JPS6093175A
(ja)
*
|
1983-10-27 |
1985-05-24 |
Nippon Denso Co Ltd |
燃料噴射時期調整装置の噴射時期検出装置
|
DE10059181C2
(de)
*
|
2000-11-29 |
2002-10-24 |
Infineon Technologies Ag |
Integrierter magnetoresistiver Halbleiterspeicher und Herstellungsverfahren dafür
|
WO2003010758A1
(en)
*
|
2001-07-24 |
2003-02-06 |
Seagate Technology Llc |
Write head for high anisotropy media
|
JP4780878B2
(ja)
*
|
2001-08-02 |
2011-09-28 |
ルネサスエレクトロニクス株式会社 |
薄膜磁性体記憶装置
|
FR2832542B1
(fr)
*
|
2001-11-16 |
2005-05-06 |
Commissariat Energie Atomique |
Dispositif magnetique a jonction tunnel magnetique, memoire et procedes d'ecriture et de lecture utilisant ce dispositif
|
JP3866567B2
(ja)
*
|
2001-12-13 |
2007-01-10 |
株式会社東芝 |
半導体記憶装置及びその製造方法
|
JP3583102B2
(ja)
*
|
2001-12-27 |
2004-10-27 |
株式会社東芝 |
磁気スイッチング素子及び磁気メモリ
|
US6606262B2
(en)
*
|
2002-01-10 |
2003-08-12 |
Hewlett-Packard Development Company, L.P. |
Magnetoresistive random access memory (MRAM) with on-chip automatic determination of optimized write current method and apparatus
|
US6714444B2
(en)
|
2002-08-06 |
2004-03-30 |
Grandis, Inc. |
Magnetic element utilizing spin transfer and an MRAM device using the magnetic element
|
JP4146202B2
(ja)
*
|
2002-09-24 |
2008-09-10 |
株式会社東芝 |
スピントンネルトランジスタ、磁気再生ヘッド、磁気情報再生システム、及び磁気記憶装置
|
US6838740B2
(en)
*
|
2002-09-27 |
2005-01-04 |
Grandis, Inc. |
Thermally stable magnetic elements utilizing spin transfer and an MRAM device using the magnetic element
|
US6958927B1
(en)
|
2002-10-09 |
2005-10-25 |
Grandis Inc. |
Magnetic element utilizing spin-transfer and half-metals and an MRAM device using the magnetic element
|
US8553517B2
(en)
*
|
2002-10-14 |
2013-10-08 |
Samsung Electronics Co., Ltd. |
Magnetic medium using spin-polarized electrons and apparatus and method of recording data on the magnetic medium
|
EP1559106A2
(de)
*
|
2002-10-22 |
2005-08-03 |
Btg International Limited |
Magnetspeicherbaustein
|
KR100493161B1
(ko)
*
|
2002-11-07 |
2005-06-02 |
삼성전자주식회사 |
Mram과 그 제조 및 구동방법
|
US6791867B2
(en)
*
|
2002-11-18 |
2004-09-14 |
Hewlett-Packard Development Company, L.P. |
Selection of memory cells in data storage devices
|
US6956766B2
(en)
*
|
2002-11-26 |
2005-10-18 |
Kabushiki Kaisha Toshiba |
Magnetic cell and magnetic memory
|
JP2004179483A
(ja)
*
|
2002-11-28 |
2004-06-24 |
Hitachi Ltd |
不揮発性磁気メモリ
|
JP4873338B2
(ja)
*
|
2002-12-13 |
2012-02-08 |
独立行政法人科学技術振興機構 |
スピン注入デバイス及びこれを用いた磁気装置
|
JP2011171756A
(ja)
*
|
2002-12-13 |
2011-09-01 |
Japan Science & Technology Agency |
スピン注入デバイス及びこれを用いた磁気装置
|
US7190611B2
(en)
*
|
2003-01-07 |
2007-03-13 |
Grandis, Inc. |
Spin-transfer multilayer stack containing magnetic layers with resettable magnetization
|
US6829161B2
(en)
*
|
2003-01-10 |
2004-12-07 |
Grandis, Inc. |
Magnetostatically coupled magnetic elements utilizing spin transfer and an MRAM device using the magnetic element
|
US6847547B2
(en)
*
|
2003-02-28 |
2005-01-25 |
Grandis, Inc. |
Magnetostatically coupled magnetic elements utilizing spin transfer and an MRAM device using the magnetic element
|
KR100615600B1
(ko)
*
|
2004-08-09 |
2006-08-25 |
삼성전자주식회사 |
고집적 자기램 소자 및 그 제조방법
|
US6952364B2
(en)
*
|
2003-03-03 |
2005-10-04 |
Samsung Electronics Co., Ltd. |
Magnetic tunnel junction structures and methods of fabrication
|
KR100542743B1
(ko)
*
|
2003-04-22 |
2006-01-11 |
삼성전자주식회사 |
자기 랜덤 엑세스 메모리
|
US6933155B2
(en)
*
|
2003-05-21 |
2005-08-23 |
Grandis, Inc. |
Methods for providing a sub .15 micron magnetic memory structure
|
US7006375B2
(en)
*
|
2003-06-06 |
2006-02-28 |
Seagate Technology Llc |
Hybrid write mechanism for high speed and high density magnetic random access memory
|
US6865109B2
(en)
*
|
2003-06-06 |
2005-03-08 |
Seagate Technology Llc |
Magnetic random access memory having flux closure for the free layer and spin transfer write mechanism
|
JP4966483B2
(ja)
*
|
2003-06-25 |
2012-07-04 |
パナソニック株式会社 |
磁気抵抗効果素子、および磁気抵抗効果素子を用いた磁気ヘッド、記録再生装置、メモリ素子、メモリアレイ、および磁気抵抗効果素子の製造方法
|
JP2005064050A
(ja)
*
|
2003-08-14 |
2005-03-10 |
Toshiba Corp |
半導体記憶装置及びそのデータ書き込み方法
|
US7573737B2
(en)
*
|
2003-08-19 |
2009-08-11 |
New York University |
High speed low power magnetic devices based on current induced spin-momentum transfer
|
US7911832B2
(en)
|
2003-08-19 |
2011-03-22 |
New York University |
High speed low power magnetic devices based on current induced spin-momentum transfer
|
US8755222B2
(en)
|
2003-08-19 |
2014-06-17 |
New York University |
Bipolar spin-transfer switching
|
US6980469B2
(en)
*
|
2003-08-19 |
2005-12-27 |
New York University |
High speed low power magnetic devices based on current induced spin-momentum transfer
|
US6985385B2
(en)
|
2003-08-26 |
2006-01-10 |
Grandis, Inc. |
Magnetic memory element utilizing spin transfer switching and storing multiple bits
|
JP2005093488A
(ja)
*
|
2003-09-12 |
2005-04-07 |
Sony Corp |
磁気抵抗効果素子とその製造方法、および磁気メモリ装置とその製造方法
|
US7161829B2
(en)
*
|
2003-09-19 |
2007-01-09 |
Grandis, Inc. |
Current confined pass layer for magnetic elements utilizing spin-transfer and an MRAM device using such magnetic elements
|
KR100615089B1
(ko)
*
|
2004-07-14 |
2006-08-23 |
삼성전자주식회사 |
낮은 구동 전류를 갖는 자기 램
