AU2003230870A1 - Extreme ultraviolet light source - Google Patents

Extreme ultraviolet light source

Info

Publication number
AU2003230870A1
AU2003230870A1 AU2003230870A AU2003230870A AU2003230870A1 AU 2003230870 A1 AU2003230870 A1 AU 2003230870A1 AU 2003230870 A AU2003230870 A AU 2003230870A AU 2003230870 A AU2003230870 A AU 2003230870A AU 2003230870 A1 AU2003230870 A1 AU 2003230870A1
Authority
AU
Australia
Prior art keywords
light source
ultraviolet light
extreme ultraviolet
extreme
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003230870A
Other languages
English (en)
Other versions
AU2003230870A8 (en
Inventor
Gerry M. Blumenstock
Norbert Bowering
Timothy S. Dyer
Igor V. Fomenkov
Jerzy R. Hoffman
R. Mark Johnson
Oleh Khodykin
Stephen T. Melnychuk
Richard M. Ness
I. Roger Oliver
William N. Partlo
Curtis L. Rettig
Rodney D. Simmons
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/120,655 external-priority patent/US6744060B2/en
Priority claimed from US10/189,824 external-priority patent/US6815700B2/en
Priority claimed from US10/384,967 external-priority patent/US6904073B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of AU2003230870A8 publication Critical patent/AU2003230870A8/xx
Publication of AU2003230870A1 publication Critical patent/AU2003230870A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70175—Lamphouse reflector arrangements or collector mirrors, i.e. collecting light from solid angle upstream of the light source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/007—Production of X-ray radiation generated from plasma involving electric or magnetic fields in the process of plasma generation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/009—Auxiliary arrangements not involved in the plasma generation
    • H05G2/0094—Reduction, prevention or protection from contamination; Cleaning
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
    • H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
    • H05H1/06—Longitudinal pinch devices

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • X-Ray Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003230870A 2002-04-10 2003-04-09 Extreme ultraviolet light source Abandoned AU2003230870A1 (en)

Applications Claiming Priority (13)

Application Number Priority Date Filing Date Title
US10/120,655 US6744060B2 (en) 1997-05-12 2002-04-10 Pulse power system for extreme ultraviolet and x-ray sources
US10/120,655 2002-04-10
US10/189,824 US6815700B2 (en) 1997-05-12 2002-07-03 Plasma focus light source with improved pulse power system
US10/189,824 2002-07-03
US41980502P 2002-10-18 2002-10-18
US60/419,805 2002-10-18
US42280802P 2002-10-31 2002-10-31
US60/422,808 2002-10-31
US10/384,967 2003-03-08
US10/384,967 US6904073B2 (en) 2001-01-29 2003-03-08 High power deep ultraviolet laser with long life optics
US10/409,254 2003-04-08
US10/409,254 US6972421B2 (en) 2000-06-09 2003-04-08 Extreme ultraviolet light source
PCT/US2003/011139 WO2003087867A2 (en) 2002-04-10 2003-04-09 Extreme ultraviolet light source

Publications (2)

Publication Number Publication Date
AU2003230870A8 AU2003230870A8 (en) 2003-10-27
AU2003230870A1 true AU2003230870A1 (en) 2003-10-27

Family

ID=29741190

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003230870A Abandoned AU2003230870A1 (en) 2002-04-10 2003-04-09 Extreme ultraviolet light source

Country Status (6)

Country Link
US (4) US6972421B2 (enExample)
EP (1) EP1493039A4 (enExample)
JP (2) JP2005522839A (enExample)
KR (1) KR101038479B1 (enExample)
AU (1) AU2003230870A1 (enExample)
WO (1) WO2003087867A2 (enExample)

