DE2639395C2 - - Google Patents
Info
- Publication number
- DE2639395C2 DE2639395C2 DE2639395A DE2639395A DE2639395C2 DE 2639395 C2 DE2639395 C2 DE 2639395C2 DE 2639395 A DE2639395 A DE 2639395A DE 2639395 A DE2639395 A DE 2639395A DE 2639395 C2 DE2639395 C2 DE 2639395C2
- Authority
- DE
- Germany
- Prior art keywords
- aromatic
- groups
- atoms
- radicals
- hydroxyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- -1 viscosity regulators Substances 0.000 claims description 127
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 58
- 125000003118 aryl group Chemical group 0.000 claims description 46
- 239000000203 mixture Substances 0.000 claims description 44
- 150000003839 salts Chemical class 0.000 claims description 39
- 239000004593 Epoxy Substances 0.000 claims description 30
- 125000004432 carbon atom Chemical group C* 0.000 claims description 29
- 150000002118 epoxides Chemical group 0.000 claims description 26
- 239000011368 organic material Substances 0.000 claims description 22
- 229920000647 polyepoxide Polymers 0.000 claims description 16
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 14
- MGFYSGNNHQQTJW-UHFFFAOYSA-N iodonium Chemical compound [IH2+] MGFYSGNNHQQTJW-UHFFFAOYSA-N 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 claims description 11
- 150000005840 aryl radicals Chemical group 0.000 claims description 9
- SURWYRGVICLUBJ-UHFFFAOYSA-N 2-ethyl-9,10-dimethoxyanthracene Chemical compound C1=CC=CC2=C(OC)C3=CC(CC)=CC=C3C(OC)=C21 SURWYRGVICLUBJ-UHFFFAOYSA-N 0.000 claims description 8
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical class C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 claims description 7
- 229920000642 polymer Polymers 0.000 claims description 7
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims description 6
- 229920001577 copolymer Polymers 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 125000001424 substituent group Chemical group 0.000 claims description 6
- 229910052717 sulfur Inorganic materials 0.000 claims description 6
- 125000004434 sulfur atom Chemical group 0.000 claims description 6
- 150000001450 anions Chemical class 0.000 claims description 5
- 150000002148 esters Chemical class 0.000 claims description 5
- 125000002541 furyl group Chemical group 0.000 claims description 5
- 150000003254 radicals Chemical class 0.000 claims description 5
- 125000001544 thienyl group Chemical group 0.000 claims description 5
- ODHXBMXNKOYIBV-UHFFFAOYSA-N triphenylamine Chemical compound C1=CC=CC=C1N(C=1C=CC=CC=1)C1=CC=CC=C1 ODHXBMXNKOYIBV-UHFFFAOYSA-N 0.000 claims description 5
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 claims description 4
- 229920001971 elastomer Polymers 0.000 claims description 4
- 239000000945 filler Substances 0.000 claims description 4
- 239000012442 inert solvent Substances 0.000 claims description 4
- 239000005060 rubber Substances 0.000 claims description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 3
- 239000000049 pigment Substances 0.000 claims description 3
- 125000003226 pyrazolyl group Chemical group 0.000 claims description 3
- CPGPAVAKSZHMBP-UHFFFAOYSA-N 9-methylanthracene Chemical compound C1=CC=C2C(C)=C(C=CC=C3)C3=CC2=C1 CPGPAVAKSZHMBP-UHFFFAOYSA-N 0.000 claims description 2
- 150000004985 diamines Chemical group 0.000 claims description 2
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 2
- DCZNSJVFOQPSRV-UHFFFAOYSA-N n,n-diphenyl-4-[4-(n-phenylanilino)phenyl]aniline Chemical compound C1=CC=CC=C1N(C=1C=CC(=CC=1)C=1C=CC(=CC=1)N(C=1C=CC=CC=1)C=1C=CC=CC=1)C1=CC=CC=C1 DCZNSJVFOQPSRV-UHFFFAOYSA-N 0.000 claims description 2
- 229920003986 novolac Polymers 0.000 claims description 2
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 claims description 2
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 claims description 2
- YYMBJDOZVAITBP-UHFFFAOYSA-N rubrene Chemical compound C1=CC=CC=C1C(C1=C(C=2C=CC=CC=2)C2=CC=CC=C2C(C=2C=CC=CC=2)=C11)=C(C=CC=C2)C2=C1C1=CC=CC=C1 YYMBJDOZVAITBP-UHFFFAOYSA-N 0.000 claims description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
- 239000003999 initiator Substances 0.000 claims 2
- 239000000463 material Substances 0.000 description 53
- 238000000576 coating method Methods 0.000 description 23
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- 239000011248 coating agent Substances 0.000 description 14
- 239000003822 epoxy resin Substances 0.000 description 12
- 239000004615 ingredient Substances 0.000 description 11
- 230000005855 radiation Effects 0.000 description 11
- WFDIJRYMOXRFFG-UHFFFAOYSA-N acetic acid anhydride Natural products CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 9
- 125000003700 epoxy group Chemical group 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 8
- 239000002184 metal Substances 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 239000007788 liquid Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- 238000010894 electron beam technology Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 125000003545 alkoxy group Chemical group 0.000 description 4
- 150000001491 aromatic compounds Chemical class 0.000 description 4
- 229910052799 carbon Inorganic materials 0.000 description 4
- 239000008199 coating composition Substances 0.000 description 4
- 125000005843 halogen group Chemical group 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- 229920006267 polyester film Polymers 0.000 description 4
- 239000011253 protective coating Substances 0.000 description 4
- WLOQLWBIJZDHET-UHFFFAOYSA-N triphenylsulfonium Chemical compound C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 WLOQLWBIJZDHET-UHFFFAOYSA-N 0.000 description 4
- 239000012953 triphenylsulfonium Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- BCQKUSCWNFMCKI-UHFFFAOYSA-M diphenyliodanium;hydrogen sulfate Chemical compound OS([O-])(=O)=O.C=1C=CC=CC=1[I+]C1=CC=CC=C1 BCQKUSCWNFMCKI-UHFFFAOYSA-M 0.000 description 3
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 3
- 150000002334 glycols Chemical class 0.000 description 3
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 3
- 125000000466 oxiranyl group Chemical group 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 230000004580 weight loss Effects 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 2
- 239000007983 Tris buffer Substances 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 239000011354 acetal resin Substances 0.000 description 2
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 2
- 125000002252 acyl group Chemical group 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 150000001346 alkyl aryl ethers Chemical class 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 2
- 125000000499 benzofuranyl group Chemical group O1C(=CC2=C1C=CC=C2)* 0.000 description 2
- 125000004196 benzothienyl group Chemical group S1C(=CC2=C1C=CC=C2)* 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- LMMDJMWIHPEQSJ-UHFFFAOYSA-N bis[(3-methyl-7-oxabicyclo[4.1.0]heptan-4-yl)methyl] hexanedioate Chemical compound C1C2OC2CC(C)C1COC(=O)CCCCC(=O)OCC1CC2OC2CC1C LMMDJMWIHPEQSJ-UHFFFAOYSA-N 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- WERYXYBDKMZEQL-UHFFFAOYSA-N butane-1,4-diol Chemical compound OCCCCO WERYXYBDKMZEQL-UHFFFAOYSA-N 0.000 description 2
