DE19982072T1 - Hochgeschwindigkeits-Präzisionspositioniervor- richtung - Google Patents
Hochgeschwindigkeits-Präzisionspositioniervor- richtungInfo
- Publication number
- DE19982072T1 DE19982072T1 DE19982072T DE19982072T DE19982072T1 DE 19982072 T1 DE19982072 T1 DE 19982072T1 DE 19982072 T DE19982072 T DE 19982072T DE 19982072 T DE19982072 T DE 19982072T DE 19982072 T1 DE19982072 T1 DE 19982072T1
- Authority
- DE
- Germany
- Prior art keywords
- stage
- forces
- motion
- planar
- cancellation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
- H02K41/02—Linear motors; Sectional motors
- H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
- H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K16/00—Machines with more than one rotor or stator
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K2201/00—Specific aspects not provided for in the other groups of this subclass relating to the magnetic circuits
- H02K2201/18—Machines moving with multiple degrees of freedom
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K7/00—Arrangements for handling mechanical energy structurally associated with dynamo-electric machines, e.g. structural association with mechanical driving motors or auxiliary dynamo-electric machines
- H02K7/08—Structural association with bearings
-
- H—ELECTRICITY
- H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
- H02K—DYNAMO-ELECTRIC MACHINES
- H02K7/00—Arrangements for handling mechanical energy structurally associated with dynamo-electric machines, e.g. structural association with mechanical driving motors or auxiliary dynamo-electric machines
- H02K7/14—Structural association with mechanical loads, e.g. with hand-held machine tools or fans
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Control Of Position Or Direction (AREA)
- Control Of Motors That Do Not Use Commutators (AREA)
- Optical Radar Systems And Details Thereof (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Length Measuring Devices With Unspecified Measuring Means (AREA)
- Details Of Measuring And Other Instruments (AREA)
- Vehicle Body Suspensions (AREA)
- Automatic Control Of Machine Tools (AREA)
- Machine Tool Units (AREA)
- Linear Motors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/156,895 US6144118A (en) | 1998-09-18 | 1998-09-18 | High-speed precision positioning apparatus |
PCT/US1999/020932 WO2000017724A1 (en) | 1998-09-18 | 1999-09-13 | High-speed precision positioning apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
DE19982072T1 true DE19982072T1 (de) | 2001-01-04 |
Family
ID=22561554
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69937547T Expired - Lifetime DE69937547T2 (de) | 1998-09-18 | 1999-09-13 | Geraet zur genauen hochgeschwindigkeits-positionierung |
DE19982072T Withdrawn DE19982072T1 (de) | 1998-09-18 | 1999-09-13 | Hochgeschwindigkeits-Präzisionspositioniervor- richtung |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69937547T Expired - Lifetime DE69937547T2 (de) | 1998-09-18 | 1999-09-13 | Geraet zur genauen hochgeschwindigkeits-positionierung |
Country Status (8)
Country | Link |
---|---|
US (3) | US6144118A (de) |
EP (1) | EP1055163B1 (de) |
JP (3) | JP4970651B2 (de) |
KR (1) | KR100583040B1 (de) |
AT (1) | ATE378625T1 (de) |
DE (2) | DE69937547T2 (de) |
TW (1) | TW449680B (de) |
WO (1) | WO2000017724A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013102477A1 (de) * | 2013-03-12 | 2014-09-18 | Carl Mahr Holding Gmbh | Positioniervorrichtung für mehrachsige Verstelltische |
Families Citing this family (157)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5998759A (en) * | 1996-12-24 | 1999-12-07 | General Scanning, Inc. | Laser processing |
US6441514B1 (en) * | 1997-04-28 | 2002-08-27 | Ultratech Stepper, Inc. | Magnetically positioned X-Y stage having six degrees of freedom |
US6260282B1 (en) * | 1998-03-27 | 2001-07-17 | Nikon Corporation | Stage control with reduced synchronization error and settling time |
US6144118A (en) * | 1998-09-18 | 2000-11-07 | General Scanning, Inc. | High-speed precision positioning apparatus |
US20040222708A1 (en) * | 1998-11-13 | 2004-11-11 | Barry Reginald Hobson | Electric oscillatory machine |
US6300590B1 (en) * | 1998-12-16 | 2001-10-09 | General Scanning, Inc. | Laser processing |
US7838794B2 (en) | 1999-12-28 | 2010-11-23 | Gsi Group Corporation | Laser-based method and system for removing one or more target link structures |
US7723642B2 (en) | 1999-12-28 | 2010-05-25 | Gsi Group Corporation | Laser-based system for memory link processing with picosecond lasers |