|
KR100568512B1
(ko)
*
|
2003-09-29 |
2006-04-07 |
삼성전자주식회사 |
열발생층을 갖는 자기열 램셀들 및 이를 구동시키는 방법들
|
KR100835275B1
(ko)
*
|
2004-08-12 |
2008-06-05 |
삼성전자주식회사 |
스핀 주입 메카니즘을 사용하여 자기램 소자를 구동시키는방법들
|
US7372722B2
(en)
*
|
2003-09-29 |
2008-05-13 |
Samsung Electronics Co., Ltd. |
Methods of operating magnetic random access memory devices including heat-generating structures
|
US7369428B2
(en)
*
|
2003-09-29 |
2008-05-06 |
Samsung Electronics Co., Ltd. |
Methods of operating a magnetic random access memory device and related devices and structures
|
JP2005109263A
(ja)
*
|
2003-09-30 |
2005-04-21 |
Toshiba Corp |
磁性体素子及磁気メモリ
|
US7027320B2
(en)
*
|
2003-10-21 |
2006-04-11 |
Hewlett-Packard Development Company, L.P. |
Soft-reference magnetic memory digitized device and method of operation
|
US7282755B2
(en)
|
2003-11-14 |
2007-10-16 |
Grandis, Inc. |
Stress assisted current driven switching for magnetic memory applications
|
US7009877B1
(en)
|
2003-11-14 |
2006-03-07 |
Grandis, Inc. |
Three-terminal magnetostatically coupled spin transfer-based MRAM cell
|
US7602000B2
(en)
*
|
2003-11-19 |
2009-10-13 |
International Business Machines Corporation |
Spin-current switched magnetic memory element suitable for circuit integration and method of fabricating the memory element
|
JP2005166087A
(ja)
*
|
2003-11-28 |
2005-06-23 |
Toshiba Corp |
半導体集積回路装置
|
JP4581394B2
(ja)
*
|
2003-12-22 |
2010-11-17 |
ソニー株式会社 |
磁気メモリ
|
US20050136600A1
(en)
|
2003-12-22 |
2005-06-23 |
Yiming Huai |
Magnetic elements with ballistic magnetoresistance utilizing spin-transfer and an MRAM device using such magnetic elements
|
JP2005209248A
(ja)
*
|
2004-01-20 |
2005-08-04 |
Hitachi Ltd |
磁気ヘッド及び磁気記録再生装置
|
US7110287B2
(en)
|
2004-02-13 |
2006-09-19 |
Grandis, Inc. |
Method and system for providing heat assisted switching of a magnetic element utilizing spin transfer
|
US7242045B2
(en)
|
2004-02-19 |
2007-07-10 |
Grandis, Inc. |
Spin transfer magnetic element having low saturation magnetization free layers
|
US6967863B2
(en)
|
2004-02-25 |
2005-11-22 |
Grandis, Inc. |
Perpendicular magnetization magnetic element utilizing spin transfer
|
US20110140217A1
(en)
*
|
2004-02-26 |
2011-06-16 |
Grandis, Inc. |
Spin transfer magnetic element with free layers having high perpendicular anisotropy and in-plane equilibrium magnetization
|
US6992359B2
(en)
*
|
2004-02-26 |
2006-01-31 |
Grandis, Inc. |
Spin transfer magnetic element with free layers having high perpendicular anisotropy and in-plane equilibrium magnetization
|
JP2006148039A
(ja)
*
|
2004-03-03 |
2006-06-08 |
Toshiba Corp |
磁気抵抗効果素子および磁気メモリ
|
JP2005294376A
(ja)
|
2004-03-31 |
2005-10-20 |
Toshiba Corp |
磁気記録素子及び磁気メモリ
|
US6946698B1
(en)
|
2004-04-02 |
2005-09-20 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
MRAM device having low-k inter-metal dielectric
|
JP4747507B2
(ja)
*
|
2004-04-16 |
2011-08-17 |
ソニー株式会社 |
磁気メモリ及びその記録方法
|
US7233039B2
(en)
*
|
2004-04-21 |
2007-06-19 |
Grandis, Inc. |
Spin transfer magnetic elements with spin depolarization layers
|
US7057921B2
(en)
*
|
2004-05-11 |
2006-06-06 |
Grandis, Inc. |
Spin barrier enhanced dual magnetoresistance effect element and magnetic memory using the same
|
US7088609B2
(en)
*
|
2004-05-11 |
2006-08-08 |
Grandis, Inc. |
Spin barrier enhanced magnetoresistance effect element and magnetic memory using the same
|
US7576956B2
(en)
*
|
2004-07-26 |
2009-08-18 |
Grandis Inc. |
Magnetic tunnel junction having diffusion stop layer
|
KR100660539B1
(ko)
*
|
2004-07-29 |
2006-12-22 |
삼성전자주식회사 |
자기 기억 소자 및 그 형성 방법
|
US7221584B2
(en)
*
|
2004-08-13 |
2007-05-22 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
MRAM cell having shared configuration
|
JP4568152B2
(ja)
*
|
2004-09-17 |
2010-10-27 |
株式会社東芝 |
磁気記録素子及びそれを用いた磁気記録装置
|
JP4920881B2
(ja)
*
|
2004-09-27 |
2012-04-18 |
株式会社日立製作所 |
低消費電力磁気メモリ及び磁化情報書き込み装置
|
JP2006108316A
(ja)
*
|
2004-10-04 |
2006-04-20 |
Sony Corp |
記憶素子及びメモリ
|
JP4626253B2
(ja)
*
|
2004-10-08 |
2011-02-02 |
ソニー株式会社 |
記憶装置
|
KR100642638B1
(ko)
*
|
2004-10-21 |
2006-11-10 |
삼성전자주식회사 |
낮은 임계 전류를 갖는 자기 램 소자의 구동 방법들
|
US7149106B2
(en)
*
|
2004-10-22 |
2006-12-12 |
Freescale Semiconductor, Inc. |
Spin-transfer based MRAM using angular-dependent selectivity
|
US20060092688A1
(en)
*
|
2004-10-29 |
2006-05-04 |
International Business Machines Corporation |
Stacked magnetic devices
|
JP2006165264A
(ja)
*
|
2004-12-07 |
2006-06-22 |
Sony Corp |
メモリ、磁気ヘッド及び磁気センサー、並びにこれらの製造方法
|
JP2006179694A
(ja)
*
|
2004-12-22 |
2006-07-06 |
Sony Corp |
記憶素子
|
US7170775B2
(en)
*
|
2005-01-06 |
2007-01-30 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
MRAM cell with reduced write current
|
JP2007027197A
(ja)
*
|
2005-07-12 |
2007-02-01 |
Sony Corp |
記憶素子
|
JP2007027575A
(ja)
*
|
2005-07-20 |
2007-02-01 |
Toshiba Corp |
磁気抵抗効果素子および磁気メモリ
|
JP5096702B2
(ja)
*
|
2005-07-28 |
2012-12-12 |
株式会社日立製作所 |
磁気抵抗効果素子及びそれを搭載した不揮発性磁気メモリ
|
US7224601B2
(en)
|
2005-08-25 |
2007-05-29 |
Grandis Inc. |
Oscillating-field assisted spin torque switching of a magnetic tunnel junction memory element
|
JP2007081280A
(ja)
*
|
2005-09-16 |
