JP2005522839A5 - - Google Patents

Download PDF

Info

Publication number
JP2005522839A5
JP2005522839A5 JP2003584754A JP2003584754A JP2005522839A5 JP 2005522839 A5 JP2005522839 A5 JP 2005522839A5 JP 2003584754 A JP2003584754 A JP 2003584754A JP 2003584754 A JP2003584754 A JP 2003584754A JP 2005522839 A5 JP2005522839 A5 JP 2005522839A5
Authority
JP
Japan
Prior art keywords
source
plasma
active material
pinch
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003584754A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005522839A (ja
Filing date
Publication date
Priority claimed from US10/120,655 external-priority patent/US6744060B2/en
Priority claimed from US10/189,824 external-priority patent/US6815700B2/en
Priority claimed from US10/384,967 external-priority patent/US6904073B2/en
Priority claimed from US10/409,254 external-priority patent/US6972421B2/en
Application filed filed Critical
Publication of JP2005522839A publication Critical patent/JP2005522839A/ja
Publication of JP2005522839A5 publication Critical patent/JP2005522839A5/ja
Pending legal-status Critical Current

Links

JP2003584754A 2002-04-10 2003-04-09 極紫外線光源 Pending JP2005522839A (ja)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US10/120,655 US6744060B2 (en) 1997-05-12 2002-04-10 Pulse power system for extreme ultraviolet and x-ray sources
US10/189,824 US6815700B2 (en) 1997-05-12 2002-07-03 Plasma focus light source with improved pulse power system
US41980502P 2002-10-18 2002-10-18
US42280802P 2002-10-31 2002-10-31
US10/384,967 US6904073B2 (en) 2001-01-29 2003-03-08 High power deep ultraviolet laser with long life optics
US10/409,254 US6972421B2 (en) 2000-06-09 2003-04-08 Extreme ultraviolet light source
PCT/US2003/011139 WO2003087867A2 (en) 2002-04-10 2003-04-09 Extreme ultraviolet light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010110262A Division JP2010182698A (ja) 2002-04-10 2010-05-12 極紫外線光源

Publications (2)

Publication Number Publication Date
JP2005522839A JP2005522839A (ja) 2005-07-28
JP2005522839A5 true JP2005522839A5 (enExample) 2006-06-08

Family

ID=29741190

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2003584754A Pending JP2005522839A (ja) 2002-04-10 2003-04-09 極紫外線光源
JP2013097975A Pending JP2013179073A (ja) 2002-04-10 2013-05-07 極紫外線光源

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013097975A Pending JP2013179073A (ja) 2002-04-10 2013-05-07 極紫外線光源

Country Status (6)

Country Link
US (4) US6972421B2 (enExample)
EP (1) EP1493039A4 (enExample)
JP (2) JP2005522839A (enExample)
KR (1) KR101038479B1 (enExample)
AU (1) AU2003230870A1 (enExample)
WO (1) WO2003087867A2 (enExample)

