HK1128714A1 - Composition, method for preparing film, and functional element and method for preparing the same - Google Patents

Composition, method for preparing film, and functional element and method for preparing the same

Info

Publication number
HK1128714A1
HK1128714A1 HK09106545A HK09106545A HK1128714A1 HK 1128714 A1 HK1128714 A1 HK 1128714A1 HK 09106545 A HK09106545 A HK 09106545A HK 09106545 A HK09106545 A HK 09106545A HK 1128714 A1 HK1128714 A1 HK 1128714A1
Authority
HK
Hong Kong
Prior art keywords
preparing
composition
same
functional element
film
Prior art date
Application number
HK09106545A
Other languages
English (en)
Inventor
Sadao Kanbe
Shunichi Seki
Original Assignee
Seiko Epson Corp
Cambridge Display Tech Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Cambridge Display Tech Ltd filed Critical Seiko Epson Corp
Publication of HK1128714A1 publication Critical patent/HK1128714A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • H10K71/135—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing using ink-jet printing
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/15—Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
    • H10K85/115—Polyfluorene; Derivatives thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/10—Organic polymers or oligomers
    • H10K85/151—Copolymers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
    • H10K85/621—Aromatic anhydride or imide compounds, e.g. perylene tetra-carboxylic dianhydride or perylene tetracarboxylic di-imide
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
    • C09K2211/14—Macromolecular compounds
    • C09K2211/1441—Heterocyclic
    • C09K2211/1466—Heterocyclic containing nitrogen as the only heteroatom
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Electroluminescent Light Sources (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Optical Filters (AREA)
HK09106545A 1999-03-29 2009-07-17 Composition, method for preparing film, and functional element and method for preparing the same HK1128714A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP8694499 1999-03-29
JP25048699 1999-09-03

Publications (1)

Publication Number Publication Date
HK1128714A1 true HK1128714A1 (en) 2009-11-06

Family

ID=26428022

Family Applications (1)

Application Number Title Priority Date Filing Date
HK09106545A HK1128714A1 (en) 1999-03-29 2009-07-17 Composition, method for preparing film, and functional element and method for preparing the same

Country Status (9)

Country Link
US (5) US6878312B1 (de)
EP (1) EP1083775B1 (de)
JP (3) JP4486261B2 (de)
KR (1) KR100495740B1 (de)
CN (1) CN1310930A (de)
DE (1) DE60045092D1 (de)
HK (1) HK1128714A1 (de)
TW (1) TW508975B (de)
WO (1) WO2000059267A1 (de)

