DE69433245D1 - Herstellungsverfahren für Halbleiterbauelement mit Kondensator von hoher dielektrischer Konstante - Google Patents
Herstellungsverfahren für Halbleiterbauelement mit Kondensator von hoher dielektrischer KonstanteInfo
- Publication number
- DE69433245D1 DE69433245D1 DE69433245T DE69433245T DE69433245D1 DE 69433245 D1 DE69433245 D1 DE 69433245D1 DE 69433245 T DE69433245 T DE 69433245T DE 69433245 T DE69433245 T DE 69433245T DE 69433245 D1 DE69433245 D1 DE 69433245D1
- Authority
- DE
- Germany
- Prior art keywords
- capacitor
- manufacturing
- semiconductor device
- dielectric constant
- high dielectric
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000003990 capacitor Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/55—Capacitors with a dielectric comprising a perovskite structure material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B12/00—Dynamic random access memory [DRAM] devices
- H10B12/01—Manufacture or treatment
- H10B12/02—Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
- H10B12/03—Making the capacitor or connections thereto
- H10B12/033—Making the capacitor or connections thereto the capacitor extending over the transistor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B51/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory transistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B51/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory transistors
- H10B51/30—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory transistors characterised by the memory core region
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10B—ELECTRONIC MEMORY DEVICES
- H10B53/00—Ferroelectric RAM [FeRAM] devices comprising ferroelectric memory capacitors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
- H01L28/75—Electrodes comprising two or more layers, e.g. comprising a barrier layer and a metal layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/958—Passivation layer
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Semiconductor Integrated Circuits (AREA)
- Semiconductor Memories (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (8)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5194617A JP2845727B2 (ja) | 1993-08-05 | 1993-08-05 | 半導体装置の製造方法 |
JP5194618A JP2960287B2 (ja) | 1993-08-05 | 1993-08-05 | 半導体装置およびその製造方法 |
JP19461793 | 1993-08-05 | ||
JP19461893 | 1993-08-05 | ||
JP2651494 | 1994-02-24 | ||
JP6026514A JP2912816B2 (ja) | 1994-02-24 | 1994-02-24 | 半導体装置および半導体装置の製造方法 |
JP5555294 | 1994-03-25 | ||
JP06055552A JP3110605B2 (ja) | 1994-03-25 | 1994-03-25 | 半導体装置およびその製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69433245D1 true DE69433245D1 (de) | 2003-11-20 |
DE69433245T2 DE69433245T2 (de) | 2004-07-22 |
Family
ID=27458511
Family Applications (5)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69432643T Expired - Fee Related DE69432643T2 (de) | 1993-08-05 | 1994-08-03 | Halbleiterbauelement mit Kondensator |
DE69433244T Expired - Fee Related DE69433244T2 (de) | 1993-08-05 | 1994-08-03 | Herstellungsverfahren für Halbleiterbauelement mit Kondensator von hoher dielektrischer Konstante |
DE69433245T Expired - Fee Related DE69433245T2 (de) | 1993-08-05 | 1994-08-03 | Herstellungsverfahren für Halbleiterbauelement mit Kondensator von hoher dielektrischer Konstante |
DE69434606T Active DE69434606T8 (de) | 1993-08-05 | 1994-08-03 | Halbleiterbauelement mit Kondensator und dessen Herstellungsverfahren |
DE69426208T Expired - Fee Related DE69426208T2 (de) | 1993-08-05 | 1994-08-03 | Halbleiterbauelement mit Kondensator und dessen Herstellungsverfahren |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69432643T Expired - Fee Related DE69432643T2 (de) | 1993-08-05 | 1994-08-03 | Halbleiterbauelement mit Kondensator |
DE69433244T Expired - Fee Related DE69433244T2 (de) | 1993-08-05 | 1994-08-03 | Herstellungsverfahren für Halbleiterbauelement mit Kondensator von hoher dielektrischer Konstante |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69434606T Active DE69434606T8 (de) | 1993-08-05 | 1994-08-03 | Halbleiterbauelement mit Kondensator und dessen Herstellungsverfahren |
