CA2968159C - Apparatus - Google Patents
Apparatus Download PDFInfo
- Publication number
- CA2968159C CA2968159C CA2968159A CA2968159A CA2968159C CA 2968159 C CA2968159 C CA 2968159C CA 2968159 A CA2968159 A CA 2968159A CA 2968159 A CA2968159 A CA 2968159A CA 2968159 C CA2968159 C CA 2968159C
- Authority
- CA
- Canada
- Prior art keywords
- pellicle
- frame
- patterning device
- stud
- attachment apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 claims abstract description 23
- 230000033001 locomotion Effects 0.000 claims description 62
- 239000003292 glue Substances 0.000 claims description 54
- 238000003384 imaging method Methods 0.000 claims description 28
- 238000003825 pressing Methods 0.000 claims description 4
- 238000000059 patterning Methods 0.000 abstract description 268
- 230000008569 process Effects 0.000 abstract description 6
- 230000005855 radiation Effects 0.000 description 87
- 230000007246 mechanism Effects 0.000 description 67
- 238000005192 partition Methods 0.000 description 52
- 239000007789 gas Substances 0.000 description 44
- 239000002245 particle Substances 0.000 description 43
- 238000011109 contamination Methods 0.000 description 37
- 210000003128 head Anatomy 0.000 description 35
- 239000000758 substrate Substances 0.000 description 27
- 238000007689 inspection Methods 0.000 description 18
- 238000005286 illumination Methods 0.000 description 14
- 238000000926 separation method Methods 0.000 description 10
- 239000004696 Poly ether ether ketone Substances 0.000 description 9
- 239000000853 adhesive Substances 0.000 description 9
- 230000001070 adhesive effect Effects 0.000 description 9
- 238000000605 extraction Methods 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 9
- 229920002530 polyetherether ketone Polymers 0.000 description 9
- 238000004140 cleaning Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 6
- 230000001143 conditioned effect Effects 0.000 description 6
- 239000000356 contaminant Substances 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 6
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 5
- 230000007547 defect Effects 0.000 description 5
- 239000000446 fuel Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- 238000009304 pastoral farming Methods 0.000 description 5
- 230000008901 benefit Effects 0.000 description 4
- 238000013459 approach Methods 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 230000005670 electromagnetic radiation Effects 0.000 description 3
- 210000001747 pupil Anatomy 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000003574 free electron Substances 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000012858 resilient material Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005411 Van der Waals force Methods 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000005381 magnetic domain Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 230000015654 memory Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000036316 preload Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Regulation And Control Of Combustion (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CA3177744A CA3177744A1 (en) | 2014-11-17 | 2015-11-16 | Apparatus |