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 239000012955 diaryliodonium Substances 0.000 description 2
- 125000005520 diaryliodonium group Chemical group 0.000 description 2
- 125000004988 dibenzothienyl group Chemical group C1(=CC=CC=2SC3=C(C21)C=CC=C3)* 0.000 description 2
- 150000002009 diols Chemical class 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000006125 ethylsulfonyl group Chemical group 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 125000000623 heterocyclic group Chemical group 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 239000000123 paper Substances 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 2
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 2
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920001610 polycaprolactone Polymers 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 229920005862 polyol Polymers 0.000 description 2
- 229920006324 polyoxymethylene Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000001953 recrystallisation Methods 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 2
- 125000001889 triflyl group Chemical group FC(F)(F)S(*)(=O)=O 0.000 description 2
- 150000004072 triols Chemical class 0.000 description 2
- 239000003039 volatile agent Substances 0.000 description 2
- 239000002023 wood Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- ODIGIKRIUKFKHP-UHFFFAOYSA-N (n-propan-2-yloxycarbonylanilino) acetate Chemical compound CC(C)OC(=O)N(OC(C)=O)C1=CC=CC=C1 ODIGIKRIUKFKHP-UHFFFAOYSA-N 0.000 description 1
- YPFDHNVEDLHUCE-UHFFFAOYSA-N 1,3-propanediol Substances OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 1
- RNFJDJUURJAICM-UHFFFAOYSA-N 2,2,4,4,6,6-hexaphenoxy-1,3,5-triaza-2$l^{5},4$l^{5},6$l^{5}-triphosphacyclohexa-1,3,5-triene Chemical compound N=1P(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP(OC=2C=CC=CC=2)(OC=2C=CC=CC=2)=NP=1(OC=1C=CC=CC=1)OC1=CC=CC=C1 RNFJDJUURJAICM-UHFFFAOYSA-N 0.000 description 1
- 125000004201 2,4-dichlorophenyl group Chemical group [H]C1=C([H])C(*)=C(Cl)C([H])=C1Cl 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
- AJKXDPSHWRTFOZ-UHFFFAOYSA-N 2-ethylhexane-1,6-diol Chemical compound CCC(CO)CCCCO AJKXDPSHWRTFOZ-UHFFFAOYSA-N 0.000 description 1
- UUODQIKUTGWMPT-UHFFFAOYSA-N 2-fluoro-5-(trifluoromethyl)pyridine Chemical compound FC1=CC=C(C(F)(F)F)C=N1 UUODQIKUTGWMPT-UHFFFAOYSA-N 0.000 description 1
- QBJWYMFTMJFGOL-UHFFFAOYSA-N 2-hexadecyloxirane Chemical compound CCCCCCCCCCCCCCCCC1CO1 QBJWYMFTMJFGOL-UHFFFAOYSA-N 0.000 description 1
- SSZWWUDQMAHNAQ-UHFFFAOYSA-N 3-chloropropane-1,2-diol Chemical compound OCC(O)CCl SSZWWUDQMAHNAQ-UHFFFAOYSA-N 0.000 description 1
- 125000004800 4-bromophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Br 0.000 description 1
- 125000004172 4-methoxyphenyl group Chemical group [H]C1=C([H])C(OC([H])([H])[H])=C([H])C([H])=C1* 0.000 description 1
- 125000004199 4-trifluoromethylphenyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C(F)(F)F 0.000 description 1
- XAYDWGMOPRHLEP-UHFFFAOYSA-N 6-ethenyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1CCCC2OC21C=C XAYDWGMOPRHLEP-UHFFFAOYSA-N 0.000 description 1
- RBHIUNHSNSQJNG-UHFFFAOYSA-N 6-methyl-3-(2-methyloxiran-2-yl)-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2(C)OC2CC1C1(C)CO1 RBHIUNHSNSQJNG-UHFFFAOYSA-N 0.000 description 1
- NHJIDZUQMHKGRE-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-yl 2-(7-oxabicyclo[4.1.0]heptan-4-yl)acetate Chemical compound C1CC2OC2CC1OC(=O)CC1CC2OC2CC1 NHJIDZUQMHKGRE-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- ADAHGVUHKDNLEB-UHFFFAOYSA-N Bis(2,3-epoxycyclopentyl)ether Chemical compound C1CC2OC2C1OC1CCC2OC21 ADAHGVUHKDNLEB-UHFFFAOYSA-N 0.000 description 1
- RKFCPKSCOVDUKS-UHFFFAOYSA-N C(C1CO1)OCCCCOCC1CO1.C=O.C1(=CC=CC=C1)O Chemical compound C(C1CO1)OCCCCOCC1CO1.C=O.C1(=CC=CC=C1)O RKFCPKSCOVDUKS-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229920000298 Cellophane Polymers 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- GXBYFVGCMPJVJX-UHFFFAOYSA-N Epoxybutene Chemical compound C=CC1CO1 GXBYFVGCMPJVJX-UHFFFAOYSA-N 0.000 description 1
- 241000282326 Felis catus Species 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- JCXJVPUVTGWSNB-UHFFFAOYSA-N Nitrogen dioxide Chemical class O=[N]=O JCXJVPUVTGWSNB-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- ORLQHILJRHBSAY-UHFFFAOYSA-N [1-(hydroxymethyl)cyclohexyl]methanol Chemical compound OCC1(CO)CCCCC1 ORLQHILJRHBSAY-UHFFFAOYSA-N 0.000 description 1
- 239000003082 abrasive agent Substances 0.000 description 1
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 229920003232 aliphatic polyester Polymers 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 150000004982 aromatic amines Chemical class 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 239000003637 basic solution Substances 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- DLDJFQGPPSQZKI-UHFFFAOYSA-N but-2-yne-1,4-diol Chemical compound OCC#CCO DLDJFQGPPSQZKI-UHFFFAOYSA-N 0.000 description 1
- 239000004359 castor oil Substances 0.000 description 1
- 235000019438 castor oil Nutrition 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- XENVCRGQTABGKY-ZHACJKMWSA-N chlorohydrin Chemical compound CC#CC#CC#CC#C\C=C\C(Cl)CO XENVCRGQTABGKY-ZHACJKMWSA-N 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical group C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- RSJLWBUYLGJOBD-UHFFFAOYSA-M diphenyliodanium;chloride Chemical compound [Cl-].C=1C=CC=CC=1[I+]C1=CC=CC=C1 RSJLWBUYLGJOBD-UHFFFAOYSA-M 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- SIVVHUQWDOGLJN-UHFFFAOYSA-N ethylsulfamic acid Chemical group CCNS(O)(=O)=O SIVVHUQWDOGLJN-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000000706 filtrate Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- ZEMPKEQAKRGZGQ-XOQCFJPHSA-N glycerol triricinoleate Natural products CCCCCC[C@@H](O)CC=CCCCCCCCC(=O)OC[C@@H](COC(=O)CCCCCCCC=CC[C@@H](O)CCCCCC)OC(=O)CCCCCCCC=CC[C@H](O)CCCCCC ZEMPKEQAKRGZGQ-XOQCFJPHSA-N 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 1
- 238000009863 impact test Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- ICIWUVCWSCSTAQ-UHFFFAOYSA-M iodate Chemical compound [O-]I(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-M 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- JLUCVDLESNBWQK-UHFFFAOYSA-N iodyl hydrogen sulfate Chemical compound I(=O)(=O)OS(O)(=O)=O JLUCVDLESNBWQK-UHFFFAOYSA-N 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- KOARAHKGQSHYGJ-UHFFFAOYSA-N methyl 2-methylprop-2-enoate;oxiran-2-ylmethyl prop-2-enoate Chemical compound COC(=O)C(C)=C.C=CC(=O)OCC1CO1 KOARAHKGQSHYGJ-UHFFFAOYSA-N 0.000 description 1
- 238000005065 mining Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- LOTWRKOXHCMWDB-UHFFFAOYSA-N n,n-bis(2-hydroxyethyl)benzamide Chemical compound OCCN(CCO)C(=O)C1=CC=CC=C1 LOTWRKOXHCMWDB-UHFFFAOYSA-N 0.000 description 1