Families Citing this family (276)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP2002163005A (ja) * 2000-11-29 2002-06-07 Nikon Corp 制御系の設計方法、制御系、制御系の調整方法及び露光方法
US7671349B2 (en) 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
FR2841684B1 (fr) * 2002-06-28 2004-09-24 Centre Nat Rech Scient Source de rayonnement, notamment ultraviolet a decharges
US7002168B2 (en) * 2002-10-15 2006-02-21 Cymer, Inc. Dense plasma focus radiation source
DE10308299A1 (de) * 2003-02-26 2004-09-16 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Düsenanordnung
US7034320B2 (en) * 2003-03-20 2006-04-25 Intel Corporation Dual hemispherical collectors
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
DE10325151B4 (de) * 2003-05-30 2006-11-30 Infineon Technologies Ag Vorrichtung für die Erzeugung und/oder Beeinflussung elektromagnetischer Strahlung eines Plasmas
US7034308B2 (en) * 2003-06-27 2006-04-25 Asml Netherlands B.V. Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby
CN1820556B (zh) * 2003-06-27 2011-07-06 法国原子能委员会 产生极端紫外辐射或软x射线辐射的方法及装置
US7230258B2 (en) * 2003-07-24 2007-06-12 Intel Corporation Plasma-based debris mitigation for extreme ultraviolet (EUV) light source
US7446329B2 (en) * 2003-08-07 2008-11-04 Intel Corporation Erosion resistance of EUV source electrodes
EP1624467A3 (en) * 2003-10-20 2007-05-30 ASML Netherlands BV Lithographic apparatus and device manufacturing method
US7135692B2 (en) * 2003-12-04 2006-11-14 Asml Netherlands B.V. Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation
DE10359464A1 (de) * 2003-12-17 2005-07-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung
WO2005061088A1 (en) * 2003-12-22 2005-07-07 Finlay Warren H Powder formation by atmospheric spray-freeze drying
US7251012B2 (en) 2003-12-31 2007-07-31 Asml Netherlands B.V. Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris
JP4535732B2 (ja) * 2004-01-07 2010-09-01 株式会社小松製作所 光源装置及びそれを用いた露光装置
US7423275B2 (en) * 2004-01-15 2008-09-09 Intel Corporation Erosion mitigation for collector optics using electric and magnetic fields
EP1732086A4 (en) * 2004-02-12 2008-04-16 Japan Science & Tech Agency PROCESSING DEVICE FOR SOFT X-RAY RAYS AND PROCESSING METHODS FOR SOFT X-RAY RAYS
JP2005235959A (ja) * 2004-02-18 2005-09-02 Canon Inc 光発生装置及び露光装置
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
EP1730764A4 (en) * 2004-03-17 2010-08-18 Cymer Inc LPP EUV LIGHT SOURCE
US20050211910A1 (en) * 2004-03-29 2005-09-29 Jmar Research, Inc. Morphology and Spectroscopy of Nanoscale Regions using X-Rays Generated by Laser Produced Plasma
US20050223973A1 (en) * 2004-03-30 2005-10-13 Infineon Technologies Ag EUV lithography system and chuck for releasing reticle in a vacuum isolated environment
ATE525678T1 (de) * 2004-06-24 2011-10-15 Nikon Corp Euv-lichtquelle, euv-belichtungsanlage und verfahren zur herstellung einer halbleitervorrichtung
US7307375B2 (en) * 2004-07-09 2007-12-11 Energetiq Technology Inc. Inductively-driven plasma light source
US7948185B2 (en) 2004-07-09 2011-05-24 Energetiq Technology Inc. Inductively-driven plasma light source
US7199384B2 (en) * 2004-07-09 2007-04-03 Energetiq Technology Inc. Inductively-driven light source for lithography
JP5179175B2 (ja) * 2004-07-09 2013-04-10 エナジェティック・テクノロジー・インコーポレーテッド 誘導駆動プラズマ光源
US7183717B2 (en) * 2004-07-09 2007-02-27 Energetiq Technology Inc. Inductively-driven light source for microscopy
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
US7586097B2 (en) 2006-01-05 2009-09-08 Virgin Islands Microsystems, Inc. Switching micro-resonant structures using at least one director
US7626179B2 (en) 2005-09-30 2009-12-01 Virgin Island Microsystems, Inc. Electron beam induced resonance
US7791290B2 (en) * 2005-09-30 2010-09-07 Virgin Islands Microsystems, Inc. Ultra-small resonating charged particle beam modulator
DE102004042501A1 (de) * 2004-08-31 2006-03-16 Xtreme Technologies Gmbh Vorrichtung zur Bereitstellung eines reproduzierbaren Targetstromes für die energiestrahlinduzierte Erzeugung kurzwelliger elektromagnetischer Strahlung
US7541121B2 (en) * 2004-10-13 2009-06-02 Infineon Technologies Ag Calibration of optical line shortening measurements
ITVE20040038A1 (it) * 2004-10-21 2005-01-21 Domiziano Mostacci Apparecchiatura per la produzione endogena di radioisotopi, particolarmente per diagnostica tomografica ad emissioni di positroni.
JP2006156359A (ja) * 2004-10-27 2006-06-15 Kumamoto Univ プラズマ発生装置およびスペクトル制御方法
US7109503B1 (en) * 2005-02-25 2006-09-19 Cymer, Inc. Systems for protecting internal components of an EUV light source from plasma-generated debris
US7145132B2 (en) 2004-12-27 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, illumination system and debris trapping system
SG123767A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, illumination system and filter system
US7196343B2 (en) * 2004-12-30 2007-03-27 Asml Netherlands B.V. Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
DE102005007884A1 (de) * 2005-02-15 2006-08-24 Xtreme Technologies Gmbh Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter (EUV-) Strahlung
US7679027B2 (en) * 2005-03-17 2010-03-16 Far-Tech, Inc. Soft x-ray laser based on z-pinch compression of rotating plasma
DE102005014433B3 (de) * 2005-03-24 2006-10-05 Xtreme Technologies Gmbh Verfahren und Anordnung zur effizienten Erzeugung von kurzwelliger Strahlung auf Basis eines lasererzeugten Plasmas
US7372623B2 (en) * 2005-03-29 2008-05-13 Asml Netherlands B.V. Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
JP4922638B2 (ja) * 2005-03-29 2012-04-25 エーエスエムエル ネザーランズ ビー.ブイ. リソグラフィ装置、シール、デバイス製造方法、コンピュータプログラム、およびデータ記録媒体
US7502095B2 (en) 2005-03-29 2009-03-10 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
DE102005015274B4 (de) * 2005-03-31 2012-02-23 Xtreme Technologies Gmbh Strahlungsquelle zur Erzeugung kurzwelliger Strahlung
