CN1263040C - 通过磁场的施加进行数据写入的薄膜磁性体存储装置 - Google Patents

通过磁场的施加进行数据写入的薄膜磁性体存储装置 Download PDF

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Publication number
CN1263040C
CN1263040C CNB02147057XA CN02147057A CN1263040C CN 1263040 C CN1263040 C CN 1263040C CN B02147057X A CNB02147057X A CN B02147057XA CN 02147057 A CN02147057 A CN 02147057A CN 1263040 C CN1263040 C CN 1263040C
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China
Prior art keywords
wiring
power supply
magnetic
data
wirings
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Expired - Fee Related
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CNB02147057XA
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Chinese (zh)
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CN1414560A (zh
Inventor
日高秀人
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Renesas Electronics Corp
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Mitsubishi Electric Corp
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Publication of CN1414560A publication Critical patent/CN1414560A/zh
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    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/14Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements
    • G11C11/15Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using thin-film elements using multiple magnetic layers
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/06Arrangements for interconnecting storage elements electrically, e.g. by wiring
    • G11C5/063Voltage and signal distribution in integrated semi-conductor memory access lines, e.g. word-line, bit-line, cross-over resistance, propagation delay
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/02Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements
    • G11C11/16Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using magnetic elements using elements in which the storage effect is based on magnetic spin effect
    • G11C11/165Auxiliary circuits
    • G11C11/1697Power supply circuits

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Mram Or Spin Memory Techniques (AREA)
  • Hall/Mr Elements (AREA)
  • Semiconductor Memories (AREA)
CNB02147057XA 2001-10-25 2002-10-25 通过磁场的施加进行数据写入的薄膜磁性体存储装置 Expired - Fee Related CN1263040C (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP327690/2001 2001-10-25
JP327690/01 2001-10-25
JP2001327690 2001-10-25
JP70583/02 2002-03-14
JP70583/2002 2002-03-14
JP2002070583A JP4570313B2 (ja) 2001-10-25 2002-03-14 薄膜磁性体記憶装置

Publications (2)

Publication Number Publication Date
CN1414560A CN1414560A (zh) 2003-04-30
CN1263040C true CN1263040C (zh) 2006-07-05

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CNB02147057XA Expired - Fee Related CN1263040C (zh) 2001-10-25 2002-10-25 通过磁场的施加进行数据写入的薄膜磁性体存储装置

Country Status (6)

Country Link
US (4) US6795335B2 (enExample)
JP (1) JP4570313B2 (enExample)
KR (1) KR100501127B1 (enExample)
CN (1) CN1263040C (enExample)
DE (1) DE10249869B4 (enExample)
TW (1) TW594730B (enExample)

