JP2004530288A5 - - Google Patents

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Publication number
JP2004530288A5
JP2004530288A5 JP2002566524A JP2002566524A JP2004530288A5 JP 2004530288 A5 JP2004530288 A5 JP 2004530288A5 JP 2002566524 A JP2002566524 A JP 2002566524A JP 2002566524 A JP2002566524 A JP 2002566524A JP 2004530288 A5 JP2004530288 A5 JP 2004530288A5
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JP
Japan
Prior art keywords
film
sio
component
complex
platinum
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JP2002566524A
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English (en)
Japanese (ja)
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JP2004530288A (ja
JP4226905B2 (ja
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Priority claimed from US09/789,083 external-priority patent/US6617674B2/en
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Publication of JP2004530288A publication Critical patent/JP2004530288A/ja
Publication of JP2004530288A5 publication Critical patent/JP2004530288A5/ja
Application granted granted Critical
Publication of JP4226905B2 publication Critical patent/JP4226905B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2002566524A 2001-02-20 2002-01-17 半導体パッケージおよびその調製方法 Expired - Lifetime JP4226905B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/789,083 US6617674B2 (en) 2001-02-20 2001-02-20 Semiconductor package and method of preparing same
PCT/US2002/001263 WO2002067292A2 (en) 2001-02-20 2002-01-17 Semiconductor package and method of preparing same

Publications (3)

Publication Number Publication Date
JP2004530288A JP2004530288A (ja) 2004-09-30
JP2004530288A5 true JP2004530288A5 (enExample) 2008-06-05
JP4226905B2 JP4226905B2 (ja) 2009-02-18

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JP2002566524A Expired - Lifetime JP4226905B2 (ja) 2001-02-20 2002-01-17 半導体パッケージおよびその調製方法

Country Status (11)

Country Link
US (1) US6617674B2 (enExample)
EP (1) EP1362364B1 (enExample)
JP (1) JP4226905B2 (enExample)
KR (1) KR100813821B1 (enExample)
CN (3) CN1514954A (enExample)
AT (1) ATE494629T1 (enExample)
AU (1) AU2002248357A1 (enExample)
CA (1) CA2438126A1 (enExample)
DE (1) DE60238823D1 (enExample)
TW (1) TW563210B (enExample)
WO (2) WO2002067292A2 (enExample)

