DE69227343D1 - Vorrichtung zur Kontrolle einer Entwicklerlösung - Google Patents

Vorrichtung zur Kontrolle einer Entwicklerlösung

Info

Publication number
DE69227343D1
DE69227343D1 DE69227343T DE69227343T DE69227343D1 DE 69227343 D1 DE69227343 D1 DE 69227343D1 DE 69227343 T DE69227343 T DE 69227343T DE 69227343 T DE69227343 T DE 69227343T DE 69227343 D1 DE69227343 D1 DE 69227343D1
Authority
DE
Germany
Prior art keywords
controlling
developer solution
developer
solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69227343T
Other languages
English (en)
Other versions
DE69227343T2 (de
Inventor
Toshimoto Nakagawa
Kouzo Tsukada
Shu Ogawa
Shinichiro Shiotsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nagase and Co Ltd
Hirama Rika Kenkyusho Ltd
Original Assignee
Nagase and Co Ltd
Hirama Rika Kenkyusho Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nagase and Co Ltd, Hirama Rika Kenkyusho Ltd filed Critical Nagase and Co Ltd
Publication of DE69227343D1 publication Critical patent/DE69227343D1/de
Application granted granted Critical
Publication of DE69227343T2 publication Critical patent/DE69227343T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
DE69227343T 1991-08-07 1992-08-07 Vorrichtung zur Kontrolle einer Entwicklerlösung Expired - Lifetime DE69227343T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3222130A JP2561578B2 (ja) 1991-08-07 1991-08-07 現像液管理装置

Publications (2)

Publication Number Publication Date
DE69227343D1 true DE69227343D1 (de) 1998-11-26
DE69227343T2 DE69227343T2 (de) 1999-03-18

Family

ID=16777642

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69227343T Expired - Lifetime DE69227343T2 (de) 1991-08-07 1992-08-07 Vorrichtung zur Kontrolle einer Entwicklerlösung

Country Status (5)

Country Link
US (1) US5223881A (de)
EP (1) EP0527058B1 (de)
JP (1) JP2561578B2 (de)
KR (1) KR0119116B1 (de)
DE (1) DE69227343T2 (de)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
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US5479233A (en) * 1992-07-06 1995-12-26 Fuji Photo Film Co., Ltd. Photosensitive lithographic printing plate processing apparatus
US5822039A (en) * 1993-02-10 1998-10-13 Noritsu Koki Co., Ltd. Photographic printing and developing apparatus
TW256929B (de) * 1993-12-29 1995-09-11 Hirama Rika Kenkyusho Kk
US5416552A (en) * 1994-01-28 1995-05-16 Surface Tek, Inc. Apparatus and method for replenishing developer
JP3238834B2 (ja) * 1994-10-12 2001-12-17 松下電器産業株式会社 薄膜パターンの形成方法および化学反応装置
JPH09162094A (ja) * 1995-12-05 1997-06-20 Tokuyama Corp 現像原液の希釈方法
JP3093975B2 (ja) * 1996-07-02 2000-10-03 株式会社平間理化研究所 レジスト剥離液管理装置
KR20000062334A (ko) * 1996-12-25 2000-10-25 나카노 가츠히코 패턴 가공용 약액 집중 관리 장치
JP3795627B2 (ja) * 1997-05-15 2006-07-12 東芝電子エンジニアリング株式会社 レジストの現像方法
JPH1184679A (ja) * 1997-09-08 1999-03-26 Nagase & Co Ltd 感光性樹脂の連続現像方法及び現像開始剤
JP2000081700A (ja) * 1998-07-02 2000-03-21 Nippon Zeon Co Ltd パタ―ン形成方法
JP3728945B2 (ja) 1998-10-30 2005-12-21 オルガノ株式会社 フォトレジスト現像廃液からの現像液の回収再利用方法及び装置
TWI298423B (en) * 2001-02-06 2008-07-01 Nagase & Co Ltd Developer producing equipment and method
JP3795342B2 (ja) * 2001-04-05 2006-07-12 シャープ株式会社 ハイブリッド型レジスト現像装置、レジスト現像方法および液晶ディスプレイの製造方法
JP3497841B2 (ja) * 2001-06-01 2004-02-16 長瀬産業株式会社 現像廃液再生装置及び現像廃液再生方法
JP2003033760A (ja) * 2001-07-26 2003-02-04 Kemitekku:Kk 現像液再生装置
US6752545B2 (en) * 2001-08-16 2004-06-22 Nagase & Co., Ltd. Alkali-based treating liquid, treating liquid adjusting method and equipment, treating liquid supplying method and equipment
US20030073242A1 (en) * 2001-10-11 2003-04-17 Kitchens Keith G. Apparatus for controlling stripping solutions methods thereof
JP2004101999A (ja) * 2002-09-11 2004-04-02 Mitsubishi Chemical Engineering Corp 現像液のリサイクル供給装置
TW575796B (en) * 2002-09-27 2004-02-11 Au Optronics Corp System and method for recovering TMAH developer
JP3894104B2 (ja) * 2002-11-15 2007-03-14 東京エレクトロン株式会社 現像方法及び現像装置及び現像液再生装置
JP2004219452A (ja) * 2003-01-09 2004-08-05 Fuji Photo Film Co Ltd 感光性平版印刷版用自動現像装置の現像補充方法
CN101452224B (zh) * 2003-06-27 2010-12-01 友达光电股份有限公司 氢氧化四甲铵显影液的回收系统及其方法
JP4366490B2 (ja) * 2003-08-22 2009-11-18 長瀬産業株式会社 現像液供給方法及び装置
US20050076801A1 (en) * 2003-10-08 2005-04-14 Miller Gary Roger Developer system
US7078162B2 (en) * 2003-10-08 2006-07-18 Eastman Kodak Company Developer regenerators
JP4183604B2 (ja) * 2003-12-01 2008-11-19 東京応化工業株式会社 現像装置および現像方法
JP4194541B2 (ja) * 2004-08-05 2008-12-10 東京エレクトロン株式会社 液処理装置、液処理方法及び液状態検出装置
US7153045B2 (en) * 2005-01-07 2006-12-26 Eastman Kodak Company Electro-mechanical system and method for mixing replenishment for plate precursor developers
KR100862987B1 (ko) * 2008-01-28 2008-10-13 주식회사 디엠에스 기판 반송장치
JP5637676B2 (ja) * 2009-11-16 2014-12-10 石原ケミカル株式会社 現像液中のフォトレジスト溶解量の測定方法
JP6713658B2 (ja) 2015-07-22 2020-06-24 株式会社平間理化研究所 現像液の成分濃度測定装置、成分濃度測定方法、現像液管理装置、及び現像液管理方法
JP6721157B2 (ja) * 2015-07-22 2020-07-08 株式会社平間理化研究所 現像液の成分濃度測定方法及び装置、並びに、現像液管理方法及び装置
JP6505534B2 (ja) * 2015-07-22 2019-04-24 株式会社平間理化研究所 現像液の管理方法及び装置
JP2018120900A (ja) 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液管理装置
JP6712415B2 (ja) 2017-01-23 2020-06-24 株式会社平間理化研究所 現像液管理装置
JP2018120893A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液の成分濃度測定装置、及び現像液管理装置
JP6736087B2 (ja) 2017-01-23 2020-08-05 株式会社平間理化研究所 現像液の濃度監視装置、及び現像液管理装置
JP2018120898A (ja) 2017-01-23 2018-08-02 株式会社平間理化研究所 現像装置
JP2018120895A (ja) * 2017-01-23 2018-08-02 株式会社平間理化研究所 現像装置
JP2018120901A (ja) 2017-01-23 2018-08-02 株式会社平間理化研究所 現像装置
JP6763608B2 (ja) 2017-01-23 2020-09-30 株式会社平間理化研究所 現像液の二酸化炭素濃度表示装置、及び現像液管理装置
JP2018120897A (ja) 2017-01-23 2018-08-02 株式会社平間理化研究所 現像液の濃度監視装置、及び現像液管理装置

