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  • C08F2/00—Processes of polymerisation
  • C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
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  • C07C15/42—Cyclic hydrocarbons containing only six-membered aromatic rings as cyclic parts substituted by unsaturated carbon radicals monocyclic
  • C07C15/44—Cyclic hydrocarbons containing only six-membered aromatic rings as cyclic parts substituted by unsaturated carbon radicals monocyclic the hydrocarbon substituent containing a carbon-to-carbon double bond
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  • C07C69/12—Acetic acid esters
  • C07C69/14—Acetic acid esters of monohydroxylic compounds
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  • C07C69/533—Monocarboxylic acid esters having only one carbon-to-carbon double bond
  • C07C69/54—Acrylic acid esters; Methacrylic acid esters

Definitions

• the present disclosure generally relates to compositions that include a blend of polymerization inhibitors and methods of using the same to inhibit unwanted polymerization in vapor-space areas. More particularly, the present disclosure relates to compositions that include at least one compound having a hydroxylamine of stable nitroxide radical, a quinone and a phenylenediamine, useful for inhibiting polymerization of ethylenic unsaturated monomers.
• Ethylenically unsaturated monomers are typically manufactured in a three- stage process consisting of (i) reaction, (ii) recovery, and (iii) purification. Distillation operations at elevated temperatures are often involved in the recovery and purification stages.
• the processes include fractional distillation of the monomers. In the top sections of the distillation columns, purified monomer vapor condenses into liquid pools prior to transfer into storage facilities. Some of the condensed monomer streams cascade down the column. In the vapor space areas of the distillation column, the liquid monomer pools are likely to generate spontaneous or peroxideinitiated free-radicals. Current polymer inhibitor technologies are confined to liquid streams in the bottom sections of the process columns.
• the inhibitors are typically non-volatile so that they are confined to the bottom section of the distillation column, and no inhibitor reaches highly reactive monomer pools in the vapor-space sections.
• the pooled monomers are not treated to abate unwanted polymerization.
• reactive monomers undesirably polymerize through radical polymerization especially at elevated temperature or when in contact with rust on the surfaces of the process equipment such as distillation column trays.
• HTEMPO 4-hydroxy-2,2,6,6-tetramethylpiperidin-1-oxyl
• OTEMPO 4-oxo-2, 2,6,6- tetramethylpiperidin-1-oxyl
• HTEMPO and OTEMPO are not volatile.
• a composition for inhibiting monomer polymerization includes a first inhibitor compound comprising a hydroxylamine; a second inhibitor compound comprising a phenylenediamine; and a third inhibitor compound comprising a benzoquinone or naphthoquinone.
• the first inhibitor compound is of formula (II): wherein R2 is C1-C22 alkyl, C1-C22 alkenyl, C1-C22 alkynyl, C1-C22 cycloalkyl, aryl, -
• C1-C22 alkylene -C(O)(Ci-C22 alkyl), -C(O)(Ci-C22 alkenyl), -C(O)(Ci-C22 alkynyl),- C(O)(Ci-C 22 cycloalkyl), -C(O)(aryl), or -C(0)(Ci-C22 alkylene), wherein the alkyl, alkylene, cycloalkyl, and aryl are optionally substituted with one or more C1-C22 alkyl, C1-C22 alkenyl, C1-C22 alkynyl, or aryl.
• R 2 is -C(O)(Ci-C 22 alkyl), -C(O)(Ci-C 22 alkenyl), - C(O)(Ci-C 22 alkynyl), -C(O)(Ci-C 22 cycloalkyl), -C(O)(aryl), or -C(O)(Ci-C 22 alkylene), wherein the alkyl, alkylene, cycloalkyl, and aryl are optionally substituted with one or more C1-C22 alkyl, C1-C22 alkenyl, C1-C22 alkynyl, or aryl.
• the first inhibitor is selected from the group consisting of:
• the first inhibitor is a compound of formula Ila: wherein R4 is H, C1-C22 alkyl, C1-C22 alkenyl, C1-C22 alkynyl, C1-C22 cycloalkyl, aryl, - C1-C22 alkylene, -C(O)(Ci-C22 alkyl), -C(O)(Ci-C22 alkenyl), -C(O)(Ci-C22 alkynyl),— C(O)(Ci-C 22 cycloalkyl), -C(O)(aryl), or -C(0)(Ci-C22 alkylene), wherein the alkyl, alkylene, cycloalkyl, and aryl are optionally substituted with one or more C1-C22 alkyl, C1-C22 alkenyl, C1-C22 alkynyl, or aryl.