Applications Claiming Priority (13)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201462080561P | 2014-11-17 | 2014-11-17 | |
| US62/080,561 | 2014-11-17 | ||
| US201562108348P | 2015-01-27 | 2015-01-27 | |
| US62/108,348 | 2015-01-27 | ||
| US201562110841P | 2015-02-02 | 2015-02-02 | |
| US62/110,841 | 2015-02-02 | ||
| US201562126173P | 2015-02-27 | 2015-02-27 | |
| US62/126,173 | 2015-02-27 | ||
| US201562149176P | 2015-04-17 | 2015-04-17 | |
| US62/149,176 | 2015-04-17 | ||
| US201562183342P | 2015-06-23 | 2015-06-23 | |
| US62/183,342 | 2015-06-23 | ||
| PCT/EP2015/076688 WO2016079052A2 (en) | 2014-11-17 | 2015-11-16 | Apparatus |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA3177744A Division CA3177744A1 (en) | 2014-11-17 | 2015-11-16 | Apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2968159A1 CA2968159A1 (en) | 2016-05-26 |
| CA2968159C true CA2968159C (en) | 2023-02-21 |
Family
ID=54542272
Family Applications (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2968159A Active CA2968159C (en) | 2014-11-17 | 2015-11-16 | Apparatus |
| CA2968151A Active CA2968151C (en) | 2014-11-17 | 2015-11-16 | Mask assembly |
| CA3206173A Pending CA3206173A1 (en) | 2014-11-17 | 2015-11-16 | Mask assembly |
| CA3177744A Pending CA3177744A1 (en) | 2014-11-17 | 2015-11-16 | Apparatus |
Family Applications After (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2968151A Active CA2968151C (en) | 2014-11-17 | 2015-11-16 | Mask assembly |
| CA3206173A Pending CA3206173A1 (en) | 2014-11-17 | 2015-11-16 | Mask assembly |
| CA3177744A Pending CA3177744A1 (en) | 2014-11-17 | 2015-11-16 | Apparatus |
Country Status (9)
| Country | Link |
|---|---|
| US (5) | US10558129B2 (enExample) |
| EP (4) | EP4286941A3 (enExample) |
| JP (10) | JP6837433B2 (enExample) |
| KR (7) | KR102873584B1 (enExample) |
| CN (5) | CN115840333A (enExample) |
| CA (4) | CA2968159C (enExample) |
| NL (2) | NL2015795A (enExample) |
| TW (4) | TWI724622B (enExample) |
| WO (2) | WO2016079051A2 (enExample) |
Families Citing this family (75)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016079051A2 (en) | 2014-11-17 | 2016-05-26 | Asml Netherlands B.V. | Mask assembly |
| WO2017102379A1 (en) | 2015-12-14 | 2017-06-22 | Asml Netherlands B.V. | A membrane for euv lithography |
| WO2017102378A1 (en) | 2015-12-14 | 2017-06-22 | Asml Netherlands B.V. | A membrane assembly |
| KR102186010B1 (ko) * | 2016-01-26 | 2020-12-04 | 한양대학교 산학협력단 | Euv 펠리클 구조체, 및 그 제조 방법 |
| KR20240154685A (ko) | 2016-04-25 | 2024-10-25 | 에이에스엠엘 네델란즈 비.브이. | Euv 리소그래피를 위한 멤브레인 |
| WO2018008594A1 (ja) * | 2016-07-05 | 2018-01-11 | 三井化学株式会社 | ペリクル膜、ペリクル枠体、ペリクル、その製造方法、露光原版、露光装置、半導体装置の製造方法 |