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8001443A (nl) * 1980-03-11 1981-10-01 Anderson & Vreeland Bv Werkwijze en inrichting voor het nabehandelen van een buigzame drukvorm.
JPS5895349A (ja) * 1981-11-30 1983-06-06 Fuji Photo Film Co Ltd 感光性プレ−トの現像補充液補充方法
JPH0634890B2 (ja) * 1985-07-10 1994-05-11 株式会社日立製作所 薬液調合方法
JPS6264792A (ja) * 1985-09-13 1987-03-23 株式会社島津製作所 超伝導磁場発生装置における保冷用液体補給装置
JPS62131368A (ja) * 1985-12-04 1987-06-13 Nec Corp 給油所における油液の在庫管理システム
JPS62186266A (ja) * 1986-02-12 1987-08-14 Canon Inc 現像装置
JPS62186265A (ja) * 1986-02-12 1987-08-14 Canon Inc 現像装置
JPS63100460A (ja) * 1986-10-16 1988-05-02 Konica Corp 現像処理の安定性等が改良される感光材料の処理方法と自動現像機
JPH067910B2 (ja) * 1987-02-10 1994-02-02 日立プラント建設株式会社 現像原液の希釈装置
US4857750A (en) * 1987-12-17 1989-08-15 Texas Instruments Incorporated Sensor for determining photoresist developer strength
JP2729797B2 (ja) * 1988-01-12 1998-03-18 富士写真フイルム株式会社 感光性平版印刷版の現像方法
US5168296A (en) * 1988-04-20 1992-12-01 Fuji Photo Film Co., Ltd. Method and apparatus for processing photosensitive material
US5121164A (en) * 1988-06-06 1992-06-09 Spectrum Sciences B.V. Method for maintaining a liquid composition
US5055870A (en) * 1989-02-17 1991-10-08 Fuji Photo Film Co., Ltd. Waterless presensitized lithographic printing plate developing apparatus
JPH02254342A (ja) * 1989-03-29 1990-10-15 Hitachi Condenser Co Ltd 現像液の不純物量検出方法
JPH0330314A (ja) * 1989-06-27 1991-02-08 Fujitsu Ltd レジスト現像装置と現像液の管理方法
JPH03107167A (ja) * 1989-09-20 1991-05-07 Fuji Photo Film Co Ltd 感光材料処理装置
JP2979093B2 (ja) * 1989-12-07 1999-11-15 カシオ計算機株式会社 フォトレジストの現像装置

Also Published As

Publication number Publication date
KR0119116B1 (ko) 1997-09-30
JPH0540345A (ja) 1993-02-19
DE69227343T2 (de) 1999-03-18
KR930020228A (ko) 1993-10-19
JP2561578B2 (ja) 1996-12-11
US5223881A (en) 1993-06-29
EP0527058A1 (de) 1993-02-10
EP0527058B1 (de) 1998-10-21

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