Families Citing this family (276)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7856044B2 (en) 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP2002163005A (ja) * 2000-11-29 2002-06-07 Nikon Corp 制御系の設計方法、制御系、制御系の調整方法及び露光方法
US7671349B2 (en) 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
FR2841684B1 (fr) * 2002-06-28 2004-09-24 Centre Nat Rech Scient Source de rayonnement, notamment ultraviolet a decharges
US7002168B2 (en) * 2002-10-15 2006-02-21 Cymer, Inc. Dense plasma focus radiation source
DE10308299A1 (de) * 2003-02-26 2004-09-16 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Düsenanordnung
US7034320B2 (en) * 2003-03-20 2006-04-25 Intel Corporation Dual hemispherical collectors
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
DE10325151B4 (de) * 2003-05-30 2006-11-30 Infineon Technologies Ag Vorrichtung für die Erzeugung und/oder Beeinflussung elektromagnetischer Strahlung eines Plasmas
TWI237733B (en) * 2003-06-27 2005-08-11 Asml Netherlands Bv Laser produced plasma radiation system with foil trap
CN1820556B (zh) * 2003-06-27 2011-07-06 法国原子能委员会 产生极端紫外辐射或软x射线辐射的方法及装置
US7230258B2 (en) * 2003-07-24 2007-06-12 Intel Corporation Plasma-based debris mitigation for extreme ultraviolet (EUV) light source
US7446329B2 (en) * 2003-08-07 2008-11-04 Intel Corporation Erosion resistance of EUV source electrodes
EP1526550A1 (en) * 2003-10-20 2005-04-27 ASML Netherlands B.V. Mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method
US7135692B2 (en) * 2003-12-04 2006-11-14 Asml Netherlands B.V. Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation
DE10359464A1 (de) * 2003-12-17 2005-07-28 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zum Erzeugen von insbesondere EUV-Strahlung und/oder weicher Röntgenstrahlung
JP5183068B2 (ja) * 2003-12-22 2013-04-17 フィンレイ，ウォーレン，エイチ 大気噴出凍結乾燥法による粉末形成
US7251012B2 (en) 2003-12-31 2007-07-31 Asml Netherlands B.V. Lithographic apparatus having a debris-mitigation system, a source for producing EUV radiation having a debris mitigation system and a method for mitigating debris
JP4535732B2 (ja) * 2004-01-07 2010-09-01 株式会社小松製作所 光源装置及びそれを用いた露光装置
US7423275B2 (en) * 2004-01-15 2008-09-09 Intel Corporation Erosion mitigation for collector optics using electric and magnetic fields
KR20060126740A (ko) * 2004-02-12 2006-12-08 도꾸리쯔교세이호징 가가꾸 기쥬쯔 신꼬 기꼬 소프트 ｘ선 가공장치 및 소프트 ｘ선 가공방법
JP2005235959A (ja) * 2004-02-18 2005-09-02 Canon Inc 光発生装置及び露光装置
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
WO2005089131A2 (en) * 2004-03-17 2005-09-29 Cymer, Inc. Lpp euv light source
WO2005094318A2 (en) * 2004-03-29 2005-10-13 Jmar Research, Inc. Morphology and spectroscopy of nanoscale regions using x-rays generated by laser produced plasma
US20050223973A1 (en) * 2004-03-30 2005-10-13 Infineon Technologies Ag EUV lithography system and chuck for releasing reticle in a vacuum isolated environment
EP1775756B1 (en) * 2004-06-24 2011-09-21 Nikon Corporation Euv light source, euv exposure equipment and semiconductor device manufacturing method
US7199384B2 (en) * 2004-07-09 2007-04-03 Energetiq Technology Inc. Inductively-driven light source for lithography
US7183717B2 (en) * 2004-07-09 2007-02-27 Energetiq Technology Inc. Inductively-driven light source for microscopy
JP5179175B2 (ja) * 2004-07-09 2013-04-10 エナジェティック・テクノロジー・インコーポレーテッド 誘導駆動プラズマ光源
US7948185B2 (en) 2004-07-09 2011-05-24 Energetiq Technology Inc. Inductively-driven plasma light source
US7307375B2 (en) * 2004-07-09 2007-12-11 Energetiq Technology Inc. Inductively-driven plasma light source
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
US7791290B2 (en) * 2005-09-30 2010-09-07 Virgin Islands Microsystems, Inc. Ultra-small resonating charged particle beam modulator
US7586097B2 (en) 2006-01-05 2009-09-08 Virgin Islands Microsystems, Inc. Switching micro-resonant structures using at least one director
US7626179B2 (en) 2005-09-30 2009-12-01 Virgin Island Microsystems, Inc. Electron beam induced resonance
DE102004042501A1 (de) * 2004-08-31 2006-03-16 Xtreme Technologies Gmbh Vorrichtung zur Bereitstellung eines reproduzierbaren Targetstromes für die energiestrahlinduzierte Erzeugung kurzwelliger elektromagnetischer Strahlung
US7541121B2 (en) * 2004-10-13 2009-06-02 Infineon Technologies Ag Calibration of optical line shortening measurements
ITVE20040038A1 (it) * 2004-10-21 2005-01-21 Domiziano Mostacci Apparecchiatura per la produzione endogena di radioisotopi, particolarmente per diagnostica tomografica ad emissioni di positroni.
JP2006156359A (ja) * 2004-10-27 2006-06-15 Kumamoto Univ プラズマ発生装置およびスペクトル制御方法
US7109503B1 (en) * 2005-02-25 2006-09-19 Cymer, Inc. Systems for protecting internal components of an EUV light source from plasma-generated debris
US7145132B2 (en) * 2004-12-27 2006-12-05 Asml Netherlands B.V. Lithographic apparatus, illumination system and debris trapping system
SG123767A1 (en) * 2004-12-28 2006-07-26 Asml Netherlands Bv Lithographic apparatus, illumination system and filter system