• the first inhibitor is selected from the group consisting of: 1 -hydroxy-2, 2, 6, 6-tetramethylpiperidin-4-yl acetate, 1 -hydroxy-2, 2,6,6- tetramethylpiperidin-4-yl propanoate, 1 -hydroxy-2, 2, 6, 6-tetramethylpiperidin-4-yl butyrate, 1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl pentanoate, 1-hydroxy-2,2,6, 6- tetramethylpiperidin-4-yl hexanoate, 1 -hydroxy-2, 2, 6, 6-tetramethylpiperidin-4-yl heptanoate, 1-hydroxy-2,2,6,6-tetramethylpiperidin-4-yl octanoate, 1-hydroxy- 2,2,6,6-tetramethylpiperidin-4-yl nonanoate, 1 -hydroxy-2, 2,6, 6-tetramethylpiperidin- 4-yl decanoate, 1-hydroxy-2,2,6,
• the second inhibitor compound is a phenylenediamine of formula (IV) or formula (V):
• the second inhibitor is selected from the group consisting of: 1 ,2-phenylenediamine, 1 ,4-phenylenediamine, N,N'-di-methyl-p- phenylenediamine, N,N'-di-sec-butyl-1 ,4-phenylenediamine, N , N'-di- 1 ,4- dimethylpentyl-1 ,4-phenylenediamine, N, N -di-ethyl-1 ,4-phenylenediamine, N-tert- butyl-N'-phenyl-1 ,4-phenylenediamine, N,N -di-phenyl-1 ,4-phenylenediamine, and any combination thereof.
• the third inhibitor compound is a benzoquinone of formula (VI) or formula (VII): wherein X3, X4, X5, and Xe are independently H, C1-C22 alkyl, or aryl, wherein the alkyl and aryl are optionally substituted with one or more C1-C22 alkyl or aryl.
• the third inhibitor compound is a naphthoquinone of formula (VII) or formula (VIII):
• X5 and Xe are independently H, C1-C22 alkyl, aryl, wherein the alkyl and aryl are optionally substituted with one or more C1-C22 alkyl or aryl.
• the first inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 80% by weight
• the second inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 50% by weight.
• the composition further comprises an organic solvent.
• the composition further comprises an ethylenic unsaturated monomer selected from the group consisting of vinyl acetate, acrylonitrile, an acrylate, a methacrylate, 1 ,3-butadiene, styrene, isoprene, acrylic acid, methacrylic acid and any combination thereof.
• an ethylenic unsaturated monomer selected from the group consisting of vinyl acetate, acrylonitrile, an acrylate, a methacrylate, 1 ,3-butadiene, styrene, isoprene, acrylic acid, methacrylic acid and any combination thereof.
• a method of inhibiting polymerization of a monomer includes adding the composition described herein to the monomer.
• the monomer is provided within a solution.
• the solution further comprises one or more additional components selected from: an acid, an organic solvent, and water.
• the monomer is an ethylenic unsaturated monomer.
• the composition is added to the monomer such that a concentration of the first inhibitor compound is about 0.1 ppm to about 10,000 ppm.
• the composition is added to the monomer such that a concentration of the second inhibitor compound is about 0.1 ppm to about 10,000 ppm.
• the monomer is selected from the group consisting of vinyl acetate, acrylonitrile, an acrylate, a methacrylate, 1 ,3-butadiene, styrene, isoprene, acrylic acid, methacrylic acid and any combination thereof.
• FIG. 1 shows kinetic curves showing the effectiveness of the combination of 4-Acetate TEMPO and N,N’-di-sec-butyl-1 ,4-phenylenediamine as an antipolymerant compared to the performance of a 25 ppm dose of composition of N,N’-di-sec-butyl-1 ,4-phenylenediamine and 2,6-di-tert-butylphenol for styrene polymerization at about 135 °C using the static method.
• compositions that include a blend of polymerization inhibitors and methods of using the same to inhibit the polymerization of ethylenic unsaturated monomers.
• Polymerization inhibitor compositions of the present disclosure include a hydroxylamine, a phenylenediamine, and a benzoquinone or naphthoquinone.
• Polymerization inhibitors and polymerization retarders can be considered generally as "antipolymerants" which are compounds that can inhibit or reduce the formation of polymers from one or more radically polymerizable compounds.
• fouling refers to the formation of polymers, prepolymers, oligomer and/or other materials, which would become insoluble in and/or precipitate from a stream and deposit on equipment under the conditions of operation of the equipment.
• the inhibitor, retarder, and amine stabilizer components and compositions of the disclosure can be referred to as “antifouling” as they inhibit or reduce such formation.
• compositions for inhibiting monomer polymerization where the compositions include a first inhibitor compound includes a hydroxylamine, a second inhibitor compound comprising a phenylenediamine, and a third inhibitor compound comprising a benzoquinone or naphthoquinone.