AU2006235506B2 (en) * 2005-04-11 2011-06-30 Terumo Kabushiki Kaisha Methods and apparatus to achieve a closure of a layered tissue defect
US7233010B2 (en) * 2005-05-20 2007-06-19 Asml Netherlands B.V. Radiation system and lithographic apparatus
DE102005025624B4 (de) 2005-06-01 2010-03-18 Xtreme Technologies Gmbh Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas
WO2006134512A2 (en) * 2005-06-14 2006-12-21 Philips Intellectual Property & Standards Gmbh Debris mitigation system with improved gas distribution
WO2007002170A2 (en) * 2005-06-21 2007-01-04 Starfire Industries Llc Microdischarge light source configuration and illumination system
JP4618013B2 (ja) * 2005-06-23 2011-01-26 ウシオ電機株式会社 極端紫外光光源装置
US7365349B2 (en) * 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US8018574B2 (en) * 2005-06-30 2011-09-13 Asml Netherlands B.V. Lithographic apparatus, radiation system and device manufacturing method
US7394083B2 (en) * 2005-07-08 2008-07-01 Cymer, Inc. Systems and methods for EUV light source metrology
JP4780394B2 (ja) * 2005-07-29 2011-09-28 独立行政法人産業技術総合研究所 液滴供給方法及び装置
US20070024169A1 (en) * 2005-07-29 2007-02-01 Koegler John M Iii Method of forming a lamp assembly
DE102005041567B4 (de) 2005-08-30 2009-03-05 Xtreme Technologies Gmbh EUV-Strahlungsquelle mit hoher Strahlungsleistung auf Basis einer Gasentladung
DE102005044141B4 (de) * 2005-09-15 2008-08-14 Qimonda Ag Belichtungsgerät und Verfahren zum Betrieb eines Belichtungsgeräts
JP4961529B2 (ja) * 2005-09-21 2012-06-27 国立大学法人大阪大学 極端紫外光源用ターゲット
WO2007064358A2 (en) * 2005-09-30 2007-06-07 Virgin Islands Microsystems, Inc. Structures and methods for coupling energy from an electromagnetic wave
US7569791B2 (en) * 2005-09-30 2009-08-04 Energetiq Technology, Inc. Inductively-driven plasma light source
JP5176052B2 (ja) * 2005-10-05 2013-04-03 国立大学法人大阪大学 放射線源用ターゲット生成供給装置
US7372059B2 (en) * 2005-10-17 2008-05-13 The University Of Washington Plasma-based EUV light source
US7825391B2 (en) * 2005-10-17 2010-11-02 The University Of Washington Plasma-based EUV light source
US20070115443A1 (en) * 2005-11-23 2007-05-24 Asml Netherlands B.V. Radiation system and lithographic apparatus
US20070119836A1 (en) * 2005-11-29 2007-05-31 Thomas Schroeder Method and apparatus for focusing a beam from an excimer laser to form a line of light on a substrate
US7465943B2 (en) * 2005-12-08 2008-12-16 Asml Netherlands B.V. Controlling the flow through the collector during cleaning
US7579609B2 (en) 2005-12-14 2009-08-25 Virgin Islands Microsystems, Inc. Coupling light of light emitting resonator to waveguide
JP4904809B2 (ja) * 2005-12-28 2012-03-28 ウシオ電機株式会社 極端紫外光光源装置
US20070152781A1 (en) * 2006-01-05 2007-07-05 Virgin Islands Microsystems, Inc. Switching micro-resonant structures by modulating a beam of charged particles
US7619373B2 (en) 2006-01-05 2009-11-17 Virgin Islands Microsystems, Inc. Selectable frequency light emitter
US7470920B2 (en) * 2006-01-05 2008-12-30 Virgin Islands Microsystems, Inc. Resonant structure-based display
US7667820B2 (en) * 2006-01-17 2010-02-23 Asml Netherlands B.V. Method for chemical reduction of an oxidized contamination material, or reducing oxidation of a contamination material and a conditioning system for doing the same
US7282776B2 (en) 2006-02-09 2007-10-16 Virgin Islands Microsystems, Inc. Method and structure for coupling two microcircuits
US20070200071A1 (en) * 2006-02-28 2007-08-30 Virgin Islands Microsystems, Inc. Coupling output from a micro resonator to a plasmon transmission line
US7605835B2 (en) 2006-02-28 2009-10-20 Virgin Islands Microsystems, Inc. Electro-photographic devices incorporating ultra-small resonant structures
US7443358B2 (en) 2006-02-28 2008-10-28 Virgin Island Microsystems, Inc. Integrated filter in antenna-based detector
US7453071B2 (en) * 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
JP4954584B2 (ja) * 2006-03-31 2012-06-20 株式会社小松製作所 極端紫外光源装置
US7558490B2 (en) 2006-04-10 2009-07-07 Virgin Islands Microsystems, Inc. Resonant detector for optical signals
WO2007121142A2 (en) * 2006-04-12 2007-10-25 The Regents Of The University Of California Improved light source employing laser-produced plasma
US7646991B2 (en) 2006-04-26 2010-01-12 Virgin Island Microsystems, Inc. Selectable frequency EMR emitter
US7876793B2 (en) 2006-04-26 2011-01-25 Virgin Islands Microsystems, Inc. Micro free electron laser (FEL)
US7492868B2 (en) * 2006-04-26 2009-02-17 Virgin Islands Microsystems, Inc. Source of x-rays
US7442940B2 (en) * 2006-05-05 2008-10-28 Virgin Island Microsystems, Inc. Focal plane array incorporating ultra-small resonant structures
US8188431B2 (en) 2006-05-05 2012-05-29 Jonathan Gorrell Integration of vacuum microelectronic device with integrated circuit
US7476907B2 (en) * 2006-05-05 2009-01-13 Virgin Island Microsystems, Inc. Plated multi-faceted reflector
US7569836B2 (en) 2006-05-05 2009-08-04 Virgin Islands Microsystems, Inc. Transmission of data between microchips using a particle beam
US7443577B2 (en) * 2006-05-05 2008-10-28 Virgin Islands Microsystems, Inc. Reflecting filtering cover
US7436177B2 (en) * 2006-05-05 2008-10-14 Virgin Islands Microsystems, Inc. SEM test apparatus
US7986113B2 (en) 2006-05-05 2011-07-26 Virgin Islands Microsystems, Inc. Selectable frequency light emitter
US7583370B2 (en) 2006-05-05 2009-09-01 Virgin Islands Microsystems, Inc. Resonant structures and methods for encoding signals into surface plasmons
US7746532B2 (en) 2006-05-05 2010-06-29 Virgin Island Microsystems, Inc. Electro-optical switching system and method
US7728702B2 (en) 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Shielding of integrated circuit package with high-permeability magnetic material
US7723698B2 (en) * 2006-05-05 2010-05-25 Virgin Islands Microsystems, Inc. Top metal layer shield for ultra-small resonant structures
US7728397B2 (en) 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Coupled nano-resonating energy emitting structures