2007-03-29 |
Fujitsu Ltd |
磁気抵抗効果素子及び磁気メモリ装置
|
US7777261B2
(en)
|
2005-09-20 |
2010-08-17 |
Grandis Inc. |
Magnetic device having stabilized free ferromagnetic layer
|
US7859034B2
(en)
*
|
2005-09-20 |
2010-12-28 |
Grandis Inc. |
Magnetic devices having oxide antiferromagnetic layer next to free ferromagnetic layer
|
US7973349B2
(en)
*
|
2005-09-20 |
2011-07-05 |
Grandis Inc. |
Magnetic device having multilayered free ferromagnetic layer
|
WO2007040189A1
(ja)
*
|
2005-10-03 |
2007-04-12 |
Nec Corporation |
磁気ランダムアクセスメモリ及びその動作方法
|
US7286395B2
(en)
*
|
2005-10-27 |
2007-10-23 |
Grandis, Inc. |
Current driven switched magnetic storage cells having improved read and write margins and magnetic memories using such cells
|
FR2892871B1
(fr)
|
2005-11-02 |
2007-11-23 |
Commissariat Energie Atomique |
Oscillateur radio frequence a courant elelctrique polarise en spin
|
US7430135B2
(en)
*
|
2005-12-23 |
2008-09-30 |
Grandis Inc. |
Current-switched spin-transfer magnetic devices with reduced spin-transfer switching current density
|
US20070253245A1
(en)
*
|
2006-04-27 |
2007-11-01 |
Yadav Technology |
High Capacity Low Cost Multi-Stacked Cross-Line Magnetic Memory
|
US20080246104A1
(en)
*
|
2007-02-12 |
2008-10-09 |
Yadav Technology |
High Capacity Low Cost Multi-State Magnetic Memory
|
US8018011B2
(en)
*
|
2007-02-12 |
2011-09-13 |
Avalanche Technology, Inc. |
Low cost multi-state magnetic memory
|
US8535952B2
(en)
*
|
2006-02-25 |
2013-09-17 |
Avalanche Technology, Inc. |
Method for manufacturing non-volatile magnetic memory
|
US8084835B2
(en)
*
|
2006-10-20 |
2011-12-27 |
Avalanche Technology, Inc. |
Non-uniform switching based non-volatile magnetic based memory
|
US7732881B2
(en)
*
|
2006-11-01 |
2010-06-08 |
Avalanche Technology, Inc. |
Current-confined effect of magnetic nano-current-channel (NCC) for magnetic random access memory (MRAM)
|
US8058696B2
(en)
*
|
2006-02-25 |
2011-11-15 |
Avalanche Technology, Inc. |
High capacity low cost multi-state magnetic memory
|
US8508984B2
(en)
*
|
2006-02-25 |
2013-08-13 |
Avalanche Technology, Inc. |
Low resistance high-TMR magnetic tunnel junction and process for fabrication thereof
|
US8063459B2
(en)
*
|
2007-02-12 |
2011-11-22 |
Avalanche Technologies, Inc. |
Non-volatile magnetic memory element with graded layer
|
US8183652B2
(en)
*
|
2007-02-12 |
2012-05-22 |
Avalanche Technology, Inc. |
Non-volatile magnetic memory with low switching current and high thermal stability
|
US20070246787A1
(en)
*
|
2006-03-29 |
2007-10-25 |
Lien-Chang Wang |
On-plug magnetic tunnel junction devices based on spin torque transfer switching
|
JP2007273523A
(ja)
*
|
2006-03-30 |
2007-10-18 |
Tdk Corp |
磁気メモリ及びスピン注入方法
|
JP4277870B2
(ja)
|
2006-04-17 |
2009-06-10 |
ソニー株式会社 |
記憶素子及びメモリ
|
JP2007294737A
(ja)
|
2006-04-26 |
2007-11-08 |
Hitachi Ltd |
トンネル磁気抵抗効果素子、それを用いた磁気メモリセル及びランダムアクセスメモリ
|
JP5096690B2
(ja)
|
2006-04-26 |
2012-12-12 |
株式会社日立製作所 |
磁気メモリセル及びランダムアクセスメモリ
|
EP1852874B1
(de)
*
|
2006-05-04 |
2010-04-28 |
Hitachi Ltd. |
Magnetspeichervorrichtung
|
JP2007305882A
(ja)
*
|
2006-05-12 |
2007-11-22 |
Sony Corp |
記憶素子及びメモリ
|
JP5076361B2
(ja)
*
|
2006-05-18 |
2012-11-21 |
株式会社日立製作所 |
半導体装置
|
US7532505B1
(en)
*
|
2006-07-17 |
2009-05-12 |
Grandis, Inc. |
Method and system for using a pulsed field to assist spin transfer induced switching of magnetic memory elements
|
US7502249B1
(en)
*
|
2006-07-17 |
2009-03-10 |
Grandis, Inc. |
Method and system for using a pulsed field to assist spin transfer induced switching of magnetic memory elements
|
US7851840B2
(en)
*
|
2006-09-13 |
2010-12-14 |
Grandis Inc. |
Devices and circuits based on magnetic tunnel junctions utilizing a multilayer barrier
|
JP5147212B2
(ja)
*
|
2006-10-04 |
2013-02-20 |
株式会社日立製作所 |
磁気メモリセル及び磁気ランダムアクセスメモリ
|
TWI449040B
(zh)
|
2006-10-06 |
2014-08-11 |
Crocus Technology Sa |
用於提供內容可定址的磁阻式隨機存取記憶體單元之系統及方法
|
US7742329B2
(en)
*
|
2007-03-06 |
2010-06-22 |
Qualcomm Incorporated |
Word line transistor strength control for read and write in spin transfer torque magnetoresistive random access memory
|
JP4682998B2
(ja)
*
|
2007-03-15 |
2011-05-11 |
ソニー株式会社 |
記憶素子及びメモリ
|
US8564293B2
(en)
*
|
2007-03-16 |
2013-10-22 |
Tohoku University |
Method for changing spin relaxation, method for detecting spin current and spintronics device using spin relaxation
|
US7573736B2
(en)
*
|
2007-05-22 |
2009-08-11 |
Taiwan Semiconductor Manufacturing Company |
Spin torque transfer MRAM device
|
JP4625936B2
(ja)
*
|
2007-06-12 |
2011-02-02 |
独立行政法人産業技術総合研究所 |
乱数発生器
|
WO2008154519A1
(en)
*
|
2007-06-12 |
2008-12-18 |
Grandis, Inc. |
Method and system for providing a magnetic element and magnetic memory being unidirectional writing enabled
|
US7688616B2
(en)
*
|
2007-06-18 |
2010-03-30 |
Taiwan Semicondcutor Manufacturing Company, Ltd. |
Device and method of programming a magnetic memory element
|
US7957179B2
(en)
*
|
2007-06-27 |
2011-06-07 |
Grandis Inc. |
Magnetic shielding in magnetic multilayer structures
|
FR2918761B1
(fr)
*
|
2007-07-10 |
2009-11-06 |
Commissariat Energie Atomique |
Capteur de champ magnetique a faible bruit.