Families Citing this family (127)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2723831B1 (fr) * 1994-08-25 1996-10-25 Plazanet Maurice Disque d'entrainement pour l'outil d'une machine pour la mise en etat et/ou l'entretien des sols
GB9920543D0 (en) 1999-08-31 1999-11-03 Cambridge Display Tech Ltd A formulation for depositing a light-emitting polymer layer
US6582504B1 (en) * 1999-11-24 2003-06-24 Sharp Kabushiki Kaisha Coating liquid for forming organic EL element
EP1309994A2 (de) 2000-08-18 2003-05-14 Siemens Aktiengesellschaft Verkapseltes organisch-elektronisches bauteil, verfahren zu seiner herstellung und seine verwendung
EP1313822B1 (de) 2000-08-30 2004-11-10 Cambridge Display Technology Limited Formulierung zur ablagerung einer konjugierten polymerschicht
JP2004105948A (ja) * 2000-11-21 2004-04-08 Seiko Epson Corp 材料の吐出方法、及び吐出装置、カラーフィルタの製造方法及び製造装置、液晶装置の製造方法及び製造装置、ｅｌ装置の製造方法及び製造装置、並びに電子機器
JP3628997B2 (ja) 2000-11-27 2005-03-16 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置の製造方法
CN1905126A (zh) * 2000-11-27 2007-01-31 精工爱普生株式会社 有机电致发光装置及其电子装置
JP4021177B2 (ja) * 2000-11-28 2007-12-12 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置の製造方法および有機エレクトロルミネッセンス装置並びに電子機器
TW518909B (en) 2001-01-17 2003-01-21 Semiconductor Energy Lab Luminescent device and method of manufacturing same
TW527432B (en) * 2001-02-28 2003-04-11 Cambridge Display Tech Ltd A method and composition for depositing a polymer layer in the production of a light-emissive device, a method of forming a polymer layer on a substrate, and the use of a composition in an ink-jet method of depositing a polymer layer
JP4347569B2 (ja) * 2001-02-27 2009-10-21 ケンブリッジ ディスプレイ テクノロジー リミテッド 基板に材料を蒸着する方法
US8232116B2 (en) 2001-02-28 2012-07-31 Cambridge Display Technology Limited Method for fabricating a polymer L.E.D.
CN100377380C (zh) * 2001-02-28 2008-03-26 剑桥显示技术有限公司 供沉积在基材上的材料配方和方法
DE50207293D1 (de) * 2001-03-10 2006-08-03 Merck Patent Gmbh Lösung und dispersionen organischer halbleiter
US6787063B2 (en) * 2001-03-12 2004-09-07 Seiko Epson Corporation Compositions, methods for producing films, functional elements, methods for producing functional elements, methods for producing electro-optical devices and methods for producing electronic apparatus
JP3969698B2 (ja) * 2001-05-21 2007-09-05 株式会社半導体エネルギー研究所 発光装置の作製方法
US20020197393A1 (en) * 2001-06-08 2002-12-26 Hideaki Kuwabara Process of manufacturing luminescent device
DE10135640A1 (de) 2001-07-21 2003-02-06 Covion Organic Semiconductors Lösungen organischer Halbleiter
US20030166311A1 (en) * 2001-09-12 2003-09-04 Seiko Epson Corporation Method for patterning, method for forming film, patterning apparatus, film formation apparatus, electro-optic apparatus and method for manufacturing the same, electronic equipment, and electronic apparatus and method for manufacturing the same
DE10153445A1 (de) * 2001-10-30 2003-05-22 Covion Organic Semiconductors Trocknungsverfahren
JP2003163084A (ja) * 2001-11-26 2003-06-06 Seiko Epson Corp 有機ｅｌ装置とその製造方法並びに電子機器
GB0129005D0 (en) * 2001-12-04 2002-01-23 Imp College Innovations Ltd Electroluminescent device
JP2005532416A (ja) * 2001-12-20 2005-10-27 アド−ビジョン・インコーポレイテッド スクリーン印刷可能なエレクトロルミネッセントポリマーインク
KR100817128B1 (ko) * 2001-12-31 2008-03-27 엘지.필립스 엘시디 주식회사 유기 발광층 성막용 용매제
US6541300B1 (en) * 2002-01-28 2003-04-01 Motorola, Inc. Semiconductor film and process for its preparation
GB0202997D0 (en) * 2002-02-08 2002-03-27 Elam T Ltd Method for forming electroluminescent devices