• the compositions are for inhibiting monomer polymerization, where the monomer is an ethylenic unsaturated monomer.
• compositions of the disclosure are useful for inhibiting polymerization of ethylenic unsaturated monomers including, but not limited to, vinyl acetate, acrylonitrile, acrylates, methacrylates, 1 ,3-butadiene, styrene, isoprene, (meth)acrylic acid, and combinations thereof.
• ethylenic unsaturated monomers including, but not limited to, vinyl acetate, acrylonitrile, acrylates, methacrylates, 1 ,3-butadiene, styrene, isoprene, (meth)acrylic acid, and combinations thereof.
• the first inhibitor compound is of formula (II): where R2 is selected from H, C1-C22 alkyl, C1-C22 alkenyl, C1-C22 alkynyl, C1-C22 cycloalkyl, aryl, -C1-C22 alkylene, -C(O)(Ci-C22 alkyl), -C(O)(Ci-C22 alkenyl), - C(O)(Ci-C 22 alkynyl), -C(O)(Ci-C 22 cycloalkyl), -C(O)(aryl), and -C(O)(C 1 -C 22 alkylene), wherein the alkyl, alkylene, cycloalkyl, and aryl are optionally substituted with one or more Ci-C 22 alkyl, Ci-C 22 alkenyl, Ci-C 22 alkynyl, or aryl.
• aryl refers to monocyclic, bicyclic (fused), and tricyclic (fused or spiro) hydrocarbon ring systems having a total of five to fourteen ring carbon atoms, wherein at least one ring in the system is aromatic and wherein each ring in the system contains 3 to 7 ring carbon atoms.
• aryl may be used interchangeably with the term “aryl ring.”
• R 2 is -C(O)(Ci-C 22 alkyl), -C(O)(Ci-C 22 alkenyl), -C(O)(Ci-C 22 alkynyl), -C(O)(CrC 22 cycloalkyl), -C(O)(aryl), and -C(O)(Ci-C 22 alkylene), where the alkyl, alkylene, cycloalkyl, and aryl are optionally substituted with one or more Ci-C 22 alkyl, Ci-C 22 alkenyl, Ci-C 22 alkynyl, or aryl.
• R 2 is H. In some aspects, R 2 is Ci-C 22 alkyl. In some aspects, R 2 is Ci-C 22 alkenyl. In some aspects, R 2 is Ci-C 22 alkynyl. In some aspects, R 2 is Ci-C 22 cycloalkyl, where the cycloalkyl is optionally substituted with one or more Ci-C 22 alkyl, Ci-C 22 alkenyl, Ci-C 22 alkynyl, or aryl. In some aspects, R 2 is aryl, where the aryl is optionally substituted with one or more Ci-C 22 alkyl, Ci-C 22 alkenyl,
• R 2 is -Ci-C 22 alkylene, where the alkylene is optionally substituted with aryl that is optionally substituted with one or more Ci-C 22 alkyl, Ci-C 22 alkenyl, Ci-C 22 alkynyl, or aryl.
• R 2 is -C(O)(Ci-C 22 alkyl).
• R 2 is -C(O)(Ci-Ci 2 alkyl).
• R 2 is -C(O)(Ci- Ce alkyl).
• R 2 is -C(O)(methyl).
• R 2 is -C(O)(ethyl). In some aspects, R 2 is -C(O)(propyl). In some aspects, R 2 is -C(O)(butyl). In some aspects, R 2 is -C(O)(Ci-C 22 alkenyl). In some aspects, R 2 is -C(O)(Ci-C 22 alkynyl). In some aspects, R 2 is -C(O)(Ci-C 22 cycloalkyl), where the cycloalkyl is optionally substituted with one or more Ci-C 22 alkyl, Ci-C 22 alkenyl, Ci-C 22 alkynyl, or aryl.
• R 2 is -C(O)(aryl), where the aryl is optionally substituted with one or more Ci-C 22 alkyl, Ci-C 22 alkenyl, Ci-C 22 alkynyl, or aryl.
• R 2 is - C(O)(Ci-C 22 alkylene), where the alkylene is optionally substituted with aryl that is optionally substituted with one or more Ci-C 22 alkyl, Ci-C 22 alkenyl, Ci-C 22 alkynyl, or aryl.
• the compound of formula (II) is 2, 2,6,6- tetramethylpiperin-1 ,4-diol; 4-methoxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-ethoxy- 2,2,6,6-tetramethylpiperidin-1-ol; 4-propoxy-2,2,6,6-tetramethylpiperidin-1-ol; 4- butoxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-pentoxy-2,2,6,6-tetramethylpiperidin-1 -ol; 4-hexyloxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-heptyloxy-2,2,6,6- tetramethylpiperidin-1-ol; 4-octyloxy-2,2,6,6-tetramethylpiperidin-1-ol; 4-nonyloxy-
• compositions of the disclosure include compounds of formula (I) and (II), respectively, where Ri and R2 are the same.