US7671295B2 (en) | 2000-01-10 | 2010-03-02 | Electro Scientific Industries, Inc. | Processing a memory link with a set of at least two laser pulses |
US20030024913A1 (en) * | 2002-04-15 | 2003-02-06 | Downes Joseph P. | Laser scanning method and system for marking articles such as printed circuit boards, integrated circuits and the like |
TW507120B (en) * | 2000-05-16 | 2002-10-21 | Gen Scanning Inc | Method and subsystem for generating a trajectory to be followed by a motor-driven stage when processing microstructures at a laser-processing site |
US20040111174A1 (en) * | 2000-05-16 | 2004-06-10 | Gsi Lumonics Corporation | Method and subsystem for determining a sequence in which microstructures are to be processed at a laser-processing site |
US6662063B2 (en) | 2000-05-16 | 2003-12-09 | Gsi Lumonics Corporation | Method and subsystem for determining a sequence in which microstructures are to be processed at a laser-processing site |
US6495791B2 (en) | 2000-05-16 | 2002-12-17 | General Scanning, Inc. | Method and subsystem for generating a trajectory to be followed by a motor-driven stage when processing microstructures at a laser-processing site |
DE60117719T2 (de) * | 2000-06-26 | 2006-11-16 | Samsung Electronics Co., Ltd. | Elektromagnetisches X-Y Positioniersystem für Nanodatenspeichersystem und Verfahren zur Herstellung von Spulen für dasselbige |
TW527526B (en) * | 2000-08-24 | 2003-04-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
US7561270B2 (en) | 2000-08-24 | 2009-07-14 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
JP2002184662A (ja) * | 2000-10-04 | 2002-06-28 | Nikon Corp | ステージ装置及び露光装置 |
US6816294B2 (en) * | 2001-02-16 | 2004-11-09 | Electro Scientific Industries, Inc. | On-the-fly beam path error correction for memory link processing |
US7245412B2 (en) * | 2001-02-16 | 2007-07-17 | Electro Scientific Industries, Inc. | On-the-fly laser beam path error correction for specimen target location processing |
US8497450B2 (en) * | 2001-02-16 | 2013-07-30 | Electro Scientific Industries, Inc. | On-the fly laser beam path dithering for enhancing throughput |
US6864601B2 (en) * | 2001-03-01 | 2005-03-08 | Nikon Corporation | Electric motors with reduced stray magnetic fields |
JP2004532517A (ja) * | 2001-03-26 | 2004-10-21 | サイマー, インコーポレイテッド | 振動制御の方法及び装置 |
US20070173075A1 (en) * | 2001-03-29 | 2007-07-26 | Joohan Lee | Laser-based method and system for processing a multi-material device having conductive link structures |
US6777645B2 (en) * | 2001-03-29 | 2004-08-17 | Gsi Lumonics Corporation | High-speed, precision, laser-based method and system for processing material of one or more targets within a field |
KR100396020B1 (ko) * | 2001-04-16 | 2003-08-27 | 박희재 | 초정밀 위치결정시스템 |
US6480651B1 (en) | 2001-07-13 | 2002-11-12 | Jds Uniphase Inc. | Method and apparatus for aligning optical components |
ITUD20010209A1 (it) * | 2001-12-14 | 2003-06-16 | Gisulfo Baccini | Motore lineare e procedimento di fabbricazione di tale motore lineare |
US6951995B2 (en) | 2002-03-27 | 2005-10-04 | Gsi Lumonics Corp. | Method and system for high-speed, precise micromachining an array of devices |
US6800833B2 (en) | 2002-03-29 | 2004-10-05 | Mariusch Gregor | Electromagnetically levitated substrate support |
KR20030083350A (ko) * | 2002-04-22 | 2003-10-30 | 삼성전자주식회사 | 엑스와이스테이지의 캘리브레이션 방법 |
EP1357429A1 (de) * | 2002-04-23 | 2003-10-29 | ASML Netherlands B.V. | Lithographisches Gerät und Verfahren zur Herstellung einer Vorrichtung |
EP1357434A1 (de) * | 2002-04-23 | 2003-10-29 | ASML Netherlands B.V. | Lithographisches Gerät und Verfahren zur Herstellung einer Vorrichtung |
US6885116B2 (en) * | 2002-05-06 | 2005-04-26 | Jeffrey G. Knirck | Moving coil linear motor positioning stage with a concentric aperture |
US7119351B2 (en) * | 2002-05-17 | 2006-10-10 | Gsi Group Corporation | Method and system for machine vision-based feature detection and mark verification in a workpiece or wafer marking system |
JP3942971B2 (ja) * | 2002-07-08 | 2007-07-11 | 株式会社ソディック | 移動体駆動装置 |
US6777896B2 (en) * | 2002-07-09 | 2004-08-17 | Nikon Corporation | Methods and apparatus for initializing a planar motor |
WO2004012260A1 (ja) * | 2002-07-30 | 2004-02-05 | Tamura Corporation | 精密加工用ステージ装置 |
EP1418017A3 (de) * | 2002-08-29 | 2008-12-24 | Canon Kabushiki Kaisha | Positioniervorrichtung, Geladenen-Teilchenstrahl-Belichtungsvorrichtung und Verfahren zur Herstellung einer Halbleitervorrichtung |
US6841956B2 (en) * | 2002-09-17 | 2005-01-11 | Nikon Corporation | Actuator to correct for off center-of-gravity line of force |
US6882901B2 (en) * | 2002-10-10 | 2005-04-19 | Shao-Wei Gong | Ultra-precision robotic system |
