JP2011258949A - 薄膜トランジスタ表示板及びその製造方法 - Google Patents
薄膜トランジスタ表示板及びその製造方法 Download PDFInfo
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- JP2011258949A JP2011258949A JP2011123767A JP2011123767A JP2011258949A JP 2011258949 A JP2011258949 A JP 2011258949A JP 2011123767 A JP2011123767 A JP 2011123767A JP 2011123767 A JP2011123767 A JP 2011123767A JP 2011258949 A JP2011258949 A JP 2011258949A
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- Prior art keywords
- oxide
- gate insulating
- protective film
- insulating film
- gate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000010409 thin film Substances 0.000 title claims abstract description 60
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 239000010408 film Substances 0.000 claims abstract description 184
- 230000001681 protective effect Effects 0.000 claims abstract description 86
- 239000004065 semiconductor Substances 0.000 claims abstract description 69
- 229910052814 silicon oxide Inorganic materials 0.000 claims abstract description 47
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 39
- 229910004205 SiNX Inorganic materials 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 238000005530 etching Methods 0.000 claims description 50
- 238000000034 method Methods 0.000 claims description 28
- 229910052731 fluorine Inorganic materials 0.000 claims description 18
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 17
- 239000011737 fluorine Substances 0.000 claims description 17
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 14
- 229910052799 carbon Inorganic materials 0.000 claims description 14
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 claims description 14
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 14
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 claims description 14
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 14
- 229910001936 tantalum oxide Inorganic materials 0.000 claims description 14
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 14
- 229910001930 tungsten oxide Inorganic materials 0.000 claims description 14
- 229910001928 zirconium oxide Inorganic materials 0.000 claims description 14
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 13
- 229910000449 hafnium oxide Inorganic materials 0.000 claims description 12
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims description 12
- 239000010949 copper Substances 0.000 claims description 10
- 229910052715 tantalum Inorganic materials 0.000 claims description 8
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 229910052735 hafnium Inorganic materials 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 229910052758 niobium Inorganic materials 0.000 claims description 7
- 229910052751 metal Inorganic materials 0.000 claims description 6
