DE69328197D1 - Transparente, leitende schicht, transparentes, leitendes basismaterial und leitendes material - Google Patents
Transparente, leitende schicht, transparentes, leitendes basismaterial und leitendes materialInfo
- Publication number
- DE69328197D1 DE69328197D1 DE69328197T DE69328197T DE69328197D1 DE 69328197 D1 DE69328197 D1 DE 69328197D1 DE 69328197 T DE69328197 T DE 69328197T DE 69328197 T DE69328197 T DE 69328197T DE 69328197 D1 DE69328197 D1 DE 69328197D1
- Authority
- DE
- Germany
- Prior art keywords
- conductive
- transparent
- base material
- conductive layer
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G11/00—Compounds of cadmium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31507—Of polycarbonate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
- Y10T428/31515—As intermediate layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31551—Of polyamidoester [polyurethane, polyisocyanate, polycarbamate, etc.]
- Y10T428/31609—Particulate metal or metal compound-containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31786—Of polyester [e.g., alkyd, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31935—Ester, halide or nitrile of addition polymer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
- Y10T428/31938—Polymer of monoethylenically unsaturated hydrocarbon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31942—Of aldehyde or ketone condensation product
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Non-Insulated Conductors (AREA)
- Physical Vapour Deposition (AREA)
- Conductive Materials (AREA)
- Compositions Of Oxide Ceramics (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP33473192 | 1992-12-15 | ||
JP33474592 | 1992-12-15 | ||
JP33644792 | 1992-12-16 | ||
JP33644692 | 1992-12-16 | ||
PCT/JP1993/001821 WO1994013851A1 (en) | 1992-12-15 | 1993-12-15 | Transparent conductive film, transparent conductive base material, and conductive material |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69328197D1 true DE69328197D1 (de) | 2000-04-27 |
DE69328197T2 DE69328197T2 (de) | 2000-08-17 |
Family
ID=27480520
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69328197T Expired - Lifetime DE69328197T2 (de) | 1992-12-15 | 1993-12-15 | Transparente, leitende schicht, transparentes, leitendes basismaterial und leitendes material |
Country Status (6)
Country | Link |
---|---|
US (1) | US5972527A (de) |
EP (1) | EP0677593B1 (de) |
KR (1) | KR100306565B1 (de) |
CA (1) | CA2150724A1 (de) |
DE (1) | DE69328197T2 (de) |
WO (1) | WO1994013851A1 (de) |
Families Citing this family (83)
Publication number | Priority date | Publication date | Assignee | Title |
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JP3947575B2 (ja) * | 1994-06-10 | 2007-07-25 | Hoya株式会社 | 導電性酸化物およびそれを用いた電極 |
EP0707320A1 (de) * | 1994-10-13 | 1996-04-17 | AT&T Corp. | Durchsichtige Leiter mit Zink-Indium-Oxide und Verfahren zur Herstellung dieser Filme |
JP3361451B2 (ja) * | 1998-03-24 | 2003-01-07 | 出光興産株式会社 | 反射型液晶表示装置用カラーフィルタ及びそれを用いた反射型液晶表示装置 |
JP4240423B2 (ja) * | 1998-04-24 | 2009-03-18 | 中部キレスト株式会社 | 金属酸化物薄膜形成用ターゲット材およびその製造方法、並びに該ターゲット材を使用した金属酸化物薄膜の形成法 |
DE19822570C1 (de) * | 1998-05-20 | 1999-07-15 | Heraeus Gmbh W C | Verfahren zum Herstellen eines Indium-Zinn-Oxid-Formkörpers |
CN1281544C (zh) * | 1998-08-31 | 2006-10-25 | 出光兴产株式会社 | 透明导电膜用靶、透明导电材料、透明导电玻璃及透明导电薄膜 |
EP1080497A1 (de) * | 1999-03-08 | 2001-03-07 | Koninklijke Philips Electronics N.V. | Anzeige |
JP2000330134A (ja) * | 1999-03-16 | 2000-11-30 | Furontekku:Kk | 薄膜トランジスタ基板および液晶表示装置 |
CN1316057C (zh) * | 1999-05-10 | 2007-05-16 | 日矿金属株式会社 | 溅射靶 |
US6669830B1 (en) * | 1999-11-25 | 2003-12-30 | Idemitsu Kosan Co., Ltd. | Sputtering target, transparent conductive oxide, and process for producing the sputtering target |
JP3961172B2 (ja) | 1999-11-26 | 2007-08-22 | アルプス電気株式会社 | 酸化物透明導電膜と酸化物透明導電膜形成用ターゲットおよび先の酸化物透明導電膜を備えた基板の製造方法と電子機器および液晶表示装置 |
CN1362936A (zh) * | 2000-02-04 | 2002-08-07 | 大塚化学株式会社 | 铟锌氧化物基六万晶层状化合物 |
EP1204149B1 (de) * | 2000-10-30 | 2007-06-27 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Deposition von Schichtsystemen und deren Verwendung |
JP2002260447A (ja) * | 2000-11-17 | 2002-09-13 | Furuya Kinzoku:Kk | 透明導電膜形成用材料とその製造方法、透明導電膜、タッチパネルとその製造方法、プラズマディスプレイとその製造方法、太陽電池とその製造方法、導電性フィルムとその製造方法、熱線反射ガラスとその製造方法、液晶表示装置とその製造方法、無機エレクトロルミネッセンス素子とその製造方法、及び、有機エレクトロルミネッセンス素子とその製造方法 |