US7196343B2 (en) * 2004-12-30 2007-03-27 Asml Netherlands B.V. Optical element, lithographic apparatus including such an optical element, device manufacturing method, and device manufactured thereby
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
DE102005007884A1 (de) * 2005-02-15 2006-08-24 Xtreme Technologies Gmbh Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter (EUV-) Strahlung
US7679027B2 (en) * 2005-03-17 2010-03-16 Far-Tech, Inc. Soft x-ray laser based on z-pinch compression of rotating plasma
DE102005014433B3 (de) * 2005-03-24 2006-10-05 Xtreme Technologies Gmbh Verfahren und Anordnung zur effizienten Erzeugung von kurzwelliger Strahlung auf Basis eines lasererzeugten Plasmas
US7502095B2 (en) 2005-03-29 2009-03-10 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
SG126120A1 (en) 2005-03-29 2006-10-30 Asml Netherlands Bv Lithographic device, device manufacturing method and device manufactured thereby
US7372623B2 (en) * 2005-03-29 2008-05-13 Asml Netherlands B.V. Multi-layer spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
DE102005015274B4 (de) * 2005-03-31 2012-02-23 Xtreme Technologies Gmbh Strahlungsquelle zur Erzeugung kurzwelliger Strahlung
WO2006110830A2 (en) * 2005-04-11 2006-10-19 Cierra, Inc. Methods and apparatus to achieve a closure of a layered tissue defect
US7233010B2 (en) * 2005-05-20 2007-06-19 Asml Netherlands B.V. Radiation system and lithographic apparatus
DE102005025624B4 (de) 2005-06-01 2010-03-18 Xtreme Technologies Gmbh Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Gasentladungsplasmas
JP4981795B2 (ja) * 2005-06-14 2012-07-25 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ ガス分散性が改良された破屑軽減システム
WO2007002170A2 (en) * 2005-06-21 2007-01-04 Starfire Industries Llc Microdischarge light source configuration and illumination system
JP4618013B2 (ja) * 2005-06-23 2011-01-26 ウシオ電機株式会社 極端紫外光光源装置
US7365349B2 (en) * 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US8018574B2 (en) * 2005-06-30 2011-09-13 Asml Netherlands B.V. Lithographic apparatus, radiation system and device manufacturing method
US7394083B2 (en) * 2005-07-08 2008-07-01 Cymer, Inc. Systems and methods for EUV light source metrology
US20070024169A1 (en) * 2005-07-29 2007-02-01 Koegler John M Iii Method of forming a lamp assembly
JP4780394B2 (ja) * 2005-07-29 2011-09-28 独立行政法人産業技術総合研究所 液滴供給方法及び装置
DE102005041567B4 (de) 2005-08-30 2009-03-05 Xtreme Technologies Gmbh EUV-Strahlungsquelle mit hoher Strahlungsleistung auf Basis einer Gasentladung
DE102005044141B4 (de) * 2005-09-15 2008-08-14 Qimonda Ag Belichtungsgerät und Verfahren zum Betrieb eines Belichtungsgeräts
JP4961529B2 (ja) * 2005-09-21 2012-06-27 国立大学法人大阪大学 極端紫外光源用ターゲット
US7569791B2 (en) * 2005-09-30 2009-08-04 Energetiq Technology, Inc. Inductively-driven plasma light source
WO2007064358A2 (en) * 2005-09-30 2007-06-07 Virgin Islands Microsystems, Inc. Structures and methods for coupling energy from an electromagnetic wave
JP5176052B2 (ja) * 2005-10-05 2013-04-03 国立大学法人大阪大学 放射線源用ターゲット生成供給装置
US7825391B2 (en) * 2005-10-17 2010-11-02 The University Of Washington Plasma-based EUV light source
US7372059B2 (en) * 2005-10-17 2008-05-13 The University Of Washington Plasma-based EUV light source
US20070115443A1 (en) * 2005-11-23 2007-05-24 Asml Netherlands B.V. Radiation system and lithographic apparatus
US20070119836A1 (en) * 2005-11-29 2007-05-31 Thomas Schroeder Method and apparatus for focusing a beam from an excimer laser to form a line of light on a substrate
US7465943B2 (en) * 2005-12-08 2008-12-16 Asml Netherlands B.V. Controlling the flow through the collector during cleaning
US7579609B2 (en) 2005-12-14 2009-08-25 Virgin Islands Microsystems, Inc. Coupling light of light emitting resonator to waveguide
JP4904809B2 (ja) * 2005-12-28 2012-03-28 ウシオ電機株式会社 極端紫外光光源装置
US7619373B2 (en) 2006-01-05 2009-11-17 Virgin Islands Microsystems, Inc. Selectable frequency light emitter
US7470920B2 (en) * 2006-01-05 2008-12-30 Virgin Islands Microsystems, Inc. Resonant structure-based display
US20070152781A1 (en) * 2006-01-05 2007-07-05 Virgin Islands Microsystems, Inc. Switching micro-resonant structures by modulating a beam of charged particles
US7667820B2 (en) * 2006-01-17 2010-02-23 Asml Netherlands B.V. Method for chemical reduction of an oxidized contamination material, or reducing oxidation of a contamination material and a conditioning system for doing the same
US7282776B2 (en) 2006-02-09 2007-10-16 Virgin Islands Microsystems, Inc. Method and structure for coupling two microcircuits
US7605835B2 (en) 2006-02-28 2009-10-20 Virgin Islands Microsystems, Inc. Electro-photographic devices incorporating ultra-small resonant structures
US20070200071A1 (en) * 2006-02-28 2007-08-30 Virgin Islands Microsystems, Inc. Coupling output from a micro resonator to a plasmon transmission line
US7443358B2 (en) * 2006-02-28 2008-10-28 Virgin Island Microsystems, Inc. Integrated filter in antenna-based detector
US7453071B2 (en) * 2006-03-29 2008-11-18 Asml Netherlands B.V. Contamination barrier and lithographic apparatus comprising same
JP4954584B2 (ja) * 2006-03-31 2012-06-20 株式会社小松製作所 極端紫外光源装置