KR20020025918A (ko) * 2002-02-15 2002-04-04 박병주 습식 공정으로 제작된 유기 반도체 디바이스 및 유기전계발광 소자
DE10226370B4 (de) 2002-06-13 2008-12-11 Polyic Gmbh & Co. Kg Substrat für ein elektronisches Bauteil, Verwendung des Substrates, Verfahren zur Erhöhung der Ladungsträgermobilität und Organischer Feld-Effekt Transistor (OFET)
WO2004017439A2 (de) 2002-07-29 2004-02-26 Siemens Aktiengesellschaft Elektronisches bauteil mit vorwiegend organischen funktionsmaterialien und herstellungsverfahren dazu
JP4852224B2 (ja) * 2002-07-30 2012-01-11 セイコーエプソン株式会社 有機ｅｌ装置の製造装置
JP3690380B2 (ja) * 2002-08-02 2005-08-31 セイコーエプソン株式会社 材料の配置方法、電子装置の製造方法、電気光学装置の製造方法
JP4239560B2 (ja) 2002-08-02 2009-03-18 セイコーエプソン株式会社 組成物とこれを用いた有機導電性膜の製造方法
ATE468618T1 (de) * 2002-09-03 2010-06-15 Cambridge Display Tech Ltd Verfahren zur herstellung eines optischen gerätes
US7368145B2 (en) 2002-09-19 2008-05-06 Dai Nippon Printing Co., Ltd. Method and apparatus for manufacturing organic EL display and color filter by ink jet method
JP2011029666A (ja) * 2002-09-30 2011-02-10 Seiko Epson Corp 塗布液組成物および薄膜形成方法
JP2004179144A (ja) * 2002-09-30 2004-06-24 Seiko Epson Corp 塗布液組成物および薄膜形成方法
JP4459521B2 (ja) 2002-10-17 2010-04-28 大日本印刷株式会社 エレクトロルミネッセンス表示装置
US9172048B2 (en) 2002-11-07 2015-10-27 Nissan Chemical Industries, Ltd. Charge-transporting varnish
GB0227778D0 (en) 2002-11-28 2003-01-08 Cambridge Display Tech Ltd Droplet-deposition related methods and apparatus
JP4378950B2 (ja) * 2002-12-24 2009-12-09 セイコーエプソン株式会社 液滴吐出装置および電気光学装置の製造方法
JP4131838B2 (ja) * 2003-05-16 2008-08-13 株式会社半導体エネルギー研究所 表示装置
WO2004106458A1 (en) 2003-05-21 2004-12-09 Dow Global Technologies Inc. Blend of viscosity modifier and luminescent compound
DE10340643B4 (de) 2003-09-03 2009-04-16 Polyic Gmbh & Co. Kg Druckverfahren zur Herstellung einer Doppelschicht für Polymerelektronik-Schaltungen, sowie dadurch hergestelltes elektronisches Bauelement mit Doppelschicht
US20050151129A1 (en) * 2004-01-14 2005-07-14 Rahul Gupta Deposition of conducting polymers
US20070152199A1 (en) * 2004-03-09 2007-07-05 Arno Seeboth Composition for the preparation of a thermoset having thermochromic properties
JP2005259523A (ja) * 2004-03-11 2005-09-22 Idemitsu Kosan Co Ltd 有機エレクトロルミネッセンス素子、その製造方法及び有機溶液
KR101163113B1 (ko) * 2004-03-16 2012-07-09 닛산 가가쿠 고교 가부시키 가이샤 유황 원자를 함유하는 반사 방지막
WO2005107335A1 (ja) * 2004-04-30 2005-11-10 Nissan Chemical Industries, Ltd. 良溶媒及び貧溶媒を含有するワニス
WO2005112144A1 (en) * 2004-05-18 2005-11-24 Merck Patent Gmbh Formulation for ink-jet printing comprising semiconducting polymers
WO2005123856A1 (ja) * 2004-06-17 2005-12-29 Sharp Kabushiki Kaisha 塗液、膜の製造方法、機能素子の製造方法、及び、機能素子
DE102004040831A1 (de) 2004-08-23 2006-03-09 Polyic Gmbh & Co. Kg Funketikettfähige Umverpackung
JP4148933B2 (ja) * 2004-08-31 2008-09-10 シャープ株式会社 機能膜の製造方法、機能膜形成用塗液、機能素子、電子デバイス及び表示装置
US7910025B2 (en) 2004-10-15 2011-03-22 Sumitomo Chemical Co., Ltd. Solution composition and polymer light-emitting device
DE102004059465A1 (de) 2004-12-10 2006-06-14 Polyic Gmbh & Co. Kg Erkennungssystem
DE102004059464A1 (de) 2004-12-10 2006-06-29 Polyic Gmbh & Co. Kg Elektronikbauteil mit Modulator
DE102004063435A1 (de) 2004-12-23 2006-07-27 Polyic Gmbh & Co. Kg Organischer Gleichrichter
WO2006087945A1 (ja) * 2005-02-15 2006-08-24 Pioneer Corporation 成膜用組成物及び有機電界発光素子
DE102005009819A1 (de) 2005-03-01 2006-09-07 Polyic Gmbh & Co. Kg Elektronikbaugruppe