|
FR2918762B1
(fr)
*
|
2007-07-10 |
2010-03-19 |
Commissariat Energie Atomique |
Capteur de champ magnetique a faible bruit utilisant un transfert de spin lateral.
|
JP4874884B2
(ja)
*
|
2007-07-11 |
2012-02-15 |
株式会社東芝 |
磁気記録素子及び磁気記録装置
|
US7982275B2
(en)
*
|
2007-08-22 |
2011-07-19 |
Grandis Inc. |
Magnetic element having low saturation magnetization
|
US9812184B2
(en)
|
2007-10-31 |
2017-11-07 |
New York University |
Current induced spin-momentum transfer stack with dual insulating layers
|
WO2009074411A1
(en)
|
2007-12-13 |
2009-06-18 |
Crocus Technology |
Magnetic memory with a thermally assisted writing procedure
|
JP2009158877A
(ja)
|
2007-12-28 |
2009-07-16 |
Hitachi Ltd |
磁気メモリセル及びランダムアクセスメモリ
|
US8013406B2
(en)
*
|
2008-01-02 |
2011-09-06 |
The Hong Kong University Of Science And Technology |
Method and apparatus for generating giant spin-dependent chemical potential difference in non-magnetic materials
|
US7919794B2
(en)
*
|
2008-01-08 |
2011-04-05 |
Qualcomm, Incorporated |
Memory cell and method of forming a magnetic tunnel junction (MTJ) of a memory cell
|
JP5283922B2
(ja)
*
|
2008-02-14 |
2013-09-04 |
株式会社東芝 |
磁気メモリ
|
JP5455313B2
(ja)
*
|
2008-02-21 |
2014-03-26 |
株式会社東芝 |
磁気記憶素子及び磁気記憶装置
|
US8802451B2
(en)
|
2008-02-29 |
2014-08-12 |
Avalanche Technology Inc. |
Method for manufacturing high density non-volatile magnetic memory
|
ATE538474T1
(de)
|
2008-04-07 |
2012-01-15 |
Crocus Technology Sa |
System und verfahren zum schreiben von daten auf magnetoresistive direktzugriffsspeicherzellen
|
US8659852B2
(en)
|
2008-04-21 |
2014-02-25 |
Seagate Technology Llc |
Write-once magentic junction memory array
|
FR2931011B1
(fr)
*
|
2008-05-06 |
2010-05-28 |
Commissariat Energie Atomique |
Element magnetique a ecriture assistee thermiquement
|
EP2124228B1
(de)
|
2008-05-20 |
2014-03-05 |
Crocus Technology |
Magnetischer Direktzugriffsspeicher mit einem elliptischen Tunnelübergang
|
US7855911B2
(en)
|
2008-05-23 |
2010-12-21 |
Seagate Technology Llc |
Reconfigurable magnetic logic device using spin torque
|
JP5339272B2
(ja)
|
2008-06-05 |
2013-11-13 |
国立大学法人東北大学 |
スピントロニクスデバイス及び情報伝達方法
|
US8031519B2
(en)
|
2008-06-18 |
2011-10-04 |
Crocus Technology S.A. |
Shared line magnetic random access memory cells
|
US8274818B2
(en)
|
2008-08-05 |
2012-09-25 |
Tohoku University |
Magnetoresistive element, magnetic memory cell and magnetic random access memory using the same
|
US7881098B2
(en)
|
2008-08-26 |
2011-02-01 |
Seagate Technology Llc |
Memory with separate read and write paths
|
US7894248B2
(en)
*
|
2008-09-12 |
2011-02-22 |
Grandis Inc. |
Programmable and redundant circuitry based on magnetic tunnel junction (MTJ)
|
EP2328194A4
(de)
*
|
2008-09-22 |
2013-07-10 |
Hitachi Ltd |
Magnetisches aufzeichnungselement, magnetische speicherzelle und magnetischer ram-speicher
|
US7985994B2
(en)
|
2008-09-29 |
2011-07-26 |
Seagate Technology Llc |
Flux-closed STRAM with electronically reflective insulative spacer
|
US8169810B2
(en)
|
2008-10-08 |
2012-05-01 |
Seagate Technology Llc |
Magnetic memory with asymmetric energy barrier
|
US7880209B2
(en)
*
|
2008-10-09 |
2011-02-01 |
Seagate Technology Llc |
MRAM cells including coupled free ferromagnetic layers for stabilization
|
US8039913B2
(en)
|
2008-10-09 |
2011-10-18 |
Seagate Technology Llc |
Magnetic stack with laminated layer
|
US8089132B2
(en)
*
|
2008-10-09 |
2012-01-03 |
Seagate Technology Llc |
Magnetic memory with phonon glass electron crystal material
|
US8228703B2
(en)
|
2008-11-04 |
2012-07-24 |
Crocus Technology Sa |
Ternary Content Addressable Magnetoresistive random access memory cell
|
US8043732B2
(en)
|
2008-11-11 |
2011-10-25 |
Seagate Technology Llc |
Memory cell with radial barrier
|
US7826181B2
(en)
|
2008-11-12 |
2010-11-02 |
Seagate Technology Llc |
Magnetic memory with porous non-conductive current confinement layer
|
KR101255474B1
(ko)
|
2008-12-10 |
2013-04-16 |
가부시키가이샤 히타치세이사쿠쇼 |
자기 저항 효과 소자, 그것을 이용한 자기 메모리 셀 및 자기 랜덤 액세스 메모리
|
US8344433B2
(en)
*
|
2009-04-14 |
2013-01-01 |
Qualcomm Incorporated |
Magnetic tunnel junction (MTJ) and methods, and magnetic random access memory (MRAM) employing same
|
EP2249349B1
(de)
*
|
2009-05-08 |
2012-02-08 |
Crocus Technology |
Magnetischer Speicher mit wärmeunterstütztem Schreibverfahren und eingeschränktem Schreibfeld
|
EP2249350B1
(de)
|
2009-05-08 |
2012-02-01 |
Crocus Technology |
Magnetischer Speicher mit wärmeunterstütztem Schreibverfahren und niedrigem Schreibstrom
|
US8218349B2
(en)
|
2009-05-26 |
2012-07-10 |
Crocus Technology Sa |
Non-volatile logic devices using magnetic tunnel junctions
|
US7999338B2
(en)
|
2009-07-13 |
2011-08-16 |
Seagate Technology Llc |
Magnetic stack having reference layers with orthogonal magnetization orientation directions
|
US8102703B2
(en)
|
2009-07-14 |
2012-01-24 |
Crocus Technology |
Magnetic element with a fast spin transfer torque writing procedure
|
US8913350B2
(en)
*
|
2009-08-10 |
2014-12-16 |
Grandis, Inc. |
Method and system for providing magnetic tunneling junction elements having improved performance through capping layer induced perpendicular anisotropy and memories using such magnetic elements
|
US20110031569A1
(en)
*
|
2009-08-10 |
2011-02-10 |
Grandis, Inc. |
Method and system for providing magnetic tunneling junction elements having improved performance through capping layer induced perpendicular anisotropy and memories using such magnetic elements