US20070258720A1 (en) * 2006-05-05 2007-11-08 Virgin Islands Microsystems, Inc. Inter-chip optical communication
US7710040B2 (en) 2006-05-05 2010-05-04 Virgin Islands Microsystems, Inc. Single layer construction for ultra small devices
US20070258675A1 (en) * 2006-05-05 2007-11-08 Virgin Islands Microsystems, Inc. Multiplexed optical communication between chips on a multi-chip module
US7718977B2 (en) 2006-05-05 2010-05-18 Virgin Island Microsystems, Inc. Stray charged particle removal device
US20070258492A1 (en) * 2006-05-05 2007-11-08 Virgin Islands Microsystems, Inc. Light-emitting resonant structure driving raman laser
US7586167B2 (en) 2006-05-05 2009-09-08 Virgin Islands Microsystems, Inc. Detecting plasmons using a metallurgical junction
US7554083B2 (en) 2006-05-05 2009-06-30 Virgin Islands Microsystems, Inc. Integration of electromagnetic detector on integrated chip
US7557647B2 (en) 2006-05-05 2009-07-07 Virgin Islands Microsystems, Inc. Heterodyne receiver using resonant structures
US7342441B2 (en) * 2006-05-05 2008-03-11 Virgin Islands Microsystems, Inc. Heterodyne receiver array using resonant structures
US7656094B2 (en) 2006-05-05 2010-02-02 Virgin Islands Microsystems, Inc. Electron accelerator for ultra-small resonant structures
US7732786B2 (en) 2006-05-05 2010-06-08 Virgin Islands Microsystems, Inc. Coupling energy in a plasmon wave to an electron beam
US7359589B2 (en) * 2006-05-05 2008-04-15 Virgin Islands Microsystems, Inc. Coupling electromagnetic wave through microcircuit
US7741934B2 (en) 2006-05-05 2010-06-22 Virgin Islands Microsystems, Inc. Coupling a signal through a window
DE102006022823B4 (de) * 2006-05-12 2010-03-25 Xtreme Technologies Gmbh Anordnung zur Erzeugung von EUV-Strahlung auf Basis eines Gasentladungsplasmas
US7573045B2 (en) 2006-05-15 2009-08-11 Virgin Islands Microsystems, Inc. Plasmon wave propagation devices and methods
WO2007135587A2 (en) * 2006-05-16 2007-11-29 Philips Intellectual Property & Standards Gmbh A method of increasing the conversion efficiency of an euv and/or soft x-ray lamp and a corresponding apparatus
JP4321721B2 (ja) * 2006-05-22 2009-08-26 国立大学法人名古屋大学 放電光源
US20070274365A1 (en) * 2006-05-26 2007-11-29 Virgin Islands Microsystems, Inc. Periodically complex resonant structures
US7679067B2 (en) 2006-05-26 2010-03-16 Virgin Island Microsystems, Inc. Receiver array using shared electron beam
US20070287091A1 (en) * 2006-06-12 2007-12-13 Jacobo Victor M System and method for exposing electronic substrates to UV light
US7655934B2 (en) * 2006-06-28 2010-02-02 Virgin Island Microsystems, Inc. Data on light bulb
JP2008053696A (ja) * 2006-07-28 2008-03-06 Ushio Inc 極端紫外光光源装置および極端紫外光発生方法
TW200808134A (en) * 2006-07-28 2008-02-01 Ushio Electric Inc Light source device for producing extreme ultraviolet radiation and method of generating extreme ultraviolet radiation
EP1882984B1 (en) * 2006-07-28 2011-10-12 Media Lario s.r.l. Multi-reflection optical systems and their fabrication
JP5162113B2 (ja) * 2006-08-07 2013-03-13 ギガフォトン株式会社 極端紫外光源装置
US7450794B2 (en) * 2006-09-19 2008-11-11 Virgin Islands Microsystems, Inc. Microcircuit using electromagnetic wave routing
US7560716B2 (en) 2006-09-22 2009-07-14 Virgin Islands Microsystems, Inc. Free electron oscillator
JP5076087B2 (ja) * 2006-10-19 2012-11-21 ギガフォトン株式会社 極端紫外光源装置及びノズル保護装置
US7759663B1 (en) * 2006-12-06 2010-07-20 Asml Netherlands B.V. Self-shading electrodes for debris suppression in an EUV source
US7696492B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
DE102006060998B4 (de) * 2006-12-20 2011-06-09 Fachhochschule Hildesheim/Holzminden/Göttingen - Körperschaft des öffentlichen Rechts - Verfahren und Vorrichtungen zum Erzeugen von Röntgenstrahlung
US7659513B2 (en) 2006-12-20 2010-02-09 Virgin Islands Microsystems, Inc. Low terahertz source and detector
US8071963B2 (en) * 2006-12-27 2011-12-06 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
DE102007004440B4 (de) * 2007-01-25 2011-05-12 Xtreme Technologies Gmbh Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung mittels einer elektrisch betriebenen Gasentladung
US20080237498A1 (en) * 2007-01-29 2008-10-02 Macfarlane Joseph J High-efficiency, low-debris short-wavelength light sources
EP1976344B1 (en) * 2007-03-28 2011-04-20 Tokyo Institute Of Technology Extreme ultraviolet light source device and extreme ultraviolet radiation generating method
US20080239262A1 (en) * 2007-03-29 2008-10-02 Asml Netherlands B.V. Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation
JP5001055B2 (ja) * 2007-04-20 2012-08-15 株式会社小松製作所 極端紫外光源装置
KR20100017443A (ko) * 2007-05-31 2010-02-16 칼 짜이스 에스엠테 아게 성형 프로세스를 이용하여 광학 요소를 제조하기 위한 방법, 상기 방법으로 제조된 광학 요소, 집광기 및 조명 장치
US7990336B2 (en) 2007-06-19 2011-08-02 Virgin Islands Microsystems, Inc. Microwave coupled excitation of solid state resonant arrays
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus
US8493548B2 (en) * 2007-08-06 2013-07-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7872244B2 (en) * 2007-08-08 2011-01-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5234448B2 (ja) * 2007-08-09 2013-07-10 国立大学法人東京工業大学 放射線源用ターゲット、その製造方法及び放射線発生装置
US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US7791053B2 (en) 2007-10-10 2010-09-07 Virgin Islands Microsystems, Inc. Depressed anode with plasmon-enabled devices such as ultra-small resonant structures
JP2009099390A (ja) 2007-10-17 2009-05-07 Tokyo Institute Of Technology 極端紫外光光源装置および極端紫外光発生方法
US8269199B2 (en) * 2007-11-29 2012-09-18 Plex Llc Laser heated discharge plasma EUV source
EP2083327B1 (en) * 2008-01-28 2017-11-29 Media Lario s.r.l. Improved grazing incidence collector optical systems for EUV and X-ray applications
US20090224182A1 (en) * 2008-02-21 2009-09-10 Plex Llc Laser Heated Discharge Plasma EUV Source With Plasma Assisted Lithium Reflux