- LUUFSCNUZAYHAT-UHFFFAOYSA-N octadecane-1,18-diol Chemical compound OCCCCCCCCCCCCCCCCCCO LUUFSCNUZAYHAT-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 150000002896 organic halogen compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001151 other effect Effects 0.000 description 1
- YPNZYYWORCABPU-UHFFFAOYSA-N oxiran-2-ylmethyl 2-methylprop-2-enoate;styrene Chemical compound C=CC1=CC=CC=C1.CC(=C)C(=O)OCC1CO1 YPNZYYWORCABPU-UHFFFAOYSA-N 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 125000003854 p-chlorophenyl group Chemical group [H]C1=C([H])C(*)=C([H])C([H])=C1Cl 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 125000005004 perfluoroethyl group Chemical group FC(F)(F)C(F)(F)* 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 239000004632 polycaprolactone Substances 0.000 description 1
- 229920005906 polyester polyol Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920000909 polytetrahydrofuran Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- JLKDVMWYMMLWTI-UHFFFAOYSA-M potassium iodate Chemical compound [K+].[O-]I(=O)=O JLKDVMWYMMLWTI-UHFFFAOYSA-M 0.000 description 1
- 239000001230 potassium iodate Substances 0.000 description 1
- 229940093930 potassium iodate Drugs 0.000 description 1
- 235000006666 potassium iodate Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000007142 ring opening reaction Methods 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000012258 stirred mixture Substances 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/62—Alcohols or phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/609,898 US4256828A (en) | 1975-09-02 | 1975-09-02 | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE2639395A1 DE2639395A1 (de) | 1977-03-10 |
| DE2639395C2 true DE2639395C2 (OSRAM) | 1991-03-14 |
Family
ID=24442793
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19762639395 Granted DE2639395A1 (de) | 1975-09-02 | 1976-09-01 | Photopolymerisierbare massen und deren verwendung |
Country Status (13)
| Country | Link |
|---|---|
| US (1) | US4256828A (OSRAM) |
| JP (1) | JPS5942688B2 (OSRAM) |
| AU (1) | AU497066B2 (OSRAM) |
| BE (1) | BE845746A (OSRAM) |
| BR (1) | BR7605796A (OSRAM) |
| CA (1) | CA1114089A (OSRAM) |
| CH (1) | CH630655A5 (OSRAM) |
| DE (1) | DE2639395A1 (OSRAM) |
| FR (1) | FR2322897A1 (OSRAM) |
| GB (1) | GB1565671A (OSRAM) |
| IT (1) | IT1066298B (OSRAM) |
| SE (1) | SE427277C (OSRAM) |
| ZA (1) | ZA765241B (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19736471A1 (de) * | 1997-08-21 | 1999-02-25 | Espe Dental Ag | Lichtinduziert kationisch härtende Zusammensetzungen und deren Verwendung |
Families Citing this family (243)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4101513A (en) * | 1977-02-02 | 1978-07-18 | Minnesota Mining And Manufacturing Company | Catalyst for condensation of hydrolyzable silanes and storage stable compositions thereof |
| GB1604953A (en) * | 1977-08-05 | 1981-12-16 | Gen Electric | Photocurable compositions and method for curing |
| GB2013208B (en) * | 1977-12-16 | 1982-11-24 | Gen Electric | Heat curable compositions |
| DE2966764D1 (en) * | 1978-10-27 | 1984-04-12 | Ici Plc | Polymerisable compositions, derived coatings and other polymerised products |
| EP0010897B1 (en) * | 1978-10-27 | 1984-01-25 | Imperial Chemical Industries Plc | Polymerisable compositions, derived coatings and other polymerised products |
| US4299938A (en) | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
| US4250203A (en) | 1979-08-30 | 1981-02-10 | American Can Company | Cationically polymerizable compositions containing sulfonium salt photoinitiators and odor suppressants and method of polymerization using same |
| US4306953A (en) | 1979-11-05 | 1981-12-22 | American Can Company | Cationically polymerizable compositions containing sulfonium salt photoinitiators and stable free radicals as odor suppressants and _method of polymerization using same |
| US4339567A (en) | 1980-03-07 | 1982-07-13 | Ciba-Geigy Corporation | Photopolymerization by means of sulphoxonium salts |
| US4362263A (en) * | 1980-04-24 | 1982-12-07 | Westinghouse Electric Corp. | Solderable solventless UV curable enamel |
| US4594379A (en) * | 1980-05-29 | 1986-06-10 | Nippon Sheet Glass Co., Ltd. | Non-fogging coating composition and a shaped article coated therewith |
| USRE32272E (en) * | 1980-05-29 | 1986-10-28 | Sumitomo Chemical Company, Limited | Non-fogging coating composition and a shaped article coated therewith |
| FR2483448B1 (fr) * | 1980-05-29 | 1985-12-20 | Nippon Sheet Glass Co Ltd | Composition de revetement antibuee, article faconne revetu de cette composition et procede de preparation de cet article |
| US4383025A (en) | 1980-07-10 | 1983-05-10 | Ciba-Geigy Corporation | Photopolymerization by means of sulfoxonium salts |
| US4398014A (en) | 1980-11-04 | 1983-08-09 | Ciba-Geigy Corporation | Sulfoxonium salts and their use as polymerization catalysts |
| JPS57191213A (en) * | 1981-05-19 | 1982-11-25 | Ngk Insulators Ltd | Preparation of carbonaceous product |
| US4442197A (en) * | 1982-01-11 | 1984-04-10 | General Electric Company | Photocurable compositions |
| US4415615A (en) * | 1982-01-15 | 1983-11-15 | Minnesota Mining And Manufacturing Co. | Cellular pressure-sensitive adhesive product and method of making |
| US4439517A (en) * | 1982-01-21 | 1984-03-27 | Ciba-Geigy Corporation | Process for the formation of images with epoxide resin |
| US4518676A (en) * | 1982-09-18 | 1985-05-21 | Ciba Geigy Corporation | Photopolymerizable compositions containing diaryliodosyl salts |
| US4426431A (en) | 1982-09-22 | 1984-01-17 | Eastman Kodak Company | Radiation-curable compositions for restorative and/or protective treatment of photographic elements |
| US4622349A (en) * | 1983-02-07 | 1986-11-11 | Union Carbide Corporation | Blends of epoxides and monoepoxides |
| US4874798A (en) * | 1983-02-07 | 1989-10-17 | Union Carbide Corporation | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials and substituted cycloaliphatic monoepoxide reactive diluents |
| CA1243147A (en) * | 1983-02-07 | 1988-10-11 | Union Carbide Corporation | Photocopolymerizable compositions based on epoxy and hydroxyl containing organic materials and substituted cycloaliphatic monoepoxide reactive diluents |
| US4814361A (en) * | 1983-02-07 | 1989-03-21 | Union Carbide Corporation | Blends of epoxides and monoepoxides |
| US4593051A (en) * | 1983-02-07 | 1986-06-03 | Union Carbide Corporation | Photocopolymerizable compositons based on epoxy and polymer/hydroxyl-containing organic materials |
| US4818776A (en) * | 1983-02-07 | 1989-04-04 | Union Carbide Corporation | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials having primary hydroxyl content |
| CA1243146A (en) * | 1983-02-07 | 1988-10-11 | Joseph V. Koleske | Photocopolymerizable compositions based on hydroxyl- containing organic materials and substituted cycloaliphatic monoepoxide reactive diluents |
| CA1240439A (en) * | 1983-02-07 | 1988-08-09 | Union Carbide Corporation | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials having primary hydroxyl content |