|
US10446209B2
(en)
*
|
2009-08-10 |
2019-10-15 |
Samsung Semiconductor Inc. |
Method and system for providing magnetic tunneling junction elements having improved performance through capping layer induced perpendicular anisotropy and memories using such magnetic elements
|
US8385106B2
(en)
*
|
2009-09-11 |
2013-02-26 |
Grandis, Inc. |
Method and system for providing a hierarchical data path for spin transfer torque random access memory
|
US8422285B2
(en)
*
|
2009-10-30 |
2013-04-16 |
Grandis, Inc. |
Method and system for providing dual magnetic tunneling junctions usable in spin transfer torque magnetic memories
|
US8159866B2
(en)
*
|
2009-10-30 |
2012-04-17 |
Grandis, Inc. |
Method and system for providing dual magnetic tunneling junctions usable in spin transfer torque magnetic memories
|
US20110141802A1
(en)
*
|
2009-12-15 |
2011-06-16 |
Grandis, Inc. |
Method and system for providing a high density memory cell for spin transfer torque random access memory
|
US8199553B2
(en)
*
|
2009-12-17 |
2012-06-12 |
Hitachi Global Storage Technologies Netherlands B.V. |
Multilevel frequency addressable field driven MRAM
|
US8063460B2
(en)
*
|
2009-12-18 |
2011-11-22 |
Intel Corporation |
Spin torque magnetic integrated circuits and devices therefor
|
US9130151B2
(en)
|
2010-01-11 |
2015-09-08 |
Samsung Electronics Co., Ltd. |
Method and system for providing magnetic tunneling junctions usable in spin transfer torque magnetic memories
|
US8254162B2
(en)
|
2010-01-11 |
2012-08-28 |
Grandis, Inc. |
Method and system for providing magnetic tunneling junctions usable in spin transfer torque magnetic memories
|
JP4903277B2
(ja)
|
2010-01-26 |
2012-03-28 |
株式会社日立製作所 |
磁気抵抗効果素子、それを用いた磁気メモリセル及びランダムアクセスメモリ
|
JP5461683B2
(ja)
*
|
2010-03-05 |
2014-04-02 |
株式会社日立製作所 |
磁気メモリセル及び磁気ランダムアクセスメモリ
|
US8891290B2
(en)
|
2010-03-17 |
2014-11-18 |
Samsung Electronics Co., Ltd. |
Method and system for providing inverted dual magnetic tunneling junction elements
|
US8411497B2
(en)
|
2010-05-05 |
2013-04-02 |
Grandis, Inc. |
Method and system for providing a magnetic field aligned spin transfer torque random access memory
|
US8546896B2
(en)
|
2010-07-16 |
2013-10-01 |
Grandis, Inc. |
Magnetic tunneling junction elements having magnetic substructures(s) with a perpendicular anisotropy and memories using such magnetic elements
|
US8374048B2
(en)
|
2010-08-11 |
2013-02-12 |
Grandis, Inc. |
Method and system for providing magnetic tunneling junction elements having a biaxial anisotropy
|
FR2964248B1
(fr)
|
2010-09-01 |
2013-07-19 |
Commissariat Energie Atomique |
Dispositif magnetique et procede de lecture et d’ecriture dans un tel dispositif magnetique
|
JP5742142B2
(ja)
*
|
2010-09-08 |
2015-07-01 |
ソニー株式会社 |
記憶素子、メモリ装置
|
FR2965654B1
(fr)
|
2010-10-01 |
2012-10-19 |
Commissariat Energie Atomique |
Dispositif magnetique a ecriture assistee thermiquement
|
US8399941B2
(en)
|
2010-11-05 |
2013-03-19 |
Grandis, Inc. |
Magnetic junction elements having an easy cone anisotropy and a magnetic memory using such magnetic junction elements
|
US8796794B2
(en)
|
2010-12-17 |
2014-08-05 |
Intel Corporation |
Write current reduction in spin transfer torque memory devices
|
US8432009B2
(en)
|
2010-12-31 |
2013-04-30 |
Grandis, Inc. |
Method and system for providing magnetic layers having insertion layers for use in spin transfer torque memories
|
US9478730B2
(en)
|
2010-12-31 |
2016-10-25 |
Samsung Electronics Co., Ltd. |
Method and system for providing magnetic layers having insertion layers for use in spin transfer torque memories
|
EP2477227B1
(de)
|
2011-01-13 |
2019-03-27 |
Crocus Technology S.A. |
Magnettunnelübergang mit einer Polarisierungsschicht
|
JP5686626B2
(ja)
*
|
2011-02-22 |
2015-03-18 |
ルネサスエレクトロニクス株式会社 |
磁気メモリ及びその製造方法
|
FR2976113B1
(fr)
|
2011-06-06 |
2013-07-12 |
Commissariat Energie Atomique |
Dispositif magnetique a couplage d'echange
|
FR2976396B1
(fr)
|
2011-06-07 |
2013-07-12 |
Commissariat Energie Atomique |
Empilement magnetique et point memoire comportant un tel empilement
|
US8766383B2
(en)
|
2011-07-07 |
2014-07-01 |
Samsung Electronics Co., Ltd. |
Method and system for providing a magnetic junction using half metallic ferromagnets
|
JP2012028798A
(ja)
*
|
2011-09-14 |
2012-02-09 |
Sony Corp |
メモリ
|
US8570792B2
(en)
*
|
2012-01-24 |
2013-10-29 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Magnetoresistive random access memory
|
US8884386B2
(en)
|
2012-02-02 |
2014-11-11 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
MRAM device and fabrication method thereof
|
US9007818B2
(en)
|
2012-03-22 |
2015-04-14 |
Micron Technology, Inc. |
Memory cells, semiconductor device structures, systems including such cells, and methods of fabrication
|
FR2989211B1
(fr)
|
2012-04-10 |
2014-09-26 |
Commissariat Energie Atomique |
Dispositif magnetique a ecriture assistee thermiquement
|
US9054030B2
(en)
|
2012-06-19 |
2015-06-09 |
Micron Technology, Inc. |
Memory cells, semiconductor device structures, memory systems, and methods of fabrication
|
US8923038B2
(en)
|
2012-06-19 |
2014-12-30 |
Micron Technology, Inc. |
Memory cells, semiconductor device structures, memory systems, and methods of fabrication
|
FR2993387B1
(fr)
|
2012-07-11 |
2014-08-08 |
Commissariat Energie Atomique |
