JP2012511529A5 - - Google Patents
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- JP2012511529A5 JP2012511529A5 JP2011539975A JP2011539975A JP2012511529A5 JP 2012511529 A5 JP2012511529 A5 JP 2012511529A5 JP 2011539975 A JP2011539975 A JP 2011539975A JP 2011539975 A JP2011539975 A JP 2011539975A JP 2012511529 A5 JP2012511529 A5 JP 2012511529A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- metal
- silane
- less
- branched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229910052751 metal Inorganic materials 0.000 claims 20
- 239000002184 metal Substances 0.000 claims 20
- 125000004432 carbon atom Chemical group C* 0.000 claims 18
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 17
- 238000000034 method Methods 0.000 claims 17
- 229910000077 silane Inorganic materials 0.000 claims 17
- 239000000203 mixture Substances 0.000 claims 14
- 150000001875 compounds Chemical class 0.000 claims 10
- 150000001282 organosilanes Chemical class 0.000 claims 10
- 229910052739 hydrogen Inorganic materials 0.000 claims 9
- 239000001257 hydrogen Substances 0.000 claims 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 8
- 125000003118 aryl group Chemical group 0.000 claims 8
- 150000002431 hydrogen Chemical class 0.000 claims 8
- 239000011148 porous material Substances 0.000 claims 7
- 125000006165 cyclic alkyl group Chemical group 0.000 claims 6
- 150000003377 silicon compounds Chemical group 0.000 claims 6
- 229910052736 halogen Inorganic materials 0.000 claims 5
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims 4
- 239000004721 Polyphenylene oxide Chemical group 0.000 claims 4
- 239000003463 adsorbent Substances 0.000 claims 4
- 125000000217 alkyl group Chemical group 0.000 claims 4
- 229910052796 boron Inorganic materials 0.000 claims 4
- 125000004122 cyclic group Chemical group 0.000 claims 4
- 150000002367 halogens Chemical class 0.000 claims 4
- 229910052742 iron Inorganic materials 0.000 claims 4
- 125000000962 organic group Chemical group 0.000 claims 4
- 229920000570 polyether Chemical group 0.000 claims 4
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims 3
- 229910052782 aluminium Inorganic materials 0.000 claims 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims 3
- 239000011575 calcium Substances 0.000 claims 3
- 229910052791 calcium Inorganic materials 0.000 claims 3
- 229910052802 copper Inorganic materials 0.000 claims 3
- 239000010949 copper Substances 0.000 claims 3
- 239000011591 potassium Substances 0.000 claims 3
- 229910052700 potassium Inorganic materials 0.000 claims 3
- 239000011734 sodium Substances 0.000 claims 3
- 229910052708 sodium Inorganic materials 0.000 claims 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims 2
- 125000003545 alkoxy group Chemical group 0.000 claims 2
- 125000002877 alkyl aryl group Chemical group 0.000 claims 2
- 125000000304 alkynyl group Chemical group 0.000 claims 2
- 125000004103 aminoalkyl group Chemical group 0.000 claims 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims 2
- 125000005160 aryl oxy alkyl group Chemical group 0.000 claims 2
- 239000000460 chlorine Substances 0.000 claims 2
- 229910052801 chlorine Inorganic materials 0.000 claims 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims 2
- 125000004966 cyanoalkyl group Chemical group 0.000 claims 2
- 125000001188 haloalkyl group Chemical group 0.000 claims 2
- 239000012535 impurity Substances 0.000 claims 2
- 125000005358 mercaptoalkyl group Chemical group 0.000 claims 2
- 229910001507 metal halide Inorganic materials 0.000 claims 2
- 150000005309 metal halides Chemical class 0.000 claims 2
- 229910052987 metal hydride Inorganic materials 0.000 claims 2
- 150000004681 metal hydrides Chemical class 0.000 claims 2
- 150000002739 metals Chemical class 0.000 claims 2
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 claims 2
