JP2008239995A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2008239995A5 JP2008239995A5 JP2008130940A JP2008130940A JP2008239995A5 JP 2008239995 A5 JP2008239995 A5 JP 2008239995A5 JP 2008130940 A JP2008130940 A JP 2008130940A JP 2008130940 A JP2008130940 A JP 2008130940A JP 2008239995 A5 JP2008239995 A5 JP 2008239995A5
- Authority
- JP
- Japan
- Prior art keywords
- fluorine
- alkyl
- group
- carbon atoms
- containing alkyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052731 fluorine Inorganic materials 0.000 claims 87
- 239000011737 fluorine Substances 0.000 claims 87
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 86
- 125000000217 alkyl group Chemical group 0.000 claims 72
- 125000004432 carbon atom Chemical group C* 0.000 claims 27
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 12
- 229920000089 Cyclic olefin copolymer Polymers 0.000 claims 12
- 229910052801 chlorine Inorganic materials 0.000 claims 12
- 239000000460 chlorine Substances 0.000 claims 12
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims 11
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims 11
- 229910052794 bromium Inorganic materials 0.000 claims 11
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims 9
- 229910052740 iodine Inorganic materials 0.000 claims 9
- 239000011630 iodine Substances 0.000 claims 9
- -1 C2-C20 alkylcarbonyl Chemical group 0.000 claims 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 8
- 239000000178 monomer Substances 0.000 claims 8
- 229910052710 silicon Inorganic materials 0.000 claims 8
- 239000010703 silicon Substances 0.000 claims 8
- 229910052739 hydrogen Inorganic materials 0.000 claims 6
- 239000001257 hydrogen Substances 0.000 claims 6
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 claims 6
- 125000003860 C1-C20 alkoxy group Chemical group 0.000 claims 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims 5
- 229910052799 carbon Inorganic materials 0.000 claims 5
- 125000004093 cyano group Chemical group *C#N 0.000 claims 5
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 4
- ORTFAQDWJHRMNX-UHFFFAOYSA-N hydroxidooxidocarbon(.) Chemical group O[C]=O ORTFAQDWJHRMNX-UHFFFAOYSA-N 0.000 claims 4
- 125000004356 hydroxy functional group Chemical group O* 0.000 claims 4
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 claims 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 3
- 125000003545 alkoxy group Chemical group 0.000 claims 3
- 125000001153 fluoro group Chemical group F* 0.000 claims 3
- 239000002994 raw material Substances 0.000 claims 3
- 125000001033 ether group Chemical group 0.000 claims 2
- 238000005227 gel permeation chromatography Methods 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 238000007152 ring opening metathesis polymerisation reaction Methods 0.000 claims 2
- 125000006755 (C2-C20) alkyl group Chemical group 0.000 claims 1
- 239000004793 Polystyrene Substances 0.000 claims 1
- 238000010521 absorption reaction Methods 0.000 claims 1
- 238000007792 addition Methods 0.000 claims 1
- 150000001336 alkenes Chemical class 0.000 claims 1
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000003118 aryl group Chemical group 0.000 claims 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 125000004185 ester group Chemical group 0.000 claims 1
