeffler Technologies AG & Co. KG Verfahren und Vorrichtung zur Beschichtung eines Bauteils mittels physikalischer Gasphasenabscheidung
CN108677160B (zh) * 2018-08-13 2020-12-29 武汉科瑞达真空科技有限公司 一种基于公自转装载托盘的连续镀膜生产线
EP3931366A1 (en) * 2019-03-01 2022-01-05 The Batteries spólka z ograniczona odpowiedzialnoscia Processing line for depositing thin-film coatings
CN111545749B (zh) * 2020-04-24 2022-06-21 江苏大学 一种超高速激光熔覆复杂曲面回转体的方法

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US5618388A (en) * 1988-02-08 1997-04-08 Optical Coating Laboratory, Inc. Geometries and configurations for magnetron sputtering apparatus
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JP2007077478A (ja) * 2005-09-16 2007-03-29 Sony Corp 成膜方法及び成膜装置
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Also Published As

Publication number Publication date
PL3095890T3 (pl) 2019-02-28
JP2017506289A (ja) 2017-03-02
KR20160106748A (ko) 2016-09-12
LT3095890T (lt) 2018-12-10
US10385446B2 (en) 2019-08-20
EP3095890B1 (de) 2018-08-29
RS58180B1 (sr) 2019-03-29
HUE040753T2 (hu) 2019-03-28
SI3095890T1 (sl) 2019-01-31
EP3095890A4 (de) 2016-11-23
WO2015108432A1 (ru) 2015-07-23
HRP20181983T1 (hr) 2019-01-25
KR102092815B1 (ko) 2020-04-24
CN105980594B (zh) 2019-06-18
IL246666B (en) 2020-08-31
IL246666A0 (en) 2016-08-31
ES2699888T3 (es) 2019-02-13
EP3095890A1 (de) 2016-11-23
US20160333467A1 (en) 2016-11-17
PT3095890T (pt) 2018-12-05
CN105980594A (zh) 2016-09-28
JP6534390B2 (ja) 2019-06-26
DK3095890T3 (da) 2019-01-02

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