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 229910052779 Neodymium Inorganic materials 0.000 claims description 3
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- 229910052793 cadmium Inorganic materials 0.000 claims description 3
- 229910052733 gallium Inorganic materials 0.000 claims description 3
- 229910052738 indium Inorganic materials 0.000 claims description 3
- 229910052712 strontium Inorganic materials 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- 229910052725 zinc Inorganic materials 0.000 claims description 3
- 239000007789 gas Substances 0.000 description 31
- 239000004973 liquid crystal related substance Substances 0.000 description 20
- 229910052581 Si3N4 Inorganic materials 0.000 description 15
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 15
- 229910052739 hydrogen Inorganic materials 0.000 description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 12
- 239000001257 hydrogen Substances 0.000 description 12
- 239000010955 niobium Substances 0.000 description 10
- 150000004767 nitrides Chemical class 0.000 description 10
- 239000010936 titanium Substances 0.000 description 10
- 239000003795 chemical substances by application Substances 0.000 description 9
- 238000000059 patterning Methods 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000006866 deterioration Effects 0.000 description 5
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 5
- 229910052719 titanium Inorganic materials 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 239000011669 selenium Substances 0.000 description 4
- -1 GaSnO Inorganic materials 0.000 description 3
- 239000004020 conductor Substances 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052790 beryllium Inorganic materials 0.000 description 2
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 230000002250 progressing effect Effects 0.000 description 2
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 229910001316 Ag alloy Inorganic materials 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910000881 Cu alloy Inorganic materials 0.000 description 1
- 229910005265 GaInZnO Inorganic materials 0.000 description 1
- 229910005555 GaZnO Inorganic materials 0.000 description 1
- 229910001182 Mo alloy Inorganic materials 0.000 description 1
- 206010047571 Visual impairment Diseases 0.000 description 1
- 229910007717 ZnSnO Inorganic materials 0.000 description 1
- IUHFWCGCSVTMPG-UHFFFAOYSA-N [C].[C] Chemical compound [C].[C] IUHFWCGCSVTMPG-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 1
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76804—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics by forming tapered via holes
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133345—Insulating layers
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1345—Conductors connecting electrodes to cell terminals