- 238000004770 highest occupied molecular orbital Methods 0.000 claims 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims 1
- 238000001459 lithography Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 238000004776 molecular orbital Methods 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- 229920002223 polystyrene Polymers 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008130940A JP2008239995A (ja) | 2001-04-27 | 2008-05-19 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体および該ポリマーの製造方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001132434 | 2001-04-27 | ||
| JP2002064653 | 2002-03-11 | ||
| JP2008130940A JP2008239995A (ja) | 2001-04-27 | 2008-05-19 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体および該ポリマーの製造方法 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002585513A Division JP4236935B2 (ja) | 2001-04-27 | 2002-04-25 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体、ポリマーの製造方法およびその用途 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008239995A JP2008239995A (ja) | 2008-10-09 |
| JP2008239995A5 true JP2008239995A5 (enExample) | 2009-03-05 |
Family
ID=26614474
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002585513A Expired - Fee Related JP4236935B2 (ja) | 2001-04-27 | 2002-04-25 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体、ポリマーの製造方法およびその用途 |
| JP2008130940A Pending JP2008239995A (ja) | 2001-04-27 | 2008-05-19 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体および該ポリマーの製造方法 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002585513A Expired - Fee Related JP4236935B2 (ja) | 2001-04-27 | 2002-04-25 | フッ素含有環状オレフィンポリマー、その環状オレフィン系単量体、ポリマーの製造方法およびその用途 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US6875819B2 (enExample) |
| EP (1) | EP1298156B1 (enExample) |
| JP (2) | JP4236935B2 (enExample) |
| KR (1) | KR100583297B1 (enExample) |
| CN (1) | CN1233685C (enExample) |
| DE (1) | DE60205555T2 (enExample) |
| TW (1) | TW575596B (enExample) |
| WO (1) | WO2002088216A1 (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100583297B1 (ko) * | 2001-04-27 | 2006-05-24 | 미쓰이 가가쿠 가부시키가이샤 | 불소 함유 시클로올레핀 중합체, 이들의 시클로올레핀단량체, 이 중합체의 제조방법 및 이 중합체의 용도 |
| US7264853B2 (en) * | 2003-08-26 | 2007-09-04 | Intel Corporation | Attaching a pellicle frame to a reticle |
| US7316869B2 (en) * | 2003-08-26 | 2008-01-08 | Intel Corporation | Mounting a pellicle to a frame |
| CN1856522A (zh) * | 2003-09-25 | 2006-11-01 | 西巴特殊化学品控股有限公司 | 带有氟化基团的romp |
| US20050202252A1 (en) * | 2004-03-12 | 2005-09-15 | Alexander Tregub | Use of alternative polymer materials for "soft" polymer pellicles |
| US7314667B2 (en) * | 2004-03-12 | 2008-01-01 | Intel Corporation | Process to optimize properties of polymer pellicles and resist for lithography applications |
| US20060008730A1 (en) * | 2004-07-09 | 2006-01-12 | Puy Michael V D | Monomers for photoresists bearing acid-labile groups of reduced optical density |
| US20060008731A1 (en) * | 2004-07-09 | 2006-01-12 | Michael Van Der Puy | Novel photoresist monomers and polymers |
| US20100221495A1 (en) * | 2005-09-12 | 2010-09-02 | Tadahiro Ohmi | Method of Manufacturing a Transparent Member and Plastic Member |
