FR2841684B1 - Source de rayonnement, notamment ultraviolet a decharges - Google Patents
Source de rayonnement, notamment ultraviolet a dechargesInfo
- Publication number
- FR2841684B1 FR2841684B1 FR0208149A FR0208149A FR2841684B1 FR 2841684 B1 FR2841684 B1 FR 2841684B1 FR 0208149 A FR0208149 A FR 0208149A FR 0208149 A FR0208149 A FR 0208149A FR 2841684 B1 FR2841684 B1 FR 2841684B1
- Authority
- FR
- France
- Prior art keywords
- discharges
- radiation source
- especially ultraviolet
- ultraviolet
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/56—One or more circuit elements structurally associated with the lamp
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/52—Cooling arrangements; Heating arrangements; Means for circulating gas or vapour within the discharge space
- H01J61/523—Heating or cooling particular parts of the lamp
- H01J61/526—Heating or cooling particular parts of the lamp heating or cooling of electrodes
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0208149A FR2841684B1 (fr) | 2002-06-28 | 2002-06-28 | Source de rayonnement, notamment ultraviolet a decharges |
JP2004516885A JP4485943B2 (ja) | 2002-06-28 | 2003-06-27 | 特に紫外放射線の、放電による放射源 |
US10/519,552 US7420191B2 (en) | 2002-06-28 | 2003-06-27 | Discharge radiation source, in particular UV radiation |
PCT/FR2003/002002 WO2004003964A2 (fr) | 2002-06-28 | 2003-06-27 | Source de rayonnement, notamment ultraviolet, a decharges |
EP03761657.0A EP1535307B1 (fr) | 2002-06-28 | 2003-06-27 | Source de rayonnement, notamment ultraviolet, a decharges |
AU2003258832A AU2003258832A1 (en) | 2002-06-28 | 2003-06-27 | Discharge radiation source, in particular uv radiation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0208149A FR2841684B1 (fr) | 2002-06-28 | 2002-06-28 | Source de rayonnement, notamment ultraviolet a decharges |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2841684A1 FR2841684A1 (fr) | 2004-01-02 |
FR2841684B1 true FR2841684B1 (fr) | 2004-09-24 |
Family
ID=29725009
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR0208149A Expired - Lifetime FR2841684B1 (fr) | 2002-06-28 | 2002-06-28 | Source de rayonnement, notamment ultraviolet a decharges |
Country Status (6)
Country | Link |
---|---|
US (1) | US7420191B2 (fr) |
EP (1) | EP1535307B1 (fr) |
JP (1) | JP4485943B2 (fr) |
AU (1) | AU2003258832A1 (fr) |
FR (1) | FR2841684B1 (fr) |
WO (1) | WO2004003964A2 (fr) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080239262A1 (en) * | 2007-03-29 | 2008-10-02 | Asml Netherlands B.V. | Radiation source for generating electromagnetic radiation and method for generating electromagnetic radiation |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6566668B2 (en) * | 1997-05-12 | 2003-05-20 | Cymer, Inc. | Plasma focus light source with tandem ellipsoidal mirror units |
JP3396399B2 (ja) * | 1997-06-26 | 2003-04-14 | シャープ株式会社 | 電子デバイス製造装置 |
US6621199B1 (en) * | 2000-01-21 | 2003-09-16 | Vortek Industries Ltd. | High intensity electromagnetic radiation apparatus and method |
US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
TW518913B (en) * | 2000-07-03 | 2003-01-21 | Asml Netherlands Bv | Radiation source, lithographic apparatus, and semiconductor device manufacturing method |
TW503669B (en) * | 2000-07-04 | 2002-09-21 | Lambda Physik Ag | Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it |
JP4724930B2 (ja) * | 2001-03-01 | 2011-07-13 | ソニー株式会社 | 炭素質材料の製造方法及び製造装置 |
DE10151080C1 (de) * | 2001-10-10 | 2002-12-05 | Xtreme Tech Gmbh | Einrichtung und Verfahren zum Erzeugen von extrem ultravioletter (EUV-)Strahlung auf Basis einer Gasentladung |
-
2002
- 2002-06-28 FR FR0208149A patent/FR2841684B1/fr not_active Expired - Lifetime
-
2003
- 2003-06-27 EP EP03761657.0A patent/EP1535307B1/fr not_active Expired - Lifetime
- 2003-06-27 WO PCT/FR2003/002002 patent/WO2004003964A2/fr active Application Filing
- 2003-06-27 AU AU2003258832A patent/AU2003258832A1/en not_active Abandoned
- 2003-06-27 JP JP2004516885A patent/JP4485943B2/ja not_active Expired - Fee Related
- 2003-06-27 US US10/519,552 patent/US7420191B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US7420191B2 (en) | 2008-09-02 |
JP2005531923A (ja) | 2005-10-20 |
AU2003258832A1 (en) | 2004-01-19 |
WO2004003964A2 (fr) | 2004-01-08 |
JP4485943B2 (ja) | 2010-06-23 |
EP1535307A2 (fr) | 2005-06-01 |
EP1535307B1 (fr) | 2013-06-19 |
WO2004003964A3 (fr) | 2005-03-10 |
US20050285048A1 (en) | 2005-12-29 |
AU2003258832A8 (en) | 2004-01-19 |
FR2841684A1 (fr) | 2004-01-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PLFP | Fee payment |
Year of fee payment: 15 |
|
PLFP | Fee payment |
Year of fee payment: 16 |