| US4812488A (en) * | 1983-02-07 | 1989-03-14 | Union Carbide Corporation | Photocopolymerizable compositions based on hydroxyl-containing organic materials and substituted cycloaliphatic monoepoxide reactive diluents |
| US4529490A (en) * | 1983-05-23 | 1985-07-16 | General Electric Company | Photopolymerizable organic compositions and diaryliodonium ketone salts used therein |
| US4725653A (en) * | 1983-10-27 | 1988-02-16 | Union Carbide Corporation | Low viscosity adducts of a polycaprolactone polyol and a polyepoxide |
| GB8332073D0 (en) * | 1983-12-01 | 1984-01-11 | Ciba Geigy Ag | Polymerisable compositions |
| DE3561155D1 (OSRAM) * | 1984-02-10 | 1988-01-21 | Ciba-Geigy Ag | |
| ES8800318A1 (es) * | 1985-04-17 | 1987-11-01 | Union Carbide Corp | Un procedimiento para preparar una composicion curable a base de policaprolactona-poliol y exposido cicloalifatico. |
| CA1289803C (en) * | 1985-10-28 | 1991-10-01 | Robert J. Cox | Photoresist composition and printed circuit boards and packages made therewith |
| US4892894A (en) * | 1985-11-07 | 1990-01-09 | Union Carbide Chemical And Plastics Company Inc. | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
| US4654379A (en) * | 1985-12-05 | 1987-03-31 | Allied Corporation | Semi-interpenetrating polymer networks |
| US4665006A (en) * | 1985-12-09 | 1987-05-12 | International Business Machines Corporation | Positive resist system having high resistance to oxygen reactive ion etching |
| CA1312040C (en) * | 1985-12-19 | 1992-12-29 | Joseph Victor Koleske | Conformal coatings cured with actinic radiation |
| US4690957A (en) * | 1986-02-27 | 1987-09-01 | Mitsubishi Denki Kabushiki Kaisha | Ultra-violet ray curing type resin composition |
| US4657779A (en) * | 1986-03-19 | 1987-04-14 | Desoto, Inc. | Shrinkage-resistant ultraviolet-curing coatings |
| EP0255989B1 (de) * | 1986-08-06 | 1990-11-22 | Ciba-Geigy Ag | Negativ-Photoresist auf Basis von Polyphenolen und Epoxidverbindungen oder Vinylethern |
| US5300380A (en) * | 1986-08-06 | 1994-04-05 | Ciba-Geigy Corporation | Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers |
| US4751138A (en) | 1986-08-11 | 1988-06-14 | Minnesota Mining And Manufacturing Company | Coated abrasive having radiation curable binder |
| CA1305823C (en) * | 1986-08-29 | 1992-07-28 | Union Carbide Corporation | Photocurable blends of cyclic ethers and cycloaliphatic epoxides |
| US4857562A (en) * | 1987-01-30 | 1989-08-15 | General Electric Company | UV curable epoxy resin compositions with delayed cure |
| US4929305A (en) * | 1987-01-30 | 1990-05-29 | General Electric Company | Method of bonding using UV curable epoxy resin compositions with delayed cure |
| US4760013A (en) * | 1987-02-17 | 1988-07-26 | International Business Machines Corporation | Sulfonium salt photoinitiators |
| US4997717A (en) * | 1987-03-27 | 1991-03-05 | Ciba-Geigy Corporation | Photocurable abrasives |
| DE3852661D1 (de) * | 1987-03-27 | 1995-02-16 | Ciba Geigy Ag | Photohärtbare Schleifmittel. |
| US4994346A (en) * | 1987-07-28 | 1991-02-19 | Ciba-Geigy Corporation | Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds |
| US5047568A (en) * | 1988-11-18 | 1991-09-10 | International Business Machines Corporation | Sulfonium salts and use and preparation thereof |
| US4954416A (en) * | 1988-12-21 | 1990-09-04 | Minnesota Mining And Manufacturing Company | Tethered sulfonium salt photoinitiators for free radical polymerization |
| US4940651A (en) * | 1988-12-30 | 1990-07-10 | International Business Machines Corporation | Method for patterning cationic curable photoresist |
| US5275880A (en) * | 1989-05-17 | 1994-01-04 | Minnesota Mining And Manufacturing Company | Microwave absorber for direct surface application |
| US5034445A (en) * | 1989-05-26 | 1991-07-23 | Genesee Polymers Corporation | Stabilized polysiloxane fluids and a process for making same |
| US5034446A (en) * | 1989-05-26 | 1991-07-23 | Genesee Polymers Corporation | Stabilized polysiloxane fluids and a process for making the same |
| US5077083A (en) * | 1989-12-04 | 1991-12-31 | Dow Corning Corporation | Epoxy-silanol functional UV curable polymers |
| US5057550A (en) * | 1989-12-04 | 1991-10-15 | Dow Corning Corporation | Epoxy-silanol functional uv curable polymers |
| ES2077664T3 (es) * | 1989-12-07 | 1995-12-01 | Sicpa Holding Sa | Tintas de imprenta altamente reactivas. |
| AU7791691A (en) * | 1990-04-26 | 1991-11-11 | W.R. Chesnut Engineering, Inc. | A rotogravure printing media and methods of manufacturing a rotogravure printing device employing the media |
| US5694852A (en) * | 1990-04-26 | 1997-12-09 | W.R. Chesnut Engineering, Inc. | Rotogravure printing media and methods of manufacturing a rotogravure printing device employing the media |
| JPH04234422A (ja) * | 1990-10-31 | 1992-08-24 | Internatl Business Mach Corp <Ibm> | 二重硬化エポキシバックシール処方物 |
| US5225316A (en) * | 1990-11-26 | 1993-07-06 | Minnesota Mining And Manufacturing Company | An imagable article comprising a photosensitive composition comprising a polymer having acid labile pendant groups |
| US5085972A (en) * | 1990-11-26 | 1992-02-04 | Minnesota Mining And Manufacturing Company | Alkoxyalkyl ester solubility inhibitors for phenolic resins |
| US5102771A (en) * | 1990-11-26 | 1992-04-07 | Minnesota Mining And Manufacturing Company | Photosensitive materials |
| US5206116A (en) * | 1991-03-04 | 1993-04-27 | Shipley Company Inc. | Light-sensitive composition for use as a soldermask and process |
| US5312715A (en) * | 1991-03-04 | 1994-05-17 | Shipley Company Inc. | Light-sensitive composition and process |
| US5248752A (en) * | 1991-11-12 | 1993-09-28 | Union Carbide Chemicals & Plastics Technology Corporation | Polyurethane (meth)acrylates and processes for preparing same |
| US5328940A (en) * | 1992-07-20 | 1994-07-12 | Lord Corporation | Radiation-curable compositions containing hydroxy-terminated polyurethanes and an epoxy compound |
| TW268969B (OSRAM) * | 1992-10-02 | 1996-01-21 | Minnesota Mining & Mfg | |
| JP2719748B2 (ja) * | 1993-02-08 | 1998-02-25 | 信越化学工業株式会社 | 新規なオニウム塩及びそれを用いたポジ型レジスト材料 |
| US5436063A (en) * | 1993-04-15 | 1995-07-25 | Minnesota Mining And Manufacturing Company | Coated abrasive article incorporating an energy cured hot melt make coat |
| US7575653B2 (en) * | 1993-04-15 | 2009-08-18 | 3M Innovative Properties Company | Melt-flowable materials and method of sealing surfaces |
| US6485589B1 (en) | 1993-04-15 | 2002-11-26 | 3M Innovative Properties Company | Melt-flowable materials and method of sealing surfaces |
| US6120878A (en) * | 1993-07-21 | 2000-09-19 | 3M Innovative Properties Company | Abrasive articles comprising vinyl ether functional resins |
| US5310838A (en) * | 1993-09-07 | 1994-05-10 | E. I. Du Pont De Nemours And Company | Functional fluoropolymers |
| EP0665220B1 (en) * | 1994-01-28 | 1999-04-07 | Shin-Etsu Chemical Co., Ltd. | Novel sulfonium salt and chemically amplified positive resist composition |
| TW307791B (OSRAM) * | 1994-02-09 | 1997-06-11 | Ciba Sc Holding Ag | |
| US5597868A (en) * | 1994-03-04 | 1997-01-28 | Massachusetts Institute Of Technology | Polymeric anti-reflective compounds |