| WO2007055489A1 (en) | 2005-11-08 | 2007-05-18 | Lg Chem, Ltd. | Colloidal photonic crystals using colloidal nanoparticles and method for preparation thereof |
| JP4866086B2 (ja) * | 2005-12-27 | 2012-02-01 | 三井化学株式会社 | 組み合わせレンズ、色収差の補正方法 |
| US9370876B2 (en) | 2008-06-20 | 2016-06-21 | 3M Innovative Properties Company | Molded microstructured articles and method of making same |
| JP5475761B2 (ja) * | 2008-06-20 | 2014-04-16 | スリーエム イノベイティブ プロパティズ カンパニー | ポリマー鋳型 |
| JP2010113315A (ja) * | 2008-10-10 | 2010-05-20 | Jsr Corp | フォトマスク |
| CN102334177B (zh) * | 2009-02-27 | 2014-01-08 | 三井化学株式会社 | 转印体及其制造方法 |
| JP2010210974A (ja) * | 2009-03-11 | 2010-09-24 | Shin-Etsu Chemical Co Ltd | ペリクルの製造方法及びペリクル |
| JP5466705B2 (ja) * | 2009-08-26 | 2014-04-09 | 三井化学株式会社 | フッ素含有環状オレフィンポリマー組成物、該組成物から得られた転写体およびその製造方法 |
| JP5366740B2 (ja) * | 2009-09-28 | 2013-12-11 | 富士フイルム株式会社 | 含エーテル環状構造含有ポリマー、光学材料用樹脂組成物、並びにその成形体、光学部品及びレンズ |
| KR20130024878A (ko) * | 2010-04-02 | 2013-03-08 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 포토 마스크 유닛 및 그 제조 방법 |
| KR101849519B1 (ko) * | 2010-11-11 | 2018-04-17 | 스탈 인터내셔날 비.브이. | 비금속 태닝 |
| CN103210096B (zh) * | 2010-11-11 | 2014-12-17 | 克拉里安特国际有限公司 | 非金属鞣制 |
| MX338054B (es) * | 2010-11-12 | 2016-03-31 | Stahl Internat Bv | Curtido sin metales. |
| CN104471479B (zh) * | 2012-08-02 | 2019-01-18 | 三井化学株式会社 | 防护膜组件 |
| US10035889B2 (en) | 2013-04-03 | 2018-07-31 | Mitsui Chemicals, Inc. | Optical film |
| JP2016105131A (ja) * | 2014-12-01 | 2016-06-09 | ウシオ電機株式会社 | 表面が改質された基板の製造方法、パターン形成体、基板表面の改質方法、および光照射装置 |
| JP6593351B2 (ja) * | 2015-02-09 | 2019-10-23 | Ａｇｃ株式会社 | 含フッ素重合体の製造方法 |
| JPWO2016129608A1 (ja) * | 2015-02-09 | 2017-11-16 | 旭硝子株式会社 | 含フッ素重合体の製造方法 |
| EP3276075B1 (en) * | 2015-03-26 | 2020-10-21 | Mitsui Chemicals, Inc. | Composition for track pad for railroad rails, and track pad for railroad rails |
| WO2018221575A1 (ja) | 2017-05-31 | 2018-12-06 | 三井化学株式会社 | 下層膜形成用材料、レジスト下層膜、レジスト下層膜の製造方法および積層体 |
| CN107216444B (zh) * | 2017-07-20 | 2019-06-21 | 中国科学院长春应用化学研究所 | 一种透明、高耐热环烯烃共聚物及其制备方法 |
| JP7253340B2 (ja) * | 2018-09-04 | 2023-04-06 | アークレイ株式会社 | 光学素子及び光学素子の製造方法 |
| CN121343135A (zh) * | 2025-12-17 | 2026-01-16 | 拓烯科技(衢州)有限公司 | 一种环烯烃聚合物、有色环烯烃聚合物薄膜及其制备方法与应用 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63238111A (ja) | 1987-03-27 | 1988-10-04 | Asahi Glass Co Ltd | 環状構造を有する含フツ素重合体の製造方法 |
| JP2581182B2 (ja) | 1987-08-14 | 1997-02-12 | 旭硝子株式会社 | 環化重合方法 |
| JP2526641B2 (ja) | 1987-08-14 | 1996-08-21 | 旭硝子株式会社 | 新規含フッ素環状重合体 |
| JPH024722A (ja) * | 1988-06-23 | 1990-01-09 | Mitsui Petrochem Ind Ltd | 弗素含有環状オレフィン化合物及びその製法 |
| JP2951337B2 (ja) | 1989-04-17 | 1999-09-20 | 古河電気工業株式会社 | ペリクル |
| JP2952962B2 (ja) | 1989-05-31 | 1999-09-27 | 旭硝子株式会社 | 汚染防止保護器具 |
| JPH04104155A (ja) | 1990-08-23 | 1992-04-06 | Shin Etsu Chem Co Ltd | リソグラフィー用ペリクル |
| JPH06199997A (ja) * | 1993-01-06 | 1994-07-19 | Japan Synthetic Rubber Co Ltd | 重合体の製造法 |
| JPH06206985A (ja) * | 1993-01-08 | 1994-07-26 | Japan Synthetic Rubber Co Ltd | （水添）ノルボルネン系重合体 |
| JPH06256477A (ja) * | 1993-03-02 | 1994-09-13 | Japan Synthetic Rubber Co Ltd | 重合体の製造法 |