• the compositions of the disclosure include compounds of formula (I) and (II), respectively, where R1 and R2 are each, independently, -C(O)(Ci-C22 alkyl).
• the compositions of the disclosure include first and second inhibitor compounds of formula (I) and (II), respectively, where R1 and R2 are different.
• the second inhibitor compound having a hydroxylamine is selected from the group consisting of: In some aspects, the second inhibitor compound having a hydroxylamine is:
• the second inhibitor compound having a hydroxylamine is:
• the second inhibitor compound having a hydroxylamine is:
• the second inhibitor compound having a hydroxylamine is:
• a hydroxylamine of a nitroxide has the potential to provide additional polymerization inhibition as compared to the corresponding nitroxide when carboncentered and oxygen-centered radical initiators are present. This is explained as follows:
• the hydroxylamine of a nitroxide is an excellent hydrogen donor due to its weak NO-H bond in the compound, and thus it is an efficient antioxidant.
• the hydroxylamine of a nitroxide easily reacts with oxygen-centered radicals, such as peroxide radicals, while it's converted to its corresponding nitroxide.
• Nitroxides are generally known as the most effective inhibitors because of their superior inhibiting capabilities through scavenging carbon-centered free radicals at a nearly diffusion controlled rate. This rate is several orders of magnitude faster than phenolic compounds. However, their kinetic superiority is not always advantageous. For instance, it may lose its superiority when oxygen-centered radicals are present as the predominant free radicals.
• nitroxide inhibitor dosages are often required for a given inhibition efficacy, thereby making their use economically unattractive or even infeasible.
• each hydroxylamine of a nitroxide is equivalent to one hydrogen donor plus one nitroxide antipolymerant when oxygen-centered radicals and carbon-centered radicals are both present, which is an attractive incentive offered by the hydroxylamines of nitroxides. That is, one hydroxylamine of a nitroxide is able to eliminate one oxygen-centered radical and one carbon-centered radical whereas a nitroxide is only capable to eliminate a carbon-centered radical.
• the first inhibitor is a compound of formula Ila: wherein R4 is H, C1-C22 alkyl, C1-C22 alkenyl, C1-C22 alkynyl, C1-C22 cycloalkyl, aryl, - C1-C22 alkylene, -C(O)(Ci-C22 alkyl), -C(O)(Ci-C22 alkenyl), -C(O)(Ci-C22 alkynyl),— C(O)(Ci-C 22 cycloalkyl), -C(O)(aryl), or -C(0)(Ci-C22 alkylene), wherein the alkyl, alkylene, cycloalkyl, and aryl are optionally substituted with one or more C1-C22 alkyl, C1-C22 alkenyl, C1-C22 alkynyl, or aryl.
• the first inhibitor is a compound of formula III: wherein R3 is -O or -OH; and R 4 is C1-C22 alkyl or aryl, wherein the alkyl and aryl are optionally substituted with one or more C1-C22 alkyl or aryl.
• R3 is -O*. In some aspects, R3 is -OH.
• R4 is C1-C22 alkyl that is optionally substituted with one or more C1-C22 alkyl or aryl. In some aspects with regard to formulae (Ila) and (III), R4 is C1-C5 alkyl that is optionally substituted with one or more C1-C22 alkyl or aryl. In some aspects with regard to formulae (Ila) and (III), R4 is C1-C4 alkyl that is optionally substituted with one or more C1-C22 alkyl or aryl.
• R4 is C1-C10 alkyl that is optionally substituted with one or more C1-C22 alkyl or aryl. In some aspects with regard to formulae (Ila) and (III), R4 is Ci-Cs alkyl that is optionally substituted with one or more C1-C22 alkyl or aryl. In some aspects, R4 is aryl that is optionally substituted with one or more C1-C22 alkyl or aryl. In some aspects, R4 is methyl. In some aspects, R4 is propyl. In some aspects, R4 is butyl. In some aspects, R4 is a C5 alkyl group.
• R4 is a Ce alkyl group. In some aspects, R4 is a C7 alkyl group. In some aspects, R4 is a Cs alkyl group. In some aspects, Rg is a C5 alkyl group. In some aspects, R4 is a C10 alkyl group. In some aspects, R4 is a C22 alkyl group. In some aspects, R4 is a C21 alkyl group. In some aspects, R4 is a On alkyl group. In some aspects, R4 is a benzyl group.