DE69426208T Expired - Fee Related DE69426208T2 (de) | 1993-08-05 | 1994-08-03 | Halbleiterbauelement mit Kondensator und dessen Herstellungsverfahren |
Country Status (5)
Country | Link |
---|---|
US (7) | US5624864A (de) |
EP (6) | EP0738014B1 (de) |
KR (1) | KR0157099B1 (de) |
CN (2) | CN1038210C (de) |
DE (5) | DE69432643T2 (de) |
Families Citing this family (100)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0574275B1 (de) * | 1992-06-12 | 1998-04-15 | Matsushita Electronics Corporation | Halbleiterbauelement mit Kondensator |
JP3045928B2 (ja) * | 1994-06-28 | 2000-05-29 | 松下電子工業株式会社 | 半導体装置およびその製造方法 |
JPH0870105A (ja) * | 1994-08-30 | 1996-03-12 | Mitsubishi Electric Corp | 半導体記憶装置およびその製造方法 |
JP3246274B2 (ja) * | 1995-06-22 | 2002-01-15 | 松下電器産業株式会社 | 半導体装置 |
JP3417167B2 (ja) * | 1995-09-29 | 2003-06-16 | ソニー株式会社 | 半導体メモリ素子のキャパシタ構造及びその形成方法 |
US5571746A (en) * | 1995-10-19 | 1996-11-05 | Chartered Semiconductor Manufacturing Pte Ltd. | Method of forming a back end capacitor with high unit capacitance |
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US6815762B2 (en) * | 1997-05-30 | 2004-11-09 | Hitachi, Ltd. | Semiconductor integrated circuit device and process for manufacturing the same including spacers on bit lines |
JP2954877B2 (ja) * | 1996-06-18 | 1999-09-27 | 松下電子工業株式会社 | 容量素子の製造方法 |
EP0837504A3 (de) | 1996-08-20 | 1999-01-07 | Ramtron International Corporation | Teilweise oder ganz eingekapselte ferroelektrische Anordnung |
US6027947A (en) * | 1996-08-20 | 2000-02-22 | Ramtron International Corporation | Partially or completely encapsulated top electrode of a ferroelectric capacitor |
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JP3257587B2 (ja) | 1997-05-23 | 2002-02-18 | 日本電気株式会社 | 誘電体膜を用いた半導体装置の製造方法 |
JP3149817B2 (ja) * | 1997-05-30 | 2001-03-26 | 日本電気株式会社 | 半導体装置およびその製造方法 |
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JP3484324B2 (ja) * | 1997-07-29 | 2004-01-06 | シャープ株式会社 | 半導体メモリ素子 |
JP3090198B2 (ja) * | 1997-08-21 | 2000-09-18 | 日本電気株式会社 | 半導体装置の構造およびその製造方法 |
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1994
- 1994-08-03 DE DE69432643T patent/DE69432643T2/de not_active Expired - Fee Related
- 1994-08-03 DE DE69433244T patent/DE69433244T2/de not_active Expired - Fee Related
- 1994-08-03 DE DE69433245T patent/DE69433245T2/de not_active Expired - Fee Related
- 1994-08-03 EP EP96110013A patent/EP0738014B1/de not_active Expired - Lifetime
- 1994-08-03 EP EP96110010A patent/EP0739037B1/de not_active Expired - Lifetime
- 1994-08-03 EP EP96110011A patent/EP0738013B1/de not_active Expired - Lifetime
- 1994-08-03 EP EP96110018A patent/EP0736905B1/de not_active Expired - Lifetime
- 1994-08-03 EP EP94112106A patent/EP0642167A3/de not_active Ceased
- 1994-08-03 EP EP96110012A patent/EP0738009B1/de not_active Expired - Lifetime
- 1994-08-03 DE DE69434606T patent/DE69434606T8/de active Active
- 1994-08-03 DE DE69426208T patent/DE69426208T2/de not_active Expired - Fee Related
- 1994-08-04 KR KR1019940019245A patent/KR0157099B1/ko not_active IP Right Cessation
- 1994-08-04 US US08/284,984 patent/US5624864A/en not_active Expired - Lifetime
- 1994-08-05 CN CN94109461A patent/CN1038210C/zh not_active Expired - Fee Related
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1997
- 1997-04-28 US US08/844,108 patent/US5780351A/en not_active Expired - Lifetime
- 1997-10-27 CN CN97121332A patent/CN1107345C/zh not_active Expired - Fee Related
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1998
- 1998-05-04 US US09/071,534 patent/US6169304B1/en not_active Expired - Fee Related
- 1998-05-04 US US09/071,122 patent/US6015987A/en not_active Expired - Lifetime
- 1998-05-04 US US09/071,121 patent/US6107657A/en not_active Expired - Fee Related
- 1998-05-04 US US09/071,795 patent/US6333528B1/en not_active Expired - Fee Related
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2000
- 2000-06-08 US US09/589,520 patent/US6294438B1/en not_active Expired - Fee Related
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