US6706999B1 (en) * | 2003-02-24 | 2004-03-16 | Electro Scientific Industries, Inc. | Laser beam tertiary positioner apparatus and method |
JP2004364392A (ja) * | 2003-06-03 | 2004-12-24 | Canon Inc | リニアモータ、及びこれを備えるステージ装置、露光装置並びにデバイス製造方法 |
JP2005005393A (ja) * | 2003-06-10 | 2005-01-06 | Canon Inc | ステージ装置、露光装置、およびデバイス製造方法 |
US7057370B2 (en) * | 2003-06-21 | 2006-06-06 | Igor Victorovich Touzov | Ultra-fast precision motor with X, Y and Theta motion and ultra-fast optical decoding and absolute position detector |
KR20070008533A (ko) | 2003-11-10 | 2007-01-17 | 블루쉬프트 테크놀로지스, 인코포레이티드. | 진공-사용 반도체 핸들링 시스템에서 작업 편을 핸들링하기위한 방법 및 시스템 |
US7458763B2 (en) | 2003-11-10 | 2008-12-02 | Blueshift Technologies, Inc. | Mid-entry load lock for semiconductor handling system |
US10086511B2 (en) | 2003-11-10 | 2018-10-02 | Brooks Automation, Inc. | Semiconductor manufacturing systems |
US20070269297A1 (en) | 2003-11-10 | 2007-11-22 | Meulen Peter V D | Semiconductor wafer handling and transport |
US7168553B2 (en) * | 2003-11-13 | 2007-01-30 | Applied Materials, Inc. | Dynamically balanced substrate carrier handler |
JP2005168154A (ja) * | 2003-12-02 | 2005-06-23 | Chiba Seimitsu:Kk | 平面モータ |
JP2005223163A (ja) * | 2004-02-06 | 2005-08-18 | Hitachi High-Technologies Corp | ステージ制御装置,ステージ制御方法、および製造装置 |
US20060000814A1 (en) | 2004-06-30 | 2006-01-05 | Bo Gu | Laser-based method and system for processing targeted surface material and article produced thereby |
US7256871B2 (en) * | 2004-07-27 | 2007-08-14 | Asml Netherlands B.V. | Lithographic apparatus and method for calibrating the same |
CN100521468C (zh) * | 2004-08-20 | 2009-07-29 | 清华大学 | 永磁同步平面电动机 |
JP4617119B2 (ja) * | 2004-08-30 | 2011-01-19 | キヤノン株式会社 | 駆動装置、露光装置及びデバイス製造方法 |
US7492440B2 (en) * | 2004-09-09 | 2009-02-17 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
KR100629390B1 (ko) * | 2004-09-21 | 2006-09-29 | 삼성전자주식회사 | 광학계 위치제어수단을 갖는 반도체 제조용 노광장치 및이를 이용한 노광방법 |
US7170581B2 (en) * | 2004-10-27 | 2007-01-30 | Asml Netherlands B.V. | Self-adapting feedforward control tuning for motion system, and lithographic apparatus provided with such a motion system |
JP4715168B2 (ja) * | 2004-11-17 | 2011-07-06 | 株式会社安川電機 | 平面サーボモータ装置および平面サーボモータ装置用プラテン |
JP2008521379A (ja) * | 2004-11-19 | 2008-06-19 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 電動モータを制御する方法、制御ユニット及び電動モータ |
KR100618639B1 (ko) * | 2004-12-28 | 2006-09-08 | 동부일렉트로닉스 주식회사 | 웨이퍼 보트의 수평 감지 장치 |
US20070091976A1 (en) * | 2005-10-25 | 2007-04-26 | Ray Curtis A | Edge emitting laser diode assembly having adjustable mounting of diodes |
EP3171220A1 (de) * | 2006-01-19 | 2017-05-24 | Nikon Corporation | Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung einer vorrichtung |
JP4498285B2 (ja) * | 2006-02-01 | 2010-07-07 | キヤノン株式会社 | 走査型プローブ装置 |
CN101986209B (zh) * | 2006-02-21 | 2012-06-20 | 株式会社尼康 | 曝光装置、曝光方法及组件制造方法 |
US20070215575A1 (en) * | 2006-03-15 | 2007-09-20 | Bo Gu | Method and system for high-speed, precise, laser-based modification of one or more electrical elements |
US7818073B2 (en) * | 2006-04-20 | 2010-10-19 | Asml Netherlands B.V. | Method for obtaining improved feedforward data, a lithographic apparatus for carrying out the method and a device manufacturing method |
KR100671241B1 (ko) * | 2006-05-12 | 2007-01-19 | 충주대학교 산학협력단 | 공극 변위 측정을 이용한 평면 스테이지 면내 위치 검출방법 및 장치 |
KR100663699B1 (ko) * | 2006-07-04 | 2007-01-05 | 한국생산기술연구원 | 스테이지장치의 스테이지와 구동부의 결합장치 |
US8084706B2 (en) * | 2006-07-20 | 2011-12-27 | Gsi Group Corporation | System and method for laser processing at non-constant velocities |
KR101711323B1 (ko) * | 2006-08-31 | 2017-02-28 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
KR101634893B1 (ko) * | 2006-08-31 | 2016-06-29 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법 |
TWI655517B (zh) * | 2006-08-31 | 2019-04-01 | 日商尼康股份有限公司 | Exposure apparatus and method, and component manufacturing method |
KR101660667B1 (ko) * | 2006-09-01 | 2016-09-27 | 가부시키가이샤 니콘 | 이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 디바이스 제조 방법, 그리고 캘리브레이션 방법 |
JP5020597B2 (ja) * | 2006-10-27 | 2012-09-05 | キヤノン株式会社 | 位置決め装置、露光装置、及びデバイス製造方法 |
US7898204B2 (en) * | 2007-01-05 | 2011-03-01 | Active Precision, Inc. | High-speed substrate manipulator |
US8278595B2 (en) * | 2007-03-16 | 2012-10-02 | Electro Scientific Industries, Inc. | Use of predictive pulse triggering to improve accuracy in link processing |
US8026158B2 (en) * | 2007-06-01 | 2011-09-27 | Electro Scientific Industries, Inc. | Systems and methods for processing semiconductor structures using laser pulses laterally distributed in a scanning window |