US7558490B2 (en) 2006-04-10 2009-07-07 Virgin Islands Microsystems, Inc. Resonant detector for optical signals
WO2007121142A2 (en) * 2006-04-12 2007-10-25 The Regents Of The University Of California Improved light source employing laser-produced plasma
US7646991B2 (en) 2006-04-26 2010-01-12 Virgin Island Microsystems, Inc. Selectable frequency EMR emitter
US7876793B2 (en) 2006-04-26 2011-01-25 Virgin Islands Microsystems, Inc. Micro free electron laser (FEL)
US7492868B2 (en) * 2006-04-26 2009-02-17 Virgin Islands Microsystems, Inc. Source of x-rays
US7728397B2 (en) 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Coupled nano-resonating energy emitting structures
US7443577B2 (en) * 2006-05-05 2008-10-28 Virgin Islands Microsystems, Inc. Reflecting filtering cover
US7723698B2 (en) * 2006-05-05 2010-05-25 Virgin Islands Microsystems, Inc. Top metal layer shield for ultra-small resonant structures
US7342441B2 (en) * 2006-05-05 2008-03-11 Virgin Islands Microsystems, Inc. Heterodyne receiver array using resonant structures
US7746532B2 (en) 2006-05-05 2010-06-29 Virgin Island Microsystems, Inc. Electro-optical switching system and method
US7741934B2 (en) 2006-05-05 2010-06-22 Virgin Islands Microsystems, Inc. Coupling a signal through a window
US20070258675A1 (en) * 2006-05-05 2007-11-08 Virgin Islands Microsystems, Inc. Multiplexed optical communication between chips on a multi-chip module
US7442940B2 (en) * 2006-05-05 2008-10-28 Virgin Island Microsystems, Inc. Focal plane array incorporating ultra-small resonant structures
US7359589B2 (en) * 2006-05-05 2008-04-15 Virgin Islands Microsystems, Inc. Coupling electromagnetic wave through microcircuit
US7710040B2 (en) 2006-05-05 2010-05-04 Virgin Islands Microsystems, Inc. Single layer construction for ultra small devices
US7656094B2 (en) 2006-05-05 2010-02-02 Virgin Islands Microsystems, Inc. Electron accelerator for ultra-small resonant structures
US7728702B2 (en) 2006-05-05 2010-06-01 Virgin Islands Microsystems, Inc. Shielding of integrated circuit package with high-permeability magnetic material
US7569836B2 (en) 2006-05-05 2009-08-04 Virgin Islands Microsystems, Inc. Transmission of data between microchips using a particle beam
US7436177B2 (en) * 2006-05-05 2008-10-14 Virgin Islands Microsystems, Inc. SEM test apparatus
US7986113B2 (en) 2006-05-05 2011-07-26 Virgin Islands Microsystems, Inc. Selectable frequency light emitter
US7557647B2 (en) 2006-05-05 2009-07-07 Virgin Islands Microsystems, Inc. Heterodyne receiver using resonant structures
US7554083B2 (en) 2006-05-05 2009-06-30 Virgin Islands Microsystems, Inc. Integration of electromagnetic detector on integrated chip
US7583370B2 (en) 2006-05-05 2009-09-01 Virgin Islands Microsystems, Inc. Resonant structures and methods for encoding signals into surface plasmons
US20070258720A1 (en) * 2006-05-05 2007-11-08 Virgin Islands Microsystems, Inc. Inter-chip optical communication
US7476907B2 (en) * 2006-05-05 2009-01-13 Virgin Island Microsystems, Inc. Plated multi-faceted reflector
US8188431B2 (en) 2006-05-05 2012-05-29 Jonathan Gorrell Integration of vacuum microelectronic device with integrated circuit
US20070258492A1 (en) * 2006-05-05 2007-11-08 Virgin Islands Microsystems, Inc. Light-emitting resonant structure driving raman laser
US7586167B2 (en) 2006-05-05 2009-09-08 Virgin Islands Microsystems, Inc. Detecting plasmons using a metallurgical junction
US7732786B2 (en) 2006-05-05 2010-06-08 Virgin Islands Microsystems, Inc. Coupling energy in a plasmon wave to an electron beam
US7718977B2 (en) 2006-05-05 2010-05-18 Virgin Island Microsystems, Inc. Stray charged particle removal device
DE102006022823B4 (de) * 2006-05-12 2010-03-25 Xtreme Technologies Gmbh Anordnung zur Erzeugung von EUV-Strahlung auf Basis eines Gasentladungsplasmas
US7573045B2 (en) 2006-05-15 2009-08-11 Virgin Islands Microsystems, Inc. Plasmon wave propagation devices and methods
DE602007010765D1 (de) * 2006-05-16 2011-01-05 Philips Intellectual Property Verfahren zur erhöhung der umwandlungseffizienz einer euv- und/oder weichen röntgenstrahlenlampe und entsprechendes gerät
JP4321721B2 (ja) * 2006-05-22 2009-08-26 国立大学法人名古屋大学 放電光源
US20070274365A1 (en) * 2006-05-26 2007-11-29 Virgin Islands Microsystems, Inc. Periodically complex resonant structures
US7679067B2 (en) 2006-05-26 2010-03-16 Virgin Island Microsystems, Inc. Receiver array using shared electron beam
US20070287091A1 (en) * 2006-06-12 2007-12-13 Jacobo Victor M System and method for exposing electronic substrates to UV light
US7655934B2 (en) * 2006-06-28 2010-02-02 Virgin Island Microsystems, Inc. Data on light bulb
JP2008053696A (ja) * 2006-07-28 2008-03-06 Ushio Inc 極端紫外光光源装置および極端紫外光発生方法
TW200808134A (en) * 2006-07-28 2008-02-01 Ushio Electric Inc Light source device for producing extreme ultraviolet radiation and method of generating extreme ultraviolet radiation
EP1882984B1 (en) * 2006-07-28 2011-10-12 Media Lario s.r.l. Multi-reflection optical systems and their fabrication