Dispositif magnetique a ecriture assistee thermiquement
|
US9082950B2
(en)
|
2012-10-17 |
2015-07-14 |
New York University |
Increased magnetoresistance in an inverted orthogonal spin transfer layer stack
|
US9082888B2
(en)
|
2012-10-17 |
2015-07-14 |
New York University |
Inverted orthogonal spin transfer layer stack
|
US8879205B2
(en)
|
2012-11-13 |
2014-11-04 |
HGST Netherlands B.V. |
High spin-torque efficiency spin-torque oscillator (STO) with dual spin polarization layer
|
KR102199622B1
(ko)
*
|
2013-01-11 |
2021-01-08 |
삼성전자주식회사 |
용이 콘 이방성을 가지는 자기 터널 접합 소자들을 제공하는 방법 및 시스템
|
US9379315B2
(en)
|
2013-03-12 |
2016-06-28 |
Micron Technology, Inc. |
Memory cells, methods of fabrication, semiconductor device structures, and memory systems
|
JP6078643B2
(ja)
*
|
2013-05-22 |
2017-02-08 |
株式会社日立製作所 |
スピン波デバイス
|
US8982613B2
(en)
|
2013-06-17 |
2015-03-17 |
New York University |
Scalable orthogonal spin transfer magnetic random access memory devices with reduced write error rates
|
US9368714B2
(en)
|
2013-07-01 |
2016-06-14 |
Micron Technology, Inc. |
Memory cells, methods of operation and fabrication, semiconductor device structures, and memory systems
|
US9466787B2
(en)
|
2013-07-23 |
2016-10-11 |
Micron Technology, Inc. |
Memory cells, methods of fabrication, semiconductor device structures, memory systems, and electronic systems
|
US9461242B2
(en)
|
2013-09-13 |
2016-10-04 |
Micron Technology, Inc. |
Magnetic memory cells, methods of fabrication, semiconductor devices, memory systems, and electronic systems
|
US9608197B2
(en)
|
2013-09-18 |
2017-03-28 |
Micron Technology, Inc. |
Memory cells, methods of fabrication, and semiconductor devices
|
US9529060B2
(en)
|
2014-01-09 |
2016-12-27 |
Allegro Microsystems, Llc |
Magnetoresistance element with improved response to magnetic fields
|
US10454024B2
(en)
|
2014-02-28 |
2019-10-22 |
Micron Technology, Inc. |
Memory cells, methods of fabrication, and memory devices
|
US9281466B2
(en)
|
2014-04-09 |
2016-03-08 |
Micron Technology, Inc. |
Memory cells, semiconductor structures, semiconductor devices, and methods of fabrication
|
US9269888B2
(en)
|
2014-04-18 |
2016-02-23 |
Micron Technology, Inc. |
Memory cells, methods of fabrication, and semiconductor devices
|
US9263667B1
(en)
|
2014-07-25 |
2016-02-16 |
Spin Transfer Technologies, Inc. |
Method for manufacturing MTJ memory device
|
US9337412B2
(en)
*
|
2014-09-22 |
2016-05-10 |
Spin Transfer Technologies, Inc. |
Magnetic tunnel junction structure for MRAM device
|
US9349945B2
(en)
|
2014-10-16 |
2016-05-24 |
Micron Technology, Inc. |
Memory cells, semiconductor devices, and methods of fabrication
|
US9768377B2
(en)
|
2014-12-02 |
2017-09-19 |
Micron Technology, Inc. |
Magnetic cell structures, and methods of fabrication
|
US10439131B2
(en)
|
2015-01-15 |
2019-10-08 |
Micron Technology, Inc. |
Methods of forming semiconductor devices including tunnel barrier materials
|
US9502642B2
(en)
|
2015-04-10 |
2016-11-22 |
Micron Technology, Inc. |
Magnetic tunnel junctions, methods used while forming magnetic tunnel junctions, and methods of forming magnetic tunnel junctions
|
US9530959B2
(en)
|
2015-04-15 |
2016-12-27 |
Micron Technology, Inc. |
Magnetic tunnel junctions
|
US9520553B2
(en)
|
2015-04-15 |
2016-12-13 |
Micron Technology, Inc. |
Methods of forming a magnetic electrode of a magnetic tunnel junction and methods of forming a magnetic tunnel junction
|
US10468590B2
(en)
|
2015-04-21 |
2019-11-05 |
Spin Memory, Inc. |
High annealing temperature perpendicular magnetic anisotropy structure for magnetic random access memory
|
US9728712B2
(en)
|
2015-04-21 |
2017-08-08 |
Spin Transfer Technologies, Inc. |
Spin transfer torque structure for MRAM devices having a spin current injection capping layer
|
US9257136B1
(en)
|
2015-05-05 |
2016-02-09 |
Micron Technology, Inc. |
Magnetic tunnel junctions
|
US9960346B2
(en)
|
2015-05-07 |
2018-05-01 |
Micron Technology, Inc. |
Magnetic tunnel junctions
|
US9812637B2
(en)
|
2015-06-05 |
2017-11-07 |
Allegro Microsystems, Llc |
Spin valve magnetoresistance element with improved response to magnetic fields
|
US9853206B2
(en)
|
2015-06-16 |
2017-12-26 |
Spin Transfer Technologies, Inc. |
Precessional spin current structure for MRAM
|
US9773974B2
(en)
|
2015-07-30 |
2017-09-26 |
Spin Transfer Technologies, Inc. |
Polishing stop layer(s) for processing arrays of semiconductor elements
|
US10163479B2
(en)
|
2015-08-14 |
2018-12-25 |
Spin Transfer Technologies, Inc. |
Method and apparatus for bipolar memory write-verify
|
US10573363B2
(en)
|
2015-12-02 |
2020-02-25 |
Samsung Electronics Co., Ltd. |
Method and apparatus for performing self-referenced read in a magnetoresistive random access memory
|
US9741926B1
(en)
|
2016-01-28 |
2017-08-22 |
Spin Transfer Technologies, Inc. |
Memory cell having magnetic tunnel junction and thermal stability enhancement layer
|
JP2017139399A
(ja)
*
|
2016-02-05 |
2017-08-10 |
Tdk株式会社 |
磁気メモリ
|
US9680089B1
(en)
|
2016-05-13 |
2017-06-13 |
Micron Technology, Inc. |
Magnetic tunnel junctions
|
US10446210B2
(en)
|
2016-09-27 |
2019-10-15 |
Spin Memory, Inc. |
Memory instruction pipeline with a pre-read stage for a write operation for reducing power consumption in a memory device that uses dynamic redundancy registers
|
US10991410B2
(en)
|
2016-09-27 |
2021-04-27 |
Spin Memory, Inc. |