DE102005017655B4 (de) 2005-04-15 2008-12-11 Polyic Gmbh & Co. Kg Mehrschichtiger Verbundkörper mit elektronischer Funktion
GB0510382D0 (en) 2005-05-20 2005-06-29 Cambridge Display Tech Ltd Ink jet printing compositions in opto-electrical devices
JP2012230904A (ja) * 2005-05-20 2012-11-22 Sumitomo Chemical Co Ltd 高沸点組成物及びそれを用いた高分子発光素子
KR101277916B1 (ko) 2005-05-20 2013-06-21 스미또모 가가꾸 가부시키가이샤 중합체 조성물 및 그것을 이용한 고분자 발광 소자
JP4682701B2 (ja) * 2005-05-27 2011-05-11 凸版印刷株式会社 有機ｅｌ素子用インキおよび有機ｅｌ素子の製造方法
DE102005031448A1 (de) 2005-07-04 2007-01-11 Polyic Gmbh & Co. Kg Aktivierbare optische Schicht
DE102005035589A1 (de) 2005-07-29 2007-02-01 Polyic Gmbh & Co. Kg Verfahren zur Herstellung eines elektronischen Bauelements
DE102005039528A1 (de) * 2005-08-18 2007-02-22 Merck Patent Gmbh Lösungen organischer Halbleiter
GB0517195D0 (en) 2005-08-23 2005-09-28 Cambridge Display Tech Ltd Molecular electronic device structures and fabrication methods
WO2007023272A1 (en) 2005-08-23 2007-03-01 Cambridge Display Technology Limited Organic electronic device structures and fabrication methods
DE102005044306A1 (de) 2005-09-16 2007-03-22 Polyic Gmbh & Co. Kg Elektronische Schaltung und Verfahren zur Herstellung einer solchen
JP4396607B2 (ja) * 2005-09-28 2010-01-13 セイコーエプソン株式会社 膜形成方法、有機エレクトロルミネセンス装置の製造方法、有機エレクトロルミネセンス装置及び電子機器
WO2007049631A1 (ja) 2005-10-28 2007-05-03 Nissan Chemical Industries, Ltd. スプレー又はインクジェット塗布用電荷輸送性ワニス
JP4251329B2 (ja) * 2005-12-20 2009-04-08 カシオ計算機株式会社 表示装置及びその製造方法
GB2437113B (en) 2006-04-12 2008-11-26 Cambridge Display Tech Ltd Light-emissive display and method of manufacturing the same
GB0618698D0 (en) * 2006-09-22 2006-11-01 Cambridge Display Tech Ltd Molecular electronic device fabrication methods and structures
DE102006047388A1 (de) 2006-10-06 2008-04-17 Polyic Gmbh & Co. Kg Feldeffekttransistor sowie elektrische Schaltung
US20100243960A1 (en) * 2007-11-16 2010-09-30 Sumitomo Chemical Company, Limited Coating solution for application method of discharging coating solution through slit-like discharge port
GB0803950D0 (en) 2008-03-03 2008-04-09 Cambridge Display Technology O Solvent for printing composition
GB2462410B (en) 2008-07-21 2011-04-27 Cambridge Display Tech Ltd Compositions and methods for manufacturing light-emissive devices
GB0814971D0 (en) 2008-08-15 2008-09-24 Cambridge Display Tech Ltd Opto-electrical devices and methods of manufacturing the same
GB2462688B (en) * 2008-08-22 2012-03-07 Cambridge Display Tech Ltd Opto-electrical devices and methods of manufacturing the same
GB2463493B (en) * 2008-09-15 2012-11-14 Cambridge Display Tech Ltd An improved method for ink jet printing organic electronic devices
JPWO2010032447A1 (ja) * 2008-09-19 2012-02-09 出光興産株式会社 有機エレクトロルミネッセンス材料組成物、薄膜形成方法及び有機エレクトロルミネッセンス素子
US20110226992A1 (en) * 2008-09-19 2011-09-22 Idemitsu Kosan Co., Ltd. Organic electroluminescent material compositions
GB2466842B (en) * 2009-01-12 2011-10-26 Cambridge Display Tech Ltd Interlayer formulation for flat films
US8174000B2 (en) 2009-02-11 2012-05-08 Universal Display Corporation Liquid compositions for inkjet printing of organic layers or other uses
JP2011023668A (ja) * 2009-07-17 2011-02-03 Sumitomo Chemical Co Ltd 液柱塗布用インクおよび有機ｅｌ素子の製造方法、並びに該有機ｅｌ素子を有する有機ｅｌ表示装置
WO2011086873A1 (ja) * 2010-01-13 2011-07-21 住友化学株式会社 有機エレクトロルミネッセンス素子および高分子発光体組成物
EP2559079B1 (de) 2010-04-12 2020-04-01 Merck Patent GmbH Zusammensetzung und verfahren zur herstellung organischer elektronischer vorrichtungen