JP5312837B2 (ja) * 2008-04-14 2013-10-09 ギガフォトン株式会社 極端紫外光源装置
WO2009131737A1 (en) * 2008-04-22 2009-10-29 The Regents Of The University Of California Method and apparatus for improved high power impulse magnetron sputtering
WO2009140270A2 (en) * 2008-05-13 2009-11-19 The Regents Of The University Of California System and method for light source employing laser-produced plasma
JP5061063B2 (ja) 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光用ミラーおよび極端紫外光源装置
US8227778B2 (en) * 2008-05-20 2012-07-24 Komatsu Ltd. Semiconductor exposure device using extreme ultra violet radiation
NL2002890A1 (nl) * 2008-06-16 2009-12-17 Asml Netherlands Bv Lithographic apparatus.
EP2298041B1 (en) * 2008-07-07 2015-09-09 Philips Deutschland GmbH Extreme uv radiation generating device comprising a corrosion-resistant material
JP5162365B2 (ja) * 2008-08-05 2013-03-13 学校法人 関西大学 半導体リソグラフィ用光源
US8519366B2 (en) 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
KR101652361B1 (ko) 2008-08-14 2016-08-30 에이에스엠엘 네델란즈 비.브이. 방사선 소스, 리소그래피 장치 및 디바이스 제조방법
JP4916535B2 (ja) * 2008-08-14 2012-04-11 エーエスエムエル ネザーランズ ビー.ブイ. 放射源、デバイス製造方法、およびリソグラフィ装置
EP2154574B1 (en) * 2008-08-14 2011-12-07 ASML Netherlands BV Radiation source and method of generating radiation
US9052615B2 (en) * 2008-08-29 2015-06-09 Gigaphoton Inc. Extreme ultraviolet light source apparatus
NL1036803A (nl) 2008-09-09 2010-03-15 Asml Netherlands Bv Radiation system and lithographic apparatus.
DE102008049494A1 (de) * 2008-09-27 2010-04-08 Xtreme Technologies Gmbh Verfahren und Anordnung zum Betreiben von plasmabasierten kurzwelligen Strahlungsquellen
US8399867B2 (en) * 2008-09-29 2013-03-19 Gigaphoton Inc. Extreme ultraviolet light source apparatus
JP4623192B2 (ja) * 2008-09-29 2011-02-02 ウシオ電機株式会社 極端紫外光光源装置および極端紫外光発生方法
US7929667B1 (en) * 2008-10-02 2011-04-19 Kla-Tencor Corporation High brightness X-ray metrology
EP2182412A1 (en) * 2008-11-04 2010-05-05 ASML Netherlands B.V. Radiation source and lithographic apparatus
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
JP5608173B2 (ja) * 2008-12-16 2014-10-15 コーニンクレッカ フィリップス エヌ ヴェ 向上された効率によってeuv放射又は軟x線を生成する方法及び装置
US8232537B2 (en) 2008-12-18 2012-07-31 Asml Netherlands, B.V. Radiation source, lithographic apparatus and device manufacturing method
JP5580032B2 (ja) * 2008-12-26 2014-08-27 ギガフォトン株式会社 極端紫外光光源装置
US20100176312A1 (en) * 2009-01-13 2010-07-15 Hiroshi Komori Extreme ultra violet light source apparatus
JP5474522B2 (ja) * 2009-01-14 2014-04-16 ギガフォトン株式会社 極端紫外光源システム
JP5455661B2 (ja) * 2009-01-29 2014-03-26 ギガフォトン株式会社 極端紫外光源装置
US8041008B2 (en) 2009-01-29 2011-10-18 The Invention Science Fund I, Llc Diagnostic delivery service
US8130904B2 (en) 2009-01-29 2012-03-06 The Invention Science Fund I, Llc Diagnostic delivery service
US8304752B2 (en) * 2009-04-10 2012-11-06 Cymer, Inc. EUV light producing system and method utilizing an alignment laser
US8050380B2 (en) * 2009-05-05 2011-11-01 Media Lario, S.R.L. Zone-optimized mirrors and optical systems using same
KR101535230B1 (ko) 2009-06-03 2015-07-09 삼성전자주식회사 Euv 마스크용 공간 영상 측정 장치 및 방법
JP2011023712A (ja) 2009-06-19 2011-02-03 Gigaphoton Inc 極端紫外光源装置
NL2004816A (en) * 2009-07-07 2011-01-10 Asml Netherlands Bv Euv radiation generation apparatus.
US9726388B2 (en) * 2009-07-20 2017-08-08 Lennox Industries Inc. Reflective ultraviolet light shield for a HVAC unit
EP2478417B1 (en) * 2009-09-18 2013-07-03 Koninklijke Philips Electronics N.V. Foil trap device with improved heat resistance
US20110089834A1 (en) * 2009-10-20 2011-04-21 Plex Llc Z-pinch plasma generator and plasma target
US8749178B2 (en) 2009-10-29 2014-06-10 Koninklijke Philips N.V. Electrode system, in particular for gas discharge light sources
US8173985B2 (en) * 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
US8000212B2 (en) * 2009-12-15 2011-08-16 Cymer, Inc. Metrology for extreme ultraviolet light source
KR101748461B1 (ko) 2010-02-09 2017-06-16 에너제틱 테크놀로지 아이엔씨. 레이저 구동 광원
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
CN102782582A (zh) * 2010-03-12 2012-11-14 Asml荷兰有限公司 辐射源、光刻设备以及器件制造方法
US20130134318A1 (en) * 2010-03-25 2013-05-30 Reza Abhari Beam line for a source of extreme ultraviolet (euv) radiation
US8263953B2 (en) 2010-04-09 2012-09-11 Cymer, Inc. Systems and methods for target material delivery protection in a laser produced plasma EUV light source
US8810775B2 (en) * 2010-04-16 2014-08-19 Media Lario S.R.L. EUV mirror module with a nickel electroformed curved mirror
JP5758750B2 (ja) * 2010-10-29 2015-08-05 ギガフォトン株式会社 極端紫外光生成システム
RU2462008C2 (ru) * 2010-11-16 2012-09-20 Государственное Образовательное Учреждение Высшего Профессионального Образования "Московский Государственный Технический Университет Имени Н.Э. Баумана" Взрывной плазменно-вихревой источник оптического излучения
JP2012129439A (ja) * 2010-12-17 2012-07-05 Renesas Electronics Corp 半導体装置の製造方法、露光装置の露光方法、露光装置および露光装置用の光源
JP5921876B2 (ja) * 2011-02-24 2016-05-24 ギガフォトン株式会社 極端紫外光生成装置
US8633459B2 (en) 2011-03-02 2014-01-21 Cymer, Llc Systems and methods for optics cleaning in an EUV light source
JP5921879B2 (ja) * 2011-03-23 2016-05-24 ギガフォトン株式会社 ターゲット供給装置及び極端紫外光生成装置
US9516730B2 (en) * 2011-06-08 2016-12-06 Asml Netherlands B.V. Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
US9605376B2 (en) * 2011-06-28 2017-03-28 Mtix Ltd. Treating materials with combined energy sources
JP5488540B2 (ja) * 2011-07-04 2014-05-14 トヨタ自動車株式会社 半導体モジュール
US9155180B1 (en) * 2011-10-10 2015-10-06 Kla-Tencor Corporation System and method of simultaneously fueling and mitigating debris for a plasma-based illumination source
JP6034598B2 (ja) * 2012-05-31 2016-11-30 ギガフォトン株式会社 Euv光生成装置の洗浄方法
NL2010965A (en) * 2012-06-22 2013-12-24 Asml Netherlands Bv Radiation source and lithographic apparatus.
JP6058324B2 (ja) * 2012-09-11 2017-01-11 ギガフォトン株式会社 ターゲット供給装置の制御方法、および、ターゲット供給装置
