WO2016203659A1 - 半導体装置用ボンディングワイヤ - Google Patents

半導体装置用ボンディングワイヤ Download PDF

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Publication number
WO2016203659A1
WO2016203659A1 PCT/JP2015/070861 JP2015070861W WO2016203659A1 WO 2016203659 A1 WO2016203659 A1 WO 2016203659A1 JP 2015070861 W JP2015070861 W JP 2015070861W WO 2016203659 A1 WO2016203659 A1 WO 2016203659A1
Authority
WO
WIPO (PCT)
Prior art keywords
wire
bonding
bonding wire
semiconductor device
core material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2015/070861
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
山田　隆
大造 小田
榛原　照男
良 大石
齋藤　和之
宇野　智裕
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Micrometal Corp
Nippon Steel Chemical and Materials Co Ltd
Original Assignee
Nippon Micrometal Corp
Nippon Steel and Sumikin Materials Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Micrometal Corp, Nippon Steel and Sumikin Materials Co Ltd filed Critical Nippon Micrometal Corp
Priority to DE112015004422.1T priority Critical patent/DE112015004422B4/de
Priority to EP15866375.7A priority patent/EP3131113B1/en
Priority to SG11201604432SA priority patent/SG11201604432SA/en
Priority to KR1020167010922A priority patent/KR101670209B1/ko
Priority to KR1020167029046A priority patent/KR20180008245A/ko
Priority to US15/107,421 priority patent/US10137534B2/en
Priority to CN201580002424.4A priority patent/CN106489199B/zh
Priority to JP2015552702A priority patent/JP5912008B1/ja
Priority to DE112016002674.9T priority patent/DE112016002674B3/de
Priority to CN201711344468.2A priority patent/CN107962313B/zh
Priority to KR1020187034354A priority patent/KR20180129987A/ko
Priority to CN201680002657.9A priority patent/CN106688086A/zh
Priority to KR1020177024954A priority patent/KR101925236B1/ko
Priority to CN202110317355.3A priority patent/CN113078134A/zh
Priority to DE112016000133.9T priority patent/DE112016000133B4/de
Priority to EP18154972.6A priority patent/EP3349246B1/en
Priority to US15/515,508 priority patent/US10414002B2/en
Priority to JP2016533746A priority patent/JP5985127B1/ja
Priority to EP16811374.4A priority patent/EP3282473B1/en
Priority to PCT/JP2016/064926 priority patent/WO2016203899A1/ja
Priority to KR1020177005522A priority patent/KR101777995B1/ko
Priority to TW105137924A priority patent/TWI618802B/zh
Priority to TW107104291A priority patent/TWI715824B/zh
Priority to TW105116514A priority patent/TWI567211B/zh
Priority to PH12016501076A priority patent/PH12016501076B1/en
Priority to US15/577,735 priority patent/US10737356B2/en
Priority to TW105118619A priority patent/TWI631227B/zh
Priority to KR1020177032781A priority patent/KR101910762B1/ko
Priority to PCT/JP2016/067624 priority patent/WO2016204138A1/ja
Priority to DE112016002703.6T priority patent/DE112016002703B4/de
Priority to KR1020187029699A priority patent/KR20180115363A/ko
Priority to CN201680027572.6A priority patent/CN107533992B/zh
Priority to JP2017525235A priority patent/JP6321297B2/ja
Priority to TW107122893A priority patent/TWI763878B/zh
Priority to JP2016151318A priority patent/JP6254649B2/ja
Publication of WO2016203659A1 publication Critical patent/WO2016203659A1/ja
Priority to JP2017228996A priority patent/JP6664368B2/ja
Anticipated expiration legal-status Critical
Priority to US15/851,554 priority patent/US10610976B2/en
Priority to JP2018071290A priority patent/JP6706280B2/ja
Ceased legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/02—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape
    • B23K35/0222—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by mechanical features, e.g. shape for use in soldering or brazing
    • B23K35/0227—Rods or wires
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24—Selection of soldering or welding materials proper
    • B23K35/30—Selection of soldering or welding materials proper with the principal constituent melting at less than 1550°C
    • B23K35/3013—Au as the principal constituent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K35/00—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting
    • B23K35/22—Rods, electrodes, materials, or media, for use in soldering, welding, or cutting characterised by the composition or nature of the material
    • B23K35/24—Selection of soldering or welding materials proper
    • B23K35/30—Selection of soldering or welding materials proper with the principal constituent melting at less than 1550°C
    • B23K35/302—Cu as the principal constituent
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/018—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of a noble metal or a noble metal alloy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C5/00—Alloys based on noble metals
    • C22C5/04—Alloys based on a platinum group metal
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C9/00—Alloys based on copper
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C9/00—Alloys based on copper
    • C22C9/04—Alloys based on copper with zinc as the next major constituent
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C9/00—Alloys based on copper
    • C22C9/06—Alloys based on copper with nickel or cobalt as the next major constituent
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/40—Semiconductor devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/015—Manufacture or treatment of bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/015—Manufacture or treatment of bond wires
    • H10W72/01515—Forming coatings
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/015—Manufacture or treatment of bond wires
    • H10W72/01551—Changing the shapes of bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/015—Manufacture or treatment of bond wires
    • H10W72/01565—Thermally treating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/0711—Apparatus therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/0711—Apparatus therefor
    • H10W72/07141—Means for applying energy, e.g. ovens or lasers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H10W72/07531—Techniques
    • H10W72/07532—Compression bonding, e.g. thermocompression bonding
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/075—Connecting or disconnecting of bond wires
    • H10W72/07541—Controlling the environment, e.g. atmosphere composition or temperature
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/521—Structures or relative sizes of bond wires
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/521—Structures or relative sizes of bond wires
    • H10W72/522—Multilayered bond wires, e.g. having a coating concentric around a core
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/521—Structures or relative sizes of bond wires
    • H10W72/522—Multilayered bond wires, e.g. having a coating concentric around a core
    • H10W72/523—Multilayered bond wires, e.g. having a coating concentric around a core characterised by the structures of the outermost layers, e.g. multilayered coatings
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/531—Shapes of wire connectors
    • H10W72/536—Shapes of wire connectors the connected ends being ball-shaped
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/551—Materials of bond wires
    • H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/551—Materials of bond wires
    • H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
    • H10W72/5522—Materials of bond wires comprising metals or metalloids, e.g. silver comprising gold [Au]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/551—Materials of bond wires
    • H10W72/552—Materials of bond wires comprising metals or metalloids, e.g. silver
    • H10W72/5525—Materials of bond wires comprising metals or metalloids, e.g. silver comprising copper [Cu]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/551—Materials of bond wires
    • H10W72/555—Materials of bond wires of outermost layers of multilayered bond wires, e.g. material of a coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/59—Bond pads specially adapted therefor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/90—Bond pads, in general
    • H10W72/951—Materials of bond pads
    • H10W72/952—Materials of bond pads comprising metals or metalloids, e.g. PbSn, Ag or Cu
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W74/00—Encapsulations, e.g. protective coatings
    • H10W74/40—Encapsulations, e.g. protective coatings characterised by their materials
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    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00—Package configurations
    • H10W90/701—Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/756—Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked lead frame, conducting package substrate or heat sink
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12861—Group VIII or IB metal-base component
    • Y10T428/12868—Group IB metal-base component alternative to platinum group metal-base component [e.g., precious metal, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12861—Group VIII or IB metal-base component
    • Y10T428/12875—Platinum group metal-base component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12861—Group VIII or IB metal-base component
    • Y10T428/12882—Cu-base component alternative to Ag-, Au-, or Ni-base component
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    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12861—Group VIII or IB metal-base component
    • Y10T428/12889—Au-base component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12861—Group VIII or IB metal-base component
    • Y10T428/12896—Ag-base component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12861—Group VIII or IB metal-base component
    • Y10T428/12903—Cu-base component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
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    • Y10T428/12903—Cu-base component
    • Y10T428/1291—Next to Co-, Cu-, or Ni-base component
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y10T428/24967—Absolute thicknesses specified
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Definitions