| US5856373A (en) * | 1994-10-31 | 1999-01-05 | Minnesota Mining And Manufacturing Company | Dental visible light curable epoxy system with enhanced depth of cure |
| ES2154352T3 (es) | 1994-10-31 | 2001-04-01 | Minnesota Mining & Mfg | Sistema epoxi, curable con luz visible, con profundidad de curado aumentada. |
| DE9420640U1 (de) * | 1994-12-23 | 1995-03-23 | Lord Corp., Cary, N.C. | Strahlungsaushärtbare Zusammensetzungen mit einem Gehalt an hydroxy-terminierten Polyurethanen und einer Epoxy-Verbindung |
| US5612445A (en) * | 1995-02-15 | 1997-03-18 | Arizona Chemical Co. | Ultraviolet curable epoxidized alkyds |
| US5877229A (en) * | 1995-07-26 | 1999-03-02 | Lockheed Martin Energy Systems, Inc. | High energy electron beam curing of epoxy resin systems incorporating cationic photoinitiators |
| DE19534664A1 (de) * | 1995-09-19 | 1997-03-20 | Thera Ges Fuer Patente | Lichtinitiiert kationisch härtende, dauerflexible Epoxidharzmasse und ihre Verwendung |
| DE19534668A1 (de) * | 1995-09-19 | 1997-03-20 | Thera Ges Fuer Patente | Kettenverlängerte Epoxidharze enthaltende, vorwiegend kationisch härtende Masse |
| DE19541075C1 (de) * | 1995-11-03 | 1997-04-24 | Siemens Ag | Photohärtbares Harz mit geringem Schwund und dessen Verwendung in einem Stereolithographieverfahren |
| US6008266A (en) * | 1996-08-14 | 1999-12-28 | International Business Machines Corporation | Photosensitive reworkable encapsulant |
| JPH1087963A (ja) * | 1996-09-20 | 1998-04-07 | Japan Synthetic Rubber Co Ltd | 樹脂組成物および繊維質材料成形型 |
| US5837398A (en) * | 1996-09-26 | 1998-11-17 | Three Bond Co., Ltd. | Radiation curable sealing material for batteries |
| JP3786480B2 (ja) * | 1996-10-14 | 2006-06-14 | Jsr株式会社 | 光硬化性樹脂組成物 |
| JP3626302B2 (ja) * | 1996-12-10 | 2005-03-09 | Jsr株式会社 | 光硬化性樹脂組成物 |
| JP3765896B2 (ja) | 1996-12-13 | 2006-04-12 | Jsr株式会社 | 光学的立体造形用光硬化性樹脂組成物 |
| US6254954B1 (en) | 1997-02-28 | 2001-07-03 | 3M Innovative Properties Company | Pressure-sensitive adhesive tape |
| US6025406A (en) * | 1997-04-11 | 2000-02-15 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy resins |
| US5998495A (en) * | 1997-04-11 | 1999-12-07 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy/polyol resin compositions |
| AU711786B2 (en) * | 1997-05-16 | 1999-10-21 | National Starch And Chemical Investment Holding Corporation | Reactive radiation- or thermally-initiated cationically- curable epoxide monomers and compositions made from those monomers |
| CA2237881A1 (en) * | 1997-05-16 | 1998-11-16 | Rose Ann Schultz | Reactive radiation- or thermally-initiated cationically-curable epoxide monomers and compositions made from those monomers |
| US6020508A (en) * | 1997-05-16 | 2000-02-01 | National Starch And Chemical Investment Holding Corporation | Radiation- or thermally-initiated cationically-curable epoxide compounds and compositions made from those compounds |
| KR20010013348A (ko) | 1997-06-06 | 2001-02-26 | 스프레이그 로버트 월터 | 잉크젯 프린터 펜 중의 결합 시스템 및 이 시스템을제공하는 방법 |
| US6001936A (en) * | 1997-10-24 | 1999-12-14 | 3M Innovative Properties Company | Dye enhanced durability through controlled dye environment |
| US6518362B1 (en) * | 1998-02-18 | 2003-02-11 | 3M Innovative Properties Company | Melt blending polyphenylene ether, polystyrene and curable epoxy |
| US6228133B1 (en) * | 1998-05-01 | 2001-05-08 | 3M Innovative Properties Company | Abrasive articles having abrasive layer bond system derived from solid, dry-coated binder precursor particles having a fusible, radiation curable component |
| US6077601A (en) | 1998-05-01 | 2000-06-20 | 3M Innovative Properties Company | Coated abrasive article |
| US6274643B1 (en) | 1998-05-01 | 2001-08-14 | 3M Innovative Properties Company | Epoxy/thermoplastic photocurable adhesive composition |
| US6057382A (en) * | 1998-05-01 | 2000-05-02 | 3M Innovative Properties Company | Epoxy/thermoplastic photocurable adhesive composition |
| US6136398A (en) * | 1998-05-01 | 2000-10-24 | 3M Innovative Properties Company | Energy cured sealant composition |
| US6187836B1 (en) * | 1998-06-05 | 2001-02-13 | 3M Innovative Properties Company | Compositions featuring cationically active and free radically active functional groups, and methods for polymerizing such compositions |
| US7005394B1 (en) | 1998-07-10 | 2006-02-28 | 3M Innovative Properties Company | Tackified thermoplastic-epoxy pressure sensitive adhesives |
| US6306926B1 (en) * | 1998-10-07 | 2001-10-23 | 3M Innovative Properties Company | Radiopaque cationically polymerizable compositions comprising a radiopacifying filler, and method for polymerizing same |
| US6235850B1 (en) | 1998-12-11 | 2001-05-22 | 3M Immovative Properties Company | Epoxy/acrylic terpolymer self-fixturing adhesive |
| US6489042B2 (en) | 1998-12-23 | 2002-12-03 | 3M Innovative Properties Company | Photoimageable dielectric material for circuit protection |
| US6294270B1 (en) | 1998-12-23 | 2001-09-25 | 3M Innovative Properties Company | Electronic circuit device comprising an epoxy-modified aromatic vinyl-conjugated diene block copolymer |
| DE19927949A1 (de) | 1999-06-18 | 2000-12-21 | Delo Industrieklebstoffe Gmbh | Kationisch härtende Masse, ihre Verwendung sowie Verfahren zur Herstellung gehärteter Polymermassen |
| WO2001025319A1 (en) * | 1999-10-06 | 2001-04-12 | Georg Gros | Adhesive primer for polyamide materials |
| US6387486B1 (en) | 1999-10-29 | 2002-05-14 | Adhesives Research, Inc. | Pressure sensitive adhesive tape and silicone-free release coating used therein |
| US6350792B1 (en) | 2000-07-13 | 2002-02-26 | Suncolor Corporation | Radiation-curable compositions and cured articles |
| US6579914B1 (en) | 2000-07-14 | 2003-06-17 | Alcatel | Coating compositions for optical waveguides and optical waveguides coated therewith |
| US6716568B1 (en) | 2000-09-15 | 2004-04-06 | Microchem Corp. | Epoxy photoresist composition with improved cracking resistance |
| US6696216B2 (en) * | 2001-06-29 | 2004-02-24 | International Business Machines Corporation | Thiophene-containing photo acid generators for photolithography |
| JP2003073481A (ja) | 2001-09-06 | 2003-03-12 | Brother Ind Ltd | 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ |
| US20030218269A1 (en) * | 2001-09-28 | 2003-11-27 | Brother Kogyo Kabushiki Kaisha | Image-receiving layer composition and overcoat layer composition for ink-jet recording |
| JP2003105077A (ja) | 2001-09-28 | 2003-04-09 | Brother Ind Ltd | 活性エネルギー線硬化型組成物、それを含有するインク及びそのインクを使用するプリンタ |
| US6765036B2 (en) * | 2002-01-15 | 2004-07-20 | 3M Innovative Properties Company | Ternary photoinitiator system for cationically polymerizable resins |
| JP2003212965A (ja) * | 2002-01-28 | 2003-07-30 | Brother Ind Ltd | 活性エネルギー線硬化型組成物 |
| US6758734B2 (en) | 2002-03-18 | 2004-07-06 | 3M Innovative Properties Company | Coated abrasive article |
| EP1348727A3 (en) | 2002-03-29 | 2003-12-03 | Brother Kogyo Kabushiki Kaisha | Image-receiving layer composition and overcoat layer composition for ink-jet recording |
| US6773474B2 (en) | 2002-04-19 | 2004-08-10 | 3M Innovative Properties Company | Coated abrasive article |