JP5567640B2 (ja) * 2012-11-05 2014-08-06 ギガフォトン株式会社 極端紫外光源装置
US9341752B2 (en) * 2012-11-07 2016-05-17 Asml Netherlands B.V. Viewport protector for an extreme ultraviolet light source
US9277634B2 (en) 2013-01-17 2016-03-01 Kla-Tencor Corporation Apparatus and method for multiplexed multiple discharge plasma produced sources
US8680495B1 (en) * 2013-03-15 2014-03-25 Cymer, Llc Extreme ultraviolet light source
JP6076838B2 (ja) * 2013-05-31 2017-02-08 住友重機械イオンテクノロジー株式会社 絶縁構造及び絶縁方法
IL234729B (en) 2013-09-20 2021-02-28 Asml Netherlands Bv A light source operated by a laser and a method using a mode mixer
IL234727B (en) 2013-09-20 2020-09-30 Asml Netherlands Bv A light source operated by a laser in an optical system corrected for deviations and the method of manufacturing the system as mentioned
US9719932B1 (en) 2013-11-04 2017-08-01 Kla-Tencor Corporation Confined illumination for small spot size metrology
US9301382B2 (en) 2013-12-02 2016-03-29 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
KR101585889B1 (ko) * 2014-02-27 2016-02-02 한국과학기술원 고효율 할로우 음극과 이를 적용한 음극 시스템
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
EP3457429B1 (en) 2014-05-15 2023-11-08 Excelitas Technologies Corp. Laser driven sealed beam lamp with adjustable pressure
US9506871B1 (en) 2014-05-25 2016-11-29 Kla-Tencor Corporation Pulsed laser induced plasma light source
KR102197066B1 (ko) 2014-07-01 2020-12-30 삼성전자 주식회사 플라즈마 광원, 그 광원을 구비한 검사 장치 및 플라즈마 광 생성 방법
US9301381B1 (en) 2014-09-12 2016-03-29 International Business Machines Corporation Dual pulse driven extreme ultraviolet (EUV) radiation source utilizing a droplet comprising a metal core with dual concentric shells of buffer gas
KR102345537B1 (ko) 2014-12-11 2021-12-30 삼성전자주식회사 플라즈마 광원, 및 그 광원을 포함하는 검사 장치
CA2890401C (en) 2015-01-21 2015-11-03 Vln Advanced Technologies Inc. Electrodischarge apparatus for generating low-frequency powerful pulsed and cavitating waterjets
CN104934278B (zh) * 2015-04-29 2017-06-23 中国科学院长春光学精密机械与物理研究所 Euv光源放电电极的液态金属高效冷却方法与装置
US9576785B2 (en) 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
KR102369935B1 (ko) 2015-08-31 2022-03-03 삼성전자주식회사 드립 홀을 갖는 콜렉팅 미러를 포함하는 euv 광 발생 장치
CA2921675C (en) 2016-02-24 2017-12-05 Vln Advanced Technologies Inc. Electro-discharge system for neutralizing landmines
US20170311429A1 (en) * 2016-04-25 2017-10-26 Asml Netherlands B.V. Reducing the effect of plasma on an object in an extreme ultraviolet light source
EP3291650B1 (en) * 2016-09-02 2019-06-05 ETH Zürich Device and method for generating uv or x-ray radiation by means of a plasma
US11008650B2 (en) 2016-11-03 2021-05-18 Starfire Industries Llc Compact system for coupling RF power directly into RF linacs
CN106533131B (zh) * 2016-11-18 2023-07-14 云南电网有限责任公司电力科学研究院 一种带脉冲激励装置的直流换流阀
JP6319920B1 (ja) * 2016-12-28 2018-05-09 国立大学法人大阪大学 光導波路形成方法、光導波路形成装置、電子加速器、x線レーザ照射装置、及び散乱x線発生装置
KR102536355B1 (ko) 2017-01-06 2023-05-25 에이에스엠엘 네델란즈 비.브이. 안내 장치 및 관련 시스템
US10955749B2 (en) 2017-01-06 2021-03-23 Asml Netherlands B.V. Guiding device and associated system
JP2019029272A (ja) * 2017-08-02 2019-02-21 ウシオ電機株式会社 レーザ駆動ランプ
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
KR102555241B1 (ko) * 2018-08-08 2023-07-13 삼성전자주식회사 극자외선 생성 장치
US10877190B2 (en) * 2018-08-17 2020-12-29 Taiwan Semiconductor Manufacturing Co., Ltd. Extreme ultraviolet radiation source
US10477664B1 (en) * 2018-09-12 2019-11-12 ETH Zürich Method and device for generating electromagnetic radiation by means of a laser-produced plasma
WO2020055540A1 (en) * 2018-09-12 2020-03-19 Cymer, Llc Metrology for a body of a gas discharge stage
US10743397B2 (en) * 2018-09-12 2020-08-11 ETH Zürich Method and device for generating electromagnetic radiation by means of a laser-produced plasma
CN113474482B (zh) 2019-02-25 2025-07-15 星火工业有限公司 用于事故耐受核燃料、粒子加速器、和航空航天前沿的金属和陶瓷纳米涂层的方法和设备
US10791616B1 (en) * 2019-03-27 2020-09-29 Taiwan Semiconductor Manufacturing Co., Ltd. Radiation source apparatus
KR102562520B1 (ko) * 2019-05-22 2023-08-01 사이머 엘엘씨 다수의 레이저 빔을 생성하는 장치 및 방법
KR20220078612A (ko) * 2019-10-16 2022-06-10 에이에스엠엘 네델란즈 비.브이. 방사선 소스에서 사용하기 위한 장치
US11259394B2 (en) * 2019-11-01 2022-02-22 Kla Corporation Laser produced plasma illuminator with liquid sheet jet target
US11438999B2 (en) * 2019-11-15 2022-09-06 The Regents Of The University Of California Devices and methods for creating plasma channels for laser plasma acceleration
JP7660572B2 (ja) * 2019-12-17 2025-04-11 エーエスエムエル ネザーランズ ビー.ブイ. 極端紫外光源用のターゲット材料タンク
EP4094125A1 (en) * 2020-01-23 2022-11-30 ASML Holding N.V. Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris
JP6885636B1 (ja) * 2020-03-05 2021-06-16 アールアンドディー−イーサン,リミテッド レーザ励起プラズマ光源およびプラズマ点火方法
CN111403290B (zh) * 2020-03-31 2021-06-04 武汉大学 一种激光冲击减小场效应晶体管沟道长度的方法
CN111628001B (zh) * 2020-05-28 2021-06-04 武汉大学 一种亚纳米顶栅电极场效应晶体管的可控制备方法
CN116195369B (zh) * 2020-09-04 2024-10-18 Isteq私人有限公司 具有多段式集光器模块的短波长辐射源和辐射收集方法
JP7536606B2 (ja) * 2020-11-12 2024-08-20 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法
CN112462577B (zh) * 2020-12-02 2023-11-28 东方晶源微电子科技(北京)有限公司深圳分公司 一种用于光刻机照明系统的自由光瞳生成方法
CN112290369A (zh) * 2020-12-24 2021-01-29 武汉奇致激光技术股份有限公司 调整电光q开关的装置和安装有该装置的光学设备
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
KR20240010016A (ko) 2021-05-28 2024-01-23 잽 에너지, 인크. 연장된 플라즈마 밀폐를 위한 장치 및 방법
KR102711420B1 (ko) * 2021-09-10 2024-09-26 경희대학교 산학협력단 전자빔 기반 극자외선 광원 장치
KR20240087651A (ko) * 2021-11-03 2024-06-19 아이에스티이큐 비.브이. 고휘도 레이저 생성 플라즈마 소스 및 방사선 생성 및 수집 방법
US12165856B2 (en) * 2022-02-21 2024-12-10 Hamamatsu Photonics K.K. Inductively coupled plasma light source
US12144072B2 (en) 2022-03-29 2024-11-12 Hamamatsu Photonics K.K. All-optical laser-driven light source with electrodeless ignition
JP7324926B1 (ja) 2022-06-02 2023-08-10 恭胤 高藤 遮蔽容器
KR102893593B1 (ko) * 2022-11-23 2025-12-04 주식회사 월드빔솔루션 전자빔 기반 극자외선 광원 장치
US12156322B2 (en) 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply

