HK1092280A1 - Stage system, exposure apparatus and exposure method - Google Patents

Stage system, exposure apparatus and exposure method

Info

Publication number
HK1092280A1
HK1092280A1 HK06112663.5A HK06112663A HK1092280A1 HK 1092280 A1 HK1092280 A1 HK 1092280A1 HK 06112663 A HK06112663 A HK 06112663A HK 1092280 A1 HK1092280 A1 HK 1092280A1
Authority
HK
Hong Kong
Prior art keywords
holder
substrate
exposure
liquid
stage system
Prior art date
Application number
HK06112663.5A
Other languages
English (en)
Inventor
Yasufumi Nishii
Kenichi Shiraishi
Hirotaka Kohno
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1092280A1 publication Critical patent/HK1092280A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
HK06112663.5A 2003-12-15 2006-11-17 Stage system, exposure apparatus and exposure method HK1092280A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003416712 2003-12-15
PCT/JP2004/018702 WO2005057636A1 (ja) 2003-12-15 2004-12-15 ステージ装置、露光装置、及び露光方法

Publications (1)

Publication Number Publication Date
HK1092280A1 true HK1092280A1 (en) 2007-02-02

Family

ID=34675168

Family Applications (1)

Application Number Title Priority Date Filing Date
HK06112663.5A HK1092280A1 (en) 2003-12-15 2006-11-17 Stage system, exposure apparatus and exposure method

Country Status (9)

Country Link
US (3) US7982857B2 (ko)
EP (1) EP1699073B1 (ko)
JP (8) JP4720506B2 (ko)
KR (8) KR101281397B1 (ko)
CN (1) CN100487860C (ko)
AT (1) ATE491221T1 (ko)
DE (1) DE602004030481D1 (ko)
HK (1) HK1092280A1 (ko)
WO (1) WO2005057636A1 (ko)

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