- 150000004756 silanes Chemical class 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims 1
- 230000003796 beauty Effects 0.000 claims 1
- 125000001309 chloro group Chemical group Cl* 0.000 claims 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims 1
- 238000009833 condensation Methods 0.000 claims 1
- 230000005494 condensation Effects 0.000 claims 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims 1
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 claims 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 claims 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical group CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 claims 1
- 150000002148 esters Chemical group 0.000 claims 1
- 238000001914 filtration Methods 0.000 claims 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 1
- 239000010931 gold Substances 0.000 claims 1
- 229910052737 gold Inorganic materials 0.000 claims 1
- 239000012433 hydrogen halide Substances 0.000 claims 1
- 229910000039 hydrogen halide Inorganic materials 0.000 claims 1
- -1 hydrogen halides Chemical class 0.000 claims 1
- 230000007062 hydrolysis Effects 0.000 claims 1
- 238000006460 hydrolysis reaction Methods 0.000 claims 1
- 229910052744 lithium Inorganic materials 0.000 claims 1
- 239000011777 magnesium Substances 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 229910044991 metal oxide Inorganic materials 0.000 claims 1
- 150000004706 metal oxides Chemical class 0.000 claims 1
- 239000005055 methyl trichlorosilane Substances 0.000 claims 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 claims 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 claims 1
- 125000005375 organosiloxane group Chemical group 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 150000004760 silicates Chemical class 0.000 claims 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 claims 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims 1
- 239000005052 trichlorosilane Substances 0.000 claims 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 claims 1
- 239000005051 trimethylchlorosilane Substances 0.000 claims 1
- 239000010457 zeolite Substances 0.000 claims 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008054537A DE102008054537A1 (de) | 2008-12-11 | 2008-12-11 | Entfernung von Fremdmetallen aus Siliciumverbindungen durch Adsorption und/oder Filtration |
| DE102008054537.6 | 2008-12-11 | ||
| PCT/EP2009/063316 WO2010066487A1 (de) | 2008-12-11 | 2009-10-13 | Reinigung von siliciumverbindungen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2012511529A JP2012511529A (ja) | 2012-05-24 |
| JP2012511529A5 true JP2012511529A5 (enExample) | 2012-07-26 |
| JP5656862B2 JP5656862B2 (ja) | 2015-01-21 |
Family
ID=41416235
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2011539975A Expired - Fee Related JP5656862B2 (ja) | 2008-12-11 | 2009-10-13 | 珪素化合物の精製 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8476468B2 (enExample) |
| EP (1) | EP2358727A1 (enExample) |
| JP (1) | JP5656862B2 (enExample) |
| KR (1) | KR20110093882A (enExample) |
| CN (1) | CN102245618A (enExample) |
| DE (1) | DE102008054537A1 (enExample) |
| TW (1) | TWI454477B (enExample) |
| WO (1) | WO2010066487A1 (enExample) |
Families Citing this family (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102009027257A1 (de) * | 2009-06-26 | 2010-12-30 | Wacker Chemie Ag | Verfahren zur Herstellung von Organoalkoxyhydrogensilanen |
| DE102009027730A1 (de) | 2009-07-15 | 2011-01-27 | Evonik Degussa Gmbh | Verahren und Verwendung von aminofunktionellen Harzen zur Dismutierung von Halogensilanen und zur Entfernung von Fremdmetallen |
| DE102009056731A1 (de) * | 2009-12-04 | 2011-06-09 | Rev Renewable Energy Ventures, Inc. | Halogenierte Polysilane und Polygermane |