Family Cites Families (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2759106A (en) * 1951-05-25 1956-08-14 Wolter Hans Optical image-forming mirror system providing for grazing incidence of rays
US3279176A (en) * 1959-07-31 1966-10-18 North American Aviation Inc Ion rocket engine
US3150483A (en) * 1962-05-10 1964-09-29 Aerospace Corp Plasma generator and accelerator
US3232046A (en) * 1962-06-06 1966-02-01 Aerospace Corp Plasma generator and propulsion exhaust system
US3746870A (en) * 1970-12-21 1973-07-17 Gen Electric Coated light conduit
US3969628A (en) * 1974-04-04 1976-07-13 The United States Of America As Represented By The Secretary Of The Army Intense, energetic electron beam assisted X-ray generator
US4042848A (en) * 1974-05-17 1977-08-16 Ja Hyun Lee Hypocycloidal pinch device
US3946332A (en) * 1974-06-13 1976-03-23 Samis Michael A High power density continuous wave plasma glow jet laser system
US3961197A (en) * 1974-08-21 1976-06-01 The United States Of America As Represented By The United States Energy Research And Development Administration X-ray generator
US3960473A (en) * 1975-02-06 1976-06-01 The Glastic Corporation Die structure for forming a serrated rod
US4162160A (en) * 1977-08-25 1979-07-24 Fansteel Inc. Electrical contact material and method for making the same
US4143275A (en) * 1977-09-28 1979-03-06 Battelle Memorial Institute Applying radiation
US4203393A (en) * 1979-01-04 1980-05-20 Ford Motor Company Plasma jet ignition engine and method
JPS5756668A (en) * 1980-09-18 1982-04-05 Nissan Motor Co Ltd Plasma igniter
US4364342A (en) * 1980-10-01 1982-12-21 Ford Motor Company Ignition system employing plasma spray
US4538291A (en) * 1981-11-09 1985-08-27 Kabushiki Kaisha Suwa Seikosha X-ray source
US4536884A (en) * 1982-09-20 1985-08-20 Eaton Corporation Plasma pinch X-ray apparatus
US4618971A (en) * 1982-09-20 1986-10-21 Eaton Corporation X-ray lithography system
US4633492A (en) * 1982-09-20 1986-12-30 Eaton Corporation Plasma pinch X-ray method
US4504964A (en) * 1982-09-20 1985-03-12 Eaton Corporation Laser beam plasma pinch X-ray system
US4507588A (en) * 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
DE3332711A1 (de) * 1983-09-10 1985-03-28 Fa. Carl Zeiss, 7920 Heidenheim Vorrichtung zur erzeugung einer plasmaquelle mit hoher strahlungsintensitaet im roentgenbereich
JPS60175351A (ja) * 1984-02-14 1985-09-09 Nippon Telegr & Teleph Corp <Ntt> X線発生装置およびx線露光法
US4561406A (en) * 1984-05-25 1985-12-31 Combustion Electromagnetics, Inc. Winged reentrant electromagnetic combustion chamber
US4837794A (en) * 1984-10-12 1989-06-06 Maxwell Laboratories Inc. Filter apparatus for use with an x-ray source
US4626193A (en) * 1985-08-02 1986-12-02 Itt Corporation Direct spark ignition system
US4774914A (en) * 1985-09-24 1988-10-04 Combustion Electromagnetics, Inc. Electromagnetic ignition--an ignition system producing a large size and intense capacitive and inductive spark with an intense electromagnetic field feeding the spark
CA1239487A (en) * 1985-10-03 1988-07-19 National Research Council Of Canada Multiple vacuum arc derived plasma pinch x-ray source
CA1239486A (en) * 1985-10-03 1988-07-19 Rajendra P. Gupta Gas discharge derived annular plasma pinch x-ray source
US4704718A (en) * 1985-11-01 1987-11-03 Princeton University Apparatus and method for generating soft X-ray lasing action in a confined plasma column through the use of a picosecond laser
US4928020A (en) * 1988-04-05 1990-05-22 The United States Of America As Represented By The United States Department Of Energy Saturable inductor and transformer structures for magnetic pulse compression
DE3927089C1 (enExample) * 1989-08-17 1991-04-25 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5102776A (en) * 1989-11-09 1992-04-07 Cornell Research Foundation, Inc. Method and apparatus for microlithography using x-pinch x-ray source
US5027076A (en) * 1990-01-29 1991-06-25 Ball Corporation Open cage density sensor
US5175755A (en) * 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
US5126638A (en) * 1991-05-13 1992-06-30 Maxwell Laboratories, Inc. Coaxial pseudospark discharge switch
US5142166A (en) * 1991-10-16 1992-08-25 Science Research Laboratory, Inc. High voltage pulsed power source
US5411224A (en) * 1993-04-08 1995-05-02 Dearman; Raymond M. Guard for jet engine
US5313481A (en) * 1993-09-29 1994-05-17 The United States Of America As Represented By The United States Department Of Energy Copper laser modulator driving assembly including a magnetic compression laser
US5448580A (en) * 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
US5504795A (en) * 1995-02-06 1996-04-02 Plex Corporation Plasma X-ray source
DE69628514T2 (de) * 1995-02-17 2004-04-29 Cymer, Inc., San Diego Leistungspulsgenerator mit energierückgewinnung
US5830336A (en) * 1995-12-05 1998-11-03 Minnesota Mining And Manufacturing Company Sputtering of lithium
SE510133C2 (sv) * 1996-04-25 1999-04-19 Jettec Ab Laser-plasma röntgenkälla utnyttjande vätskor som strålmål
JPH10221499A (ja) * 1997-02-07 1998-08-21 Hitachi Ltd レーザプラズマx線源およびそれを用いた半導体露光装置並びに半導体露光方法
US6031241A (en) * 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
US5963616A (en) * 1997-03-11 1999-10-05 University Of Central Florida Configurations, materials and wavelengths for EUV lithium plasma discharge lamps
US5936988A (en) * 1997-12-15 1999-08-10 Cymer, Inc. High pulse rate pulse power system
US6172324B1 (en) * 1997-04-28 2001-01-09 Science Research Laboratory, Inc. Plasma focus radiation source
US5866871A (en) * 1997-04-28 1999-02-02 Birx; Daniel Plasma gun and methods for the use thereof
US6586757B2 (en) * 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
US6566667B1 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
US6566668B2 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with tandem ellipsoidal mirror units
US6064072A (en) * 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US6541786B1 (en) * 1997-05-12 2003-04-01 Cymer, Inc. Plasma pinch high energy with debris collector
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US6452199B1 (en) * 1997-05-12 2002-09-17 Cymer, Inc. Plasma focus high energy photon source with blast shield
US6281585B1 (en) 1997-06-30 2001-08-28 Philips Electronics North America Corporation Air gap dielectric in self-aligned via structures
JP2000089000A (ja) * 1998-09-14 2000-03-31 Nikon Corp X線発生装置
JP2001035688A (ja) * 1999-07-26 2001-02-09 Nikon Corp 軟x線発生装置及びこれを備えた露光装置及び軟x線の発生方法
AU1454100A (en) * 1998-10-27 2000-05-15 Jmar Research, Inc. Shaped source of soft x-ray, extreme ultraviolet and ultraviolet radiation
US6186632B1 (en) * 1998-12-31 2001-02-13 The Regents Of The University Of California Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography
JP2000299197A (ja) * 1999-04-13 2000-10-24 Agency Of Ind Science & Technol X線発生装置
US6377651B1 (en) * 1999-10-11 2002-04-23 University Of Central Florida Laser plasma source for extreme ultraviolet lithography using a water droplet target
US6831963B2 (en) * 2000-10-20 2004-12-14 University Of Central Florida EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
EP1232516A4 (en) * 1999-10-27 2003-03-12 Jmar Res Inc METHOD AND SYSTEM FOR GENERATING RADIATION USING MICROCIBLES
US6469310B1 (en) * 1999-12-17 2002-10-22 Asml Netherlands B.V. Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus
US6493423B1 (en) * 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6195272B1 (en) * 2000-03-16 2001-02-27 Joseph E. Pascente Pulsed high voltage power supply radiography system having a one to one correspondence between low voltage input pulses and high voltage output pulses
US6661018B1 (en) * 2000-04-25 2003-12-09 Northrop Grumman Corporation Shroud nozzle for gas jet control in an extreme ultraviolet light source
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP2002008891A (ja) * 2000-06-22 2002-01-11 Nikon Corp 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
JP2002006096A (ja) * 2000-06-23 2002-01-09 Nikon Corp 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
FR2814599B1 (fr) * 2000-09-27 2005-05-20 Commissariat Energie Atomique Dispositif laser de forte puissance crete et application a la generation de lumiere dans l'extreme ultra violet
US6804327B2 (en) * 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
US6567499B2 (en) * 2001-06-07 2003-05-20 Plex Llc Star pinch X-ray and extreme ultraviolet photon source
US6998785B1 (en) * 2001-07-13 2006-02-14 University Of Central Florida Research Foundation, Inc. Liquid-jet/liquid droplet initiated plasma discharge for generating useful plasma radiation
DE10151080C1 (de) * 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
FR2837990B1 (fr) * 2002-03-28 2007-04-27 Commissariat Energie Atomique Cavite laser de forte puissance crete et association de plusieurs de ces cavites, notamment pour exciter un generateur de lumiere dans l'extreme ultraviolet
JP4111487B2 (ja) * 2002-04-05 2008-07-02 ギガフォトン株式会社 極端紫外光源装置