| EP1507836A1 (en) * | 2002-05-28 | 2005-02-23 | 3M Innovative Properties Company | Adhesive tape |
| KR20050037561A (ko) | 2002-07-24 | 2005-04-22 | 어드헤시브즈 리서치, 인코포레이티드 | 가변형성 감압 접착 테이프 및 디스플레이 스크린에서의그 용도 |
| EP1540419A1 (en) * | 2002-08-30 | 2005-06-15 | Toyo Gosei Kogyo Co., Ltd. | Method for producing a pattern formation mold |
| KR100846418B1 (ko) * | 2002-08-30 | 2008-07-16 | 도요 고세이 고교 가부시키가이샤 | 패턴 형성 방법 |
| US20070006493A1 (en) * | 2003-05-12 | 2007-01-11 | Arnold Eberwein | Illuminated license plate for vehicles and vehicle provided with the same |
| US20070065608A1 (en) * | 2003-07-28 | 2007-03-22 | Valspar Sourcing, Inc. | Metal containers having an easily openable end and method of manufacturing the same |
| WO2005019299A1 (ja) * | 2003-08-21 | 2005-03-03 | Asahi Kasei Chemicals Corporation | 感光性組成物およびその硬化物 |
| US20070031641A1 (en) * | 2003-09-05 | 2007-02-08 | 3M Innovative Properties Company | License plate for back illumination and method for making same |
| WO2005044470A1 (en) * | 2003-10-27 | 2005-05-19 | Adhesives Research, Inc. | Poly (alkylene oxide) polymer-based pressure sensitive adhesive and tapes formed therefrom |
| US7262228B2 (en) * | 2003-11-21 | 2007-08-28 | Curators Of The University Of Missouri | Photoinitiator systems with anthracene-based electron donors for curing cationically polymerizable resins |
| WO2005075080A1 (en) * | 2004-01-30 | 2005-08-18 | Corning Incorporated | Multiwell plate and method for making multiwell plate using a low cytotoxicity photocurable adhesive |
| US20050260522A1 (en) * | 2004-02-13 | 2005-11-24 | William Weber | Permanent resist composition, cured product thereof, and use thereof |
| CN2689322Y (zh) * | 2004-02-28 | 2005-03-30 | 鸿富锦精密工业(深圳)有限公司 | 主机板固定装置 |
| ATE375896T1 (de) * | 2004-04-07 | 2007-11-15 | 3M Innovative Properties Co | Kennzeichenschild-anordnung mit lichtquelle und hinterleuchtetem kennzeichenschild |
| US7449280B2 (en) * | 2004-05-26 | 2008-11-11 | Microchem Corp. | Photoimageable coating composition and composite article thereof |
| US20060026904A1 (en) * | 2004-08-06 | 2006-02-09 | 3M Innovative Properties Company | Composition, coated abrasive article, and methods of making the same |
| US20060065357A1 (en) | 2004-09-24 | 2006-03-30 | Curwood, Inc. | Process for manufacturing packaging laminates and articles made therefrom |
| JP2006131850A (ja) * | 2004-11-09 | 2006-05-25 | Toagosei Co Ltd | 熱硬化性組成物 |
| US8287611B2 (en) * | 2005-01-28 | 2012-10-16 | Saint-Gobain Abrasives, Inc. | Abrasive articles and methods for making same |
| US7591865B2 (en) * | 2005-01-28 | 2009-09-22 | Saint-Gobain Abrasives, Inc. | Method of forming structured abrasive article |
| GB2433637A (en) * | 2005-12-21 | 2007-06-27 | 3M Innovative Properties Co | Semi-transparent retroreflective material |
| EP1967540B1 (en) * | 2005-12-26 | 2013-04-03 | Kaneka Corporation | Curable composition |
| US8435098B2 (en) * | 2006-01-27 | 2013-05-07 | Saint-Gobain Abrasives, Inc. | Abrasive article with cured backsize layer |
| GB0602105D0 (en) * | 2006-02-02 | 2006-03-15 | 3M Innovative Properties Co | License plate assembly |
| WO2008053888A1 (fr) * | 2006-10-31 | 2008-05-08 | Nippon Shokubai Co., Ltd. | Guide d'ondes optique flexible, procédé pour produire celui-ci, et composition de résine époxyde pour un guide d'ondes optique flexible |
| US7714037B1 (en) * | 2006-12-15 | 2010-05-11 | Henkel Corporation | Photoinitiated cationic epoxy compositions and articles exhibiting low color |
| CN101939140B (zh) * | 2006-12-21 | 2012-11-28 | 圣戈本磨料股份有限公司 | 低腐蚀磨料制品及其制备方法 |
| TW200838967A (en) | 2007-02-02 | 2008-10-01 | Jsr Corp | Composition for radiation-curable adhesive, composite, and method for producing the composite |
| US8399592B2 (en) | 2007-04-17 | 2013-03-19 | Kaneka Corporation | Polyhedral polysiloxane modified product and composition using the modified product |
| JP4946640B2 (ja) * | 2007-06-06 | 2012-06-06 | 東洋インキScホールディングス株式会社 | 剥離シート用感エネルギー線重合性組成物、剥離シート、および剥離シートの製造方法 |
| JP5101930B2 (ja) | 2007-06-08 | 2012-12-19 | マブチモーター株式会社 | 多角形状外形の小型モータ |
| JP2008310001A (ja) * | 2007-06-14 | 2008-12-25 | Tokyo Ohka Kogyo Co Ltd | 感光性樹脂組成物及びパターン形成方法 |
| JP2009013315A (ja) * | 2007-07-06 | 2009-01-22 | Toyo Ink Mfg Co Ltd | 封止用組成物 |
| JP4946676B2 (ja) * | 2007-07-06 | 2012-06-06 | 東洋インキScホールディングス株式会社 | 剥離シート用感エネルギー線重合性組成物、剥離シート、および剥離シートの製造方法 |
| JP2009051982A (ja) * | 2007-08-29 | 2009-03-12 | Toyo Ink Mfg Co Ltd | 硬化型粘接着材料 |
| DE102007063698B4 (de) * | 2007-09-13 | 2010-10-28 | Carl Zeiss Vision Gmbh | Optisches Bauelement mit Oberflächenbeschichtung |
| US9464172B2 (en) | 2007-12-10 | 2016-10-11 | Kaneka Corporation | Alkali-developable curable composition, insulating thin film using the same, and thin film transistor |
| US8047368B2 (en) | 2008-01-23 | 2011-11-01 | Curwood, Inc. | Vacuum skin packaging laminate, package and process for using same |
| JP5435879B2 (ja) | 2008-02-14 | 2014-03-05 | 株式会社ダイセル | ナノインプリント用硬化性樹脂組成物 |
| JP5101343B2 (ja) | 2008-03-03 | 2012-12-19 | 株式会社ダイセル | 微細構造物の製造方法 |
| JP2009265519A (ja) * | 2008-04-28 | 2009-11-12 | Hitachi Cable Ltd | フレキシブル光導波路およびその製造方法 |
| JP2010015135A (ja) * | 2008-06-03 | 2010-01-21 | Hitachi Cable Ltd | 光ファイバ固定溝付き光導波路基板およびその製造方法、その製造方法に用いる型、ならびに、その光導波路基板を含む光電気混載モジュール |
| EP2133064A1 (en) * | 2008-06-10 | 2009-12-16 | 3M Innovative Properties Company | Initiator system containing a diarylalkylamine derivate, hardenable composition and use thereof |
| EP2133063A1 (en) | 2008-06-10 | 2009-12-16 | 3M Innovative Properties Company | Initiator system with biphenylene derivates, method of production and use thereof |
| JP5555170B2 (ja) | 2008-10-02 | 2014-07-23 | 株式会社カネカ | 光硬化性組成物および硬化物 |
| CN102348838B (zh) | 2008-12-23 | 2014-09-17 | 3M创新有限公司 | 可固化纤维和包含该纤维的组合物;处理地下地层的方法 |
| WO2010075253A1 (en) | 2008-12-23 | 2010-07-01 | 3M Innovative Properties Company | Fluid composition comprising particles and method of modifying a wellbore using the same |
| EP2485290A4 (en) | 2009-10-01 | 2013-03-06 | Hitachi Chemical Co Ltd | MATERIALS FOR ORGANIC ELECTRONICS, ORGANIC ELECTRONIC ELEMENTS, ORGANIC ELECTROLUMINESCENE ELEMENT, DISPLAY ELEMENT WITH THE ORGANIC ELECTROLUMINESCENE ELEMENT, ILLUMINATION DEVICE AND DISPLAY DEVICE |
| KR101537654B1 (ko) | 2010-04-22 | 2015-07-17 | 히타치가세이가부시끼가이샤 | 유기 일렉트로닉스 재료, 중합 개시제 및 열중합 개시제, 잉크 조성물, 유기 박막 및 그 제조 방법, 유기 일렉트로닉스 소자, 유기 일렉트로 루미네센스 소자, 조명 장치, 표시 소자, 및 표시 장치 |
| JP5622564B2 (ja) | 2010-06-30 | 2014-11-12 | 富士フイルム株式会社 | 感光性組成物、パターン形成材料、並びに、これを用いた感光性膜、パターン形成方法、パターン膜、低屈折率膜、光学デバイス、及び、固体撮像素子 |
| DE102011105593A1 (de) | 2011-06-27 | 2012-12-27 | Sml Verwaltungs Gmbh | Auskleidungsschlauch für die Sanierung von Leitungssystemen und Verfahren zur Sanierung von Leitungssystemen |
| DE102012202377A1 (de) | 2011-10-21 | 2013-04-25 | Tesa Se | Klebemasse insbesondere zur Kapselung einer elektronischen Anordnung |
| CN103087640A (zh) | 2011-11-08 | 2013-05-08 | 汉高股份有限公司 | 双固化粘合剂组合物及其用途以及粘合基底的方法 |
| US9096759B2 (en) | 2011-12-21 | 2015-08-04 | E I Du Pont De Nemours And Company | Printing form and process for preparing the printing form with curable composition having solvent-free epoxy resin |
