|
JPS57117238A
(en)
|
1981-01-14 |
1982-07-21 |
Nippon Kogaku Kk <Nikon> |
Exposing and baking device for manufacturing integrated circuit with illuminometer
|
|
JPS6144429A
(ja)
|
1984-08-09 |
1986-03-04 |
Nippon Kogaku Kk <Nikon> |
位置合わせ方法、及び位置合せ装置
|
|
US4780617A
(en)
|
1984-08-09 |
1988-10-25 |
Nippon Kogaku K.K. |
Method for successive alignment of chip patterns on a substrate
|
|
US5243195A
(en)
|
1991-04-25 |
1993-09-07 |
Nikon Corporation |
Projection exposure apparatus having an off-axis alignment system and method of alignment therefor
|
|
JP3200874B2
(ja)
|
1991-07-10 |
2001-08-20 |
株式会社ニコン |
投影露光装置
|
|
US5559582A
(en)
*
|
1992-08-28 |
1996-09-24 |
Nikon Corporation |
Exposure apparatus
|
|
JPH08313842A
(ja)
|
1995-05-15 |
1996-11-29 |
Nikon Corp |
照明光学系および該光学系を備えた露光装置
|
|
JP4029182B2
(ja)
|
1996-11-28 |
2008-01-09 |
株式会社ニコン |
露光方法
|
|
CN1244018C
(zh)
|
1996-11-28 |
2006-03-01 |
株式会社尼康 |
曝光方法和曝光装置
|
|
JP4029183B2
(ja)
|
1996-11-28 |
2008-01-09 |
株式会社ニコン |
投影露光装置及び投影露光方法
|
|
DE69717975T2
(de)
|
1996-12-24 |
2003-05-28 |
Asml Netherlands B.V., Veldhoven |
In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät
|
|
JPH1116816A
(ja)
|
1997-06-25 |
1999-01-22 |
Nikon Corp |
投影露光装置、該装置を用いた露光方法、及び該装置を用いた回路デバイスの製造方法
|
|
JPH1123692A
(ja)
|
1997-06-30 |
1999-01-29 |
Sekisui Chem Co Ltd |
地中探査用アンテナ
|
|
JPH1128790A
(ja)
|
1997-07-09 |
1999-02-02 |
Asahi Chem Ind Co Ltd |
紫外線遮蔽用熱可塑性樹脂板
|
|
JP4210871B2
(ja)
|
1997-10-31 |
2009-01-21 |
株式会社ニコン |
露光装置
|
|
US6020964A
(en)
|
1997-12-02 |
2000-02-01 |
Asm Lithography B.V. |
Interferometer system and lithograph apparatus including an interferometer system
|
|
JP4264676B2
(ja)
|
1998-11-30 |
2009-05-20 |
株式会社ニコン |
露光装置及び露光方法
|
|
US6897963B1
(en)
|
1997-12-18 |
2005-05-24 |
Nikon Corporation |
Stage device and exposure apparatus
|
|
US6208407B1
(en)
|
1997-12-22 |
2001-03-27 |
Asm Lithography B.V. |
Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
|
|
AU1262499A
(en)
|
1998-03-11 |
1999-09-27 |
Nikon Corporation |
Ultraviolet laser apparatus and exposure apparatus comprising the ultraviolet laser apparatus
|
|
AU2747999A
(en)
|
1998-03-26 |
1999-10-18 |
Nikon Corporation |
Projection exposure method and system
|
|
JP4505989B2
(ja)
|
1998-05-19 |
2010-07-21 |
株式会社ニコン |
収差測定装置並びに測定方法及び該装置を備える投影露光装置並びに該方法を用いるデバイス製造方法、露光方法
|
|
WO2001035168A1
(en)
|
1999-11-10 |
2001-05-17 |
Massachusetts Institute Of Technology |
Interference lithography utilizing phase-locked scanning beams
|
|
JP2002014005A
(ja)
|
2000-04-25 |
2002-01-18 |
Nikon Corp |
空間像計測方法、結像特性計測方法、空間像計測装置及び露光装置
|
|
US20020041377A1
(en)
|
2000-04-25 |
2002-04-11 |
Nikon Corporation |
Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
|
|
WO2002069049A2
(en)
|
2001-02-27 |
2002-09-06 |
Asml Us, Inc. |
Simultaneous imaging of two reticles
|
|
TW529172B
(en)
|
2001-07-24 |
2003-04-21 |
Asml Netherlands Bv |
Imaging apparatus
|
|
US20050059617A1
(en)
|
2001-09-17 |
2005-03-17 |
Takeshi Imanishi |
Novel anitsense oligonucleotide derivatives against to hepatitis c virus
|
|
AU2002351933A1
(en)
|
2001-11-08 |
2003-05-19 |
Develogen Aktiengesellschaft Fur Entwicklungsbiologische Forschung |
