JP2010177693A5 - - Google Patents
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- Publication number
- JP2010177693A5 JP2010177693A5 JP2010087338A JP2010087338A JP2010177693A5 JP 2010177693 A5 JP2010177693 A5 JP 2010177693A5 JP 2010087338 A JP2010087338 A JP 2010087338A JP 2010087338 A JP2010087338 A JP 2010087338A JP 2010177693 A5 JP2010177693 A5 JP 2010177693A5
- Authority
- JP
- Japan
- Prior art keywords
- liquid
- substrate
- immersion
- moving
- gap
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000007788 liquid Substances 0.000 claims 42
- 239000000758 substrate Substances 0.000 claims 40
- 238000007654 immersion Methods 0.000 claims 27
- 238000004140 cleaning Methods 0.000 claims 11
- 238000000034 method Methods 0.000 claims 11
- 238000004519 manufacturing process Methods 0.000 claims 7
- 238000003672 processing method Methods 0.000 claims 5
- 238000011084 recovery Methods 0.000 claims 5
- 239000000463 material Substances 0.000 claims 4
- 230000003287 optical effect Effects 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- 238000007598 dipping method Methods 0.000 claims 2
- 230000002093 peripheral effect Effects 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2010087338A JP5408006B2 (ja) | 2004-10-26 | 2010-04-05 | 洗浄方法、及び基板処理方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004310993 | 2004-10-26 | ||
| JP2004310993 | 2004-10-26 | ||
| JP2010087338A JP5408006B2 (ja) | 2004-10-26 | 2010-04-05 | 洗浄方法、及び基板処理方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005309546A Division JP4665712B2 (ja) | 2004-10-26 | 2005-10-25 | 基板処理方法、露光装置及びデバイス製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010177693A JP2010177693A (ja) | 2010-08-12 |
| JP2010177693A5 true JP2010177693A5 (OSRAM) | 2011-08-18 |
| JP5408006B2 JP5408006B2 (ja) | 2014-02-05 |
Family
ID=36227803
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005309546A Expired - Fee Related JP4665712B2 (ja) | 2004-10-26 | 2005-10-25 | 基板処理方法、露光装置及びデバイス製造方法 |
| JP2010087338A Expired - Fee Related JP5408006B2 (ja) | 2004-10-26 | 2010-04-05 | 洗浄方法、及び基板処理方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005309546A Expired - Fee Related JP4665712B2 (ja) | 2004-10-26 | 2005-10-25 | 基板処理方法、露光装置及びデバイス製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US8040489B2 (OSRAM) |
| EP (1) | EP1814144B1 (OSRAM) |
| JP (2) | JP4665712B2 (OSRAM) |
| KR (2) | KR101285951B1 (OSRAM) |
| CN (2) | CN101866113B (OSRAM) |
| TW (1) | TWI436403B (OSRAM) |
| WO (1) | WO2006046562A1 (OSRAM) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101520591B1 (ko) | 2003-06-13 | 2015-05-14 | 가부시키가이샤 니콘 | 노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법 |
| TWI245163B (en) | 2003-08-29 | 2005-12-11 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| TWI605315B (zh) | 2003-12-03 | 2017-11-11 | Nippon Kogaku Kk | Exposure device, exposure method, and device manufacturing method |
| JP4220423B2 (ja) | 2004-03-24 | 2009-02-04 | 株式会社東芝 | レジストパターン形成方法 |
| KR101285951B1 (ko) * | 2004-10-26 | 2013-07-12 | 가부시키가이샤 니콘 | 기판 처리 방법, 노광 장치 및 디바이스 제조 방법 |
| US20080137056A1 (en) | 2004-12-06 | 2008-06-12 | Tomoharu Fujiwara | Method for Processing Substrate, Exposure Method, Exposure Apparatus, and Method for Producing Device |
| JP5040646B2 (ja) * | 2005-03-23 | 2012-10-03 | 株式会社ニコン | 露光装置及び露光方法、並びにデバイス製造方法 |
| KR20070122445A (ko) | 2005-04-28 | 2007-12-31 | 가부시키가이샤 니콘 | 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법 |
| JP4718893B2 (ja) * | 2005-05-13 | 2011-07-06 | 株式会社東芝 | パターン形成方法 |
| US20090033896A1 (en) * | 2005-06-28 | 2009-02-05 | Hiroyuki Nagasaka | Exposure apparatus and method, and device manufacturing method |