US20080303474A1 (en) * | 2007-06-08 | 2008-12-11 | Gsi Group Corporation | Systems and methods for controlling limited rotation motor systems |
US7535193B2 (en) * | 2007-06-18 | 2009-05-19 | Xradia, Inc. | Five axis compensated rotating stage |
US8076605B2 (en) * | 2007-06-25 | 2011-12-13 | Electro Scientific Industries, Inc. | Systems and methods for adapting parameters to increase throughput during laser-based wafer processing |
WO2009001385A1 (en) * | 2007-06-28 | 2008-12-31 | Hexagon Metrology S.P.A. | Method for determining dynamic errors in a measuring machine |
ATE482050T1 (de) | 2007-06-30 | 2010-10-15 | Trumpf Werkzeugmaschinen Gmbh | Maschine zum bearbeiten von werkstücken und verfahren zum maschinellen bearbeiten von werkstücken |
KR20140137465A (ko) * | 2007-09-19 | 2014-12-02 | 지에스아이 그룹 코포레이션 | 고속 빔 편향 링크 가공 |
EP2159304A1 (de) * | 2008-08-27 | 2010-03-03 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Vorrichtung und Verfahren zur Atomlagenabscheidung |
US8084896B2 (en) * | 2008-12-31 | 2011-12-27 | Electro Scientific Industries, Inc. | Monolithic stage positioning system and method |
US8324848B2 (en) * | 2009-02-05 | 2012-12-04 | Asm Assembly Automation Ltd | System for maintaining thermal stability of a motion stage |
EP2221668B1 (de) * | 2009-02-24 | 2021-04-14 | ASML Netherlands B.V. | Lithographischer Apparat und Positionierungsanordnung |
US20100243617A1 (en) * | 2009-03-26 | 2010-09-30 | Electro Scientific Industries, Inc. | Printed circuit board via drilling stage assembly |
JP5375323B2 (ja) * | 2009-05-15 | 2013-12-25 | 株式会社ニコン | 移動体装置、露光装置、及び移動体制御方法 |
US8378252B2 (en) * | 2009-05-29 | 2013-02-19 | Electro Scientific Industries, Inc. | Method and apparatus for hybrid resolution feedback of a motion stage |
DE102009039203A1 (de) | 2009-08-27 | 2011-03-17 | Andreas Ehlerding | Einrichtung zur Kompensation von Drehmomenten, die durch Beschleunigung von redundanten Zusatzachsen bei Mess- und Werkzeugmaschinen entstehen mittels einer Mehrzahl von koordiniert linear bewegbarer Ausgleichsmassen |
KR101104413B1 (ko) * | 2009-09-25 | 2012-01-16 | 세크론 주식회사 | 반도체 소자 테스트용 접속 장치 및 이를 포함하는 테스트 핸들러 |
US20110210105A1 (en) * | 2009-12-30 | 2011-09-01 | Gsi Group Corporation | Link processing with high speed beam deflection |
US8459622B2 (en) * | 2010-04-21 | 2013-06-11 | Seagate Technology Llc | Noncontact positioning of a workpiece |
US20140041205A1 (en) | 2010-11-19 | 2014-02-13 | Reald Inc. | Method of manufacturing directional backlight apparatus and directional structured optical film |
KR101318211B1 (ko) | 2011-05-31 | 2013-10-15 | 한국기계연구원 | 5 자유도 운동 오차 보정 기능을 갖는 능동 보정형 스테이지 및 그 운동 오차 보정 방법 |
DE112012002844T5 (de) | 2011-07-05 | 2014-04-24 | Electronic Scientific Industries, Inc. | Verfahren zur Laserbearbeitung mit einem thermisch stabilisierten akustooptischen Strahlablenker und thermisch stabilisiertes Hochgeschwindigkeits-Laserbearbeitungssystem |
JP2013036941A (ja) * | 2011-08-10 | 2013-02-21 | Yamaha Corp | 磁気センサの検査装置及び検査方法 |
US9237337B2 (en) * | 2011-08-24 | 2016-01-12 | Reald Inc. | Autostereoscopic display with a passive cycloidal diffractive waveplate |
DE102011085336B4 (de) * | 2011-10-27 | 2013-06-06 | Eitzenberger Luftlagertechnik Gmbh | Positioniervorrichtung, Kreuztisch und Hubeinheit |
KR101829030B1 (ko) | 2011-10-27 | 2018-03-29 | 더 유니버시티 오브 브리티쉬 콜롬비아 | 변위 장치 및 변위 장치의 제조, 사용 그리고 제어를 위한 방법 |
CN102592684A (zh) * | 2011-12-12 | 2012-07-18 | 江西理工大学 | 一种空间三维平动二维转动的全柔顺并联机构 |
KR102059391B1 (ko) | 2012-05-18 | 2019-12-26 | 리얼디 스파크, 엘엘씨 | 지향성 디스플레이 장치 |
US9188731B2 (en) | 2012-05-18 | 2015-11-17 | Reald Inc. | Directional backlight |
WO2013173732A1 (en) | 2012-05-18 | 2013-11-21 | Reald Inc. | Directionally illuminated waveguide arrangement |
US9235057B2 (en) | 2012-05-18 | 2016-01-12 | Reald Inc. | Polarization recovery in a directional display device |
JP6508832B2 (ja) | 2012-05-18 | 2019-05-08 | リアルディー スパーク エルエルシー | 指向性バックライトの複数の光源の制御 |
US9350980B2 (en) | 2012-05-18 | 2016-05-24 | Reald Inc. | Crosstalk suppression in a directional backlight |
US9678267B2 (en) | 2012-05-18 | 2017-06-13 | Reald Spark, Llc | Wide angle imaging directional backlights |
EP2850488A4 (de) | 2012-05-18 | 2016-03-02 | Reald Inc | Direktionale rückbeleuchtung |
EP2904778B1 (de) | 2012-10-02 | 2020-05-27 | RealD Spark, LLC | Zeitlich multiplexierte anzeige mit landschafts- und portraitbetriebsmodi |
WO2014100753A1 (en) | 2012-12-21 | 2014-06-26 | Reald Inc. | Superlens component for directional display |
CN105324605B (zh) | 2013-02-22 | 2020-04-28 | 瑞尔D斯帕克有限责任公司 | 定向背光源 |