- G02F1/13458—Terminal pads
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136227—Through-hole connection of the pixel electrode to the active element through an insulation layer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76816—Aspects relating to the layout of the pattern or to the size of vias or trenches
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1222—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
- H01L27/1225—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/124—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits
- H01L27/1244—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or layout of the wiring layers specially adapted to the circuit arrangement, e.g. scanning lines in LCD pixel circuits for preventing breakage, peeling or short circuiting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/40—Electrodes ; Multistep manufacturing processes therefor
- H01L29/43—Electrodes ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/49—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET
- H01L29/4908—Metal-insulator-semiconductor electrodes, e.g. gates of MOSFET for thin film semiconductor, e.g. gate of TFT
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
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Abstract
【解決手段】絶縁基板上に形成されたゲート電極と、前記ゲート電極上に形成されたSiNxから構成された第1ゲート絶縁膜と、前記第1ゲート絶縁膜の上に形成されたSiOxから構成された第2ゲート絶縁膜と、前記ゲート電極と重畳するように形成され、チャネル部を有する酸化物半導体層と、前記酸化物半導体層及び前記ゲート電極の上部に形成されたSiOxから構成された保護膜とを含み、前記保護膜はドレイン電極拡張部を露出するコンタクトホールを含む。ここで、前記コンタクトホールは、ドレイン電極拡張部を直接的に露出する部分の保護膜が、その上部の保護膜よりさらに狭い領域を占める形状を有する。
【選択図】図4C
Description
27、28 ストレージ配線
67 ドレイン電極拡張部
82 画素電極
230 ゲート絶縁膜
40 酸化物半導体層
170 保護膜
77、106 コンタクトホール
Claims (22)
- 絶縁基板上に形成されたゲート電極と、
前記ゲート電極上に形成されるゲート絶縁膜と、
前記ゲート絶縁膜を介して、前記ゲート電極と重畳し、チャネル部を有する酸化物半導体層と、
前記酸化物半導体層の上に形成されて、互いに離隔して配置されたソース電極及びドレイン電極と、
前記ソース電極及び前記ドレイン電極の上部に形成され、酸化物を含む保護膜とを含み、
前記保護膜は、前記ドレイン電極を露出する第1コンタクトホールを有し、
前記第1コンタクトホールは、底面から上部に向かうほど次第に断面積が広くなる形状を有する、薄膜トランジスタ表示板。 - 前記保護膜は、前記酸化物半導体層の上に形成されて、酸化ケイ素(SiOx)、酸化アルミニウム、酸化チタン、酸化ジルコニウム、酸化ハフニウム、酸化タンタル、酸化タングステンのうちの少なくとも1種からなる第1保護膜と、前記第1保護膜の上に形成されて、SiON、SiNx、及びSiONとSiNxとの組み合わせのいずれか1種からなる第2保護膜とを含む、請求項1に記載の薄膜トランジスタ表示板。
- 前記第1コンタクトホールの側壁は前記第1保護膜での傾度が前記第2保護膜での傾度に比べて緩やかである、請求項2に記載の薄膜トランジスタ表示板。
- 前記ゲート絶縁膜は、前記ゲート電極上に形成される第1ゲート絶縁膜と、前記第1ゲート絶縁膜の上に形成される第2ゲート絶縁膜を含み、
前記第2ゲート絶縁膜は、酸化ケイ素(SiOx)、酸化アルミニウム、酸化チタン、酸化ジルコニウム、酸化ハフニウム、酸化タンタル、酸化タングステンのうちの少なくとも1種からなる、請求項1に記載の薄膜トランジスタ表示板。 - 前記第1ゲート絶縁膜は250nmから500nm間の厚さを有し、前記第2ゲート絶縁膜は30nmから100nm間の厚さを有する、請求項4に記載の薄膜トランジスタ表示板。
- 前記酸化物半導体層は、Zn、In、Ga、Sn、Cd、Ge、Pb、Sr、Ca、Ni、Cu、Sb、Ba、Sc、Y、Nb、Ta、Hf、Nd、12、13、14族金属元素及びこれらの組み合わせから選択した物質の酸化物を含む、請求項1乃至5に記載の薄膜トランジスタ表示板。
- 前記ゲート電極に接続してゲート信号を供給し、ゲートパッド部を有するゲート線を絶縁基板上にさらに含み、
前記保護膜及び前記ゲート絶縁膜は、前記ゲートパッド部を露出する第2コンタクトホールを有し、