| RU2137783C1 (ru) * | 1993-09-10 | 1999-09-20 | Циба Спешиалти Кемикэлс Холдинг Инк. | Способ фотокаталитической полимеризации циклических олефинов в присутствии рутениевого или осмиевого катализатора, содержащего фотолабильные лиганды, композиция и носитель с покрытием |
| US5677405A (en) * | 1995-05-24 | 1997-10-14 | The B.F. Goodrich Company | Homopolymers and copolymers of cationically polymerizable monomers and method of their preparation |
| ATE215105T1 (de) * | 1996-11-04 | 2002-04-15 | Goodrich Co B F | Photostrukturierbare dielektrische zusammensetzungen |
| EP0907106A4 (en) | 1997-02-13 | 2000-04-05 | Mitsui Chemicals Inc | FILM MEMBRANE FOR ULTRAVIOLET RAYS AND FILM |
| EP1131677B1 (en) | 1998-09-23 | 2005-08-03 | E.I. Dupont De Nemours And Company | Photoresists, polymers and processes for microlithography |
| KR20020012206A (ko) | 1999-05-04 | 2002-02-15 | 메리 이. 보울러 | 플루오르화 중합체, 포토레지스트 및 마이크로리소그래피방법 |
| JP3901401B2 (ja) * | 1999-07-13 | 2007-04-04 | 三井化学株式会社 | ポジ型フォトレジスト組成物およびパターン形成方法 |
| JP2001226467A (ja) * | 2000-02-17 | 2001-08-21 | Hitachi Chem Co Ltd | フッ素含有ノルボルネン系重合体およびその製造方法 |
| JP2001328964A (ja) * | 2000-05-19 | 2001-11-27 | Tokyo Ohka Kogyo Co Ltd | 新規多環式不飽和炭化水素誘導体及びその製造方法 |
| KR100583297B1 (ko) * | 2001-04-27 | 2006-05-24 | 미쓰이 가가쿠 가부시키가이샤 | 불소 함유 시클로올레핀 중합체, 이들의 시클로올레핀단량체, 이 중합체의 제조방법 및 이 중합체의 용도 |
-
2002
- 2002-04-25 KR KR1020027017694A patent/KR100583297B1/ko not_active Expired - Lifetime
- 2002-04-25 EP EP02722782A patent/EP1298156B1/en not_active Expired - Lifetime
- 2002-04-25 JP JP2002585513A patent/JP4236935B2/ja not_active Expired - Fee Related
- 2002-04-25 CN CNB028014243A patent/CN1233685C/zh not_active Expired - Lifetime
- 2002-04-25 DE DE60205555T patent/DE60205555T2/de not_active Expired - Lifetime
- 2002-04-25 WO PCT/JP2002/004140 patent/WO2002088216A1/ja not_active Ceased
- 2002-04-25 US US10/312,506 patent/US6875819B2/en not_active Expired - Lifetime
- 2002-04-26 TW TW091108668A patent/TW575596B/zh not_active IP Right Cessation
-
2008
- 2008-05-19 JP JP2008130940A patent/JP2008239995A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2008239995A5 (enExample) | ||
| JP6156658B2 (ja) | 含フッ素高分岐ポリマー及びそれを含む樹脂組成物 | |
| EP3900693B1 (en) | Use of a resin composition | |
| JP2014524942A5 (enExample) | ||
| JP5473270B2 (ja) | 高分岐ポリマーを用いた光パターニング組成物 | |
| JP2019001997A5 (enExample) | ||
| JP2005529200A5 (enExample) | ||
| JPWO2018025943A1 (ja) | 光硬化性組成物、義歯床及び有床義歯 | |
| JP2008138176A5 (enExample) | ||
| JP2012502018A5 (enExample) | ||
| JP2006521453A5 (enExample) | ||
| EP2103592A3 (en) | Hydroxyl-containing monomer, polymer, resist composition, and patterning process | |
| JP2008308696A5 (ja) | 非共役環状ポリエン系共重合体を含むゴム組成物および用途 | |
| TW202115139A (zh) | 硬化性組成物及由其所構成之光造形用樹脂組成物 | |
| JP2006152249A5 (enExample) | ||
| EP1652844A3 (en) | Fluorinated monomer having cyclic structure, manufacturing method, polymer, photoresist composition and patterning process | |
| JP2013127611A5 (enExample) | ||
| JP2009509007A5 (enExample) | ||
| TW201529642A (zh) | 含倍半矽氧烷化合物及改性聚矽氧化合物之壓印材料 | |
| CN108779215A (zh) | 共聚物的制造方法 | |
| JP5746941B2 (ja) | アダマンタン誘導体を用いたシート | |
| JP5872484B2 (ja) | 含フッ素ハイパーブランチポリマー及びその製造方法 | |
| JPWO2011065154A1 (ja) | 硬化性樹脂組成物 | |
| JP2016120683A (ja) | 積層構造物、光硬化性組成物および積層構造物の製造方法 | |
| WO2018168370A1 (ja) | 重合体およびポジ型レジスト組成物 |