  • the Pd coating layer may include a region of a single Pd layer, and a region where Pd and Cu have a concentration gradient in the depth direction of the wire.
  • the reason why the region having the concentration gradient is formed in the Pd coating layer is that Pd and Cu atoms may be diffused by heat treatment or the like in the manufacturing process.
  • the concentration gradient means that the degree of concentration change in the depth direction is 10 mol% or more per 0.1 ⁇ m.
  • the Pd coating layer may contain inevitable impurities.
  • the bonding wire can be obtained by manufacturing a Cu alloy used as a core material, then processing it into a wire shape, forming a Pd coating layer and an Au layer, and performing a heat treatment. In some cases, after forming the Pd coating layer and the Au layer, wire drawing and heat treatment are performed again.
  • the production method of the Cu alloy core material, the Pd coating layer, the formation method of the alloy skin layer containing Au and Pd, and the heat treatment method will be described in detail.
  • the EBSD method has the feature that the crystal orientation of the observation surface can be observed, and the angle difference of the crystal orientation between adjacent measurement points can be illustrated. Even a thin wire such as a bonding wire is relatively simple and accurate. The crystal orientation can be observed.
  • the particle size measurement can be obtained by using the analysis software provided in the apparatus for the measurement result by the EBSD method.
  • the crystal grain size defined in the present invention is an arithmetic average of equivalent diameters of crystal grains included in the measurement region (diameter of circle corresponding to crystal grain area; equivalent circle diameter).