Men protein, gst2, rab-rp1, csp, f-box protein lilina/fbl7, abc50, coronin, sec61 alpha, or vhappa1-1, or homologous proteins involved in the regulation of energy homeostasis
|
|
JP4214729B2
(ja)
|
2002-07-25 |
2009-01-28 |
コニカミノルタホールディングス株式会社 |
硬化性白インク組成物
|
|
TWI249082B
(en)
|
2002-08-23 |
2006-02-11 |
Nikon Corp |
Projection optical system and method for photolithography and exposure apparatus and method using same
|
|
US6893629B2
(en)
|
2002-10-30 |
2005-05-17 |
Isp Investments Inc. |
Delivery system for a tooth whitener
|
|
EP2495613B1
(en)
|
2002-11-12 |
2013-07-31 |
ASML Netherlands B.V. |
Lithographic apparatus
|
|
SG121818A1
(en)
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
KR101036114B1
(ko)
*
|
2002-12-10 |
2011-05-23 |
가부시키가이샤 니콘 |
노광장치 및 노광방법, 디바이스 제조방법
|
|
DE60326384D1
(de)
|
2002-12-13 |
2009-04-09 |
Koninkl Philips Electronics Nv |
Flüssigkeitsentfernung in einem verfahren und einer einrichtung zum bestrahlen von flecken auf einer schicht
|
|
ATE335272T1
(de)
|
2002-12-19 |
2006-08-15 |
Koninkl Philips Electronics Nv |
Verfahren und anordnung zum bestrahlen einer schicht mittels eines lichtpunkts
|
|
AU2003295177A1
(en)
|
2002-12-19 |
2004-07-14 |
Koninklijke Philips Electronics N.V. |
Method and device for irradiating spots on a layer
|
|
EP1598855B1
(en)
|
2003-02-26 |
2015-04-22 |
Nikon Corporation |
Exposure apparatus and method, and method of producing apparatus
|
|
JP2004304135A
(ja)
|
2003-04-01 |
2004-10-28 |
Nikon Corp |
露光装置、露光方法及びマイクロデバイスの製造方法
|
|
EP2161621B1
(en)
|
2003-04-11 |
2018-10-24 |
Nikon Corporation |
Cleanup method for optics in an immersion lithography apparatus, and corresponding immersion lithography apparatus
|
|
TWI424470B
(zh)
|
2003-05-23 |
2014-01-21 |
尼康股份有限公司 |
A method of manufacturing an exposure apparatus and an element
|
|
JP2005277363A
(ja)
*
|
2003-05-23 |
2005-10-06 |
Nikon Corp |
露光装置及びデバイス製造方法
|
|
EP1486827B1
(en)
*
|
2003-06-11 |
2011-11-02 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
KR101520591B1
(ko)
*
|
2003-06-13 |
2015-05-14 |
가부시키가이샤 니콘 |
노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
|
|
US7370659B2
(en)
*
|
2003-08-06 |
2008-05-13 |
Micron Technology, Inc. |
Photolithographic stepper and/or scanner machines including cleaning devices and methods of cleaning photolithographic stepper and/or scanner machines
|
|
JP4305095B2
(ja)
*
|
2003-08-29 |
2009-07-29 |
株式会社ニコン |
光学部品の洗浄機構を搭載した液浸投影露光装置及び液浸光学部品洗浄方法
|
|
JP4444920B2
(ja)
|
2003-09-19 |
2010-03-31 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
WO2005036623A1
(ja)
|
2003-10-08 |
2005-04-21 |
Zao Nikon Co., Ltd. |
基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
|
|
US20050122218A1
(en)
|
2003-12-06 |
2005-06-09 |
Goggin Christopher M. |
Ranging and warning device using emitted and reflected wave energy
|
|
EP1697798A2
(en)
|
2003-12-15 |
2006-09-06 |
Carl Zeiss SMT AG |
Projection objective having a high aperture and a planar end surface
|
|
WO2005059645A2
(en)
|
2003-12-19 |
2005-06-30 |
Carl Zeiss Smt Ag |
Microlithography projection objective with crystal elements
|