JP5162113B2 (ja) * 2006-08-07 2013-03-13 ギガフォトン株式会社 極端紫外光源装置
US7450794B2 (en) * 2006-09-19 2008-11-11 Virgin Islands Microsystems, Inc. Microcircuit using electromagnetic wave routing
US7560716B2 (en) 2006-09-22 2009-07-14 Virgin Islands Microsystems, Inc. Free electron oscillator
JP5076087B2 (ja) * 2006-10-19 2012-11-21 ギガフォトン株式会社 極端紫外光源装置及びノズル保護装置
US7759663B1 (en) * 2006-12-06 2010-07-20 Asml Netherlands B.V. Self-shading electrodes for debris suppression in an EUV source
US7696492B2 (en) * 2006-12-13 2010-04-13 Asml Netherlands B.V. Radiation system and lithographic apparatus
DE102006060998B4 (de) * 2006-12-20 2011-06-09 Fachhochschule Hildesheim/Holzminden/Göttingen - Körperschaft des öffentlichen Rechts - Verfahren und Vorrichtungen zum Erzeugen von Röntgenstrahlung
US7659513B2 (en) 2006-12-20 2010-02-09 Virgin Islands Microsystems, Inc. Low terahertz source and detector
US8071963B2 (en) * 2006-12-27 2011-12-06 Asml Netherlands B.V. Debris mitigation system and lithographic apparatus
DE102007004440B4 (de) * 2007-01-25 2011-05-12 Xtreme Technologies Gmbh Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung mittels einer elektrisch betriebenen Gasentladung
US20080237498A1 (en) * 2007-01-29 2008-10-02 Macfarlane Joseph J High-efficiency, low-debris short-wavelength light sources
US20080237501A1 (en) * 2007-03-28 2008-10-02 Ushio Denki Kabushiki Kaisha Extreme ultraviolet light source device and extreme ultraviolet radiation generating method
US20080239262A1 (en) * 2007-03-29 2008-10-02 Asml Netherlands B.V. Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation
JP5001055B2 (ja) * 2007-04-20 2012-08-15 株式会社小松製作所 極端紫外光源装置
JP2010528480A (ja) * 2007-05-31 2010-08-19 カール・ツァイス・エスエムティー・アーゲー 成形によって光学素子を作製する方法、この方法により作製した光学素子、集光器および照明系
US7990336B2 (en) 2007-06-19 2011-08-02 Virgin Islands Microsystems, Inc. Microwave coupled excitation of solid state resonant arrays
US8227771B2 (en) * 2007-07-23 2012-07-24 Asml Netherlands B.V. Debris prevention system and lithographic apparatus
US8493548B2 (en) * 2007-08-06 2013-07-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7872244B2 (en) * 2007-08-08 2011-01-18 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5234448B2 (ja) * 2007-08-09 2013-07-10 国立大学法人東京工業大学 放射線源用ターゲット、その製造方法及び放射線発生装置
US7655925B2 (en) 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US7791053B2 (en) 2007-10-10 2010-09-07 Virgin Islands Microsystems, Inc. Depressed anode with plasmon-enabled devices such as ultra-small resonant structures
JP2009099390A (ja) 2007-10-17 2009-05-07 Tokyo Institute Of Technology 極端紫外光光源装置および極端紫外光発生方法
US8269199B2 (en) * 2007-11-29 2012-09-18 Plex Llc Laser heated discharge plasma EUV source
EP2083327B1 (en) * 2008-01-28 2017-11-29 Media Lario s.r.l. Improved grazing incidence collector optical systems for EUV and X-ray applications
WO2009105247A1 (en) * 2008-02-21 2009-08-27 Plex Llc Laser heated discharge plasma euv source with plasma assisted lithium reflux
JP5312837B2 (ja) 2008-04-14 2013-10-09 ギガフォトン株式会社 極端紫外光源装置
US8574410B2 (en) * 2008-04-22 2013-11-05 The Regents Of The University Of California Method and apparatus for improved high power impulse magnetron sputtering
WO2009140270A2 (en) * 2008-05-13 2009-11-19 The Regents Of The University Of California System and method for light source employing laser-produced plasma
US8227778B2 (en) * 2008-05-20 2012-07-24 Komatsu Ltd. Semiconductor exposure device using extreme ultra violet radiation
JP5061063B2 (ja) 2008-05-20 2012-10-31 ギガフォトン株式会社 極端紫外光用ミラーおよび極端紫外光源装置
NL2002890A1 (nl) * 2008-06-16 2009-12-17 Asml Netherlands Bv Lithographic apparatus.
US8519367B2 (en) * 2008-07-07 2013-08-27 Koninklijke Philips N.V. Extreme UV radiation generating device comprising a corrosion-resistant material
JP5162365B2 (ja) * 2008-08-05 2013-03-13 学校法人 関西大学 半導体リソグラフィ用光源
US8519366B2 (en) 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
EP2154574B1 (en) * 2008-08-14 2011-12-07 ASML Netherlands BV Radiation source and method of generating radiation
JP4916535B2 (ja) * 2008-08-14 2012-04-11 エーエスエムエル ネザーランズ ビー．ブイ． 放射源、デバイス製造方法、およびリソグラフィ装置
US9207548B2 (en) 2008-08-14 2015-12-08 Asml Netherlands B.V. Radiation source with a debris mitigation system, lithographic apparatus with a debris mitigation system, method for preventing debris from depositing on collector mirror, and device manufacturing method
US9052615B2 (en) * 2008-08-29 2015-06-09 Gigaphoton Inc. Extreme ultraviolet light source apparatus
NL1036803A (nl) 2008-09-09 2010-03-15 Asml Netherlands Bv Radiation system and lithographic apparatus.
DE102008049494A1 (de) * 2008-09-27 2010-04-08 Xtreme Technologies Gmbh Verfahren und Anordnung zum Betreiben von plasmabasierten kurzwelligen Strahlungsquellen
JP4623192B2 (ja) * 2008-09-29 2011-02-02 ウシオ電機株式会社 極端紫外光光源装置および極端紫外光発生方法
JP5576079B2 (ja) * 2008-09-29 2014-08-20 ギガフォトン株式会社 極端紫外光源装置
US7929667B1 (en) * 2008-10-02 2011-04-19 Kla-Tencor Corporation High brightness X-ray metrology
EP2182412A1 (en) * 2008-11-04 2010-05-05 ASML Netherlands B.V. Radiation source and lithographic apparatus