| US10585359B2 (en) * | 2016-07-29 | 2020-03-10 | Asml Holding N.V. | Membrane assembly and particle trap |
| JP6607574B2 (ja) * | 2016-08-24 | 2019-11-20 | 信越化学工業株式会社 | ペリクルフレーム及びペリクル |
| KR101848153B1 (ko) * | 2016-09-12 | 2018-05-29 | 한양대학교 산학협력단 | 마스크 보호 모듈, 이를 포함하는 펠리클, 및 이를 포함하는 리소그래피 장치 |
| JP6816170B2 (ja) | 2017-02-17 | 2021-01-20 | 三井化学株式会社 | ペリクル、露光原版、露光装置、及び半導体装置の製造方法 |
| US11183410B2 (en) | 2017-04-24 | 2021-11-23 | Photronics, Inc. | Pellicle removal tool |
| CN110809736B (zh) | 2017-06-15 | 2023-10-24 | Asml荷兰有限公司 | 表膜和表膜组件 |
| US11143952B2 (en) | 2017-09-28 | 2021-10-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle removal method |
| JP7307054B2 (ja) * | 2017-10-27 | 2023-07-11 | エーエスエムエル ネザーランズ ビー．ブイ． | ペリクルフレーム及びペリクルアセンブリ |
| US11106127B2 (en) * | 2017-11-08 | 2021-08-31 | Taiwan Semiconductor Manufacturing Co., Ltd. | Structure of pellicle-mask structure with vent structure |
| WO2019101517A1 (en) * | 2017-11-21 | 2019-05-31 | Asml Netherlands B.V. | Porous graphitic pellicle |
| JP6921412B2 (ja) * | 2018-01-25 | 2021-08-18 | 株式会社ブイ・テクノロジー | ペリクルフレーム把持装置及びペリクルフレーム把持方法 |
| EP3530511B1 (de) * | 2018-02-27 | 2020-05-27 | Joseph Vögele AG | Verfahren zum rekonfigurieren einer bedienanordnung für eine baumaschine |
| WO2019172141A1 (ja) | 2018-03-05 | 2019-09-12 | 三井化学株式会社 | ペリクル、露光原版、露光装置、及び半導体装置の製造方法 |
| JP7019472B2 (ja) * | 2018-03-22 | 2022-02-15 | 三井化学株式会社 | カーボンナノチューブ自立膜の製造方法、およびペリクルの製造方法 |
| JP7061494B2 (ja) * | 2018-03-28 | 2022-04-28 | 三井化学株式会社 | 検査方法、ペリクルの製造方法、および検査装置 |
| US12271108B2 (en) | 2018-07-04 | 2025-04-08 | Asml Netherlands B.V. | Apparatus for positioning and clamped curing |
| CN108950475B (zh) * | 2018-07-25 | 2020-11-10 | 京东方科技集团股份有限公司 | 张网结构、张网装置及张网方法 |
| US11016383B2 (en) * | 2018-08-31 | 2021-05-25 | Taiwan Semiconductor Manufacturing Co., Ltd. | Pellicle for an EUV lithography mask and a method of manufacturing thereof |
| WO2020064217A1 (en) | 2018-09-28 | 2020-04-02 | Asml Netherlands B.V. | Lithographic system and method |
| NL2024075B1 (en) | 2018-11-16 | 2020-08-19 | Asml Netherlands Bv | A pellicle for euv lithography |
| KR102243367B1 (ko) * | 2018-11-30 | 2021-04-23 | 한양대학교 산학협력단 | 펠리클 홀더, 펠리클 검사 장치, 및 펠리클 검사 방법 |
| US11137693B2 (en) * | 2018-11-30 | 2021-10-05 | Iucf-Hyu (Industry-University Cooperation Foundation Hanyang University) | Pellicle holder, pellicle inspection apparatus, and pellicle inspection method |
| KR20240104185A (ko) * | 2018-12-10 | 2024-07-04 | 어플라이드 머티어리얼스, 인코포레이티드 | 극자외선 리소그래피 애플리케이션에서 포토마스크로부터의 부착 피처 제거 |
| EP3671342B1 (en) * | 2018-12-20 | 2021-03-17 | IMEC vzw | Induced stress for euv pellicle tensioning |
| KR102172722B1 (ko) | 2018-12-26 | 2020-11-02 | 주식회사 에프에스티 | 초극자외선 리소그라피용 펠리클의 검사에 사용되는 캡슐 |
| KR20200088529A (ko) | 2019-01-14 | 2020-07-23 | 주식회사 에프에스티 | 초극자외선 리소그라피용 펠리클 검사 시스템 |
| KR20200088528A (ko) | 2019-01-14 | 2020-07-23 | 주식회사 에프에스티 | 펠리클 장착 시스템, 스터드 부착 장치, 펠리클 부착 장치 및 펠리클 부착 방법 |
| KR102863372B1 (ko) * | 2019-02-28 | 2025-09-24 | 에이에스엠엘 네델란즈 비.브이. | 레티클 조립체의 조립을 위한 장치 |