| DE102010002342A1 (de) | 2010-02-25 | 2011-08-25 | Evonik Degussa GmbH, 45128 | Verwendung der spezifischen Widerstandsmessung zur indirekten Bestimmung der Reinheit von Silanen und Germanen und ein entsprechendes Verfahren |
| DE102011003453A1 (de) | 2011-02-01 | 2012-08-02 | Wacker Chemie Ag | Verfahren zur destillativen Reinigung von Chlorsilanen |
| DE102011077455B4 (de) | 2011-06-14 | 2014-02-06 | Wacker Chemie Ag | Verfahren zur Bestimmung von Verunreinigungen in Silicium und Reaktor zur Abscheidung von polykristallinem Silicium |
| CN103120937B (zh) * | 2011-11-18 | 2016-01-13 | 中国石油化工股份有限公司 | 用于对苯二甲酸精制的Pd/C催化剂的制备方法 |
| DE102012200992A1 (de) | 2012-01-24 | 2013-07-25 | Wacker Chemie Ag | Dotierstoffarmes polykristallines Siliciumstück |
| KR20140127879A (ko) | 2012-02-16 | 2014-11-04 | 다우 코닝 코포레이션 | 메탈로이드-함유 물질을 형성시키기 위한 침착 시스템 및 이를 사용한 이의 형성 방법 |
| CN104592291B (zh) * | 2013-10-30 | 2017-12-29 | 中国科学院上海高等研究院 | 有机硅化合物中金属杂质的去除方法 |
| DE102014203810A1 (de) * | 2014-03-03 | 2015-09-03 | Evonik Degussa Gmbh | Verfahren zur Herstellung reiner Octachlortrisilane und Decachlortetrasilane |
| DE102014013250B4 (de) | 2014-09-08 | 2021-11-25 | Christian Bauch | Verfahren zur Aufreinigung halogenierter Oligosilane |
| DE102014220539A1 (de) | 2014-10-09 | 2016-04-14 | Wacker Chemie Ag | Reinigung von Chlorsilanen mittels Destillation und Adsorption |
| EP3056262B1 (de) * | 2015-02-12 | 2018-05-02 | Evonik Degussa GmbH | Verfahren zur Gewinnung hochreiner Chlorsilanmischungen |
| CN108250230B (zh) * | 2018-02-07 | 2020-09-15 | 浙江博瑞电子科技有限公司 | 一种二异丙胺硅烷的精制方法 |
| CN112189026B (zh) * | 2018-06-19 | 2022-09-13 | 日产化学株式会社 | 除去盐类了的聚硅氧烷的制造方法 |
| CN108929343A (zh) * | 2018-06-27 | 2018-12-04 | 合盛硅业（泸州）有限公司 | 一种提纯八甲基环四硅氧烷的方法 |
| WO2020114609A1 (de) | 2018-12-07 | 2020-06-11 | Wacker Chemie Ag | Verfahren zur verminderung des gehalts an borverbindungen in halogensilan enthaltenden zusammensetzung |
| EP4017861B8 (en) * | 2019-08-22 | 2023-08-16 | Dow Silicones Corporation | Process for purifying silicon compounds |
| JP7477620B2 (ja) * | 2020-11-05 | 2024-05-01 | ワッカー ケミー アクチエンゲゼルシャフト | クロロシラン混合物から不純物を除去する方法 |
| CN112759608B (zh) * | 2020-12-31 | 2023-05-02 | 有研国晶辉新材料有限公司 | 一种八甲基环四硅氧烷中金属杂质的去除设备及工艺 |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2877097A (en) * | 1958-05-06 | 1959-03-10 | Guenter A Wolff | Method of purification of silicon compounds |
| IT1088820B (it) * | 1977-12-05 | 1985-06-10 | Smiel Spa | Processo di purificazione di clorosilani impiegabili nella preparazione di silicio per elettronica |
| CA1207127A (en) * | 1982-09-29 | 1986-07-08 | Dow Corning Corporation | Purification of chlorosilanes |
| JPH0688772B2 (ja) * | 1985-02-27 | 1994-11-09 | 昭和電工株式会社 | ジクロロシランの精製法 |
| JP2570409B2 (ja) * | 1988-12-06 | 1997-01-08 | 三菱マテリアル株式会社 | クロロポリシランの精製方法 |
| JPH0747594B2 (ja) * | 1990-07-20 | 1995-05-24 | 大陽酸素株式会社 | 高純度アルコキシシランの製造方法 |
| US5445742A (en) | 1994-05-23 | 1995-08-29 | Dow Corning Corporation | Process for purifying halosilanes |
| EP0702017B1 (de) | 1994-09-14 | 2001-11-14 | Degussa AG | Verfahren zur Herstellung von chloridarmen bzw. chloridfreien aminofunktionellen Organosilanen |
| DE19516386A1 (de) | 1995-05-04 | 1996-11-07 | Huels Chemische Werke Ag | Verfahren zur Herstellung von an chlorfunktionellen Organosilanen armen bzw. freien aminofunktionellen Organosilanen |
| JP3823400B2 (ja) * | 1996-05-23 | 2006-09-20 | 東亞合成株式会社 | 高純度アルコキシシランの製造方法 |
| DE19649023A1 (de) | 1996-11-27 | 1998-05-28 | Huels Chemische Werke Ag | Verfahren zur Entfernung von Restmengen an acidem Chlor in Carbonoyloxysilanen |
| DE19746862A1 (de) | 1997-10-23 | 1999-04-29 | Huels Chemische Werke Ag | Vorrichtung und Verfahren für Probenahme und IR-spektroskopische Analyse von hochreinen, hygroskopischen Flüssigkeiten |