US10744759B2 (en) 2010-06-29 2020-08-18 CARDINAL HEALTH SWITZERLAND 515 GmbH First drop dissimilarity in drop-on-demand inkjet devices and methods for its correction
GB201013820D0 (en) * 2010-08-18 2010-09-29 Cambridge Display Tech Ltd Low contact resistance organic thin film transistors
JP5527104B2 (ja) * 2010-08-24 2014-06-18 セイコーエプソン株式会社 成膜用インク、成膜方法および発光素子の製造方法
TWI576408B (zh) 2010-08-24 2017-04-01 精工愛普生股份有限公司 成膜用墨水、成膜方法、液滴噴出裝置、發光元件之製造方法、發光元件、發光裝置及電子機器
JP5527105B2 (ja) * 2010-08-24 2014-06-18 セイコーエプソン株式会社 成膜用インク、成膜方法および発光素子の製造方法
CN102504803B (zh) * 2011-09-29 2013-11-27 中国科学院长春应用化学研究所 一种利用对流改善喷墨打印薄膜均匀性的有机发光材料溶液及其制备方法
KR101827975B1 (ko) 2011-10-10 2018-03-29 엘지이노텍 주식회사 발광소자
KR101389451B1 (ko) * 2012-03-19 2014-04-29 연세대학교 산학협력단 산화물 박막용 조성물, 이를 이용한 액상 공정 산화물 박막의 제조 방법, 이를 이용한 전자 소자 및 박막 트랜지스터
JP6015073B2 (ja) * 2012-04-02 2016-10-26 セイコーエプソン株式会社 機能層形成用インク、発光素子の製造方法
US20130314327A1 (en) * 2012-05-22 2013-11-28 J Touch Corporation Frameless touch panel
GB201210858D0 (en) * 2012-06-19 2012-08-01 Cambridge Display Tech Ltd Method
DE102012018583B4 (de) 2012-09-20 2018-10-31 Heidelberger Druckmaschinen Ag Verfahren zum Drucken einer funktionalen Schicht für elektronische Bauteile
JP6079118B2 (ja) * 2012-10-10 2017-02-15 コニカミノルタ株式会社 発光層形成用インク組成物、発光素子の作製方法及びエレクトロルミネッセンスデバイス
JP6214938B2 (ja) * 2013-06-18 2017-10-18 日本化薬株式会社 有機半導体及びその用途、並びに半導体層形成用インク
WO2015023302A1 (en) 2013-08-12 2015-02-19 Kateeva, Inc. Ester-based solvent systems for printable organic light-emitting diode ink formulations
KR102145424B1 (ko) * 2013-11-11 2020-08-18 엘지디스플레이 주식회사 표시장치 제조용 잉크 및 이를 이용한 표시장치의 제조방법
US20170044308A1 (en) 2014-02-14 2017-02-16 Hitachi Chemical Company, Ltd. Polymer or oligomer, hole transport material composition, and organic electronic element using same
WO2015194429A1 (ja) * 2014-06-17 2015-12-23 株式会社ダイセル 有機ｅｌ素子製造用溶剤
US10020185B2 (en) 2014-10-07 2018-07-10 Samsung Sdi Co., Ltd. Composition for forming silica layer, silica layer, and electronic device
JP6638187B2 (ja) * 2014-12-02 2020-01-29 セイコーエプソン株式会社 成膜用インクおよび成膜方法
JP6638186B2 (ja) * 2014-12-02 2020-01-29 セイコーエプソン株式会社 成膜用インクおよび成膜方法
KR101837971B1 (ko) 2014-12-19 2018-03-13 삼성에스디아이 주식회사 실리카계 막 형성용　조성물, 실리카계 막, 및 전자 디바이스
KR101833800B1 (ko) 2014-12-19 2018-03-02 삼성에스디아이 주식회사 실리카계 막 형성용 조성물, 실리카계 막의 제조방법 및 상기 실리카계 막을 포함하는 전자 소자
CN107210380B (zh) * 2015-01-26 2019-06-28 住友化学株式会社 组合物和使用该组合物的发光元件
CN107251259B (zh) * 2015-03-05 2020-06-30 住友化学株式会社 组合物和使用该组合物的发光元件
KR102386848B1 (ko) 2015-04-13 2022-04-15 삼성디스플레이 주식회사 표시장치 및 그 제조방법
WO2016186012A1 (ja) * 2015-05-19 2016-11-24 住友化学株式会社 組成物及びそれを用いた発光素子
CN104908423B (zh) * 2015-06-26 2016-08-24 京东方科技集团股份有限公司 一种薄膜制作方法及系统
KR20170014946A (ko) * 2015-07-31 2017-02-08 삼성에스디아이 주식회사 실리카 막 형성용 조성물, 실리카 막의 제조방법 및 실리카 막
CN108291105B (zh) * 2015-11-12 2021-09-10 广州华睿光电材料有限公司 用于印刷电子器件的组合物及其在电子器件中的应用
WO2017102052A1 (en) * 2015-12-16 2017-06-22 Merck Patent Gmbh Formulations containing a solid solvent
JP6661365B2 (ja) * 2015-12-17 2020-03-11 東芝テック株式会社 インクジェットインク並びに有機薄膜太陽電池の製造方法及び製造装置
JP6833388B2 (ja) * 2016-08-01 2021-02-24 株式会社Ｊｏｌｅｄ 有機ｅｌ用インク
WO2018095381A1 (zh) 2016-11-23 2018-05-31 广州华睿光电材料有限公司 印刷油墨组合物及其制备方法和用途
TWI763772B (zh) * 2017-01-30 2022-05-11 德商麥克專利有限公司 電子裝置之有機元件的形成方法
KR20210083347A (ko) * 2018-11-06 2021-07-06 메르크 파텐트 게엠베하 전자 디바이스의 유기 소자의 형성 방법
CN111876020B (zh) * 2020-08-06 2021-11-05 中国科学院长春应用化学研究所 一种有机发光材料墨水及其制备方法和喷墨打印方法
WO2024024508A1 (ja) * 2022-07-25 2024-02-01 富士フイルム株式会社 組成物、ならびに、膜、光学フィルタ、固体撮像素子、画像表示装置、赤外線センサおよびカメラモジュールの製造方法