• Examples of a compound of formulae (Ila) or (III) include, but are not limited to, 1-oxyl-2,2,6,6-tetramethylpiperidin-4-yl acetate; 1-oxyl-2, 2,6,6- tetramethylpiperidin-4-yl propanoate; 1 -oxyl-2,2,6,6-tetramethylpiperidin-4-yl butyrate; 1 -oxyl-2,2,6,6-tetramethylpiperidin-4-yl pentanoate; 1 -oxyl-2, 2, 6, 6- tetramethylpiperidin-4-yl hexanoate; 1-oxyl-2,2,6,6-tetramethylpiperidin-4-yl heptanoate; 1-oxyl-2,2,6,6-tetramethylpiperidin-4-yl octanoate; 1 -oxyl-2, 2,6,6- tetramethylpiperidin-4-yl nonanoate; 1 -oxyl-2,2,6,6-
• the compound of formulae (Ila) or (III) is 1 -oxyl-2, 2,6,6- tetramethylpiperidin-4-yl acetate; 1-oxyl-2,2,6,6-tetramethylpiperidin-4-yl propanoate; or 1 -oxyl-2,2,6,6-tetramethylpiperidin-4-yl butyrate.
• the compound of formulae (Ila) or (III) is 1 -oxyl-2,2,6,6-tetramethylpiperidin-4-yl acetate.
• the compound of formulae (Ila) or (III) is 1-oxyl-2,2,6,6-tetramethylpiperidin- 4-yl propanoate.
• the compound of formulae (Ila) or (III) is 1-oxyl- 2,2,6,6-tetramethylpiperidin-4-yl butyrate.
• the second inhibitor compound is a phenylenediamine of formula (IV) or formula (V): para-phenylenediamine ortho-phenylenediamine
• the second inhibitor compound is a phenylenediamine of formula (IV). In some aspects, the second inhibitor compound is a phenylenediamine of formula (V).
• phenylenediamines include, but are not limited to, 1 ,2- phenylenediamine, 1 ,4-phenylenediamine, N,N'-di-methyl-p-phenylenediamine, N,N'- di-sec-butyl-1 ,4-phenylenediamine, N , N'-d i-1 ,4-dimethylpentyl-1 ,4- phenylenediamine, N , N '-di-ethyl-1 ,4-phenylenediamine, N-tert-butyl-N'-phenyl-1 ,4- phenylenediamine, and N,N'-di-phenyl-1 ,4-phenylenediamine.
• the phenylenediamine is N,N'-di-sec-butyl-1 ,4- phenylenediamine, N , N '-di-1 ,4-dimethylpentyl-1 ,4-phenylenediamine, N, N'-di-ethyl- 1 ,4-phenylenediamine, N-te/Y-butyl-N'-phenyl-1 ,4-phenylenediamine, or N , N '-diphenyl- 1 ,4-phenylenediamine.
• the phenylenediamine is N,N'-di-sec-butyl-1 ,4- phenylenediamine.
• the phenylenediamine is N,N'-di-1 ,4-dimethylpentyl-1 ,4- phenylenediamine. [0056] In some aspects, the phenylenediamine is N,N'-di-ethyl-1 ,4- phenylenediamine.
• the phenylenediamine is N-tert-butyl-N'-phenyl-1 ,4- phenylenediamine.
• the phenylenediamine is N,N'-di-phenyl-1 ,4- phenylenediamine.
• the third inhibitor compound is a benzoquinone of formula (VI) or formula (VII):
• the third inhibitor compound is a benzoquinone of formula (VI). In some aspects, the third inhibitor compound is a benzoquinone of formula (VII).
• the third inhibitor compound is a naphthoquinone of formula (VII) or formula (VIII): wherein X5 and Xe are independently H, C1-C22 alkyl, aryl, wherein the alkyl and aryl are optionally substituted with one or more C1-C22 alkyl or aryl.
• X5 and Xe are independently H or C1-C22 alkyl.
• X5 and Xe are independently H or C1-C15 alkyl.
• X5 and Xe are independently H or C1-C10 alkyl.
• X5 and Xe are independently H or C1-C5 alkyl.
• the third inhibitor compound is a naphthoquinone of formula (VII). In some aspects, the third inhibitor compound is a naphthoquinone of formula (VIII).
• X3, X4, X5, and Xe are independently H or C1-C22 alkyl. In some aspects, at least one of X3, X4, X5, and Xe is C1-C22 alkyl. In some aspects, X3, X4, and X5 are H and Xe is C1-C22 alkyl. In some aspects, X3, X4, and X5 are H and Xe is C1-C10 alkyl. In some aspects, X3, X4, and X5 are H and Xe is tert-butyl.
