CN100538486C - 液晶显示装置 - Google Patents
液晶显示装置 Download PDFInfo
- Publication number
- CN100538486C CN100538486C CNB2007100855601A CN200710085560A CN100538486C CN 100538486 C CN100538486 C CN 100538486C CN B2007100855601 A CNB2007100855601 A CN B2007100855601A CN 200710085560 A CN200710085560 A CN 200710085560A CN 100538486 C CN100538486 C CN 100538486C
- Authority
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- China
- Prior art keywords
- transistor
- npn
- type mosfet
- potential
- electrically connected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 28
- 239000010409 thin film Substances 0.000 claims description 6
- 239000003990 capacitor Substances 0.000 description 196
- 238000012937 correction Methods 0.000 description 54
- 238000010586 diagram Methods 0.000 description 46
- 230000000295 complement effect Effects 0.000 description 29
- 239000004065 semiconductor Substances 0.000 description 9
- 239000000758 substrate Substances 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
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- 230000006872 improvement Effects 0.000 description 3
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- 238000000034 method Methods 0.000 description 3
- 230000003071 parasitic effect Effects 0.000 description 3
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- 238000009825 accumulation Methods 0.000 description 2
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- 239000006185 dispersion Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
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- 230000002441 reversible effect Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000008186 active pharmaceutical agent Substances 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- RDYMFSUJUZBWLH-UHFFFAOYSA-N endosulfan Chemical compound C12COS(=O)OCC2C2(Cl)C(Cl)=C(Cl)C1(Cl)C2(Cl)Cl RDYMFSUJUZBWLH-UHFFFAOYSA-N 0.000 description 1
- 230000005669 field effect Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/60—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs wherein the TFTs are in active matrices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136213—Storage capacitors associated with the pixel electrode
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C19/00—Digital stores in which the information is moved stepwise, e.g. shift registers
- G11C19/28—Digital stores in which the information is moved stepwise, e.g. shift registers using semiconductor elements
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/01—Modifications for accelerating switching
- H03K19/017—Modifications for accelerating switching in field-effect transistor circuits
- H03K19/01728—Modifications for accelerating switching in field-effect transistor circuits in synchronous circuits, i.e. by using clock signals
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K19/00—Logic circuits, i.e. having at least two inputs acting on one output; Inverting circuits
- H03K19/0175—Coupling arrangements; Interface arrangements
- H03K19/0185—Coupling arrangements; Interface arrangements using field effect transistors only
- H03K19/018507—Interface arrangements
- H03K19/018521—Interface arrangements of complementary type, e.g. CMOS
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/811—Combinations of field-effect devices and one or more diodes, capacitors or resistors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/441—Interconnections, e.g. scanning lines
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D86/00—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