CN103234503A (zh) * | 2013-04-26 | 2013-08-07 | 宁波市镇海银球轴承有限公司 | 一种带测量微型轴承内外圈测量台的轮廓仪 |
EP3011734A4 (de) | 2013-06-17 | 2017-02-22 | RealD Inc. | Steuerung von lichtquellen einer gerichteten rückbeleuchtung |
US9354422B1 (en) * | 2013-07-01 | 2016-05-31 | Ball Aerospace & Technologies Corp. | High acceleration actuator |
CN105452812B (zh) | 2013-08-06 | 2019-04-30 | 不列颠哥伦比亚大学 | 移位装置以及用于检测和估计与其相关联的运动的方法和设备 |
EP3058562A4 (de) | 2013-10-14 | 2017-07-26 | RealD Spark, LLC | Steuerung einer gerichteten anzeige |
WO2015057588A1 (en) | 2013-10-14 | 2015-04-23 | Reald Inc. | Light input for directional backlight |
US9551825B2 (en) | 2013-11-15 | 2017-01-24 | Reald Spark, Llc | Directional backlights with light emitting element packages |
US9529280B2 (en) | 2013-12-06 | 2016-12-27 | Kla-Tencor Corporation | Stage apparatus for semiconductor inspection and lithography systems |
US10307863B2 (en) * | 2013-12-06 | 2019-06-04 | Mitsubishi Electric Research Laboratories, Inc. | Control of redundant laser processing machines |
WO2015179962A1 (en) | 2014-05-30 | 2015-12-03 | The University Of British Columbia | Displacement devices and methods for fabrication, use and control of same |
EP3152822B1 (de) | 2014-06-07 | 2019-08-07 | The University Of British Columbia | Verfahren und systeme zur kontrollierten bewegung von mehrerer beweglicher stufen in einer verdrängervorrichtung |
EP3155712A4 (de) | 2014-06-14 | 2018-02-21 | The University Of British Columbia | Verdrängungsvorrichtungen, beweglichen stufen für verdrängungsvorrichtungen und verfahren zur herstellung, verwendung und steuerung davon |
CN106662773B (zh) | 2014-06-26 | 2021-08-06 | 瑞尔D 斯帕克有限责任公司 | 定向防窥显示器 |
EP3660889A1 (de) * | 2014-07-03 | 2020-06-03 | Newport Corporation | Mehrachsige positionierungsvorrichtung |
DE112014006602A5 (de) * | 2014-08-11 | 2017-02-16 | Festo Ag & Co. Kg | Positioniersystem |
EP3204686B1 (de) | 2014-10-08 | 2019-07-17 | RealD Spark, LLC | Verbindungseinheit für eine direktionale rückbeleuchtung |
WO2016105541A1 (en) | 2014-12-24 | 2016-06-30 | Reald Inc. | Adjustment of perceived roundness in stereoscopic image of a head |
WO2016168345A1 (en) | 2015-04-13 | 2016-10-20 | Reald Inc. | Wide angle imaging directional backlights |
CN107850804B (zh) | 2015-05-27 | 2021-06-11 | 瑞尔D斯帕克有限责任公司 | 广角成像定向背光源 |
JP2017000117A (ja) * | 2015-06-15 | 2017-01-05 | 国立大学法人 東京大学 | 細胞カウンタステージ |
CA2988803C (en) | 2015-07-06 | 2024-01-30 | The University Of British Columbia | Methods and systems for controllably moving one or more moveable stages in a displacement device |
WO2017074951A1 (en) | 2015-10-26 | 2017-05-04 | Reald Inc. | Intelligent privacy system, apparatus, and method thereof |
US10459321B2 (en) | 2015-11-10 | 2019-10-29 | Reald Inc. | Distortion matching polarization conversion systems and methods thereof |
EP3374822B1 (de) | 2015-11-13 | 2023-12-27 | RealD Spark, LLC | Oberflächeneigenschaften für gerichtete hintergrundlichter in der bildgebung |
US10330843B2 (en) | 2015-11-13 | 2019-06-25 | Reald Spark, Llc | Wide angle imaging directional backlights |
CN114143495A (zh) | 2016-01-05 | 2022-03-04 | 瑞尔D斯帕克有限责任公司 | 多视角图像的注视校正 |
CN106325102B (zh) * | 2016-10-14 | 2019-09-06 | 中国科学院光电技术研究所 | 一种大范围可编程控制的目标轨迹模拟装置 |
US10926418B2 (en) | 2017-03-27 | 2021-02-23 | Planar Motor Incorporated | Robotic devices and methods for fabrication, use and control of same |
CN106952851B (zh) * | 2017-04-17 | 2023-06-13 | 如皋市大昌电子有限公司 | 一种颠簸式批量芯片定位系统 |
CN107364694B (zh) * | 2017-08-31 | 2023-10-13 | 东北农业大学 | 基于重力势能驱动的大棚运输系统 |
DE102018203667A1 (de) * | 2018-03-12 | 2019-09-12 | Robert Bosch Gmbh | Verfahren zur automatisierten Bewegungsplanung bei einem Planarantrieb |
WO2020073118A1 (en) | 2018-10-13 | 2020-04-16 | Planar Motor Incorporated | Systems and methods for identifying a magnetic mover |
KR101982833B1 (ko) * | 2018-11-27 | 2019-05-28 | 주식회사 엠오티 | 워크테이블 처짐 보정 기능을 구비한 글래스 검사 장치 |
KR101983385B1 (ko) * | 2018-11-27 | 2019-05-28 | 주식회사 엠오티 | 워크테이블의 처짐 보정 장치 |
NL2022467B1 (en) * | 2019-01-28 | 2020-08-18 | Prodrive Tech Bv | Position sensor for long stroke linear permanent magnet motor |
CN115104245A (zh) | 2019-12-16 | 2022-09-23 | 平面电机公司 | 定子模块和机器人系统 |
EP4214441A4 (de) | 2020-09-16 | 2024-08-28 | Reald Spark Llc | Fahrzeugaussenbeleuchtungsvorrichtung |
CN112729181A (zh) * | 2020-12-25 | 2021-04-30 | 上海广川科技有限公司 | 一种进行晶圆定位检测的装置及方法 |
CN114019350A (zh) * | 2021-10-21 | 2022-02-08 | 上海华力集成电路制造有限公司 | 并行测试装置 |
US12040584B2 (en) * | 2021-12-08 | 2024-07-16 | Eagle Technology, Llc | Optical system for use with a vacuum chamber and associated method |
US20230210592A1 (en) | 2021-12-30 | 2023-07-06 | Biosense Webster (Israel) Ltd. | Dual balloons for pulmonary vein isolation |