Family Cites Families (58)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE927152C (de) 1952-02-23 1955-05-02 Huels Chemische Werke Ag Druckpasten
US4378302A (en) * 1980-12-16 1983-03-29 General Electric Company Red perylene dichroic dye containing liquid crystal formulations
JPS5964678A (ja) * 1982-10-04 1984-04-12 Nippon Telegr & Teleph Corp <Ntt> インクジエツト記録用インク
JPS5971372A (ja) * 1982-10-15 1984-04-23 Oki Electric Ind Co Ltd インキジエツト用インキ
US4713198A (en) 1984-04-27 1987-12-15 Sangamo Weston, Inc. High temperature plastic scintillators
JPS62243285A (ja) 1986-04-14 1987-10-23 松下電器産業株式会社 エレクトロルミネツセンスパネル及びその形成方法
JPS62292871A (ja) * 1986-06-13 1987-12-19 Fuji Xerox Co Ltd 記録用組成物
JPS63264684A (ja) * 1986-12-05 1988-11-01 Dainippon Ink & Chem Inc インク組成物
JPS6416880A (en) * 1987-07-10 1989-01-20 Fuji Photo Film Co Ltd Recording liquid
US5091004A (en) * 1987-09-22 1992-02-25 Dainippon Ink And Chemicals, Inc. Ink composition
JPH01161350A (ja) * 1987-12-18 1989-06-26 Konica Corp 平版印刷版を用いた印刷方法
US5006370A (en) * 1988-10-11 1991-04-09 Ethyl Corporation Compositions for production of electronic coatings
US5068131A (en) * 1988-10-11 1991-11-26 Ethyl Corporation Method for production of electronic coatings
US4855120A (en) * 1988-10-24 1989-08-08 Ethyl Corporation Production of silane and useful coproducts
DE3934329A1 (de) * 1989-10-13 1991-04-18 Basf Ag Polymerisierbare perylen-3,4,9,10-tetracarbonsaeurebisimide sowie deren polymerisate
JPH04153280A (ja) * 1990-10-16 1992-05-26 Seiko Epson Corp インクジェット記録用インク
US5443922A (en) * 1991-11-07 1995-08-22 Konica Corporation Organic thin film electroluminescence element
JPH05224008A (ja) * 1992-02-13 1993-09-03 Toray Ind Inc カラ−フィルタ
AU661382B2 (en) * 1992-04-02 1995-07-20 Nippon Paper Industries Co. Ltd. Novel bis-dithiobenzilnickel complexes and benzoin derivatives
JPH069910A (ja) * 1992-06-26 1994-01-18 Seiko Epson Corp インク組成物
JP3644458B2 (ja) * 1995-02-13 2005-04-27 ソニー株式会社 記録方法及び記録液
JP3036436B2 (ja) 1996-06-19 2000-04-24 セイコーエプソン株式会社 アクティブマトリックス型有機ｅｌ表示体の製造方法
US6207301B1 (en) * 1996-08-21 2001-03-27 Sumitomo Chemical Company, Limited Polymer fluorescent substance and organic electroluminescence device
JP3899566B2 (ja) * 1996-11-25 2007-03-28 セイコーエプソン株式会社 有機ｅｌ表示装置の製造方法
ATE308224T1 (de) 1997-03-19 2005-11-15 Fuji Photo Film Co Ltd Elektrolumineszente vorrichtung
JPH10321369A (ja) 1997-03-19 1998-12-04 Fuji Photo Film Co Ltd エレクトロルミネツセンスデバイス
JP3415741B2 (ja) * 1997-03-31 2003-06-09 東レ・ダウコーニング・シリコーン株式会社 電気絶縁性薄膜形成用組成物および電気絶縁性薄膜の形成方法
US6309763B1 (en) * 1997-05-21 2001-10-30 The Dow Chemical Company Fluorene-containing polymers and electroluminescent devices therefrom
US5998045A (en) * 1997-07-03 1999-12-07 International Business Machines Corporation Polymeric light-emitting device