前記第2コンタクトホールは、底面から上部に向かうほど次第に断面積が広くなる形状を有する、請求項1に記載の薄膜トランジスタ表示板。 - 前記保護膜は、前記酸化物半導体層の上に形成されており、酸化ケイ素(SiOx)、酸化アルミニウム、酸化チタン、酸化ジルコニウム、酸化ハフニウム、酸化タンタル、酸化タングステンのうちの少なくとも1種からなる第1保護膜と、前記第1保護膜の上に形成されており、SiON、SiNx、及びSiONとSiNxの組み合わせのいずれか1種からなる第2保護膜とを含み、
前記第2コンタクトホールの側壁は、底面から上部に向かって第1傾斜、前記第1傾斜より緩やかな第2傾斜、及び前記第2傾斜より急な第3傾斜を有する、請求項7に記載の薄膜トランジスタ表示板。 - 前記ゲート絶縁膜は、前記ゲート電極上に形成される第1ゲート絶縁膜と、前記第1ゲート絶縁膜の上に形成される第2ゲート絶縁膜を含み、
前記第2ゲート絶縁膜は、酸化ケイ素(SiOx)、酸化アルミニウム、酸化チタン、酸化ジルコニウム、酸化ハフニウム、酸化タンタル、酸化タングステンのうちの少なくとも1種からなる、請求項7または8に記載の薄膜トランジスタ表示板。 - 前記第1ゲート絶縁膜は250nmから500nm間の厚さを有し、前記第2ゲート絶縁膜は30nmから100nm間の厚さを有する、請求項9に記載の薄膜トランジスタ表示板。
- 前記第1保護膜は、50nmから400nm間の厚さを有し、前記第2保護膜は、50nmから400nm間の厚さを有する、請求項2または8に記載の薄膜トランジスタ表示板。
- 絶縁基板上にゲート電極を形成する段階と、
前記ゲート電極上にゲート絶縁膜を形成する段階と、
前記ゲート絶縁膜上に酸化物半導体層を形成する段階と、
前記酸化物半導体層上に互いに離隔して配置されたソース電極及びドレイン電極を形成する段階と、
前記ドレイン電極を露出する第1コンタクトホールを有し、酸化物を含む保護膜を前記ソース電極及び前記ドレイン電極上に形成する段階と
を含み、
前記第1コンタクトホールは底面から上部に向かうほど次第に断面積が広くなる形状を有する薄膜トランジスタ表示板の製造方法。 - 前記第1コンタクトホールを形成する段階は、SF6/O2系のエッチングガスを使用する第1段階と、前記第1段階で使用されたエッチングガスに加え、炭素(Carbon)を含むフッ素(Fluorine)系のエッチングガスを使用する第2段階とを含む、請求項12に記載の薄膜トランジスタ表示板の製造方法。
- 前記炭素(Carbon)を含むフッ素(Fluorine)系のエッチングガスとしては、C4F8、C2F6、CF4、及びCHF3のうちの少なくとも1種を使用する、請求項13に記載の薄膜トランジスタ表示板の製造方法。
- 前記保護膜は、前記酸化物半導体層の上に形成されて、酸化ケイ素(SiOx)、酸化アルミニウム、酸化チタン、酸化ジルコニウム、酸化ハフニウム、酸化タンタル、酸化タングステンのうちの少なくとも1種からなる第1保護膜と、前記第1保護膜の上に形成されて、SiON、SiNx、及びSiONとSiNxとの組み合わせのいずれか1種からなる第2保護膜とを含む、請求項14に記載の薄膜トランジスタ表示板の製造方法。
- 前記ゲート絶縁膜を形成する段階は、前記ゲート電極上に第1ゲート絶縁膜を形成する段階と、前記第1ゲート絶縁膜上に酸化ケイ素(SiOx)、酸化アルミニウム、酸化チタン、酸化ジルコニウム、酸化ハフニウム、酸化タンタル、酸化タングステンのうちの少なくとも1種からなる第2ゲート絶縁膜を形成する段階とを含み、
前記第1ゲート絶縁膜は250nmから500nm間の厚さを有し、前記第2ゲート絶縁膜は30nmから100nm間の厚さを有する、請求項12に記載の薄膜トランジスタ表示板の製造方法。 - 前記ゲート電極を形成する段階において、前記ゲート電極に接続されてゲート信号を供給し、ゲートパッド部を有するゲート線を形成し、
前記保護膜を形成する段階において、前記保護膜及び前記ゲート絶縁膜を貫いて前記ゲートパッド部を露出し、底面から上部に向かうほど次第に断面積が広くなる形状を有する第2コンタクトホールを形成する、請求項12に記載の薄膜トランジスタ表示板の製造方法。 - 前記開口部を形成する段階は、SF6/O2系のエッチングガスを使用する第1段階と、前記第1段階で使用されたエッチングガスに加え、炭素(Carbon)を含むフッ素(Fluorine)系のエッチングガスを使用する第2段階とを含む、請求項17に記載の薄膜トランジスタ表示板の製造方法。
- 前記炭素(Carbon)を含むフッ素(Fluorine)系のエッチングガスとしては、 C4F8、C2F6、CF4、及びCHF3のうちの少なくとも1種を使用する、請求項18に記載の薄膜トランジスタ表示板の製造方法。
- 前記保護膜を形成する段階は、酸化ケイ素(SiOx)、酸化アルミニウム、酸化チタン、酸化ジルコニウム、酸化ハフニウム、酸化タンタル、酸化タングステンのうちの少なくとも1種からなる第1保護膜を前記酸化物半導体層の上に形成する段階と、SiON、SiNx、及びSiONとSiNxの組み合わせのいずれか1種からなる第2保護膜を前記第1保護膜の上に形成する段階とを含み、
前記第2コンタクトホールの側壁は、底面から上部に向かって第1傾斜、前記第1傾斜より緩やかな第2傾斜、及び前記第2傾斜より急な第3傾斜を有する、請求項17に記載の薄膜トランジスタ表示板の製造方法。 - 前記ゲート絶縁膜を形成する段階は、前記ゲート電極上に第1ゲート絶縁膜を形成する段階と、前記第1ゲート絶縁膜上に酸化ケイ素(SiOx)、酸化アルミニウム、酸化チタン、酸化ジルコニウム、酸化ハフニウム、酸化タンタル、酸化タングステンのうちの少なくとも1種からなる第2ゲート絶縁膜を形成する段階とを含み、
前記第1ゲート絶縁膜は250nmから500nm間の厚さを有し、前記第2ゲート絶縁膜は30nmから100nm間の厚さを有する、請求項19に記載の薄膜トランジスタ表示板の製造方法。 - 前記第1保護膜は、50nmから400nm間の厚さを有し、前記第2保護膜は、50nmから400nm間の厚さを有する、請求項15または20に記載の薄膜トランジスタ表示板の製造方法。
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US20110297930A1 (en) | 2011-12-08 |
CN102270644B (zh) | 2016-10-12 |
US9184090B2 (en) | 2015-11-10 |
CN102270644A (zh) | 2011-12-07 |
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