WO2024030274A1 (en) | 2022-08-02 | 2024-02-08 | Reald Spark, Llc | Pupil tracking near-eye display |
Family Cites Families (105)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US27436A (en) * | 1860-03-13 | Kaitge | ||
AU411601B2 (en) | 1966-05-31 | 1971-03-12 | Alden Sawyer | Magnetic positioning device |
FR2087241A5 (de) | 1970-05-12 | 1971-12-31 | Cit Alcatel | |
JPS5117303B1 (de) * | 1970-12-30 | 1976-06-01 | ||
JPS5037169U (de) * | 1973-07-31 | 1975-04-18 | ||
JPS553679B2 (de) * | 1973-08-27 | 1980-01-26 | ||
US3864564A (en) * | 1973-09-26 | 1975-02-04 | Corning Glass Works | Acquisition system for slide analysis |
US4019109A (en) * | 1974-05-13 | 1977-04-19 | Hughes Aircraft Company | Alignment system and method with micromovement stage |
US4425537A (en) * | 1978-06-26 | 1984-01-10 | Optimetrix Corporation | X-Y Addressable workpiece positioner and mask aligner using same |
JPS5847043B2 (ja) * | 1979-02-07 | 1983-10-20 | 株式会社日立製作所 | 位置制御方式 |
DD146525B1 (de) * | 1979-10-17 | 1982-07-28 | Furchert Hans Juergen | Zweikoordinatenschrittmotor |
US4464030A (en) * | 1982-03-26 | 1984-08-07 | Rca Corporation | Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system |
US4455512A (en) * | 1982-04-23 | 1984-06-19 | General Signal Corporation | System for linear motor control |
US4560911A (en) * | 1982-06-01 | 1985-12-24 | Anorad Corporation | Positioning table and linear motor |
US4485339A (en) * | 1983-06-10 | 1984-11-27 | The Perkin-Elmer Corporation | Electro-magnetic alignment device |
US4506205A (en) * | 1983-06-10 | 1985-03-19 | The Perkin-Elmer Corporation | Electro-magnetic alignment apparatus |
US4506204A (en) | 1983-06-10 | 1985-03-19 | The Perkin-Elmer Corporation | Electro-magnetic apparatus |
US4507597A (en) * | 1983-06-10 | 1985-03-26 | The Perkin-Elmer Corporation | Electro-magnetic alignment assemblies |
US4532402A (en) | 1983-09-02 | 1985-07-30 | Xrl, Inc. | Method and apparatus for positioning a focused beam on an integrated circuit |
DD222747A1 (de) | 1983-11-30 | 1985-05-22 | Zeiss Jena Veb Carl | X-y-flaechenantrieb mit begrenzter phi-drehung und z-verschiebung |
US4509002A (en) | 1983-12-20 | 1985-04-02 | International Business Machines Corporation | Precision X-Y positioner |
US4514674A (en) | 1983-12-22 | 1985-04-30 | International Business Machines Corporation | Electromagnetic X-Y-Theta precision positioner |
GB8413955D0 (en) * | 1984-05-31 | 1984-07-04 | Pa Consulting Services | Displacement measuring apparatus |
US4621926A (en) * | 1985-04-30 | 1986-11-11 | Lasercon Corporation | Interferometer system for controlling non-rectilinear movement of an object |
US4654571A (en) * | 1985-09-16 | 1987-03-31 | Hinds Walter E | Single plane orthogonally movable drive system |
US4742286A (en) * | 1985-10-29 | 1988-05-03 | Micro-Stage, Inc. | Gas bearing X-Y-θ stage assembly |
US4808892A (en) * | 1985-12-13 | 1989-02-28 | Kulick And Soffa Ind. Inc. | Bi-directional drive motor system |
JPS62207165A (ja) * | 1986-03-06 | 1987-09-11 | Omron Tateisi Electronics Co | 二次元アクチユエ−タ |
FR2598797B1 (fr) * | 1986-05-07 | 1990-05-11 | Nippon Telegraph & Telephone | Procede de mesure et/ou d'ajustement du deplacement d'un objet et appareil pour la mise en oeuvre de ce procede |
US4935676A (en) * | 1987-04-17 | 1990-06-19 | General Signal Corporation | Method of moving head to correct for hysteresis |
US4728770A (en) | 1987-04-27 | 1988-03-01 | Questar Corporation | Dual axis optical system |
US4821207A (en) * | 1987-04-28 | 1989-04-11 | Ford Motor Company | Automated curvilinear path interpolation for industrial robots |
US4839543A (en) * | 1988-02-04 | 1989-06-13 | Trilogy Systems Corporation | Linear motor |
JPH0674963B2 (ja) * | 1988-02-08 | 1994-09-21 | 株式会社日立製作所 | レーザ干渉測長器及びそれを用いた位置決め方法 |
JP3017996B2 (ja) | 1988-02-23 | 2000-03-13 | 株式会社ナガセインテグレックス | 振動防止装置、ワーク送りアタッチメント及び加工機並びに振動防止方法 |
US4952858A (en) * | 1988-05-18 | 1990-08-28 | Galburt Daniel N | Microlithographic apparatus |
JP2623123B2 (ja) * | 1988-08-17 | 1997-06-25 | キヤノン株式会社 | 微動ステージ装置 |
US4859974A (en) * | 1988-10-11 | 1989-08-22 | General Electric Company | Electromagnetic motor/actuator |
US5208497A (en) * | 1989-04-17 | 1993-05-04 | Sharp Kabushiki Kaisha | Linear driving apparatus |
US5049796A (en) * | 1989-05-17 | 1991-09-17 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Robust high-performance control for robotic manipulators |
JPH02307091A (ja) * | 1989-05-22 | 1990-12-20 | Oki Electric Ind Co Ltd | ステージ機構 |