| DE19821156B4 (de) | 1998-05-12 | 2006-04-06 | Degussa Ag | Verfahren zur Minderung von Resthalogengehalten und Farbzahlverbesserung in Alkoxysilanen oder Alkoxysilan-basierenden Zusammensetzungen und die Verwendung von Aktivkohle dazu |
| ATE284406T1 (de) | 1998-11-06 | 2004-12-15 | Degussa | Verfahren zur herstellung von chloridarmen oder chloridfreien alkoxysilanen |
| DE19963433A1 (de) | 1999-12-28 | 2001-07-12 | Degussa | Verfahren zur Abscheidung von Chlorsilanen aus Gasströmen |
| JP2002173495A (ja) * | 2000-03-28 | 2002-06-21 | Mitsui Chemicals Inc | 高純度有機シラン類及びその精製法 |
| DE10057482A1 (de) * | 2000-11-20 | 2002-05-23 | Solarworld Ag | Verfahren zur Reinigung von Trichlorsilan |
| FR2843392B1 (fr) * | 2002-08-09 | 2004-09-10 | Rhodia Chimie Sa | Procede de preparation d'halogenoalkyldialkylchlorosilane |
| DE10330022A1 (de) | 2003-07-03 | 2005-01-20 | Degussa Ag | Verfahren zur Herstellung von Iow-k dielektrischen Filmen |
| US20050054211A1 (en) * | 2003-09-04 | 2005-03-10 | Mindi Xu | Purification of silicon-containing materials |
| DE102004008442A1 (de) | 2004-02-19 | 2005-09-15 | Degussa Ag | Siliciumverbindungen für die Erzeugung von SIO2-haltigen Isolierschichten auf Chips |
| JP2007530401A (ja) * | 2004-03-19 | 2007-11-01 | インテグリス・インコーポレーテッド | ゼオライトを用いて無機ハロゲン化物及びオキシハロゲン化物を精製する方法及び装置 |
| DE102004037675A1 (de) | 2004-08-04 | 2006-03-16 | Degussa Ag | Verfahren und Vorrichtung zur Reinigung von Wasserstoffverbindungen enthaltendem Siliciumtetrachlorid oder Germaniumtetrachlorid |
| DE102004045245B4 (de) | 2004-09-17 | 2007-11-15 | Degussa Gmbh | Vorrichtung und Verfahren zur Herstellung von Silanen |
| DE102005041137A1 (de) | 2005-08-30 | 2007-03-01 | Degussa Ag | Reaktor, Anlage und großtechnisches Verfahren zur kontinuierlichen Herstellung von hochreinem Siliciumtetrachlorid oder hochreinem Germaniumtetrachlorid |
| DE102006003464A1 (de) | 2006-01-25 | 2007-07-26 | Degussa Gmbh | Verfahren zur Erzeugung einer Siliciumschicht auf einer Substratoberfläche durch Gasphasenabscheidung |
| DE102007014107A1 (de) | 2007-03-21 | 2008-09-25 | Evonik Degussa Gmbh | Aufarbeitung borhaltiger Chlorsilanströme |
| DE102007048937A1 (de) * | 2007-10-12 | 2009-04-16 | Evonik Degussa Gmbh | Entfernung von polaren organischen Verbindungen und Fremdmetallen aus Organosilanen |
| DE102007050199A1 (de) * | 2007-10-20 | 2009-04-23 | Evonik Degussa Gmbh | Entfernung von Fremdmetallen aus anorganischen Silanen |
| DE102007050573A1 (de) | 2007-10-23 | 2009-04-30 | Evonik Degussa Gmbh | Großgebinde zur Handhabung und für den Transport von hochreinen und ultra hochreinen Chemikalien |
| DE102007059170A1 (de) | 2007-12-06 | 2009-06-10 | Evonik Degussa Gmbh | Katalysator und Verfahren zur Dismutierung von Wasserstoff enthaltenden Halogensilanen |
| DE102008004396A1 (de) | 2008-01-14 | 2009-07-16 | Evonik Degussa Gmbh | Anlage und Verfahren zur Verminderung des Gehaltes von Elementen, wie Bor, in Halogensilanen |
| DE102008004397A1 (de) | 2008-01-14 | 2009-07-16 | Evonik Degussa Gmbh | Verfahren zur Verminderung des Gehaltes von Elementen, wie Bor, in Halogensilanen sowie Anlage zur Durchführung des Verfahrens |
| JP5206185B2 (ja) * | 2008-07-14 | 2013-06-12 | 東亞合成株式会社 | 高純度クロロポリシランの製造方法 |
-
2008
- 2008-12-11 DE DE102008054537A patent/DE102008054537A1/de not_active Withdrawn
-
2009
- 2009-10-13 JP JP2011539975A patent/JP5656862B2/ja not_active Expired - Fee Related
- 2009-10-13 CN CN2009801494218A patent/CN102245618A/zh active Pending
- 2009-10-13 EP EP09737391A patent/EP2358727A1/de not_active Withdrawn
- 2009-10-13 US US13/121,702 patent/US8476468B2/en not_active Expired - Fee Related
- 2009-10-13 KR KR1020117013252A patent/KR20110093882A/ko not_active Abandoned
- 2009-10-13 WO PCT/EP2009/063316 patent/WO2010066487A1/de not_active Ceased
- 2009-12-09 TW TW098142062A patent/TWI454477B/zh not_active IP Right Cessation
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