Bi-polar write scheme
|
US11119910B2
(en)
|
2016-09-27 |
2021-09-14 |
Spin Memory, Inc. |
Heuristics for selecting subsegments for entry in and entry out operations in an error cache system with coarse and fine grain segments
|
US10818331B2
(en)
|
2016-09-27 |
2020-10-27 |
Spin Memory, Inc. |
Multi-chip module for MRAM devices with levels of dynamic redundancy registers
|
US11151042B2
(en)
|
2016-09-27 |
2021-10-19 |
Integrated Silicon Solution, (Cayman) Inc. |
Error cache segmentation for power reduction
|
US10437723B2
(en)
|
2016-09-27 |
2019-10-08 |
Spin Memory, Inc. |
Method of flushing the contents of a dynamic redundancy register to a secure storage area during a power down in a memory device
|
US10366774B2
(en)
|
2016-09-27 |
2019-07-30 |
Spin Memory, Inc. |
Device with dynamic redundancy registers
|
US10460781B2
(en)
|
2016-09-27 |
2019-10-29 |
Spin Memory, Inc. |
Memory device with a dual Y-multiplexer structure for performing two simultaneous operations on the same row of a memory bank
|
US10546625B2
(en)
|
2016-09-27 |
2020-01-28 |
Spin Memory, Inc. |
Method of optimizing write voltage based on error buffer occupancy
|
US10628316B2
(en)
|
2016-09-27 |
2020-04-21 |
Spin Memory, Inc. |
Memory device with a plurality of memory banks where each memory bank is associated with a corresponding memory instruction pipeline and a dynamic redundancy register
|
US10437491B2
(en)
|
2016-09-27 |
2019-10-08 |
Spin Memory, Inc. |
Method of processing incomplete memory operations in a memory device during a power up sequence and a power down sequence using a dynamic redundancy register
|
US11119936B2
(en)
|
2016-09-27 |
2021-09-14 |
Spin Memory, Inc. |
Error cache system with coarse and fine segments for power optimization
|
US10360964B2
(en)
|
2016-09-27 |
2019-07-23 |
Spin Memory, Inc. |
Method of writing contents in memory during a power up sequence using a dynamic redundancy register in a memory device
|
US10665777B2
(en)
|
2017-02-28 |
2020-05-26 |
Spin Memory, Inc. |
Precessional spin current structure with non-magnetic insertion layer for MRAM
|
US10672976B2
(en)
|
2017-02-28 |
2020-06-02 |
Spin Memory, Inc. |
Precessional spin current structure with high in-plane magnetization for MRAM
|
US10620279B2
(en)
|
2017-05-19 |
2020-04-14 |
Allegro Microsystems, Llc |
Magnetoresistance element with increased operational range
|
US11022661B2
(en)
|
2017-05-19 |
2021-06-01 |
Allegro Microsystems, Llc |
Magnetoresistance element with increased operational range
|
US10032978B1
(en)
|
2017-06-27 |
2018-07-24 |
Spin Transfer Technologies, Inc. |
MRAM with reduced stray magnetic fields
|
US10656994B2
(en)
|
2017-10-24 |
2020-05-19 |
Spin Memory, Inc. |
Over-voltage write operation of tunnel magnet-resistance (“TMR”) memory device and correcting failure bits therefrom by using on-the-fly bit failure detection and bit redundancy remapping techniques
|
US10489245B2
(en)
|
2017-10-24 |
2019-11-26 |
Spin Memory, Inc. |
Forcing stuck bits, waterfall bits, shunt bits and low TMR bits to short during testing and using on-the-fly bit failure detection and bit redundancy remapping techniques to correct them
|
US10481976B2
(en)
|
2017-10-24 |
2019-11-19 |
Spin Memory, Inc. |
Forcing bits as bad to widen the window between the distributions of acceptable high and low resistive bits thereby lowering the margin and increasing the speed of the sense amplifiers
|
US10529439B2
(en)
|
2017-10-24 |
2020-01-07 |
Spin Memory, Inc. |
On-the-fly bit failure detection and bit redundancy remapping techniques to correct for fixed bit defects
|
US10679685B2
(en)
|
2017-12-27 |
2020-06-09 |
Spin Memory, Inc. |
Shared bit line array architecture for magnetoresistive memory
|
US10395711B2
(en)
|
2017-12-28 |
2019-08-27 |
Spin Memory, Inc. |
Perpendicular source and bit lines for an MRAM array
|
US10516094B2
(en)
|
2017-12-28 |
2019-12-24 |
Spin Memory, Inc. |
Process for creating dense pillars using multiple exposures for MRAM fabrication
|
US10811594B2
(en)
|
2017-12-28 |
2020-10-20 |
Spin Memory, Inc. |
Process for hard mask development for MRAM pillar formation using photolithography
|
US10891997B2
(en)
|
2017-12-28 |
2021-01-12 |
Spin Memory, Inc. |
Memory array with horizontal source line and a virtual source line
|
US10395712B2
(en)
|
2017-12-28 |
2019-08-27 |
Spin Memory, Inc. |
Memory array with horizontal source line and sacrificial bitline per virtual source
|
US10360962B1
(en)
|
2017-12-28 |
2019-07-23 |
Spin Memory, Inc. |
Memory array with individually trimmable sense amplifiers
|
US10424726B2
(en)
|
2017-12-28 |
2019-09-24 |
Spin Memory, Inc. |
Process for improving photoresist pillar adhesion during MRAM fabrication
|
US10367139B2
(en)
|
2017-12-29 |
2019-07-30 |
Spin Memory, Inc. |
Methods of manufacturing magnetic tunnel junction devices
|
US10886330B2
(en)
|
2017-12-29 |
2021-01-05 |
Spin Memory, Inc. |
Memory device having overlapping magnetic tunnel junctions in compliance with a reference pitch
|
US10784439B2
(en)
|
2017-12-29 |
2020-09-22 |
Spin Memory, Inc. |
Precessional spin current magnetic tunnel junction devices and methods of manufacture
|
US10360961B1
(en)
|
2017-12-29 |
2019-07-23 |
Spin Memory, Inc. |
AC current pre-charge write-assist in orthogonal STT-MRAM
|
US10424723B2
(en)
|
2017-12-29 |
2019-09-24 |
Spin Memory, Inc. |