Families Citing this family (53)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6617674B2 (en) * 2001-02-20 2003-09-09 Dow Corning Corporation Semiconductor package and method of preparing same
DE10144467B4 (de) * 2001-09-10 2006-07-27 Infineon Technologies Ag Elektronisches Sensorbauteil und Verfahren zu seiner Herstellung
US6836023B2 (en) * 2002-04-17 2004-12-28 Fairchild Semiconductor Corporation Structure of integrated trace of chip package
US6905904B2 (en) * 2002-06-24 2005-06-14 Dow Corning Corporation Planar optical waveguide assembly and method of preparing same
US6907176B2 (en) 2002-06-24 2005-06-14 Dow Corning Corporation Planar optical waveguide assembly and method of preparing same
JP3910908B2 (ja) * 2002-10-29 2007-04-25 新光電気工業株式会社 半導体装置用基板及びこの製造方法、並びに半導体装置
JP3910907B2 (ja) * 2002-10-29 2007-04-25 新光電気工業株式会社 キャパシタ素子及びこの製造方法、半導体装置用基板、並びに半導体装置
US7145229B2 (en) * 2002-11-14 2006-12-05 The Regents Of The University Of California Silicone metalization
US20040102022A1 (en) * 2002-11-22 2004-05-27 Tongbi Jiang Methods of fabricating integrated circuitry
WO2005001573A2 (en) * 2003-06-23 2005-01-06 Dow Corning Corporation Adhesion method using gray-scale photolithography
JP4308821B2 (ja) * 2003-07-28 2009-08-05 ダウ・コーニング・コーポレイション パターン形成されたシリコーン層をエッチングする方法
KR101154209B1 (ko) * 2003-11-17 2012-06-18 다우 코닝 코포레이션 경화된 실리콘 수지 기판의 엠보싱방법
DE102004005562A1 (de) * 2004-02-03 2005-08-25 Kettenbach Gmbh & Co. Kg Über Hydrosilylierungs-Reaktion additionsvernetzende Zweikomponenten-Dentalmaterial mit starren und/oder voluminösen Gruppen sowie mit hoher Biegefestigkeit und E-Modul
US7208344B2 (en) * 2004-03-31 2007-04-24 Aptos Corporation Wafer level mounting frame for ball grid array packaging, and method of making and using the same
DE102004036573A1 (de) * 2004-07-28 2006-03-23 Ge Bayer Silicones Gmbh & Co. Kg Verwendung lichtaktivierbarer, härtbarer Silikonzusammensetzungen zur Herstellung von dickwandigen Formartikeln oder dickwandigen Beschichtungen
WO2006023037A2 (en) 2004-08-11 2006-03-02 Dow Corning Corporation Photopolymerizable silicone materials forming semipermeable membranes for sensor applications
DE602005009971D1 (de) * 2004-11-19 2008-11-06 Dow Corning Zusammensetzung aus organohydrogenpolysiloxanharz und silizium
US8092910B2 (en) * 2005-02-16 2012-01-10 Dow Corning Toray Co., Ltd. Reinforced silicone resin film and method of preparing same
ATE551398T1 (de) * 2005-02-16 2012-04-15 Dow Corning Verstärkte silikonharzfolie und herstellungsverfahren dafür
KR101278460B1 (ko) 2005-03-01 2013-07-02 다우 코닝 코포레이션 반도체 가공을 위한 임시 웨이퍼 접착방법
JP2006303452A (ja) * 2005-03-25 2006-11-02 Sanyo Electric Co Ltd 半導体装置及びその製造方法
JP4055015B2 (ja) * 2005-04-04 2008-03-05 セイコーエプソン株式会社 半導体装置の製造方法
US8691389B2 (en) * 2005-06-02 2014-04-08 Dow Corning Corporation Method of nanopatterning, a cured resist film use therein, and an article including the resist film
JP5542331B2 (ja) * 2005-06-14 2014-07-09 ダウ・コーニング・コーポレイション 強化シリコーン樹脂フィルム及びそれらを調製する方法
WO2007018756A1 (en) 2005-08-04 2007-02-15 Dow Corning Corporation Reinforced silicone resin film and method of preparing same
KR100647483B1 (ko) * 2005-08-19 2006-11-23 삼성전자주식회사 반도체 패키지의 배선 구조물 및 이의 제조 방법, 이를이용한 웨이퍼 레벨 패키지 및 이의 제조 방법
ATE517947T1 (de) 2005-12-21 2011-08-15 Dow Corning Silikonharzfilm, herstellungsverfahren dafür und nanomaterialgefüllte silikonzusammensetzung
KR101426316B1 (ko) 2006-01-19 2014-08-06 다우 코닝 코포레이션 실리콘 수지 필름, 이의 제조방법, 및 나노물질로 충전된실리콘 조성물
CN101379153B (zh) * 2006-02-02 2011-12-28 陶氏康宁公司 有机硅树脂膜,其制备方法和纳米材料填充的有机硅组合物
US7449785B2 (en) * 2006-02-06 2008-11-11 Taiwan Semiconductor Manufacturing Co., Ltd. Solder bump on a semiconductor substrate
US8084097B2 (en) * 2006-02-20 2011-12-27 Dow Corning Corporation Silicone resin film, method of preparing same, and nanomaterial-filled silicone composition
JP2007258317A (ja) * 2006-03-22 2007-10-04 Shin Etsu Chem Co Ltd 半導体装置の製造方法
JP2007266191A (ja) * 2006-03-28 2007-10-11 Nec Electronics Corp ウェハ処理方法
JP5520044B2 (ja) * 2006-04-11 2014-06-11 ダウ コーニング コーポレーション 低熱変形シリコーン複合体モールド
KR20090018199A (ko) * 2006-06-05 2009-02-19 다우 코닝 코포레이션 전자 패키지 및 이의 제조방법
WO2008021125A2 (en) * 2006-08-14 2008-02-21 Dow Corning Corporation Method of preparing a patterned film with a developing solvent
US7538021B2 (en) * 2006-09-20 2009-05-26 Intel Corporation Removing dry film resist residues using hydrolyzable membranes
US20100056410A1 (en) * 2006-09-25 2010-03-04 Advanced Technology Materials, Inc. Compositions and methods for the removal of photoresist for a wafer rework application
CN101636270B (zh) 2007-02-22 2012-07-04 道康宁公司 增强硅树脂膜
WO2008103228A1 (en) 2007-02-22 2008-08-28 Dow Corning Corporation Reinforced silicone resin films
US7834449B2 (en) * 2007-04-30 2010-11-16 Broadcom Corporation Highly reliable low cost structure for wafer-level ball grid array packaging
US20100143686A1 (en) * 2007-05-01 2010-06-10 Bizhong Zhu Nanomaterial-Filled Silicone Composition and Reinforced Silicone Resin Film
US7872347B2 (en) * 2007-08-09 2011-01-18 Broadcom Corporation Larger than die size wafer-level redistribution packaging process
US8017246B2 (en) * 2007-11-08 2011-09-13 Philips Lumileds Lighting Company, Llc Silicone resin for protecting a light transmitting surface of an optoelectronic device
US20100264522A1 (en) * 2009-04-20 2010-10-21 Chien-Pin Chen Semiconductor device having at least one bump without overlapping specific pad or directly contacting specific pad
US8643164B2 (en) * 2009-06-11 2014-02-04 Broadcom Corporation Package-on-package technology for fan-out wafer-level packaging
CN102753636B (zh) 2010-02-12 2014-02-12 道康宁公司 用于半导体加工的暂时晶片粘结方法
DE102010043149A1 (de) * 2010-10-29 2012-05-03 Wacker Chemie Ag Hochtransparente durch Licht vernetzbare Siliconmischungen
PL2695745T3 (pl) 2012-08-06 2016-03-31 Unilin Bvba Sposób wytwarzania paneli o powierzchni dekoracyjnej
ES2762235T3 (es) 2014-02-06 2020-05-22 Unilin Bvba Procedimiento de fabricación de paneles de piso que tienen una superficie decorativa
TW201601358A (zh) * 2014-06-19 2016-01-01 道康寧公司 用於晶圓級z軸熱中介層的可光圖案化聚矽氧
JP2018507290A (ja) * 2015-02-03 2018-03-15 ダウ コーニング コーポレーションDow Corning Corporation 硬化性シリコーン配合物及び関連する硬化生成物、方法、物品、並びにデバイス
TWI678551B (zh) 2015-07-28 2019-12-01 美商道康寧公司 智慧型光學材料、配方、方法、用途、物品、及裝置