Families Citing this family (41)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6466475B1 (en) * 2001-10-31 2002-10-15 Hewlett-Packard Company Uniform magnetic environment for cells in an MRAM array
US6940748B2 (en) * 2002-05-16 2005-09-06 Micron Technology, Inc. Stacked 1T-nMTJ MRAM structure
JP4646485B2 (ja) * 2002-06-25 2011-03-09 ルネサスエレクトロニクス株式会社 薄膜磁性体記憶装置
JP4208500B2 (ja) * 2002-06-27 2009-01-14 株式会社ルネサステクノロジ 薄膜磁性体記憶装置
JP4266302B2 (ja) * 2002-11-27 2009-05-20 株式会社ルネサステクノロジ 不揮発性記憶装置
JP2004207364A (ja) * 2002-12-24 2004-07-22 Toshiba Corp 半導体装置及びその半導体装置のデータ書き込み方法
JP4315703B2 (ja) * 2003-02-27 2009-08-19 株式会社ルネサステクノロジ 薄膜磁性体記憶装置
NL1024114C1 (nl) * 2003-08-15 2005-02-16 Systematic Design Holding B V Werkwijze en inrichting voor het verrichten van metingen aan magnetische velden met gebruik van een hall-sensor.
JP2005064075A (ja) * 2003-08-20 2005-03-10 Toshiba Corp 磁気記憶装置及びその製造方法
KR100527536B1 (ko) * 2003-12-24 2005-11-09 주식회사 하이닉스반도체 마그네틱 램
JP4819316B2 (ja) * 2004-02-23 2011-11-24 ルネサスエレクトロニクス株式会社 半導体装置
DE102004025675B4 (de) * 2004-05-26 2008-02-14 Qimonda Ag Integrierter Halbleiterspeicher mit organischem Auswahltransistor
DE102004025676B4 (de) * 2004-05-26 2008-09-04 Qimonda Ag Integrierter Halbleiterspeicher mit organischem Auswahltransistor
US7372728B2 (en) * 2004-06-16 2008-05-13 Stmicroelectronics, Inc. Magnetic random access memory array having bit/word lines for shared write select and read operations
US7209383B2 (en) * 2004-06-16 2007-04-24 Stmicroelectronics, Inc. Magnetic random access memory array having bit/word lines for shared write select and read operations
FR2871921A1 (fr) * 2004-06-16 2005-12-23 St Microelectronics Sa Architecture de memoire a lignes d'ecriture segmentees
US7106621B2 (en) * 2004-06-30 2006-09-12 Stmicroelectronics, Inc. Random access memory array with parity bit structure
US7079415B2 (en) * 2004-06-30 2006-07-18 Stmicroelectronics, Inc. Magnetic random access memory element
US7136298B2 (en) * 2004-06-30 2006-11-14 Stmicroelectronics, Inc. Magnetic random access memory array with global write lines
US7301800B2 (en) * 2004-06-30 2007-11-27 Stmicroelectronics, Inc. Multi-bit magnetic random access memory element
US7262069B2 (en) * 2005-06-07 2007-08-28 Freescale Semiconductor, Inc. 3-D inductor and transformer devices in MRAM embedded integrated circuits
JP4779608B2 (ja) * 2005-11-30 2011-09-28 Tdk株式会社 磁気メモリ
EP1898425A1 (fr) * 2006-09-05 2008-03-12 Stmicroelectronics Sa Mémoire à changement de phase comprenant un décodeur de colonne basse tension
JP2008157854A (ja) * 2006-12-26 2008-07-10 Seiko Instruments Inc 半導体磁気センサ
US7508702B2 (en) * 2007-04-17 2009-03-24 Macronix International Co., Ltd. Programming method of magnetic random access memory
JP2009043804A (ja) * 2007-08-07 2009-02-26 Panasonic Corp 半導体記憶装置、メモリ搭載lsi、及び半導体記憶装置の製造方法
JP4698712B2 (ja) * 2008-09-05 2011-06-08 ルネサスエレクトロニクス株式会社 薄膜磁性体記憶装置
JP4945592B2 (ja) * 2009-03-13 2012-06-06 株式会社東芝 半導体記憶装置
US9532442B2 (en) 2009-08-19 2016-12-27 Nec Corporation Feed line structure, circuit board using same, and EMI noise reduction method
JP5116816B2 (ja) * 2010-07-28 2013-01-09 ルネサスエレクトロニクス株式会社 半導体集積回路装置および磁気メモリ装置
CN105393306B (zh) * 2013-06-29 2018-08-21 英特尔公司 用于存储器和逻辑单元的磁性元件
KR102116879B1 (ko) * 2014-05-19 2020-06-01 에스케이하이닉스 주식회사 전자 장치
US11075656B2 (en) 2019-07-16 2021-07-27 Microsoft Technology Licensing, Llc Bit error reduction of communication systems using error correction
US11086719B2 (en) * 2019-07-16 2021-08-10 Microsoft Technology Licensing, Llc Use of error correction codes to prevent errors in neighboring storage
US10911284B1 (en) 2019-07-16 2021-02-02 Microsoft Technology Licensing, Llc Intelligent optimization of communication systems utilizing error correction
US11172455B2 (en) 2019-07-16 2021-11-09 Microsoft Technology Licensing, Llc Peak to average power output reduction of RF systems utilizing error correction
US11031961B2 (en) 2019-07-16 2021-06-08 Microsoft Technology Licensing, Llc Smart symbol changes for optimization of communications using error correction
US11044044B2 (en) 2019-07-16 2021-06-22 Microsoft Technology Licensing, Llc Peak to average power ratio reduction of optical systems utilizing error correction
US11063696B2 (en) 2019-07-16 2021-07-13 Microsoft Technology Licensing, Llc Increasing average power levels to reduce peak-to-average power levels using error correction codes
US10911141B1 (en) 2019-07-30 2021-02-02 Microsoft Technology Licensing, Llc Dynamically selecting a channel model for optical communications
JP2024130130A (ja) * 2023-03-14 2024-09-30 キオクシア株式会社 記憶装置