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
|
JP4548341B2
(ja)
*
|
2004-02-10 |
2010-09-22 |
株式会社ニコン |
露光装置及びデバイス製造方法、メンテナンス方法及び露光方法
|
|
US7898642B2
(en)
*
|
2004-04-14 |
2011-03-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7616383B2
(en)
*
|
2004-05-18 |
2009-11-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
CN1954408B
(zh)
*
|
2004-06-04 |
2012-07-04 |
尼康股份有限公司 |
曝光装置、曝光方法及元件制造方法
|
|
WO2005122218A1
(ja)
*
|
2004-06-09 |
2005-12-22 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
|
KR101245070B1
(ko)
*
|
2004-06-21 |
2013-03-18 |
가부시키가이샤 니콘 |
노광 장치 및 그 부재의 세정 방법, 노광 장치의 메인터넌스 방법, 메인터넌스 기기, 그리고 디바이스 제조 방법
|
|
JP2006013806A
(ja)
|
2004-06-24 |
2006-01-12 |
Maspro Denkoh Corp |
信号処理装置及びcatv用ヘッドエンド装置
|
|
US7463330B2
(en)
*
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP2006032750A
(ja)
*
|
2004-07-20 |
2006-02-02 |
Canon Inc |
液浸型投影露光装置、及びデバイス製造方法
|
|
JP4534651B2
(ja)
*
|
2004-08-03 |
2010-09-01 |
株式会社ニコン |
露光装置、デバイス製造方法及び液体回収方法
|
|
US7224427B2
(en)
*
|
2004-08-03 |
2007-05-29 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Megasonic immersion lithography exposure apparatus and method
|
|
EP3267257B1
(en)
|
2004-08-03 |
2019-02-13 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
US7701550B2
(en)
*
|
2004-08-19 |
2010-04-20 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP4772306B2
(ja)
*
|
2004-09-06 |
2011-09-14 |
株式会社東芝 |
液浸光学装置及び洗浄方法
|
|
CN101052916B
(zh)
|
2004-09-30 |
2010-05-12 |
株式会社尼康 |
投影光学设备和曝光装置
|
|
EP1814144B1
(en)
*
|
2004-10-26 |
2012-06-06 |
Nikon Corporation |
Substrate processing method and device production system
|
|
KR101318037B1
(ko)
*
|
2004-11-01 |
2013-10-14 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US7362412B2
(en)
*
|
2004-11-18 |
2008-04-22 |
International Business Machines Corporation |
Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system
|
|
US7732123B2
(en)
*
|
2004-11-23 |
2010-06-08 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion photolithography with megasonic rinse
|
|
WO2006062065A1
(ja)
*
|
2004-12-06 |
2006-06-15 |
Nikon Corporation |
メンテナンス方法、メンテナンス機器、露光装置、及びデバイス製造方法
|
|
JP4752473B2
(ja)
*
|
2004-12-09 |
2011-08-17 |
株式会社ニコン |
露光装置、露光方法及びデバイス製造方法
|
|
US7880860B2
(en)
*
|
2004-12-20 |
2011-02-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US20060250588A1
(en)
*
|
2005-05-03 |
2006-11-09 |
Stefan Brandl |
Immersion exposure tool cleaning system and method
|
|
WO2006122578A1
(en)
|
2005-05-17 |
2006-11-23 |
Freescale Semiconductor, Inc. |
Contaminant removal apparatus and method therefor
|
|
US7986395B2
(en)
*
|
2005-10-24 |
2011-07-26 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion lithography apparatus and methods
|
|
US8125610B2
(en)
*
|
2005-12-02 |
2012-02-28 |
ASML Metherlands B.V. |
Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
|
|
US7969548B2
(en)
*
|
2006-05-22 |
2011-06-28 |
Asml Netherlands B.V. |
Lithographic apparatus and lithographic apparatus cleaning method
|
|
US8564759B2
(en)
*
|
2006-06-29 |
2013-10-22 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Apparatus and method for immersion lithography
|