| CN113557475B (zh) * | 2019-03-13 | 2024-09-17 | Asml控股股份有限公司 | 用于光刻设备的静电夹具 |
| WO2020207774A1 (en) | 2019-04-12 | 2020-10-15 | Asml Netherlands B.V. | Pellicle for euv lithography |
| KR102242356B1 (ko) * | 2019-08-05 | 2021-04-20 | 주식회사 에프에스티 | 일체화된 프레임과 멤브레인을 포함하는 펠리클, 그 제조방법, 펠리클을 포함하는 노광장치 및 펠리클의 제조장치 |
| KR102273266B1 (ko) * | 2019-10-23 | 2021-07-06 | 주식회사 에프에스티 | 일체화된 프레임과 멤브레인을 포함하는 펠리클의 제조방법 |
| KR102898051B1 (ko) * | 2020-03-13 | 2025-12-10 | 삼성전자주식회사 | 펠리클 전사 장치 및 펠리클 전사 방법 |
| KR102873574B1 (ko) * | 2020-04-23 | 2025-10-21 | 에이에스엠엘 네델란즈 비.브이. | Euv 리소그래피용 펠리클 프레임 |
| TWI760062B (zh) * | 2020-05-14 | 2022-04-01 | 家登精密工業股份有限公司 | 提供有保持銷組件之光罩盒及固持光罩的方法 |
| US20230213850A1 (en) * | 2020-06-04 | 2023-07-06 | Shin-Etsu Chemical Co., Ltd. | Pellicle Frame, Pellicle, Pellicle-Equipped Exposure Original Plate, Exposure Method, Method for Manufacturing Semiconductor, and Method for Manufacturing Liquid Crystal Display Board |
| KR20230019853A (ko) * | 2020-06-08 | 2023-02-09 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 펠리클 프레임, 펠리클, 펠리클 부착 노광 원판, 노광 방법, 반도체의 제조 방법 및 액정 표시판의 제조 방법 |
| US11822230B2 (en) * | 2020-07-24 | 2023-11-21 | Taiwan Semiconductor Manufacturing Company, Ltd. | EUV pellicle and mounting method thereof on photo mask |
| JPWO2022030499A1 (enExample) * | 2020-08-06 | 2022-02-10 | ||
| NL2028873B1 (en) * | 2020-08-24 | 2022-07-20 | Asml Netherlands Bv | Apparatus and method for processing a reticle and pellicle assembly |
| KR20230066590A (ko) * | 2020-09-17 | 2023-05-16 | 린텍 오브 아메리카, 인크. | 나노섬유 필름 인장 제어 |
| KR20220043268A (ko) | 2020-09-29 | 2022-04-05 | 삼성전자주식회사 | 온도/압력이 독립으로 제어되는 스터드 부착 장치 및 스터드 부착 방법 |
| KR102668456B1 (ko) | 2020-12-07 | 2024-05-23 | 주식회사 에프에스티 | 극자외선 리소그라피용 펠리클 프레임 |
| KR102512243B1 (ko) | 2020-12-16 | 2023-03-21 | 주식회사 에프에스티 | 극자외선 리소그라피용 다공성 펠리클 프레임 |
| WO2022128593A1 (en) * | 2020-12-17 | 2022-06-23 | mi2-factory GmbH | Energy filter assembly for ion implantation system with at least one coupling element |
| KR102581084B1 (ko) | 2021-02-04 | 2023-09-21 | 주식회사 에프에스티 | 극자외선 리소그라피용 펠리클 프레임 |
| KR102279897B1 (ko) | 2021-02-18 | 2021-07-21 | 주식회사 에프에스티 | 다액형 경화성 조성물의 도포 방법 |
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| JP5984187B2 (ja) * | 2013-04-22 | 2016-09-06 | 信越化学工業株式会社 | ペリクルとフォトマスクのアセンブリ |
| JP6303286B2 (ja) | 2013-04-30 | 2018-04-04 | 凸版印刷株式会社 | ペリクル付きフォトマスクの検査方法及びペリクル粘着耐久性検査装置 |
| CN103246157A (zh) | 2013-05-21 | 2013-08-14 | 上海和辉光电有限公司 | 防尘薄膜框架、光学掩膜版及其安装方法 |
| CN203422554U (zh) * | 2013-08-01 | 2014-02-05 | 上海凸版光掩模有限公司 | 一种光掩模板贴膜装置 |
| CN203650297U (zh) * | 2013-10-25 | 2014-06-18 | 常州市佳和工具有限公司 | 轴承夹具 |
| JP2015138128A (ja) | 2014-01-22 | 2015-07-30 | 凸版印刷株式会社 | ペリクルフレーム除去方法及びペリクルフレーム除去装置 |
| JP6106337B2 (ja) | 2014-05-27 | 2017-03-29 | 三井化学株式会社 | ペリクル製造装置 |
| WO2016079051A2 (en) | 2014-11-17 | 2016-05-26 | Asml Netherlands B.V. | Mask assembly |
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