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1369989A (en) 1970-11-27 1974-10-09 Dow Corning Ltd Organopolysiloxane elastomers
US3723497A (en) 1971-11-19 1973-03-27 Dow Corning Silicone compositions catalyzed with platinum ii diacetylacetonate
US4064027A (en) 1973-09-28 1977-12-20 Dow Corning Corporation UV curable composition
DE2736499C2 (de) 1977-08-12 1990-03-29 Wacker-Chemie GmbH, 8000 München Verfahren zum Herstellen von klebrige Stoffe abweisenden Überzügen
JPS5987840A (ja) 1982-11-10 1984-05-21 Toray Silicone Co Ltd 半導体装置
FR2597110A1 (fr) * 1986-04-14 1987-10-16 Rhone Poulenc Multi Tech Composition organopolysiloxane, potentiellement reticulable et utilisable notamment en microlithographie, et son procede d'application
US5171716A (en) 1986-12-19 1992-12-15 North American Philips Corp. Method of manufacturing semiconductor device with reduced packaging stress
US5045918A (en) 1986-12-19 1991-09-03 North American Philips Corp. Semiconductor device with reduced packaging stress
US5145886A (en) 1988-05-19 1992-09-08 Minnesota Mining And Manufacturing Company Radiation activated hydrosilation reaction
US5091103A (en) * 1990-05-01 1992-02-25 Alicia Dean Photoresist stripper
EP0464614B1 (en) 1990-06-25 1999-09-29 Matsushita Electronics Corporation A composition having sensitivity to light or radiation
US5679977A (en) * 1990-09-24 1997-10-21 Tessera, Inc. Semiconductor chip assemblies, methods of making same and components for same
US5678301A (en) * 1991-06-04 1997-10-21 Micron Technology, Inc. Method for forming an interconnect for testing unpackaged semiconductor dice
US5290397A (en) * 1992-08-21 1994-03-01 Cornell Research Foundation, Inc. Bilayer resist and process for preparing same
US5854302A (en) * 1993-04-29 1998-12-29 The Dow Chemical Company Partially polymerized divinylsiloxane linked bisbenzocyclobutene resins and methods for making said resins
US5834339A (en) * 1996-03-07 1998-11-10 Tessera, Inc. Methods for providing void-free layers for semiconductor assemblies
US6211572B1 (en) * 1995-10-31 2001-04-03 Tessera, Inc. Semiconductor chip package with fan-in leads
US6284563B1 (en) 1995-10-31 2001-09-04 Tessera, Inc. Method of making compliant microelectronic assemblies
CN1178230A (zh) * 1996-07-30 1998-04-08 日本化药株式会社 半导体封装用环氧树脂液体组合物
JP3639088B2 (ja) * 1997-06-06 2005-04-13 株式会社ルネサステクノロジ 半導体装置及び配線テープ
CN1244038A (zh) * 1998-08-04 2000-02-09 长兴化学工业股份有限公司 半导体封装用树脂组合物
US6103552A (en) 1998-08-10 2000-08-15 Lin; Mou-Shiung Wafer scale packaging scheme
JP4174174B2 (ja) * 2000-09-19 2008-10-29 株式会社ルネサステクノロジ 半導体装置およびその製造方法並びに半導体装置実装構造体
US6617674B2 (en) * 2001-02-20 2003-09-09 Dow Corning Corporation Semiconductor package and method of preparing same

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