- H10D86/40—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
- H10D86/481—Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs integrated with passive devices, e.g. auxiliary capacitors
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Mathematical Physics (AREA)
- Computer Hardware Design (AREA)
- General Engineering & Computer Science (AREA)
- Computing Systems (AREA)
- Nonlinear Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Crystallography & Structural Chemistry (AREA)
- Power Engineering (AREA)
- Electronic Switches (AREA)
- Logic Circuits (AREA)
- Control Of Indicators Other Than Cathode Ray Tubes (AREA)
- Manipulation Of Pulses (AREA)
- Liquid Crystal Display Device Control (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002375002 | 2002-12-25 | ||
| JP375002/2002 | 2002-12-25 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2003801076455A Division CN100338879C (zh) | 2002-12-25 | 2003-12-18 | 配备了校正电路的数字电路及具有该数字电路的电子装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101025535A CN101025535A (zh) | 2007-08-29 |
| CN100538486C true CN100538486C (zh) | 2009-09-09 |
Family
ID=32677321
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2007100855601A Expired - Lifetime CN100538486C (zh) | 2002-12-25 | 2003-12-18 | 液晶显示装置 |
| CNB2003801076455A Expired - Fee Related CN100338879C (zh) | 2002-12-25 | 2003-12-18 | 配备了校正电路的数字电路及具有该数字电路的电子装置 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2003801076455A Expired - Fee Related CN100338879C (zh) | 2002-12-25 | 2003-12-18 | 配备了校正电路的数字电路及具有该数字电路的电子装置 |
Country Status (6)
| Country | Link |
|---|---|
| US (8) | US7411318B2 (enExample) |
| JP (14) | JP4344698B2 (enExample) |
| KR (1) | KR101114892B1 (enExample) |
| CN (2) | CN100538486C (enExample) |
| AU (1) | AU2003292565A1 (enExample) |
| WO (1) | WO2004059843A1 (enExample) |
Families Citing this family (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7327168B2 (en) | 2002-11-20 | 2008-02-05 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and driving method thereof |
| US7528643B2 (en) | 2003-02-12 | 2009-05-05 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, electronic device having the same, and driving method of the same |
| JP4665525B2 (ja) * | 2005-01-20 | 2011-04-06 | セイコーエプソン株式会社 | レベルシフタ、レベルシフタの駆動方法、電気光学装置、電気光学装置の駆動方法及び電子機器 |
| TWI297563B (en) * | 2005-01-21 | 2008-06-01 | Au Optronics Corp | Level shifter |
| JP4826213B2 (ja) * | 2005-03-02 | 2011-11-30 | ソニー株式会社 | レベルシフト回路およびシフトレジスタ並びに表示装置 |
| EP1717783B1 (en) * | 2005-04-28 | 2015-06-03 | Semiconductor Energy Laboratory Co., Ltd. | Data latch circuit, driving method of the data latch circuit, and display device |
| US20060267875A1 (en) * | 2005-05-27 | 2006-11-30 | Bi-Hsien Chen | Plasma display panel having less impedance in the sink discharge current path |
| US7898623B2 (en) | 2005-07-04 | 2011-03-01 | Semiconductor Energy Laboratory Co., Ltd. | Display device, electronic device and method of driving display device |
| KR100691351B1 (ko) * | 2005-07-25 | 2007-03-12 | 삼성전자주식회사 | 반도체 집적회로 |
| JP4533821B2 (ja) * | 2005-08-16 | 2010-09-01 | パナソニック株式会社 | Mos型固体撮像装置 |
| US7986287B2 (en) | 2005-08-26 | 2011-07-26 | Semiconductor Energy Laboratory Co., Ltd. | Display device and method of driving the same |
| EP1793366A3 (en) | 2005-12-02 | 2009-11-04 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device, display device, and electronic device |
| KR100752656B1 (ko) * | 2006-02-23 | 2007-08-29 | 삼성전자주식회사 | 전하 전달 소자의 바디 바이어스 전압을 선택적으로제어하는 전하 전달 스위치 회로 및 이를 포함하는 승압전압 발생 회로 |