• benzoquinones include, but are not limited to, 2-tert-butyl-1 ,4- benzoquinone, 2-tert-butyl-5-methylbenzoquinone, 2-sec-butyl-5- methylbenzoquinone, 2-n-butyl-5-methylbenzoquinone, 2-sec-butyl-5- methylbenzoquinone, 2-/so-propyl-5-methylbenzoquinone, 2,5-di-sec- butylbenzoquinone, 2,5-di-tert-butylbenzoquinone, 2,5-di-/so-popylbenzoquinone,
• the benzoquinone is 2-tert-butyl-1 ,4-benzoquinone.
• naphthoquinones include, but are not limited to, 1 ,4- naphthoquinone, 1 ,2-naphthoquinone, 1-methyl-1 ,4-naphthoquinone, 1-ethyl-1 ,4- naphthoquinone, 1-n-propyl-1 ,4-naphthoquinone, 1 -isopropyl-1 ,4-naphthoquinone, 1- n-buty I- 1 ,4-naphthoquinone, 1 -sec-butyl-1 ,4-naphthoquinone, 1 -tert-butyl- 1 ,4- naphthoquinone, 1-methyl-1 ,2-naphthoquinone, 1-ethyl-1 ,2-naphthoquinone, 1-n- propyl-1 ,2-naphthoquinone, 1 -iso
• the composition consists essentially of a first inhibitor compound, a second inhibitor compound, and a third inhibitor compound. In other aspects, the composition consists of an organic solvent, a first inhibitor, a second inhibitor, and a third inhibitor compound. In some aspects, the composition does not include 4-hydroxy-2,2,6,6-tetramethylpiperidin-1-oxyl.
• the first inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 80% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 70% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 60% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 50% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 40% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 30% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 20% by weight. In some aspects, the first inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 10% by weight.
• the first inhibitor compound is present in the composition at a concentration of about 0.01 % by weight, about 0.1 % by weight, about 1 % by weight, about 5% by weight, about 10% by weight, about 15% by weight, about 20% by weight, about 25% by weight, about 30% by weight, about 35% by weight, about 40% by weight, about 45% by weight, about 50% by weight, about 55% by weight, about 60% by weight, about 65% by weight, about 70% by weight, about 75% by weight, or about 80% by weight.
• the second inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 50% by weight. In some aspects, the second inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 40% by weight. In some aspects, the second inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 30% by weight. In some aspects, the second inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 20% by weight. In some aspects, the second inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 10% by weight.
• the second inhibitor compound is present in the composition at a concentration of about 0.01 % by weight, about 0.1% by weight, about 1 % by weight, about 5% by weight, about 10% by weight, about 15% by weight, about 20% by weight, about 25% by weight, about 30% by weight, about 35% by weight, about 40% by weight, about 45% by weight, or about 50% by weight.
• the third inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 80% by weight. In some aspects, the third inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 70% by weight.
• the third inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 60% by weight. In some aspects, the third inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 50% by weight. In some aspects, the third inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 40% by weight. In some aspects, the third inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 30% by weight. In some aspects, the third inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 20% by weight. In some aspects, the third inhibitor compound is present in the composition at a concentration of about 0.01 % by weight to about 10% by weight.
• the third inhibitor compound is present in the composition at a concentration of about 0.01 % by weight, about 0.1 % by weight, about 1 % by weight, about 5% by weight, about 10% by weight, about 15% by weight, about 20% by weight, about 25% by weight, about 30% by weight, about 35% by weight, about 40% by weight, about 45% by weight, about 50% by weight, about 55% by weight, about 60% by weight, about 65% by weight, about 70% by weight, about 75% by weight, or about 80% by weight.
• a mole ratio of the first inhibitor compound to the second inhibitor compound is about 100:1 to about 1 :100.
• a mole ratio of the first inhibitor compound to the second inhibitor compound is about 90:1 to about 1 :90. In some aspects, a mole ratio of the first inhibitor compound to the second inhibitor compound is about 80:1 to about 1 :80. In some aspects, a mole ratio of the first inhibitor compound to the second inhibitor compound is about 70:1 to about 1 :70. In some aspects, a mole ratio of the first inhibitor compound to the second inhibitor compound is about 60:1 to about 1 :60. In some aspects, a mole ratio of the first inhibitor compound to the second inhibitor compound is about 50:1 to about 1 :50. In some aspects, a mole ratio of the first inhibitor compound to the second inhibitor compound is about 40:1 to about 1 :40.
• a mole ratio of the first inhibitor compound to the second inhibitor compound is about 30:1 to about 1 :30. In some aspects, a mole ratio of the first inhibitor compound to the second inhibitor compound is about 20:1 to about 1 :20. In some aspects, a mole ratio of the first inhibitor compound to the second inhibitor compound is about 10:1 to about 1 :10. In some aspects, a mole ratio of the first inhibitor compound to the second inhibitor compound is about 1 :1.