US8283643B2 (en) * 2008-11-24 2012-10-09 Cymer, Inc. Systems and methods for drive laser beam delivery in an EUV light source
EP2380411B1 (en) * 2008-12-16 2015-04-15 Philips Deutschland GmbH Method and device for generating euv radiation or soft x-rays with enhanced efficiency
US8232537B2 (en) * 2008-12-18 2012-07-31 Asml Netherlands, B.V. Radiation source, lithographic apparatus and device manufacturing method
JP5580032B2 (ja) * 2008-12-26 2014-08-27 ギガフォトン株式会社 極端紫外光光源装置
US20100176312A1 (en) * 2009-01-13 2010-07-15 Hiroshi Komori Extreme ultra violet light source apparatus
JP5474522B2 (ja) * 2009-01-14 2014-04-16 ギガフォトン株式会社 極端紫外光源システム
JP5455661B2 (ja) * 2009-01-29 2014-03-26 ギガフォトン株式会社 極端紫外光源装置
US8116429B2 (en) 2009-01-29 2012-02-14 The Invention Science Fund I, Llc Diagnostic delivery service
US8130904B2 (en) 2009-01-29 2012-03-06 The Invention Science Fund I, Llc Diagnostic delivery service
US8304752B2 (en) * 2009-04-10 2012-11-06 Cymer, Inc. EUV light producing system and method utilizing an alignment laser
US8050380B2 (en) * 2009-05-05 2011-11-01 Media Lario, S.R.L. Zone-optimized mirrors and optical systems using same
KR101535230B1 (ko) * 2009-06-03 2015-07-09 삼성전자주식회사 Ｅｕｖ 마스크용 공간 영상 측정 장치 및 방법
JP2011023712A (ja) * 2009-06-19 2011-02-03 Gigaphoton Inc 極端紫外光源装置
NL2004816A (en) * 2009-07-07 2011-01-10 Asml Netherlands Bv Euv radiation generation apparatus.
US9726388B2 (en) 2009-07-20 2017-08-08 Lennox Industries Inc. Reflective ultraviolet light shield for a HVAC unit
WO2011033447A1 (en) 2009-09-18 2011-03-24 Koninklijke Philips Electronics N.V. Foil trap device with improved heat resistance
US20110089834A1 (en) * 2009-10-20 2011-04-21 Plex Llc Z-pinch plasma generator and plasma target
KR101706908B1 (ko) 2009-10-29 2017-02-15 코닌클리케 필립스 엔.브이. 특히 가스 방전 광원들을 위한 전극 시스템
US8000212B2 (en) * 2009-12-15 2011-08-16 Cymer, Inc. Metrology for extreme ultraviolet light source
US8173985B2 (en) * 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
JP2013519211A (ja) 2010-02-09 2013-05-23 エナジェティック・テクノロジー・インコーポレーテッド レーザー駆動の光源
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
US20120327381A1 (en) * 2010-03-12 2012-12-27 Asml Netherlands B.V. Radiation Source, Lithographic Apparatus and Device Manufacturing Method
WO2011116897A1 (en) * 2010-03-25 2011-09-29 Eth Zurich A beam line for a source of extreme ultraviolet (euv) radiation
US8263953B2 (en) 2010-04-09 2012-09-11 Cymer, Inc. Systems and methods for target material delivery protection in a laser produced plasma EUV light source
US8810775B2 (en) * 2010-04-16 2014-08-19 Media Lario S.R.L. EUV mirror module with a nickel electroformed curved mirror
JP5758750B2 (ja) * 2010-10-29 2015-08-05 ギガフォトン株式会社 極端紫外光生成システム
RU2462008C2 (ru) * 2010-11-16 2012-09-20 Государственное Образовательное Учреждение Высшего Профессионального Образования "Московский Государственный Технический Университет Имени Н.Э. Баумана" Взрывной плазменно-вихревой источник оптического излучения
JP2012129439A (ja) * 2010-12-17 2012-07-05 Renesas Electronics Corp 半導体装置の製造方法、露光装置の露光方法、露光装置および露光装置用の光源
JP5921876B2 (ja) * 2011-02-24 2016-05-24 ギガフォトン株式会社 極端紫外光生成装置
US8633459B2 (en) 2011-03-02 2014-01-21 Cymer, Llc Systems and methods for optics cleaning in an EUV light source
JP5921879B2 (ja) * 2011-03-23 2016-05-24 ギガフォトン株式会社 ターゲット供給装置及び極端紫外光生成装置
US9516730B2 (en) * 2011-06-08 2016-12-06 Asml Netherlands B.V. Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
US9605376B2 (en) * 2011-06-28 2017-03-28 Mtix Ltd. Treating materials with combined energy sources
JP5488540B2 (ja) * 2011-07-04 2014-05-14 トヨタ自動車株式会社 半導体モジュール
US9155180B1 (en) * 2011-10-10 2015-10-06 Kla-Tencor Corporation System and method of simultaneously fueling and mitigating debris for a plasma-based illumination source
JP6034598B2 (ja) * 2012-05-31 2016-11-30 ギガフォトン株式会社 Ｅｕｖ光生成装置の洗浄方法
US9753383B2 (en) * 2012-06-22 2017-09-05 Asml Netherlands B.V. Radiation source and lithographic apparatus
JP6058324B2 (ja) * 2012-09-11 2017-01-11 ギガフォトン株式会社 ターゲット供給装置の制御方法、および、ターゲット供給装置
JP5567640B2 (ja) * 2012-11-05 2014-08-06 ギガフォトン株式会社 極端紫外光源装置
US9341752B2 (en) * 2012-11-07 2016-05-17 Asml Netherlands B.V. Viewport protector for an extreme ultraviolet light source
US9277634B2 (en) 2013-01-17 2016-03-01 Kla-Tencor Corporation Apparatus and method for multiplexed multiple discharge plasma produced sources
US8680495B1 (en) * 2013-03-15 2014-03-25 Cymer, Llc Extreme ultraviolet light source
JP6076838B2 (ja) * 2013-05-31 2017-02-08 住友重機械イオンテクノロジー株式会社 絶縁構造及び絶縁方法
IL234727B (en) 2013-09-20 2020-09-30 Asml Netherlands Bv A light source operated by a laser in an optical system corrected for deviations and the method of manufacturing the system as mentioned
IL234729B (en) 2013-09-20 2021-02-28 Asml Netherlands Bv A light source operated by a laser and a method using a mode mixer
US9719932B1 (en) 2013-11-04 2017-08-01 Kla-Tencor Corporation Confined illumination for small spot size metrology
US9301382B2 (en) 2013-12-02 2016-03-29 Asml Netherlands B.V. Apparatus for and method of source material delivery in a laser produced plasma EUV light source