Magnetic tunnel junction devices including an optimization layer
|
US10236047B1
(en)
|
2017-12-29 |
2019-03-19 |
Spin Memory, Inc. |
Shared oscillator (STNO) for MRAM array write-assist in orthogonal STT-MRAM
|
US10236048B1
(en)
|
2017-12-29 |
2019-03-19 |
Spin Memory, Inc. |
AC current write-assist in orthogonal STT-MRAM
|
US10546624B2
(en)
|
2017-12-29 |
2020-01-28 |
Spin Memory, Inc. |
Multi-port random access memory
|
US10840436B2
(en)
|
2017-12-29 |
2020-11-17 |
Spin Memory, Inc. |
Perpendicular magnetic anisotropy interface tunnel junction devices and methods of manufacture
|
US10199083B1
(en)
|
2017-12-29 |
2019-02-05 |
Spin Transfer Technologies, Inc. |
Three-terminal MRAM with ac write-assist for low read disturb
|
US10270027B1
(en)
|
2017-12-29 |
2019-04-23 |
Spin Memory, Inc. |
Self-generating AC current assist in orthogonal STT-MRAM
|
US10840439B2
(en)
|
2017-12-29 |
2020-11-17 |
Spin Memory, Inc. |
Magnetic tunnel junction (MTJ) fabrication methods and systems
|
US10319900B1
(en)
|
2017-12-30 |
2019-06-11 |
Spin Memory, Inc. |
Perpendicular magnetic tunnel junction device with precessional spin current layer having a modulated moment density
|
US10229724B1
(en)
|
2017-12-30 |
2019-03-12 |
Spin Memory, Inc. |
Microwave write-assist in series-interconnected orthogonal STT-MRAM devices
|
US10339993B1
(en)
|
2017-12-30 |
2019-07-02 |
Spin Memory, Inc. |
Perpendicular magnetic tunnel junction device with skyrmionic assist layers for free layer switching
|
US10236439B1
(en)
|
2017-12-30 |
2019-03-19 |
Spin Memory, Inc. |
Switching and stability control for perpendicular magnetic tunnel junction device
|
US10141499B1
(en)
|
2017-12-30 |
2018-11-27 |
Spin Transfer Technologies, Inc. |
Perpendicular magnetic tunnel junction device with offset precessional spin current layer
|
US10255962B1
(en)
|
2017-12-30 |
2019-04-09 |
Spin Memory, Inc. |
Microwave write-assist in orthogonal STT-MRAM
|
US10468588B2
(en)
|
2018-01-05 |
2019-11-05 |
Spin Memory, Inc. |
Perpendicular magnetic tunnel junction device with skyrmionic enhancement layers for the precessional spin current magnetic layer
|
US10438995B2
(en)
|
2018-01-08 |
2019-10-08 |
Spin Memory, Inc. |
Devices including magnetic tunnel junctions integrated with selectors
|
US10438996B2
(en)
|
2018-01-08 |
2019-10-08 |
Spin Memory, Inc. |
Methods of fabricating magnetic tunnel junctions integrated with selectors
|
US10388861B1
(en)
|
2018-03-08 |
2019-08-20 |
Spin Memory, Inc. |
Magnetic tunnel junction wafer adaptor used in magnetic annealing furnace and method of using the same
|
US10446744B2
(en)
|
2018-03-08 |
2019-10-15 |
Spin Memory, Inc. |
Magnetic tunnel junction wafer adaptor used in magnetic annealing furnace and method of using the same
|
US20190296220A1
(en)
|
2018-03-23 |
2019-09-26 |
Spin Transfer Technologies, Inc. |
Magnetic Tunnel Junction Devices Including an Annular Free Magnetic Layer and a Planar Reference Magnetic Layer
|
US11107974B2
(en)
|
2018-03-23 |
2021-08-31 |
Spin Memory, Inc. |
Magnetic tunnel junction devices including a free magnetic trench layer and a planar reference magnetic layer
|
US11107978B2
(en)
|
2018-03-23 |
2021-08-31 |
Spin Memory, Inc. |
Methods of manufacturing three-dimensional arrays with MTJ devices including a free magnetic trench layer and a planar reference magnetic layer
|
US10784437B2
(en)
|
2018-03-23 |
2020-09-22 |
Spin Memory, Inc. |
Three-dimensional arrays with MTJ devices including a free magnetic trench layer and a planar reference magnetic layer
|
US10411185B1
(en)
|
2018-05-30 |
2019-09-10 |
Spin Memory, Inc. |
Process for creating a high density magnetic tunnel junction array test platform
|
US10593396B2
(en)
|
2018-07-06 |
2020-03-17 |
Spin Memory, Inc. |
Multi-bit cell read-out techniques for MRAM cells with mixed pinned magnetization orientations
|
US10559338B2
(en)
|
2018-07-06 |
2020-02-11 |
Spin Memory, Inc. |
Multi-bit cell read-out techniques
|
US10692569B2
(en)
|
2018-07-06 |
2020-06-23 |
Spin Memory, Inc. |
Read-out techniques for multi-bit cells
|
US10600478B2
(en)
|
2018-07-06 |
2020-03-24 |
Spin Memory, Inc. |
Multi-bit cell read-out techniques for MRAM cells with mixed pinned magnetization orientations
|
US11193989B2
(en)
|
2018-07-27 |
2021-12-07 |
Allegro Microsystems, Llc |
Magnetoresistance assembly having a TMR element disposed over or under a GMR element
|
US10650875B2
(en)
|
2018-08-21 |
2020-05-12 |
Spin Memory, Inc. |
System for a wide temperature range nonvolatile memory
|
US10699761B2
(en)
|
2018-09-18 |
2020-06-30 |
Spin Memory, Inc. |
Word line decoder memory architecture
|
US11621293B2
(en)
|
2018-10-01 |
2023-04-04 |
Integrated Silicon Solution, (Cayman) Inc. |
Multi terminal device stack systems and methods
|
US10971680B2
(en)
|
2018-10-01 |
2021-04-06 |
Spin Memory, Inc. |
Multi terminal device stack formation methods
|
US10580827B1
(en)
|
2018-11-16 |
2020-03-03 |
Spin Memory, Inc. |
Adjustable stabilizer/polarizer method for MRAM with enhanced stability and efficient switching
|
US11107979B2
(en)
|
2018-12-28 |
2021-08-31 |
Spin Memory, Inc. |
Patterned silicide structures and methods of manufacture
|
US11719771B1
(en)
|
2022-06-02 |
2023-08-08 |
Allegro Microsystems, Llc |
Magnetoresistive sensor having seed layer hysteresis suppression
|
CN116096210A
(zh)
*
|
2023-01-09 |
2023-05-09 |
苏州凌存科技有限公司 |
一种磁性多层膜及磁性存储器
|