• the composition also includes one or more additional compounds selected from the group consisting of 2,2,6, 6-tetramethylpiperidin-1-oxyl;
• the composition also includes 2,2,6, 6-tetramethylpiperidin-1-oxyl. In some aspects, the composition also includes 2,2,6, 6-tetramethylpiperidin-1-ol. In some aspects, the composition also includes 4-hydroxyl-2, 2,6, 6-tetramethylpiperidin-1 -oxyl. In some aspects, the composition also includes 4-hydroxy-2,2,6,6-tetramethylpiperidin-1-ol. In some aspects, the composition also includes 4-oxo-2,2,6,6-tetramethylpiperidin-1- oxyl. In some aspects, the composition also includes 4-oxo-2, 2,6,6- tetramethylpiperidin-1-ol. In some aspects, the composition also includes 4-acetoxy-
• the composition also includes 4-acetoxy-2,2,6,6-tetramethylpiperidin-1-ol. In some aspects, the composition also includes 4-propionoxy-2,2,6,6- tetramethylpiperidin-1-oxyl. In some aspects, the composition also includes 4-propionoxy-2, 2,6, 6-tetramethylpiperidin-1-ol. In some aspects, the composition also includes bis((2,2,6,6-tetramethylpiperidin-1-oxyl)-4-yl) oxalate.
• the composition may optionally also include one or more organic solvents.
• organic solvents are selected from vinyl acetate, dimethyl phthalate, dimethylformamide, toluene, xylene, highly aromatic naphtha, acetonitrile, ethyl acetate, acetone, dichloromethane, tetrahydrofuran, hexanes, dimethyl sulfoxide, N-methyl-2-pyrrolidone, and combinations thereof.
• the composition also includes vinyl acetate.
• the composition also includes dimethyl phthalate.
• the composition also includes dimethylformamide. In certain aspects, the composition also includes toluene. In certain aspects, the composition also includes xylene. In certain aspects, the composition also includes highly aromatic naphtha. In certain aspects, the composition also includes acetonitrile.
• the composition also includes one or more ethylenic unsaturated monomers.
• the one or more ethylenic unsaturated monomers are selected from vinyl acetate, acrylonitrile, acrylate esters, methacrylate esters, 1 ,3-butadiene, styrene, isoprene, (meth)acrylic acid, and combinations thereof.
• the composition also includes vinyl acetate.
• the composition also includes acrylonitrile.
• the composition also includes acrylates.
• the composition also includes methacrylates. In certain aspects, the composition also includes 1 ,3- butadiene. In certain aspects, the composition also includes styrene. In certain aspects, the composition also includes isoprene. In certain aspects, the composition also includes acrylic acid and (meth)acrylic acid.
• the present disclosure also relates to methods of inhibiting polymerization of monomers that include adding a composition of the disclosure to the monomer.
• a composition of the disclosure to the monomer.
• an effective amount of the composition of the disclosure is added to the monomer, where an effective amount is any amount sufficient to inhibit the polymerization of the monomer.
• the monomer is an ethylenic unsaturated monomer.
• the monomer is an ethylenic unsaturated monomer selected from vinyl acetate, acrylonitrile, acrylate esters, methacrylate esters, 1 ,3-butadiene, styrene, isoprene, (meth)acrylic acid, and combinations thereof are disclosed.
• the methods disclosed herein are useful in inhibiting the polymerization of vinyl acetate.
• the methods disclosed herein are useful in inhibiting the polymerization of acrylonitrile.
• the methods disclosed herein are useful in inhibiting the polymerization of acrylates.
• the methods disclosed herein are useful in inhibiting the polymerization of methacrylates. In some aspects, the methods disclosed herein are useful in inhibiting the polymerization of 1 ,3-butadiene. In some aspects, the methods disclosed herein are useful in inhibiting the polymerization of styrene. In some aspects, the methods disclosed herein are useful in inhibiting the polymerization of isoprene. In some aspects, the methods disclosed herein are useful in inhibiting the polymerization of (meth)acrylic acid.
• the composition of the disclosure can be added manually or automatically to the fluid.
• the composition can also be added continuously and/or intermittently. Automatic addition may be accomplished through the use of chemical injection pumps.
• the chemical injection pumps may be programmed to add particular amounts of the polymerization inhibitor composition, or any components thereof, at certain time intervals to the fluid.
• the chemical injection pumps can be manually controlled to add particular amounts of the polymerization inhibitor composition, or any components thereof, to the fluid. Addition of the presently disclosed polymerization inhibitor compositions to the monomer will thereby inhibit polymerization of the monomer.