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Wire Bonding (AREA)
  • Manufacturing & Machinery (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
PCT/JP2015/070861 2015-06-15 2015-07-22 半導体装置用ボンディングワイヤ Ceased WO2016203659A1 (ja)

Priority Applications (38)

Application Number Priority Date Filing Date Title
DE112015004422.1T DE112015004422B4 (de) 2015-06-15 2015-07-22 Bonddraht für Halbleitervorrichtung
EP15866375.7A EP3131113B1 (en) 2015-06-15 2015-07-22 Bonding wire for semiconductor device
SG11201604432SA SG11201604432SA (en) 2015-06-15 2015-07-22 Bonding wire for semiconductor device
KR1020167010922A KR101670209B1 (ko) 2015-06-15 2015-07-22 반도체 장치용 본딩 와이어
KR1020167029046A KR20180008245A (ko) 2015-06-15 2015-07-22 반도체 장치용 본딩 와이어
US15/107,421 US10137534B2 (en) 2015-06-15 2015-07-22 Bonding wire for semiconductor device
CN201580002424.4A CN106489199B (zh) 2015-06-15 2015-07-22 半导体装置用接合线
JP2015552702A JP5912008B1 (ja) 2015-06-15 2015-07-22 半導体装置用ボンディングワイヤ
PCT/JP2016/064926 WO2016203899A1 (ja) 2015-06-15 2016-05-19 半導体装置用ボンディングワイヤ
CN201711344468.2A CN107962313B (zh) 2015-06-15 2016-05-19 半导体装置用接合线
KR1020187034354A KR20180129987A (ko) 2015-06-15 2016-05-19 반도체 장치용 본딩 와이어
CN201680002657.9A CN106688086A (zh) 2015-06-15 2016-05-19 半导体装置用接合线
KR1020177024954A KR101925236B1 (ko) 2015-06-15 2016-05-19 반도체 장치용 본딩 와이어
CN202110317355.3A CN113078134A (zh) 2015-06-15 2016-05-19 半导体装置用接合线
DE112016000133.9T DE112016000133B4 (de) 2015-06-15 2016-05-19 Bonddraht für Halbleitervorrichtung
EP18154972.6A EP3349246B1 (en) 2015-06-15 2016-05-19 Bonding wire for semiconductor device
US15/515,508 US10414002B2 (en) 2015-06-15 2016-05-19 Bonding wire for semiconductor device
JP2016533746A JP5985127B1 (ja) 2015-06-15 2016-05-19 半導体装置用ボンディングワイヤ
EP16811374.4A EP3282473B1 (en) 2015-06-15 2016-05-19 Bonding wire for semiconductor device
DE112016002674.9T DE112016002674B3 (de) 2015-06-15 2016-05-19 Bonddraht für Halbleitervorrichtung
KR1020177005522A KR101777995B1 (ko) 2015-06-15 2016-05-19 반도체 장치용 본딩 와이어
TW105137924A TWI618802B (zh) 2015-06-15 2016-05-26 半導體裝置用接合線
TW107104291A TWI715824B (zh) 2015-06-15 2016-05-26 半導體裝置用接合線
TW105116514A TWI567211B (zh) 2015-06-15 2016-05-26 Connection lines for semiconductor devices
PH12016501076A PH12016501076B1 (en) 2015-06-15 2016-06-06 Bonding wire for semiconductor device
US15/577,735 US10737356B2 (en) 2015-06-15 2016-06-14 Bonding wire for semiconductor device
JP2017525235A JP6321297B2 (ja) 2015-06-15 2016-06-14 半導体装置用ボンディングワイヤ
KR1020177032781A KR101910762B1 (ko) 2015-06-15 2016-06-14 반도체 장치용 본딩 와이어
PCT/JP2016/067624 WO2016204138A1 (ja) 2015-06-15 2016-06-14 半導体装置用ボンディングワイヤ
DE112016002703.6T DE112016002703B4 (de) 2015-06-15 2016-06-14 Bonddraht für Halbleiterbauelement
KR1020187029699A KR20180115363A (ko) 2015-06-15 2016-06-14 반도체 장치용 본딩 와이어
CN201680027572.6A CN107533992B (zh) 2015-06-15 2016-06-14 半导体装置用接合线
TW105118619A TWI631227B (zh) 2015-06-15 2016-06-14 半導體裝置用接合線
TW107122893A TWI763878B (zh) 2015-06-15 2016-06-14 半導體裝置用接合線
JP2016151318A JP6254649B2 (ja) 2015-06-15 2016-08-01 半導体装置用ボンディングワイヤ
JP2017228996A JP6664368B2 (ja) 2015-06-15 2017-11-29 半導体装置用ボンディングワイヤ
US15/851,554 US10610976B2 (en) 2015-06-15 2017-12-21 Bonding wire for semiconductor device
JP2018071290A JP6706280B2 (ja) 2015-06-15 2018-04-03 半導体装置用ボンディングワイヤ