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3456247A (en) * 1966-01-14 1969-07-15 Ibm Coupled film storage device
US5136239A (en) * 1990-04-27 1992-08-04 Josephs Richard M Apparatus for measuring flux and other hysteretic properties in thin film recording discs
JPH04239758A (ja) * 1991-01-23 1992-08-27 Nec Corp 半導体集積回路装置
JP3392657B2 (ja) * 1996-09-26 2003-03-31 株式会社東芝 半導体記憶装置
JPH10214779A (ja) * 1997-01-31 1998-08-11 Canon Inc 電子ビーム露光方法及び該方法を用いたデバイス製造方法
US5898302A (en) * 1997-11-25 1999-04-27 Cleveland State University Residual stress measurements in metal objects using four coils
JP4226679B2 (ja) * 1998-03-23 2009-02-18 株式会社東芝 磁気記憶装置
JP3593652B2 (ja) * 2000-03-03 2004-11-24 富士通株式会社 磁気ランダムアクセスメモリ装置
JP3800925B2 (ja) * 2000-05-15 2006-07-26 日本電気株式会社 磁気ランダムアクセスメモリ回路
JP2002170377A (ja) * 2000-09-22 2002-06-14 Mitsubishi Electric Corp 薄膜磁性体記憶装置
DE10053965A1 (de) * 2000-10-31 2002-06-20 Infineon Technologies Ag Verfahren zur Verhinderung unerwünschter Programmierungen in einer MRAM-Anordnung
JP4667594B2 (ja) * 2000-12-25 2011-04-13 ルネサスエレクトロニクス株式会社 薄膜磁性体記憶装置
JP2002299575A (ja) * 2001-03-29 2002-10-11 Toshiba Corp 半導体記憶装置
US6700813B2 (en) * 2001-04-03 2004-03-02 Canon Kabushiki Kaisha Magnetic memory and driving method therefor
JP5019681B2 (ja) * 2001-04-26 2012-09-05 ルネサスエレクトロニクス株式会社 薄膜磁性体記憶装置
US6490217B1 (en) * 2001-05-23 2002-12-03 International Business Machines Corporation Select line architecture for magnetic random access memories
EP1271772B1 (en) * 2001-06-28 2007-08-15 STMicroelectronics S.r.l. A process for noise reduction, particularly for audio systems, device and computer program product therefor
US6404671B1 (en) * 2001-08-21 2002-06-11 International Business Machines Corporation Data-dependent field compensation for writing magnetic random access memories
US6646911B2 (en) * 2001-10-26 2003-11-11 Mitsubishi Denki Kabushiki Kaisha Thin film magnetic memory device having data read current tuning function
JP4073690B2 (ja) * 2001-11-14 2008-04-09 株式会社ルネサステクノロジ 薄膜磁性体記憶装置
JP4208500B2 (ja) * 2002-06-27 2009-01-14 株式会社ルネサステクノロジ 薄膜磁性体記憶装置
US6894871B2 (en) * 2002-08-07 2005-05-17 Western Digital (Fremont), Inc. Technique for reducing pole tip protrusion in a magnetic write head and GMR stripe temperature in an associated read head structure utilizing one or more internal diffuser regions
US7355884B2 (en) * 2004-10-08 2008-04-08 Kabushiki Kaisha Toshiba Magnetoresistive element

Also Published As

Publication number Publication date
TW594730B (en) 2004-06-21
JP2003204044A (ja) 2003-07-18
US20030081450A1 (en) 2003-05-01
DE10249869B4 (de) 2006-08-31
US7233519B2 (en) 2007-06-19
US20070195589A1 (en) 2007-08-23
US20050030829A1 (en) 2005-02-10
JP4570313B2 (ja) 2010-10-27
DE10249869A1 (de) 2003-05-15
US6795335B2 (en) 2004-09-21
KR100501127B1 (ko) 2005-07-18
US20060158929A1 (en) 2006-07-20
US6970377B2 (en) 2005-11-29
KR20030034021A (ko) 2003-05-01
US7315468B2 (en) 2008-01-01
CN1414560A (zh) 2003-04-30

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Owner name: RENESAS ELECTRONICS CORPORATION

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Address after: Kawasaki, Kanagawa, Japan

Patentee after: Renesas Electronics Corporation

Address before: Tokyo, Japan, Japan

Patentee before: Missubishi Electric Co., Ltd.

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CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20060705

Termination date: 20161025