US6843937B1 (en) 1997-07-16 2005-01-18 Seiko Epson Corporation Composition for an organic EL element and method of manufacturing the organic EL element
JP3911775B2 (ja) 1997-07-30 2007-05-09 セイコーエプソン株式会社 有機ｅｌ素子の製造方法
JPH1154272A (ja) * 1997-07-31 1999-02-26 Seiko Epson Corp 発光ディスプレイの製造方法
DE69834395T2 (de) 1997-09-02 2007-02-08 Seiko Epson Corp. Verfahren zur herstellung einer organischen elektrolumineszenten vorrichtung
US6403236B1 (en) * 1997-09-04 2002-06-11 Sumitomo Chemical Company, Limited Polymer light emitting device
ATE262264T1 (de) 1997-09-05 2004-04-15 Cambridge Display Tech Ltd Transportschichten in self-assembly-technik für oled's
US6497969B2 (en) * 1997-09-05 2002-12-24 Nessdisplay Co., Ltd. Electroluminescent device having an organic layer including polyimide
AU9451098A (en) 1997-10-14 1999-05-03 Patterning Technologies Limited Method of forming an electronic device
US5777070A (en) * 1997-10-23 1998-07-07 The Dow Chemical Company Process for preparing conjugated polymers
JP3104223B2 (ja) * 1997-11-06 2000-10-30 日本電気株式会社 有機エレクトロルミネッセント素子
WO1999048337A1 (en) 1998-03-13 1999-09-23 Cambridge Display Technology Ltd. Electroluminescent devices
JP3823602B2 (ja) 1998-06-10 2006-09-20 住友化学株式会社 高分子蛍光体および有機エレクトロルミネッセンス素子
US6403237B1 (en) 1998-06-10 2002-06-11 Sumitomo Chemical Co., Ltd. Polymeric fluorescent substance and organic electroluminescence device
JP2000077187A (ja) * 1998-06-17 2000-03-14 Honda Motor Co Ltd 有機エレクトロルミネッセンス素子
JP3900724B2 (ja) * 1999-01-11 2007-04-04 セイコーエプソン株式会社 有機ｅｌ素子の製造方法および有機ｅｌ表示装置
US6228228B1 (en) * 1999-02-23 2001-05-08 Sarnoff Corporation Method of making a light-emitting fiber
GB9917356D0 (en) 1999-07-24 1999-09-22 Univ Cambridge Tech Aromatic monomers and polymers for optoelectronic devices
GB9920543D0 (en) 1999-08-31 1999-11-03 Cambridge Display Tech Ltd A formulation for depositing a light-emitting polymer layer
JP2001076880A (ja) * 1999-08-31 2001-03-23 Sumitomo Chem Co Ltd 有機エレクトロルミネッセンス素子
JP2003508890A (ja) * 1999-09-01 2003-03-04 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング 電界ルミネセンスデバイスおよびその製造法
GB2360489A (en) * 2000-03-23 2001-09-26 Seiko Epson Corp Deposition of soluble materials
JP4347569B2 (ja) * 2001-02-27 2009-10-21 ケンブリッジ ディスプレイ テクノロジー リミテッド 基板に材料を蒸着する方法
CN100377380C (zh) * 2001-02-28 2008-03-26 剑桥显示技术有限公司 供沉积在基材上的材料配方和方法
JP4153280B2 (ja) 2002-09-27 2008-09-24 シャープ株式会社 光ピックアップ装置
DE102004007777A1 (de) * 2004-02-18 2005-09-08 Covion Organic Semiconductors Gmbh Lösungen organischer Halbleiter
DE102004023276A1 (de) * 2004-05-11 2005-12-01 Covion Organic Semiconductors Gmbh Lösungen organischer Halbleiter
JP5228341B2 (ja) * 2007-03-14 2013-07-03 セイコーエプソン株式会社 有機エレクトロルミネッセンス素子の製造方法及び有機トランジスタの製造方法
WO2012001744A1 (ja) * 2010-07-01 2012-01-05 パナソニック株式会社 有機発光素子用インク、有機発光素子の製造方法、有機表示パネル、有機表示装置、有機発光装置、インク、機能層の形成方法、および有機発光素子
JP2012028180A (ja) * 2010-07-23 2012-02-09 Panasonic Corp 表示装置の製造方法および表示装置の製造装置