| DE102012206273A1 (de) | 2012-04-17 | 2013-10-17 | Tesa Se | Vernetzbare Klebmasse mit Hart- und Weichblöcken als Permeantenbarriere |
| SG11201502443WA (en) * | 2012-09-29 | 2015-04-29 | 3M Innovative Properties Co | Adhesive composition and adhesive tape |
| JP6170563B2 (ja) | 2012-10-02 | 2017-07-26 | ブルースター・シリコーンズ・フランス・エスアエス | ホウ酸ヨードニウムを含み、許容できる臭いを放出する、カチオン架橋/重合可能な組成物 |
| JP5967824B2 (ja) | 2012-10-26 | 2016-08-10 | 日本化薬株式会社 | 感光性樹脂組成物、レジスト積層体及びそれらの硬化物 |
| JP5901070B2 (ja) | 2012-10-26 | 2016-04-06 | 日本化薬株式会社 | 感光性樹脂組成物、レジスト積層体及びそれらの硬化物 |
| JP6066413B2 (ja) | 2012-11-22 | 2017-01-25 | 日本化薬株式会社 | 感光性樹脂組成物、レジスト積層体及びそれらの硬化物 |
| JP5939964B2 (ja) | 2012-11-22 | 2016-06-29 | 日本化薬株式会社 | 感光性樹脂組成物、レジスト積層体及びそれらの硬化物 |
| DE102012222056A1 (de) | 2012-12-03 | 2014-06-05 | Tesa Se | Lamination starrer Substrate mit dünnen Klebebändern |
| WO2014092826A1 (en) | 2012-12-12 | 2014-06-19 | Empire Technology Development Llc | Nano-encapsulating polymers with high barrier properties |
| DE102012024905A1 (de) | 2012-12-20 | 2014-06-26 | Sml Verwaltungs Gmbh | Auskleidungsschlauch für die Sanierung von Leitungssystemen und Verfahren zur Sanierung von Leitungssystemen |
| EP2759514A1 (de) | 2013-01-29 | 2014-07-30 | tesa SE | Haftklebemasse enthaltend ein verbundenes Nanopartikelnetzwerk, Verfahren zu ihrer Herstellung sowie die Verwendung derselben |
| US10665786B2 (en) | 2013-03-08 | 2020-05-26 | Hitachi Chemical Company, Ltd. | Treatment liquid containing ionic compound, organic electronic element, and method for producing organic electronic element |
| DE102013211047B4 (de) | 2013-06-13 | 2015-04-30 | MTU Aero Engines AG | Verfahren zum Verschließen von Kühlluftbohrungen |
| CN107001892B (zh) | 2014-10-29 | 2019-09-06 | 德莎欧洲股份公司 | 包含多官能性硅氧烷水清除剂的胶粘剂 |
| JP6470409B2 (ja) | 2014-10-29 | 2019-02-13 | テーザ・ソシエタス・ヨーロピア | シラン系水捕捉剤を含むoled適合接着剤 |
| US20170327717A1 (en) | 2014-10-29 | 2017-11-16 | Tesa Se | Adhesive compounds containing getter materials that can be activated |
| EP3253842A1 (de) | 2015-02-06 | 2017-12-13 | tesa SE | Klebemasse mit reduziertem gelbwert |
| EP3091059B1 (de) | 2015-05-05 | 2020-09-09 | tesa SE | Klebeband mit klebemasse mit kontinuierlicher polymerphase |
| DE102015217860A1 (de) | 2015-05-05 | 2016-11-10 | Tesa Se | Klebeband mit Klebemasse mit kontinuierlicher Polymerphase |
| EP3320053B1 (en) | 2015-06-04 | 2020-06-17 | 3M Innovative Properties Company | Uv curable epoxy/acrylate adhesive composition |
| DE102015210345A1 (de) | 2015-06-04 | 2016-12-08 | Tesa Se | Wasserdampfsperrende Klebemasse mit anpolymerisiertem Epoxidsirup |
| DE102015210346A1 (de) | 2015-06-04 | 2016-12-08 | Tesa Se | Verfahren zur Herstellung viskoser Epoxidsirupe und danach erhältliche Epoxidsirupe |
| CN108884363B (zh) | 2016-04-04 | 2021-10-15 | 德莎欧洲股份公司 | 具有暗反应的可辐射活化的压敏胶带及其用途 |
| DE102016207550A1 (de) | 2016-05-02 | 2017-11-02 | Tesa Se | Funktionalisierte (Co)Polymere für Klebesysteme und Klebebänder |
| DE102016207540A1 (de) | 2016-05-02 | 2017-11-02 | Tesa Se | Wasserdampfsperrende Klebemasse mit hochfunktionalisiertem Poly(meth)acrylat |
| DE102016213911A1 (de) | 2016-07-28 | 2018-02-01 | Tesa Se | OLED kompatible Klebemassen mit cyclischen Azasilanwasserfängern |
| WO2018102198A1 (en) | 2016-12-02 | 2018-06-07 | 3M Innovative Properties Company | Multilayer adhesive article |
| WO2019082148A1 (en) | 2017-10-26 | 2019-05-02 | 3M Innovative Properties Company | SOFT ABRASIVE ARTICLE WITH IMAGE LAYER |
| DE102017221072A1 (de) | 2017-11-24 | 2019-05-29 | Tesa Se | Verfahren zur Herstellung haftklebriger Reaktivklebebänder |
| US10297370B1 (en) | 2017-12-14 | 2019-05-21 | Tesa Se | Forming a rigid cable harness with a curable sleeve |
| DE102018202545A1 (de) | 2018-02-20 | 2019-08-22 | Tesa Se | Zusammensetzung zur Erzeugung einer Klebemasse insbesondere zur Kapselung einer elektronischen Anordnung |
| DE102018216868A1 (de) | 2018-10-01 | 2020-04-02 | Tesa Se | Latent reaktiver Klebefilm |
| JP7297442B2 (ja) * | 2018-12-27 | 2023-06-26 | キヤノン株式会社 | 微細構造体の製造方法及び液体吐出ヘッドの製造方法 |
| DE102019103120A1 (de) | 2019-02-08 | 2020-08-13 | Tesa Se | UV-härtbares Klebeband und Verfahren zum Ummanteln von langgestrecktem Gut insbesondere Leitungen |
| DE102019103123A1 (de) | 2019-02-08 | 2020-08-13 | Tesa Se | Thermisch erweichbares Klebeband und Verfahren zum Ummanteln von langgestrecktem Gut insbesondere Leitungen |
| DE102019103122A1 (de) | 2019-02-08 | 2020-08-13 | Tesa Se | Mit Feuchtigkeit härtbares Klebeband und Verfahren zum Ummanteln von langgestrecktem Gut insbesondere Leitungen |
| DE102019207550A1 (de) | 2019-05-23 | 2020-11-26 | Tesa Se | Verfahren zur Herstellung haftklebriger Reaktivklebebänder |
| KR20220044737A (ko) | 2019-08-07 | 2022-04-11 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | Uv 경화성 접착제 조성물 및 접착 필름, 접착 테이프, 및 이를 포함하는 접합 구성 요소 |
| CN113072900B (zh) | 2020-01-06 | 2022-09-23 | 3M创新有限公司 | 可紫外光固化的压敏胶组合物及可紫外光固化的压敏胶带 |
| WO2022144734A1 (en) | 2020-12-31 | 2022-07-07 | 3M Innovative Properties Company | Uv-curable tape |
| DE102021201094A1 (de) | 2021-02-05 | 2022-08-11 | Tesa Se | Polyvinylaromat-Polydien-Blockcopolymer basierende Haftklebemassen mit gesteigerter Wärmescherfestigkeit |
| JP7672840B2 (ja) * | 2021-02-26 | 2025-05-08 | キヤノン株式会社 | 積層体の製造方法及び液体吐出ヘッドの製造方法 |
| JP7628369B2 (ja) * | 2021-05-31 | 2025-02-10 | 株式会社ディスコ | 樹脂シート、樹脂シートの製造方法、及び樹脂被覆方法 |
| DE102021126466A1 (de) | 2021-10-13 | 2023-04-13 | Tesa Se | Klebeband und Verfahren zum Ummanteln von langgestrecktem Gut insbesondere Leitungen |
| DE102021131472A1 (de) | 2021-11-30 | 2023-06-01 | Relineeurope Gmbh | Auskleidungsschlauch zur Sanierung fluidführender Leitungssysteme |
| DE102022105737A1 (de) | 2022-03-11 | 2023-09-14 | Tesa Se | Aushärtbare Klebemasse mit verbesserter Stanzbarkeit und verbesserten Schockeigenschaften |
| DE102022105738A1 (de) | 2022-03-11 | 2023-09-14 | Tesa Se | Aushärtbare Klebemasse mit verbesserter Stanzbarkeit |
| WO2024003637A1 (en) | 2022-06-29 | 2024-01-04 | 3M Innovative Properties Company | Curable adhesive and articles for bonding pavement and concrete |
| DE102022117183A1 (de) | 2022-07-11 | 2024-01-11 | Tesa Se | Unvernetztes Polyepoxid und Klebemasse umfassend dieses Polyepoxid |
| DE102022124903A1 (de) | 2022-09-28 | 2024-03-28 | Tesa Se | Kationisch härtbare Klebemasse mit definierter Färbung im ausgehärteten Zustand |
| DE102022124905A1 (de) | 2022-09-28 | 2024-03-28 | Tesa Se | Verfahren zur Ummantelung einer Batteriezelle |
| DE102022124902A1 (de) | 2022-09-28 | 2024-03-28 | Tesa Se | Kationisch härtbare Klebemasse mit Indikation der Haltefestigkeit |
| DE102022124904A1 (de) | 2022-09-28 | 2024-03-28 | Tesa Se | Aushärtbare Haftklebemasse mit verbesserten Klebeeigenschaften |
| DE102023111055A1 (de) | 2023-04-28 | 2024-10-31 | Tesa Se | Chemikalienbeständiges, reaktives Haftklebeband |
| DE102023111054A1 (de) | 2023-04-28 | 2024-10-31 | Tesa Se | Kationisch härtbare Klebmasse, insbesondere zur Verklebung von metallischen Substraten |