US5098190A (en) * | 1989-08-07 | 1992-03-24 | Optra, Inc. | Meterology using interferometric measurement technology for measuring scale displacement with three output signals |
NL8902471A (nl) * | 1989-10-05 | 1991-05-01 | Philips Nv | Tweetraps positioneerinrichting. |
JPH03180413A (ja) | 1989-12-08 | 1991-08-06 | Nkk Corp | 竪型炉の装入物傾斜角制御装置 |
US5109148A (en) * | 1990-01-26 | 1992-04-28 | Mitsubishi Denki Kabushiki Kaisha | Positioning device for a machining apparatus |
JP3087305B2 (ja) * | 1990-03-05 | 2000-09-11 | 株式会社ニコン | ステージ装置 |
US5126648A (en) * | 1990-03-22 | 1992-06-30 | Megamation Incorporated | High resolution piggyback linear motor design for placement systems and the like |
US5047676A (en) * | 1990-04-02 | 1991-09-10 | Hitachi Metals, Ltd. | Brushless linear actuator with sensor-activated coils |
US5153494A (en) * | 1990-04-06 | 1992-10-06 | International Business Machines Corp. | Ultrafast electro-dynamic x, y and theta positioning stage |
US5157296A (en) * | 1990-12-20 | 1992-10-20 | Massachusetts Institute Of Technology | Bearing for use in high resolution precision control device |
NL9100407A (nl) * | 1991-03-07 | 1992-10-01 | Philips Nv | Optisch lithografische inrichting met een krachtgecompenseerd machinegestel. |
JPH04307920A (ja) * | 1991-04-05 | 1992-10-30 | Nippon Telegr & Teleph Corp <Ntt> | 半導体ウエハの移送方法および半導体ウエハ用移送装置 |
US5196745A (en) * | 1991-08-16 | 1993-03-23 | Massachusetts Institute Of Technology | Magnetic positioning device |
JP2714502B2 (ja) * | 1991-09-18 | 1998-02-16 | キヤノン株式会社 | 移動ステージ装置 |
EP0557100B1 (de) * | 1992-02-21 | 1999-01-13 | Canon Kabushiki Kaisha | System zum Steuern von Trägerplatten |
JP3217522B2 (ja) * | 1992-03-02 | 2001-10-09 | キヤノン株式会社 | 精密位置決め装置 |
JP2833908B2 (ja) * | 1992-03-04 | 1998-12-09 | 山形日本電気株式会社 | 露光装置における位置決め装置 |
US5590141A (en) | 1992-04-24 | 1996-12-31 | Electro Scientific Industries, Inc. | Method and apparatus for generating and employing a high density of excited ions in a lasant |
DE69325799T2 (de) * | 1992-05-05 | 2000-04-13 | Microe, Inc. | Apparat zum detektieren einer relativen bewegung |
US5486923A (en) * | 1992-05-05 | 1996-01-23 | Microe | Apparatus for detecting relative movement wherein a detecting means is positioned in the region of natural interference |
US5334892A (en) * | 1992-12-22 | 1994-08-02 | Anorad Corporation | Positioning device for planar positioning |
US5815248A (en) * | 1993-04-22 | 1998-09-29 | Nikon Corporation | Illumination optical apparatus and method having a wavefront splitter and an optical integrator |
JP3082516B2 (ja) * | 1993-05-31 | 2000-08-28 | キヤノン株式会社 | 光学式変位センサおよび該光学式変位センサを用いた駆動システム |
JPH07142336A (ja) * | 1993-06-30 | 1995-06-02 | Canon Inc | 露光装置 |
US5453594A (en) | 1993-10-06 | 1995-09-26 | Electro Scientific Industries, Inc. | Radiation beam position and emission coordination system |
US5508596A (en) * | 1993-10-07 | 1996-04-16 | Omax Corporation | Motion control with precomputation |
US5528118A (en) * | 1994-04-01 | 1996-06-18 | Nikon Precision, Inc. | Guideless stage with isolated reaction stage |
JP3477698B2 (ja) * | 1994-06-13 | 2003-12-10 | 株式会社ニコン | 走査型露光装置および走査露光方法 |
US5850280A (en) * | 1994-06-16 | 1998-12-15 | Nikon Corporation | Stage unit, drive table, and scanning exposure and apparatus using same |
JP3065489B2 (ja) * | 1994-10-12 | 2000-07-17 | 捷夫 本田 | 耐振動型干渉計 |
US5623853A (en) * | 1994-10-19 | 1997-04-29 | Nikon Precision Inc. | Precision motion stage with single guide beam and follower stage |
US5548195A (en) * | 1994-12-22 | 1996-08-20 | International Business Machines Corporation | Compensated servo control stage positioning apparatus |
US5648690A (en) * | 1995-03-15 | 1997-07-15 | Hinds; Walter E. | Motor system generating orthogonal movement in a single plane |
US5847960A (en) * | 1995-03-20 | 1998-12-08 | Electro Scientific Industries, Inc. | Multi-tool positioning system |
US5751585A (en) * | 1995-03-20 | 1998-05-12 | Electro Scientific Industries, Inc. | High speed, high accuracy multi-stage tool positioning system |
JPH08266071A (ja) * | 1995-03-23 | 1996-10-11 | Toshiro Higuchi | 多軸駆動装置 |
DE69600131T2 (de) * | 1995-04-19 | 1998-07-23 | Gerber Garment Technology Inc | Laserschneidgerät und Verfahren zum Schneiden von Flachmaterial |
TW316874B (de) * | 1995-05-30 | 1997-10-01 | Philips Electronics Nv | |
US5760564A (en) * | 1995-06-27 | 1998-06-02 | Nikon Precision Inc. | Dual guide beam stage mechanism with yaw control |
DE69601763T2 (de) * | 1995-09-04 | 1999-09-09 | Canon K.K. | Einrichtung zur Antriebsregelung |
JP3653827B2 (ja) * | 1995-10-20 | 2005-06-02 | 株式会社ニコン | 干渉計 |
JPH09184537A (ja) * | 1996-01-05 | 1997-07-15 | Canon Inc | 除振装置 |