Similar Documents

Publication Publication Date Title
JP2005522839A5 (enExample)
CN1820556B (zh) 产生极端紫外辐射或软x射线辐射的方法及装置
TWI382789B (zh) 製造遠紫外線輻射或軟性x射線之方法及裝置
RU2278483C2 (ru) Эуф источник с вращающимися электродами и способ получения эуф излучения из газоразрядной плазмы
EP1716726B1 (en) Method and device for generating in particular euv radiation and/or soft x-ray radiation
JP2011505668A (ja) レーザ加熱放電プラズマeuv光源
US7557511B2 (en) Apparatus and method utilizing high power density electron beam for generating pulsed stream of ablation plasma
CN103874312A (zh) 一种面向z箍缩的壳层等离子体柱产生方法及其装置
TW447225B (en) Plasma focus high energy photon source with blast shield
JPH0315296B2 (enExample)
Pellarin et al. High-efficiency cluster laser vaporization sources based on Ti: sapphire lasers
TW200419614A (en) Gas discharge lamp
CN116634648A (zh) 一种采用激光辐照方式的无线热释电中子发生器
Pereira et al. Slower impedance collapse with hot anode and enhanced emission cathode
JP2001160499A (ja) 金属プラズマ放電型x線発生装置
JPS62176038A (ja) X線発光装置
Ohzu et al. Soft x-ray output from a pinch plasma using laser-induced Au plasma
Torrisi et al. Tantalum irradiation by high power pulsed laser at 1315 and 438 nm wavelengths
Mao et al. Buffer gas effects on the ablation rates of copper using a pico-second pulsed Nd: YAG laser
JPH06325708A (ja) X線発生装置
Wang et al. Unipolar arc simulation device
Konovalov et al. Wide-aperture electric-discharge XeCl lasers
Nozdrin et al. Hollow photocathode prototype for e-gun
Hahn et al. Electron Beam Transport in Gas and Plasma-filled Cells on RITS
JPH1025564A (ja) コーティング方法およびコーティング装置