KR101585889B1 (ko) * 2014-02-27 2016-02-02 한국과학기술원 고효율 할로우 음극과 이를 적용한 음극 시스템
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
US9748086B2 (en) 2014-05-15 2017-08-29 Excelitas Technologies Corp. Laser driven sealed beam lamp
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
US9506871B1 (en) 2014-05-25 2016-11-29 Kla-Tencor Corporation Pulsed laser induced plasma light source
KR102197066B1 (ko) 2014-07-01 2020-12-30 삼성전자 주식회사 플라즈마 광원, 그 광원을 구비한 검사 장치 및 플라즈마 광 생성 방법
US9301381B1 (en) 2014-09-12 2016-03-29 International Business Machines Corporation Dual pulse driven extreme ultraviolet (EUV) radiation source utilizing a droplet comprising a metal core with dual concentric shells of buffer gas
KR102345537B1 (ko) 2014-12-11 2021-12-30 삼성전자주식회사 플라즈마 광원, 및 그 광원을 포함하는 검사 장치
CA2890401C (en) 2015-01-21 2015-11-03 Vln Advanced Technologies Inc. Electrodischarge apparatus for generating low-frequency powerful pulsed and cavitating waterjets
CN104934278B (zh) * 2015-04-29 2017-06-23 中国科学院长春光学精密机械与物理研究所 Euv光源放电电极的液态金属高效冷却方法与装置
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US9576785B2 (en) 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
KR102369935B1 (ko) 2015-08-31 2022-03-03 삼성전자주식회사 드립 홀을 갖는 콜렉팅 미러를 포함하는 euv 광 발생 장치
CA2921675C (en) 2016-02-24 2017-12-05 Vln Advanced Technologies Inc. Electro-discharge system for neutralizing landmines
US20170311429A1 (en) 2016-04-25 2017-10-26 Asml Netherlands B.V. Reducing the effect of plasma on an object in an extreme ultraviolet light source
EP3291650B1 (en) * 2016-09-02 2019-06-05 ETH Zürich Device and method for generating uv or x-ray radiation by means of a plasma
US11008650B2 (en) 2016-11-03 2021-05-18 Starfire Industries Llc Compact system for coupling RF power directly into RF linacs
CN106533131B (zh) * 2016-11-18 2023-07-14 云南电网有限责任公司电力科学研究院 一种带脉冲激励装置的直流换流阀
JP6319920B1 (ja) * 2016-12-28 2018-05-09 国立大学法人大阪大学 光導波路形成方法、光導波路形成装置、電子加速器、ｘ線レーザ照射装置、及び散乱ｘ線発生装置
CN110169206B (zh) 2017-01-06 2023-11-03 Asml荷兰有限公司 引导装置和相关联的系统
US10955749B2 (en) * 2017-01-06 2021-03-23 Asml Netherlands B.V. Guiding device and associated system
JP2019029272A (ja) * 2017-08-02 2019-02-21 ウシオ電機株式会社 レーザ駆動ランプ
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same
KR102555241B1 (ko) * 2018-08-08 2023-07-13 삼성전자주식회사 극자외선 생성 장치
US10877190B2 (en) * 2018-08-17 2020-12-29 Taiwan Semiconductor Manufacturing Co., Ltd. Extreme ultraviolet radiation source
US20210194202A1 (en) * 2018-09-12 2021-06-24 Cymer, Llc Metrology for a body of a gas discharge stage
US10743397B2 (en) * 2018-09-12 2020-08-11 ETH Zürich Method and device for generating electromagnetic radiation by means of a laser-produced plasma
US10477664B1 (en) * 2018-09-12 2019-11-12 ETH Zürich Method and device for generating electromagnetic radiation by means of a laser-produced plasma
CN120866780A (zh) 2019-02-25 2025-10-31 星火工业有限公司 用于事故耐受核燃料、粒子加速器、和航空航天前沿的金属和陶瓷纳米涂层的方法和设备
US10791616B1 (en) * 2019-03-27 2020-09-29 Taiwan Semiconductor Manufacturing Co., Ltd. Radiation source apparatus
KR102562520B1 (ko) * 2019-05-22 2023-08-01 사이머 엘엘씨 다수의 레이저 빔을 생성하는 장치 및 방법
WO2021073833A1 (en) * 2019-10-16 2021-04-22 Asml Netherlands B.V. Apparatus for use in a radiation source
US11259394B2 (en) * 2019-11-01 2022-02-22 Kla Corporation Laser produced plasma illuminator with liquid sheet jet target
US11438999B2 (en) * 2019-11-15 2022-09-06 The Regents Of The University Of California Devices and methods for creating plasma channels for laser plasma acceleration
CN114830832B (zh) * 2019-12-17 2025-09-05 Asml荷兰有限公司 用于极紫外光源的目标材料储槽
JP7614211B2 (ja) 2020-01-23 2025-01-15 エーエスエムエル ホールディング エヌ．ブイ． 粒子状デブリの軌道を変更するための偏向装置を備えるリソグラフィシステム
JP6885636B1 (ja) * 2020-03-05 2021-06-16 アールアンドディー−イーサン，リミテッド レーザ励起プラズマ光源およびプラズマ点火方法
CN111403290B (zh) * 2020-03-31 2021-06-04 武汉大学 一种激光冲击减小场效应晶体管沟道长度的方法
CN111628001B (zh) * 2020-05-28 2021-06-04 武汉大学 一种亚纳米顶栅电极场效应晶体管的可控制备方法
JP7549313B2 (ja) * 2020-09-04 2024-09-11 アイエスティーイーキュー ビー．ヴィー． マルチセクションの集光モジュールを備えた短波長放射線源
JP7536606B2 (ja) * 2020-11-12 2024-08-20 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法
CN112462577B (zh) * 2020-12-02 2023-11-28 东方晶源微电子科技（北京）有限公司深圳分公司 一种用于光刻机照明系统的自由光瞳生成方法
CN112290369A (zh) * 2020-12-24 2021-01-29 武汉奇致激光技术股份有限公司 调整电光q开关的装置和安装有该装置的光学设备
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
CA3216592A1 (en) * 2021-05-28 2022-12-15 Uri Shumlak Apparatus and method for extended plasma confinement
KR102711420B1 (ko) * 2021-09-10 2024-09-26 경희대학교 산학협력단 전자빔 기반 극자외선 광원 장치
JP2024540157A (ja) * 2021-11-03 2024-10-31 アイエスティーイーキュー ビー．ヴィー． 高輝度レーザ生成プラズマ源，ならびに放射生成および収集方法
US12165856B2 (en) 2022-02-21 2024-12-10 Hamamatsu Photonics K.K. Inductively coupled plasma light source
US12144072B2 (en) 2022-03-29 2024-11-12 Hamamatsu Photonics K.K. All-optical laser-driven light source with electrodeless ignition
JP7324926B1 (ja) 2022-06-02 2023-08-10 恭胤 高藤 遮蔽容器
KR102893593B1 (ko) * 2022-11-23 2025-12-04 주식회사 월드빔솔루션 전자빔 기반 극자외선 광원 장치
US12156322B2 (en) 2022-12-08 2024-11-26 Hamamatsu Photonics K.K. Inductively coupled plasma light source with switched power supply