| US8125610B2 (en) * | 2005-12-02 | 2012-02-28 | ASML Metherlands B.V. | Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus |
| KR20090018024A (ko) * | 2006-05-18 | 2009-02-19 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 메인터넌스 방법, 그리고 디바이스 제조 방법 |
| KR20090023335A (ko) * | 2006-05-22 | 2009-03-04 | 가부시키가이샤 니콘 | 노광 방법 및 장치, 메인터넌스 방법, 그리고 디바이스 제조 방법 |
| JP4994976B2 (ja) * | 2006-07-18 | 2012-08-08 | 東京エレクトロン株式会社 | 高屈折率液体循環システム、パターン形成方法およびコンピュータ読取可能な記憶媒体 |
| JP2008042004A (ja) * | 2006-08-08 | 2008-02-21 | Tokyo Electron Ltd | パターン形成方法およびパターン形成装置 |
| WO2008026593A1 (en) * | 2006-08-30 | 2008-03-06 | Nikon Corporation | Exposure apparatus, device production method, cleaning method, and cleaning member |
| JP5029611B2 (ja) | 2006-09-08 | 2012-09-19 | 株式会社ニコン | クリーニング用部材、クリーニング方法、露光装置、並びにデバイス製造方法 |
| JP4807749B2 (ja) * | 2006-09-15 | 2011-11-02 | 東京エレクトロン株式会社 | 露光・現像処理方法 |
| JP4926678B2 (ja) * | 2006-12-04 | 2012-05-09 | 東京エレクトロン株式会社 | 液浸露光用洗浄装置および洗浄方法、ならびにコンピュータプログラムおよび記憶媒体 |
| WO2008108253A2 (en) * | 2007-02-23 | 2008-09-12 | Nikon Corporation | Exposing method, exposure apparatus, device fabricating method, and substrate for immersion exposure |
| NL2004808A (en) | 2009-06-30 | 2011-01-12 | Asml Netherlands Bv | Fluid handling structure, lithographic apparatus and device manufacturing method. |
| JP5402664B2 (ja) * | 2010-01-19 | 2014-01-29 | 株式会社ニコン | 洗浄方法、露光装置、及びデバイスの製造方法 |
| NL2008168A (en) * | 2011-02-25 | 2012-08-28 | Asml Netherlands Bv | Method of calculating model parameters of a substrate, a lithographic apparatus and an apparatus for controlling lithographic processing by a lithographic apparatus. |
| NL2008845A (en) * | 2011-05-24 | 2012-11-27 | Asml Netherlands Bv | Lithographic apparatus and component. |
| HK1246869A1 (zh) * | 2015-05-28 | 2018-09-14 | 株式会社尼康 | 物体保持装置、曝光装置、平板显示器的制造方法及器件制造方法 |
| US11014103B2 (en) * | 2017-07-26 | 2021-05-25 | Taiwan Semiconductor Manufacturing Company Ltd. | Substrate processing apparatus and substrate processing method |
| CN107255907B (zh) * | 2017-08-17 | 2021-01-22 | 京东方科技集团股份有限公司 | 一种补偿装置、曝光装置及曝光补偿方法 |
| CN107561747A (zh) * | 2017-10-12 | 2018-01-09 | 惠科股份有限公司 | 一种显示基板的预烘烤装置及预烘烤系统 |
| TWI673567B (zh) * | 2018-02-13 | 2019-10-01 | 特銓股份有限公司 | 光罩靜電清潔設備以及光罩靜電清潔方法 |
| CN110597021B (zh) * | 2019-09-20 | 2021-04-23 | 上海华力微电子有限公司 | 浸没式光刻工艺中晶圆表面残水缺陷的改善方法 |
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| US8383322B2 (en) * | 2005-08-05 | 2013-02-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Immersion lithography watermark reduction |
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-
2005
- 2005-10-25 KR KR1020127016035A patent/KR101285951B1/ko not_active Expired - Fee Related
- 2005-10-25 WO PCT/JP2005/019604 patent/WO2006046562A1/ja not_active Ceased
- 2005-10-25 JP JP2005309546A patent/JP4665712B2/ja not_active Expired - Fee Related
- 2005-10-25 CN CN2010101407110A patent/CN101866113B/zh not_active Expired - Fee Related
- 2005-10-25 KR KR1020077003267A patent/KR101236120B1/ko not_active Expired - Fee Related
- 2005-10-25 TW TW094137268A patent/TWI436403B/zh not_active IP Right Cessation
- 2005-10-25 US US11/666,165 patent/US8040489B2/en not_active Expired - Fee Related
- 2005-10-25 EP EP05805228A patent/EP1814144B1/en not_active Expired - Lifetime
- 2005-10-25 CN CN2005800359899A patent/CN101044594B/zh not_active Expired - Fee Related
-
2008
- 2008-06-09 US US12/155,714 patent/US8941808B2/en not_active Expired - Fee Related
-
2010
- 2010-04-05 JP JP2010087338A patent/JP5408006B2/ja not_active Expired - Fee Related
-
2011
- 2011-09-13 US US13/137,789 patent/US20120008112A1/en not_active Abandoned
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