JPH09219361A (ja) * | 1996-02-09 | 1997-08-19 | Nikon Corp | 露光装置 |
JP3634530B2 (ja) * | 1996-02-29 | 2005-03-30 | キヤノン株式会社 | 位置決め装置および露光装置 |
US5780943A (en) * | 1996-04-04 | 1998-07-14 | Nikon Corporation | Exposure apparatus and method |
JP3726270B2 (ja) * | 1996-05-23 | 2005-12-14 | 株式会社ニコン | 露光装置及び方法 |
JPH09325309A (ja) * | 1996-06-03 | 1997-12-16 | Nikon Corp | プリアライメント装置及びプリアライメント方法 |
US5717518A (en) * | 1996-07-22 | 1998-02-10 | Kla Instruments Corporation | Broad spectrum ultraviolet catadioptric imaging system |
JPH1055953A (ja) * | 1996-08-08 | 1998-02-24 | Canon Inc | 走査ステージ装置およびこれを用いた露光装置 |
JP3286186B2 (ja) * | 1996-10-09 | 2002-05-27 | キヤノン株式会社 | 微動位置決め制御装置 |
JPH10144601A (ja) * | 1996-11-14 | 1998-05-29 | Nikon Corp | 指令値の決定方法及びステージ装置 |
JPH10149974A (ja) * | 1996-11-15 | 1998-06-02 | Canon Inc | ステージ装置、露光装置およびデバイス製造方法 |
US5757160A (en) * | 1996-12-23 | 1998-05-26 | Svg Lithography Systems, Inc. | Moving interferometer wafer stage |
US5998759A (en) | 1996-12-24 | 1999-12-07 | General Scanning, Inc. | Laser processing |
US5886432A (en) * | 1997-04-28 | 1999-03-23 | Ultratech Stepper, Inc. | Magnetically-positioned X-Y stage having six-degrees of freedom |
JPH1198811A (ja) * | 1997-09-24 | 1999-04-09 | Canon Inc | リニアモータ、これを用いたステージ装置や露光装置、ならびにデバイス製造方法 |
US6278114B1 (en) * | 1997-12-19 | 2001-08-21 | Kabushiki Kaisha Toshiba | Method and apparatus for measuring dimensions of a feature of a specimen |
US6054784A (en) * | 1997-12-29 | 2000-04-25 | Asm Lithography B.V. | Positioning device having three coil systems mutually enclosing angles of 120° and lithographic device comprising such a positioning device |
JP3052928B2 (ja) | 1998-04-01 | 2000-06-19 | 日本電気株式会社 | レーザ加工装置 |
US6418353B1 (en) * | 1998-04-22 | 2002-07-09 | Lsi Logic Corporation | Automating photolithography in the fabrication of integrated circuits |
US6339604B1 (en) | 1998-06-12 | 2002-01-15 | General Scanning, Inc. | Pulse control in laser systems |
US6181728B1 (en) | 1998-07-02 | 2001-01-30 | General Scanning, Inc. | Controlling laser polarization |
US6144118A (en) * | 1998-09-18 | 2000-11-07 | General Scanning, Inc. | High-speed precision positioning apparatus |
US6172325B1 (en) | 1999-02-10 | 2001-01-09 | Electro Scientific Industries, Inc. | Laser processing power output stabilization apparatus and method employing processing position feedback |
KR100773070B1 (ko) | 2000-07-12 | 2007-11-02 | 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 | Ic 퓨즈를 하나의 펄스로 절단하기 위한 uv 레이저시스템 및 방법 |
-
1998
- 1998-09-18 US US09/156,895 patent/US6144118A/en not_active Expired - Lifetime
-
1999
- 1999-09-13 JP JP2000571323A patent/JP4970651B2/ja not_active Expired - Fee Related
- 1999-09-13 WO PCT/US1999/020932 patent/WO2000017724A1/en active IP Right Grant
- 1999-09-13 KR KR1020007005405A patent/KR100583040B1/ko not_active IP Right Cessation
- 1999-09-13 DE DE69937547T patent/DE69937547T2/de not_active Expired - Lifetime
- 1999-09-13 EP EP99946884A patent/EP1055163B1/de not_active Expired - Lifetime
- 1999-09-13 AT AT99946884T patent/ATE378625T1/de not_active IP Right Cessation
- 1999-09-13 DE DE19982072T patent/DE19982072T1/de not_active Withdrawn
- 1999-10-06 TW TW088116067A patent/TW449680B/zh not_active IP Right Cessation
-
2000
- 2000-07-11 US US09/613,833 patent/US6744228B1/en not_active Expired - Lifetime
-
2003
- 2003-12-29 US US10/747,552 patent/US6949844B2/en not_active Expired - Fee Related
-
2010
- 2010-10-01 JP JP2010223837A patent/JP5562789B2/ja not_active Expired - Fee Related
-
2014
- 2014-02-26 JP JP2014035452A patent/JP2014140049A/ja active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102013102477A1 (de) * | 2013-03-12 | 2014-09-18 | Carl Mahr Holding Gmbh | Positioniervorrichtung für mehrachsige Verstelltische |
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Publication number | Publication date |
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JP2014140049A (ja) | 2014-07-31 |
DE69937547D1 (de) | 2007-12-27 |
ATE378625T1 (de) | 2007-11-15 |
JP5562789B2 (ja) | 2014-07-30 |
US20040140780A1 (en) | 2004-07-22 |
JP2002525858A (ja) | 2002-08-13 |
KR20010032211A (ko) | 2001-04-16 |
EP1055163A1 (de) | 2000-11-29 |
WO2000017724A1 (en) | 2000-03-30 |
WO2000017724A9 (en) | 2001-04-05 |
JP2011091392A (ja) | 2011-05-06 |
US6949844B2 (en) | 2005-09-27 |
DE69937547T2 (de) | 2008-03-06 |
US6144118A (en) | 2000-11-07 |
US6744228B1 (en) | 2004-06-01 |
KR100583040B1 (ko) | 2006-05-24 |
EP1055163B1 (de) | 2007-11-14 |
TW449680B (en) | 2001-08-11 |
EP1055163A4 (de) | 2000-12-06 |
JP4970651B2 (ja) | 2012-07-11 |
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