Family Cites Families (80)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2759106A (en) 1951-05-25 1956-08-14 Wolter Hans Optical image-forming mirror system providing for grazing incidence of rays
US3279176A (en) 1959-07-31 1966-10-18 North American Aviation Inc Ion rocket engine
US3150483A (en) 1962-05-10 1964-09-29 Aerospace Corp Plasma generator and accelerator
US3232046A (en) 1962-06-06 1966-02-01 Aerospace Corp Plasma generator and propulsion exhaust system
US3746870A (en) 1970-12-21 1973-07-17 Gen Electric Coated light conduit
US3969628A (en) 1974-04-04 1976-07-13 The United States Of America As Represented By The Secretary Of The Army Intense, energetic electron beam assisted X-ray generator
US4042848A (en) 1974-05-17 1977-08-16 Ja Hyun Lee Hypocycloidal pinch device
US3946332A (en) 1974-06-13 1976-03-23 Samis Michael A High power density continuous wave plasma glow jet laser system
US3961197A (en) 1974-08-21 1976-06-01 The United States Of America As Represented By The United States Energy Research And Development Administration X-ray generator
US3960473A (en) 1975-02-06 1976-06-01 The Glastic Corporation Die structure for forming a serrated rod
US4162160A (en) 1977-08-25 1979-07-24 Fansteel Inc. Electrical contact material and method for making the same
US4143275A (en) 1977-09-28 1979-03-06 Battelle Memorial Institute Applying radiation
US4203393A (en) 1979-01-04 1980-05-20 Ford Motor Company Plasma jet ignition engine and method
JPS5756668A (en) 1980-09-18 1982-04-05 Nissan Motor Co Ltd Plasma igniter
US4364342A (en) 1980-10-01 1982-12-21 Ford Motor Company Ignition system employing plasma spray
US4538291A (en) 1981-11-09 1985-08-27 Kabushiki Kaisha Suwa Seikosha X-ray source
US4618971A (en) 1982-09-20 1986-10-21 Eaton Corporation X-ray lithography system
US4633492A (en) 1982-09-20 1986-12-30 Eaton Corporation Plasma pinch X-ray method
US4536884A (en) 1982-09-20 1985-08-20 Eaton Corporation Plasma pinch X-ray apparatus
US4504964A (en) 1982-09-20 1985-03-12 Eaton Corporation Laser beam plasma pinch X-ray system
US4507588A (en) 1983-02-28 1985-03-26 Board Of Trustees Operating Michigan State University Ion generating apparatus and method for the use thereof
DE3332711A1 (de) 1983-09-10 1985-03-28 Fa. Carl Zeiss, 7920 Heidenheim Vorrichtung zur erzeugung einer plasmaquelle mit hoher strahlungsintensitaet im roentgenbereich
JPS60175351A (ja) 1984-02-14 1985-09-09 Nippon Telegr & Teleph Corp <Ntt> Ｘ線発生装置およびｘ線露光法
US4561406A (en) 1984-05-25 1985-12-31 Combustion Electromagnetics, Inc. Winged reentrant electromagnetic combustion chamber
US4837794A (en) 1984-10-12 1989-06-06 Maxwell Laboratories Inc. Filter apparatus for use with an x-ray source
US4626193A (en) 1985-08-02 1986-12-02 Itt Corporation Direct spark ignition system
US4774914A (en) 1985-09-24 1988-10-04 Combustion Electromagnetics, Inc. Electromagnetic ignition--an ignition system producing a large size and intense capacitive and inductive spark with an intense electromagnetic field feeding the spark
CA1239487A (en) 1985-10-03 1988-07-19 National Research Council Of Canada Multiple vacuum arc derived plasma pinch x-ray source
CA1239486A (en) 1985-10-03 1988-07-19 Rajendra P. Gupta Gas discharge derived annular plasma pinch x-ray source
US4704718A (en) * 1985-11-01 1987-11-03 Princeton University Apparatus and method for generating soft X-ray lasing action in a confined plasma column through the use of a picosecond laser
US4928020A (en) 1988-04-05 1990-05-22 The United States Of America As Represented By The United States Department Of Energy Saturable inductor and transformer structures for magnetic pulse compression
DE3927089C1 (enExample) 1989-08-17 1991-04-25 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De
US5102776A (en) 1989-11-09 1992-04-07 Cornell Research Foundation, Inc. Method and apparatus for microlithography using x-pinch x-ray source
US5027076A (en) 1990-01-29 1991-06-25 Ball Corporation Open cage density sensor
US5175755A (en) 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
US5126638A (en) 1991-05-13 1992-06-30 Maxwell Laboratories, Inc. Coaxial pseudospark discharge switch
US5142166A (en) 1991-10-16 1992-08-25 Science Research Laboratory, Inc. High voltage pulsed power source
US5411224A (en) 1993-04-08 1995-05-02 Dearman; Raymond M. Guard for jet engine
US5313481A (en) 1993-09-29 1994-05-17 The United States Of America As Represented By The United States Department Of Energy Copper laser modulator driving assembly including a magnetic compression laser
US5448580A (en) 1994-07-05 1995-09-05 The United States Of America As Represented By The United States Department Of Energy Air and water cooled modulator
US5504795A (en) 1995-02-06 1996-04-02 Plex Corporation Plasma X-ray source
DE69628514T2 (de) 1995-02-17 2004-04-29 Cymer, Inc., San Diego Leistungspulsgenerator mit energierückgewinnung
US5830336A (en) 1995-12-05 1998-11-03 Minnesota Mining And Manufacturing Company Sputtering of lithium
SE510133C2 (sv) * 1996-04-25 1999-04-19 Jettec Ab Laser-plasma röntgenkälla utnyttjande vätskor som strålmål
JPH10221499A (ja) * 1997-02-07 1998-08-21 Hitachi Ltd レーザプラズマｘ線源およびそれを用いた半導体露光装置並びに半導体露光方法
US5963616A (en) 1997-03-11 1999-10-05 University Of Central Florida Configurations, materials and wavelengths for EUV lithium plasma discharge lamps
US6031241A (en) 1997-03-11 2000-02-29 University Of Central Florida Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications
US5936988A (en) 1997-12-15 1999-08-10 Cymer, Inc. High pulse rate pulse power system
US5866871A (en) * 1997-04-28 1999-02-02 Birx; Daniel Plasma gun and methods for the use thereof
US6172324B1 (en) 1997-04-28 2001-01-09 Science Research Laboratory, Inc. Plasma focus radiation source
US6064072A (en) 1997-05-12 2000-05-16 Cymer, Inc. Plasma focus high energy photon source
US5763930A (en) 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US6541786B1 (en) * 1997-05-12 2003-04-01 Cymer, Inc. Plasma pinch high energy with debris collector
US6586757B2 (en) * 1997-05-12 2003-07-01 Cymer, Inc. Plasma focus light source with active and buffer gas control
US6566667B1 (en) * 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with improved pulse power system
US6452199B1 (en) 1997-05-12 2002-09-17 Cymer, Inc. Plasma focus high energy photon source with blast shield
US6566668B2 (en) 1997-05-12 2003-05-20 Cymer, Inc. Plasma focus light source with tandem ellipsoidal mirror units
US6281585B1 (en) 1997-06-30 2001-08-28 Philips Electronics North America Corporation Air gap dielectric in self-aligned via structures
JP2000089000A (ja) * 1998-09-14 2000-03-31 Nikon Corp Ｘ線発生装置
JP2001035688A (ja) * 1999-07-26 2001-02-09 Nikon Corp 軟ｘ線発生装置及びこれを備えた露光装置及び軟ｘ線の発生方法
WO2000025322A1 (en) * 1998-10-27 2000-05-04 Jmar Technology Co. Shaped source of soft x-ray, extreme ultraviolet and ultraviolet radiation
US6186632B1 (en) * 1998-12-31 2001-02-13 The Regents Of The University Of California Condenser for ring-field deep-ultraviolet and extreme-ultraviolet lithography
JP2000299197A (ja) * 1999-04-13 2000-10-24 Agency Of Ind Science & Technol Ｘ線発生装置
US6377651B1 (en) * 1999-10-11 2002-04-23 University Of Central Florida Laser plasma source for extreme ultraviolet lithography using a water droplet target
US6831963B2 (en) * 2000-10-20 2004-12-14 University Of Central Florida EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
EP1232516A4 (en) * 1999-10-27 2003-03-12 Jmar Res Inc METHOD AND SYSTEM FOR GENERATING RADIATION USING MICROCIBLES
US6469310B1 (en) * 1999-12-17 2002-10-22 Asml Netherlands B.V. Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus
US6493423B1 (en) * 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6195272B1 (en) 2000-03-16 2001-02-27 Joseph E. Pascente Pulsed high voltage power supply radiography system having a one to one correspondence between low voltage input pulses and high voltage output pulses
US6661018B1 (en) * 2000-04-25 2003-12-09 Northrop Grumman Corporation Shroud nozzle for gas jet control in an extreme ultraviolet light source
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
JP2002008891A (ja) * 2000-06-22 2002-01-11 Nikon Corp 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
JP2002006096A (ja) 2000-06-23 2002-01-09 Nikon Corp 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法
FR2814599B1 (fr) * 2000-09-27 2005-05-20 Commissariat Energie Atomique Dispositif laser de forte puissance crete et application a la generation de lumiere dans l'extreme ultra violet
US6804327B2 (en) 2001-04-03 2004-10-12 Lambda Physik Ag Method and apparatus for generating high output power gas discharge based source of extreme ultraviolet radiation and/or soft x-rays
US6567499B2 (en) * 2001-06-07 2003-05-20 Plex Llc Star pinch X-ray and extreme ultraviolet photon source
US6998785B1 (en) * 2001-07-13 2006-02-14 University Of Central Florida Research Foundation, Inc. Liquid-jet/liquid droplet initiated plasma discharge for generating useful plasma radiation
DE10151080C1 (de) 2001-10-10 2002-12-05 Xtreme Tech Gmbh Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung
FR2837990B1 (fr) * 2002-03-28 2007-04-27 Commissariat Energie Atomique Cavite laser de forte puissance crete et association de plusieurs de ces cavites, notamment pour exciter un generateur de lumiere dans l'extreme ultraviolet
JP4111487B2 (ja) * 2002-04-05 2008-07-02 ギガフォトン株式会社 極端紫外光源装置

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AU2003230870A8 (en) 2003-10-27
US20100176313A1 (en) 2010-07-15
US7642533B2 (en) 2010-01-05
KR101038479B1 (ko) 2011-06-02
US20080023657A1 (en) 2008-01-31
JP2005522839A (ja) 2005-07-28
EP1493039A2 (en) 2005-01-05
US20040108473A1 (en) 2004-06-10
WO2003087867A3 (en) 2003-12-18
US7368741B2 (en) 2008-05-06
WO2003087867A2 (en) 2003-10-23
US20050230645A1 (en) 2005-10-20
KR20040108718A (ko) 2004-12-24

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