US6537667B2 (en) | 2000-11-21 | 2003-03-25 | Nissan Chemical Industries, Ltd. | Electro-conductive oxide particle and process for its production |
US6419804B1 (en) * | 2000-11-22 | 2002-07-16 | Hsu Cheng-Shen | Contamination-resistant thin film deposition method |
KR100778835B1 (ko) * | 2000-12-28 | 2007-11-22 | 엘지.필립스 엘시디 주식회사 | 액정표시장치의 제조방법 |
KR100776505B1 (ko) * | 2000-12-30 | 2007-11-16 | 엘지.필립스 엘시디 주식회사 | 액정표시장치의 화소전극 제조 방법 |
JP2002343562A (ja) * | 2001-05-11 | 2002-11-29 | Pioneer Electronic Corp | 発光ディスプレイ装置及びその製造方法 |
EP1408137B1 (de) | 2001-07-17 | 2012-04-18 | Idemitsu Kosan Co., Ltd. | Sputtertarget für die abscheidung eines transparenten, leitfähigen films |
KR101002504B1 (ko) * | 2001-08-02 | 2010-12-17 | 이데미쓰 고산 가부시키가이샤 | 스퍼터링 타겟, 투명 전도막 및 이들의 제조방법 |
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US20050199861A1 (en) * | 2001-12-12 | 2005-09-15 | Wu L. W. | Manufacturing method for transparent and conductive coatings |
KR101002492B1 (ko) | 2002-08-02 | 2010-12-17 | 이데미쓰 고산 가부시키가이샤 | 스퍼터링 타겟, 소결체, 이들을 사용하여 제조한 도전막,유기 el 소자, 및 이것에 사용하는 기판 |
US7439007B2 (en) * | 2002-12-20 | 2008-10-21 | Ricoh Company, Ltd. | Phase change information recording medium having multiple layers and recording and playback method for the medium |
US7635440B2 (en) * | 2003-03-04 | 2009-12-22 | Nippon Mining & Metals Co., Ltd. | Sputtering target, thin film for optical information recording medium and process for producing the same |
US7825021B2 (en) * | 2004-01-16 | 2010-11-02 | Semiconductor Energy Laboratory Co., Ltd. | Method for manufacturing display device |
CN103121799A (zh) | 2004-03-09 | 2013-05-29 | 出光兴产株式会社 | 溅射靶、透明导电膜、薄膜晶体管、薄膜晶体管基板及其制造方法及液晶显示装置 |
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KR101314946B1 (ko) * | 2005-09-27 | 2013-10-04 | 이데미쓰 고산 가부시키가이샤 | 스퍼터링 타겟, 투명 도전막 및 터치 패널용 투명 전극 |
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CN105161543A (zh) * | 2009-09-24 | 2015-12-16 | 株式会社半导体能源研究所 | 半导体器件及其制造方法 |
JP4891381B2 (ja) | 2009-11-19 | 2012-03-07 | 出光興産株式会社 | In−Ga−Zn系焼結体、及びスパッタリングターゲット |
JP4843083B2 (ja) | 2009-11-19 | 2011-12-21 | 出光興産株式会社 | In−Ga−Zn系酸化物スパッタリングターゲット |
BR112012029813A2 (pt) | 2010-05-26 | 2017-03-07 | Univ Toledo | estrutura de célula fotovoltaica, método para fazer uma camada de interface de dispersão de luz para uma célula fotovoltaica e estrutura de célula fotovoltaica (pv) tendo uma camada de interface de dispersão |
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JPS59119611A (ja) * | 1982-12-27 | 1984-07-10 | 松下電器産業株式会社 | 透明導電膜のパタ−ン形成方法 |
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JPH0244263B2 (ja) * | 1987-04-22 | 1990-10-03 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | Ingazn7o10deshimesarerurotsuhoshokeinosojokozoojusurukagobutsuoyobisonoseizoho |
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US5105291A (en) * | 1989-11-20 | 1992-04-14 | Ricoh Company, Ltd. | Liquid crystal display cell with electrodes of substantially amorphous metal oxide having low resistivity |
JPH03254009A (ja) * | 1990-03-05 | 1991-11-13 | Mitsubishi Materials Corp | 白色導電性粉末の製造方法 |
FR2662153A1 (fr) * | 1990-05-16 | 1991-11-22 | Saint Gobain Vitrage Int | Produit a substrat en verre portant une couche conductrice transparente contenant du zinc et de l'indium et procede pour l'obtenir. |
US5510173A (en) * | 1993-08-20 | 1996-04-23 | Southwall Technologies Inc. | Multiple layer thin films with improved corrosion resistance |
-
1993
- 1993-12-15 DE DE69328197T patent/DE69328197T2/de not_active Expired - Lifetime
- 1993-12-15 CA CA 2150724 patent/CA2150724A1/en not_active Abandoned
- 1993-12-15 KR KR1019950702423A patent/KR100306565B1/ko active IP Right Grant
- 1993-12-15 WO PCT/JP1993/001821 patent/WO1994013851A1/ja active IP Right Grant
- 1993-12-15 EP EP94903007A patent/EP0677593B1/de not_active Expired - Lifetime
- 1993-12-15 US US08/446,584 patent/US5972527A/en not_active Expired - Lifetime
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---|---|
DE69328197T2 (de) | 2000-08-17 |
EP0677593B1 (de) | 2000-03-22 |
KR100306565B1 (ko) | 2001-11-30 |
EP0677593A4 (de) | 1996-10-23 |
WO1994013851A1 (en) | 1994-06-23 |
EP0677593A1 (de) | 1995-10-18 |
KR950704533A (ko) | 1995-11-20 |
CA2150724A1 (en) | 1994-06-23 |
US5972527A (en) | 1999-10-26 |
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