Also Published As

Publication number Publication date
US20120263867A1 (en) 2012-10-18
US9620719B2 (en) 2017-04-11
JP2011042794A (ja) 2011-03-03
JP4731629B2 (ja) 2011-07-27
CN1310930A (zh) 2001-08-29
EP1083775B1 (de) 2010-10-13
KR20010043918A (ko) 2001-05-25
US20080305245A1 (en) 2008-12-11
JP2010157751A (ja) 2010-07-15
US20090186161A1 (en) 2009-07-23
US8187669B2 (en) 2012-05-29
DE60045092D1 (de) 2010-11-25
KR100495740B1 (ko) 2005-06-17
JP4486261B2 (ja) 2010-06-23
JP5286339B2 (ja) 2013-09-11
EP1083775A4 (de) 2005-12-07
US20050156148A1 (en) 2005-07-21
WO2000059267A1 (fr) 2000-10-05
EP1083775A1 (de) 2001-03-14
US8231932B2 (en) 2012-07-31
TW508975B (en) 2002-11-01
US6878312B1 (en) 2005-04-12

Similar Documents

Publication Publication Date Title
HK1128714A1 (en) Composition, method for preparing film, and functional element and method for preparing the same
AU3734799A (en) 5-demethoxyfumagillol derivatives and processes for preparing the same
HUP0203746A3 (en) Novel composition and method for stabilizing the same
HK1018780A1 (en) 6-Phenylpyridine-2-ylamine derivatives, the composition and use thereof.
HUP0201073A2 (en) Hyperbranched copolyamide, composition based on said hyperbranched copolyamide and method for obtaining same
HRP20020375A2 (en) Substituted 2-thio-3,5-dicyano-4-aryl-6-aminopyridines and the use thereof
AU2001236148A1 (en) Polyorganosilsesquioxane and process for preparing the same
EP1097961A4 (de) Mikroporöser film aus polyolefin und dessen herstellungsverfahren
EP1097962A4 (de) Mikroporöser film aus polyolefin und dessen herstellungsverfahren
HK1044338A1 (en) 5-Pyridyl-1, 3-azole compounds, process for producing the same and use thereof
ZA200203367B (en) Antidiabetic formulation and method.
IL138280A0 (en) 20-KETO-11β-ARYLSTERIODS, PHARMACEUTICAL COMPOSITIONS CONTAINING THE SAME AND METHODS FOR THE PREPARATION THEREOF
MXPA01005543A (es) Formulacion de liberacion controlada que consta de gnrh-ii.
ZA200004956B (en) Vaccine composition.
AU7773001A (en) Acylacetonitriles, process for preparation thereof and miticides containing the same
GB2345286B (en) Photoresist copolymer, process for preparing the same and photoresist composition comprising the same
AU2001235695A1 (en) Method for preparing functionalised polyalkylenimines, composition containing same and uses thereof
EP1158314A4 (de) Mattenaehnlicher hochtransparenter film
GB2336592B (en) Polymer for photoresist,photoresist composition containing the same,and preparation method thereof
AU1029501A (en) Cleaning-in-place composition and method for using the same
EP0978524A4 (de) Fluorpolymere, verfahren zu ihrer herstellung und ihre verwendung
PL351616A1 (en) Polyolefin compositions, method for the production and use thereof
SG90261A1 (en) Propylene-based copolymer, process for producing the same and film comprising the same
EP1234869A4 (de) Reinigungszusammensetzung und verfahren zur herstellung derselben
GB2359635B (en) Photographic element, compound, and process