| US8330492B2 (en) | 2006-06-02 | 2012-12-11 | Semiconductor Energy Laboratory Co., Ltd. | Liquid crystal display device and electronic device |
| KR100768240B1 (ko) * | 2006-09-19 | 2007-10-17 | 삼성에스디아이 주식회사 | 전압 레벨 변환 회로 |
| JP4932415B2 (ja) | 2006-09-29 | 2012-05-16 | 株式会社半導体エネルギー研究所 | 半導体装置 |
| TW200904002A (en) * | 2007-07-03 | 2009-01-16 | Toppoly Optoelectronics Corp | Level shifter, interface driving circuit, and image display system |
| BRPI1011202A2 (pt) | 2009-06-09 | 2016-03-15 | Sharp Kk | dispositivo semicondutor |
| CN102024410B (zh) | 2009-09-16 | 2014-10-22 | 株式会社半导体能源研究所 | 半导体装置及电子设备 |
| JP5711116B2 (ja) * | 2009-12-03 | 2015-04-30 | パナソニック株式会社 | 半導体集積回路およびそれを備えた昇圧回路 |
| KR101674690B1 (ko) * | 2010-03-30 | 2016-11-09 | 가부시키가이샤 제이올레드 | 인버터 회로 및 표시 장치 |
| WO2012029767A1 (ja) * | 2010-09-02 | 2012-03-08 | シャープ株式会社 | 半導体回路及び表示装置 |
| JP5873755B2 (ja) | 2011-05-13 | 2016-03-01 | 株式会社半導体エネルギー研究所 | 半導体装置及び表示装置 |
| KR102760694B1 (ko) * | 2011-05-13 | 2025-01-24 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 표시 장치 |
| EP2789101A4 (en) * | 2011-12-08 | 2015-06-24 | Intel Corp | VOLTAGE-COMPENSATED LEVEL RELAY |
| KR101882297B1 (ko) * | 2012-02-03 | 2018-07-30 | 삼성디스플레이 주식회사 | 화소 및 이를 이용한 유기전계발광 표시장치 |
| US8779818B2 (en) * | 2012-11-06 | 2014-07-15 | Texas Instruments Incorporated | Optimizing pre-driver control for digital integrated circuits |
| EP2779456B1 (en) * | 2013-03-15 | 2018-08-29 | Dialog Semiconductor B.V. | Method for reducing overdrive need in mos switching and logic circuit |
| TWI638519B (zh) * | 2013-05-17 | 2018-10-11 | 半導體能源研究所股份有限公司 | 可程式邏輯裝置及半導體裝置 |
| KR102281814B1 (ko) * | 2014-12-10 | 2021-07-26 | 엘지디스플레이 주식회사 | 게이트 구동회로 및 이를 포함하는 표시장치 |
| US9490245B1 (en) * | 2015-06-19 | 2016-11-08 | Qualcomm Incorporated | Circuit and layout for a high density antenna protection diode |
| JP6744604B2 (ja) * | 2016-07-22 | 2020-08-19 | ザインエレクトロニクス株式会社 | 入力装置 |
| FR3055463A1 (fr) * | 2016-08-31 | 2018-03-02 | St Microelectronics Crolles 2 Sas | Element de memorisation durci |
| US9997230B1 (en) * | 2017-06-20 | 2018-06-12 | Elite Semiconductor Memory Technology Inc. | Reference voltage pre-processing circuit and reference voltage pre-processing method for a reference voltage buffer |
| CN107527925B (zh) * | 2017-08-25 | 2019-11-05 | 京东方科技集团股份有限公司 | 显示基板及其制造方法、显示面板、显示装置 |
| JP2019092010A (ja) * | 2017-11-13 | 2019-06-13 | 株式会社東海理化電機製作所 | 信号処理装置 |
| JP7006189B2 (ja) * | 2017-11-28 | 2022-01-24 | 株式会社アイシン | 静電容量検出装置 |
| WO2019172389A1 (ja) | 2018-03-08 | 2019-09-12 | 三井化学株式会社 | マグネシウム合金/樹脂複合構造体およびその製造方法 |
| KR102396743B1 (ko) * | 2018-07-16 | 2022-05-12 | 에스케이하이닉스 주식회사 | 메모리 장치, 이를 포함하는 메모리 시스템 및 그것의 동작 방법 |
| US10680599B1 (en) * | 2019-04-03 | 2020-06-09 | Infineon Technologies Ag | RF switch with compensation |
| US20220407425A1 (en) * | 2021-06-22 | 2022-12-22 | Texas Instruments Incorporated | Low forward voltage drop passive full-bridge rectifier architectures |
| US12431884B2 (en) * | 2023-01-24 | 2025-09-30 | Blue Cheetah Analog Design, Inc. | Data communication link with capacitor-based pumped output |
| CN116543678A (zh) * | 2023-04-13 | 2023-08-04 | 合肥鑫晟光电科技有限公司 | 像素驱动电路、驱动基板及显示装置 |
| US20250185300A1 (en) * | 2023-12-05 | 2025-06-05 | Qualcomm Incorporated | Electronic devices employing thin-gate insulator transistors coupled to varactors to reduce gate-to-source/drain voltage to avoid voltage breakdown, and related fabrication methods |
| KR102727423B1 (ko) * | 2024-02-29 | 2024-11-08 | 국립한밭대학교 산학협력단 | 스택 구조를 포함하는 온도 센서 |
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