| DE102023135599A1 (de) | 2023-12-18 | 2025-06-18 | Tesa Se | Aushärtbare Haftklebemasse mit hoher Verklebungsfestigkeit und guter Klebkraft im ausgehärteten Zustand |
| CN120230493A (zh) | 2023-12-28 | 2025-07-01 | 德莎欧洲股份公司 | 固化性电绝缘带 |
| DE102024107751A1 (de) | 2024-03-19 | 2025-09-25 | Tesa Se | Chemikalienbeständige, reaktiv aushärtbare Klebemasse und Klebeband |
| DE102024107753A1 (de) | 2024-03-19 | 2025-09-25 | Tesa Se | Reaktives Klebeband |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE564172A (OSRAM) * | 1957-01-22 | |||
| US3410824A (en) * | 1965-03-19 | 1968-11-12 | Ralph B. Atkinson | Light sensitive resin from a dihydroxy chalcone and an epoxy prepolymer |
| US3412046A (en) * | 1965-07-01 | 1968-11-19 | Dexter Corp | Catalyzed polyepoxide-anhydride resin systems |
| US3567453A (en) * | 1967-12-26 | 1971-03-02 | Eastman Kodak Co | Light sensitive compositions for photoresists and lithography |
| US3826650A (en) * | 1968-08-20 | 1974-07-30 | American Can Co | Epoxy photopolymer duplicating stencil |
| DE2115918C3 (de) * | 1971-04-01 | 1980-04-24 | Hoechst Ag, 6000 Frankfurt | Verfahren zur Herstellung von Epoxydpolyaddukten |
| US3711390A (en) * | 1971-05-18 | 1973-01-16 | J Feinberg | Photopolymerizable epoxy systems containing substituted cyclic amides or substituted ureas as gelation inhibitors |
| US3816280A (en) * | 1971-05-18 | 1974-06-11 | American Can Co | Photopolymerizable epoxy systems containing cyclic amide gelation inhibitors |
| US3729313A (en) * | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
| US3816281A (en) * | 1973-04-30 | 1974-06-11 | American Can Co | Poly(vinyl pyrrolidone)stabilized polymerized epoxy compositions and process for irradiating same |
| AU497960B2 (en) * | 1974-04-11 | 1979-01-25 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions |
| US4175972A (en) * | 1974-05-02 | 1979-11-27 | General Electric Company | Curable epoxy compositions containing aromatic onium salts and hydroxy compounds |
| US4175973A (en) * | 1974-05-02 | 1979-11-27 | General Electric Company | Curable compositions |
| GB1516351A (en) * | 1974-05-02 | 1978-07-05 | Gen Electric | Curable epoxide compositions |
| US4058401A (en) * | 1974-05-02 | 1977-11-15 | General Electric Company | Photocurable compositions containing group via aromatic onium salts |
| GB1516512A (en) * | 1974-05-02 | 1978-07-05 | Gen Electric | Chalcogenium salts |
| US4026705A (en) * | 1975-05-02 | 1977-05-31 | General Electric Company | Photocurable compositions and methods |
| US4108747A (en) * | 1976-07-14 | 1978-08-22 | General Electric Company | Curable compositions and method for curing such compositions |
-
1975
- 1975-09-02 US US05/609,898 patent/US4256828A/en not_active Expired - Lifetime
-
1976
- 1976-08-09 CA CA258,706A patent/CA1114089A/en not_active Expired
- 1976-08-30 SE SE7609584A patent/SE427277C/xx unknown
- 1976-09-01 IT IT51101/76A patent/IT1066298B/it active
- 1976-09-01 BR BR7605796A patent/BR7605796A/pt unknown
- 1976-09-01 DE DE19762639395 patent/DE2639395A1/de active Granted
- 1976-09-01 CH CH1108276A patent/CH630655A5/de not_active IP Right Cessation
- 1976-09-01 ZA ZA765241A patent/ZA765241B/xx unknown
- 1976-09-01 JP JP51103780A patent/JPS5942688B2/ja not_active Expired
- 1976-09-01 FR FR7626391A patent/FR2322897A1/fr active Granted
- 1976-09-01 GB GB36215/76A patent/GB1565671A/en not_active Expired
- 1976-09-01 AU AU17359/76A patent/AU497066B2/en not_active Expired
- 1976-09-01 BE BE170268A patent/BE845746A/xx not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19736471A1 (de) * | 1997-08-21 | 1999-02-25 | Espe Dental Ag | Lichtinduziert kationisch härtende Zusammensetzungen und deren Verwendung |
Also Published As
| Publication number | Publication date |
|---|---|
| SE427277B (sv) | 1983-03-21 |
| IT1066298B (it) | 1985-03-04 |
| AU1735976A (en) | 1978-03-09 |
| AU497066B2 (en) | 1978-11-23 |
| SE7609584L (sv) | 1977-03-03 |
| JPS5942688B2 (ja) | 1984-10-17 |
| BE845746A (fr) | 1977-03-01 |
| FR2322897B1 (OSRAM) | 1982-01-29 |
| GB1565671A (en) | 1980-04-23 |
| CA1114089A (en) | 1981-12-08 |
| US4256828A (en) | 1981-03-17 |
| DE2639395A1 (de) | 1977-03-10 |
| CH630655A5 (de) | 1982-06-30 |
| FR2322897A1 (fr) | 1977-04-01 |
| JPS5230899A (en) | 1977-03-08 |
| BR7605796A (pt) | 1977-08-16 |
| ZA765241B (en) | 1977-08-31 |
| SE427277C (sv) | 1985-07-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE2639395C2 (OSRAM) | ||
| US4318766A (en) | Process of using photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials | |
| DE2954646C2 (OSRAM) | ||
| EP0646580B1 (de) | Vinyletherverbindungen mit zusätzlichen von Vinylethergruppen verschiedenen funktionellen Gruppen und deren Verwendung zur Formulierung härtbarer Zusammensetzungen | |
| DE60129666T2 (de) | Polymerisierbare zusammensetzung und gehärtetes harz daraus, verfahren zur seiner herstellung | |
| DE2520489C2 (de) | Photopolymerisierbare Massen | |
| EP0022081B1 (de) | Sulphoxoniumsalze enthaltende polymerisierbare Mischungen sowie Verfahren zur Herstellung hochmolekularer Produkte aus diesen Mischungen durch Bestrahlung | |
| US4231951A (en) | Complex salt photoinitiator | |
| EP0054509B1 (de) | Sulfoxoniumsalzpolymerisationskatalysatoren | |
| DE2035890B2 (de) | Verfahren zur polymerisation von monomeren epoxyden | |
| DE69119764T2 (de) | Energiehärtbare, kationisch oder radikalisch polymerisierbare druckempfindliche zusammensetzungen | |
| DE2315500A1 (de) | Polymerisierbares epoxydgemisch | |
| US4977199A (en) | Photo curable blends of 2-methyoxytetrahydropyran and a cycloaliphatic diepoxide | |
| EP0380010B1 (de) | Strahlungsempfindliche, ethylenisch ungesättigte, copolymerisierbare Sulfoniumsalze und Verfahren zu deren Herstellung | |
| DE3604580A1 (de) | Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren | |
| DE2602574A1 (de) | Photopolymerisierbare massen | |
| EP0146501A2 (de) | Polymerisierbare Zusammensetzungen | |
| DE2618897A1 (de) | Haertbare zusammensetzungen | |
| US4378277A (en) | Photopolymerizable epoxy-containing compositions | |
| CH642387A5 (de) | Photopolymerisierbare gemische. | |
| DE2557078C3 (de) | Lichtempfindliche Masse | |
| DE69729463T2 (de) | Monomere, oligomere und polymere mit oxiranendgruppen, verfahren zu ihrer herstellung und ihre kationische strahlungspolymerisation | |
| EP0145653B1 (de) | Photopolymerisierbare Zusammensetzungen | |
| DE2361141A1 (de) | Photopolymerisierbare materialien und verfahren zur photopolymerisation | |
| DE4305332A1 (en) | New sulphonium salts with olefinic gps. - useful as photoinitiators for cationic polymerisation and for prodn. of photoresists |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8110 | Request for examination paragraph 44 | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8328 | Change in the person/name/address of the agent |
Free format text: TAUCHNER, P., DIPL.-CHEM. DR.RER.NAT. HEUNEMANN, D., DIPL.-PHYS. DR.RER.NAT. RAUH, P., DIPL.-CHEM. DR.RER.NAT. HERMANN, G., DIPL.-PHYS. DR.RER.NAT. SCHMIDT, J., DIPL.-ING. JAENICHEN, H., DIPL.-BIOL. DR.RER.NAT., PAT.-ANWAELTE TREMMEL, H., RECHTSANW., 8000 MUENCHEN |