• the monomer is provided as a neat liquid. In other aspects, the monomer is provided within a solution, hereafter referred to as “the monomer solution.”
• the monomer solution also includes one or more additional components selected from an acid, an organic solvent, water, and combinations thereof.
• the monomer solution includes one or more organic solvents selected from vinyl acetate, dimethyl phthalate, dimethylformamide, toluene, xylene, highly aromatic naphtha, acetonitrile, ethyl acetate, acetone, dichloromethane, tetrahydrofuran, hexanes, dimethyl sulfoxide, N- methyl-2-pyrrolidone, and combinations thereof.
• the composition is added to the monomer such that a concentration of the first inhibitor compound is about 0.1 ppm to about 10,000 ppm. In some aspects, the composition is added to the monomer such that a concentration of the first inhibitor compound is about 0.1 ppm to about 5,000 ppm. In some aspects, the composition is added to the monomer such that a concentration of the first inhibitor compound is about 0.1 ppm to about 1 ,000 ppm. In some aspects, the composition is added to the monomer such that a concentration of the first inhibitor compound is about 0.1 ppm to about 500 ppm.
• the composition is added to the monomer such that a concentration of the second inhibitor compound is about 0.1 ppm to about 10,000 ppm. In some aspects, the composition is added to the monomer such that a concentration of the second inhibitor compound is about 0.1 ppm to about 5,000 ppm. In some aspects, the composition is added to the monomer such that a concentration of the second inhibitor compound is about 0.1 ppm to about 1 ,000 ppm. In some aspects, the composition is added to the monomer such that a concentration of the second inhibitor compound is about 0.1 ppm to about 500 ppm. [0089] In some aspects, the composition is added to the monomer such that a concentration of the third inhibitor compound is about 0.1 ppm to about 10,000 ppm.
• the composition is added to the monomer such that a concentration of the third inhibitor compound is about 0.1 ppm to about 5,000 ppm. In some aspects, the composition is added to the monomer such that a concentration of the third inhibitor compound is about 0.1 ppm to about 1 ,000 ppm. In some aspects, the composition is added to the monomer such that a concentration of the third inhibitor compound is about 0.1 ppm to about 500 ppm. [0090]
• the methods of the disclosure are useful for inhibiting the premature polymerization of monomers during manufacturing process, particularly those that are performed under acidic conditions.
• the methods of the disclosure are useful for preventing polymerization of acrylates, which may include, but are not limited to, acrylonitrile, acrylic acid, methyl methacrylic acid and its esters, and vinyl acetate.
• acrylates which may include, but are not limited to, acrylonitrile, acrylic acid, methyl methacrylic acid and its esters, and vinyl acetate.
• the methods of the disclosure are also useful for preventing the premature polymerization of styrene during manufacturing and purification processes.
• the methods of the disclosure are also useful in butadiene extraction processes. This utility stems from the balanced partition coefficients between polar organic phases and organic phases.
• compositions disclosed herein are used in distillative purification of olefins.
• the composition can be added to the process stream before entering the distillation unit or the composition can be added to the process stream in the distillation unit.
• compositions of the disclosure to inhibit the polymerization of polystyrene was assessed via the following protocol.
• Styrene was used as the reactive monomer for the polymerization kinetics studies and screening of the proposed antipolymerant products.
• TBC tert-butylcatechol
• Styrene was used as the reactive monomer for the polymerization kinetics studies and screening of the proposed antipolymerant products.
• styrene is stabilized with TBC. For each run of experiments, the stabilizer was removed, and the styrene thus freshly cleaned was used immediately.
• a sample of the reaction solution was taken from the reactor after which the solution was immediately diluted with toluene.
• the concentration of polystyrene in the diluted solution was analyze using a proprietary procedure. From that point in time, a sample was collected every 20 minutes and the reaction solution similarly diluted and analyzed for the concentration of polystyrene.
• the polymerization reactor was charged with 300 mL of styrene freshly cleaned and treated with 400 ppm of 4-Acetoxy TEMPOH.
• the reaction kinetics study was conducted as illustrated in Example 1 .
• composition disclosed herein may comprise, consist of, or consist essentially of any element, component and/or ingredient disclosed herein or any combination of two or more of the elements, components or ingredients disclosed herein.
• Any method disclosed herein may comprise, consist of, or consist essentially of any method step disclosed herein or any combination of two or more of the method steps disclosed herein.
• the term "about” refers to the cited value being within the errors arising from the standard deviation found in their respective testing measurements, and if those errors cannot be determined, then “about” may refer to, for example, within 5% of the cited value.

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