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015-120509 2015-06-15
JP2015120509 2015-06-15

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US (4) US10137534B2 (enExample)
EP (3) EP3131113B1 (enExample)
JP (5) JP2017005240A (enExample)
KR (6) KR20180008245A (enExample)
CN (4) CN106489199B (enExample)
DE (4) DE112015004422B4 (enExample)
MY (1) MY162048A (enExample)
PH (1) PH12016501076B1 (enExample)
SG (1) SG11201604432SA (enExample)
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10950571B2 (en) * 2017-02-22 2021-03-16 Nippon Steel Chemical & Material Co., Ltd. Bonding wire for semiconductor device
JP2021184484A (ja) * 2016-06-20 2021-12-02 日鉄マイクロメタル株式会社 半導体装置用銅合金ボンディングワイヤ

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106489199B (zh) 2015-06-15 2019-09-03 日铁新材料股份有限公司 半导体装置用接合线
SG11201604430YA (en) 2015-07-23 2017-02-27 Nippon Micrometal Corp Bonding wire for semiconductor device
JP6371932B1 (ja) * 2017-02-22 2018-08-08 新日鉄住金マテリアルズ株式会社 半導体装置用ボンディングワイヤ
CN111033706B (zh) * 2017-08-09 2021-05-25 日铁化学材料株式会社 半导体装置用Cu合金接合线
KR20190120420A (ko) * 2017-12-28 2019-10-23 닛데쓰마이크로메탈가부시키가이샤 반도체 장치용 본딩 와이어
TWI749372B (zh) * 2018-09-21 2021-12-11 日商日鐵化學材料股份有限公司 半導體裝置用Cu合金接合導線
US10985130B2 (en) * 2018-09-21 2021-04-20 Nippon Steel Chemical & Material Co., Ltd. Cu alloy bonding wire for semiconductor device
CN109402445B (zh) * 2018-11-09 2021-01-15 上海理工大学 一种抗氧化铜基合金键合引线及其制备方法
JP6487108B1 (ja) 2018-11-26 2019-03-20 田中電子工業株式会社 パラジウム被覆銅ボンディングワイヤ及びその製造方法
JP6507329B1 (ja) 2019-02-08 2019-04-24 田中電子工業株式会社 パラジウム被覆銅ボンディングワイヤ、ワイヤ接合構造、半導体装置及び半導体装置の製造方法
PH12021552178A1 (en) * 2019-03-12 2022-08-08 Tanaka Electronics Ind Palladium-coated copper bonding wire, manufacturing method of palladium-coated copper bonding wire, wire bonding structure using the same, semiconductor device and manufacturing method thereof
EP3940756A4 (en) * 2019-03-13 2023-06-21 Nippon Micrometal Corporation TYING WIRE
TWI699468B (zh) * 2019-04-03 2020-07-21 精機機械廠股份有限公司 縫紉機之三軌送布裝置
PH12021553019A1 (en) 2019-06-04 2022-11-07 Tanaka Electronics Ind Palladium-coated copper bonding wire, manufacturing method of palladium-coated copper bonding wire, semiconductor device using the same, and manufacturing method thereof
CN110284023B (zh) * 2019-07-22 2021-02-26 安徽广宇电子材料有限公司 一种铜合金键合丝及其制备方法和应用
DE112020004723T5 (de) * 2019-10-01 2022-06-15 Tanaka Denshi Kogyo K.K. Drahtbondstruktur, hierfür verwendeter Bonddraht und Halbleitervorrichtung
KR102751542B1 (ko) * 2020-03-13 2025-01-10 닛데쓰마이크로메탈가부시키가이샤 Al 본딩 와이어
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TWI726836B (zh) * 2020-12-31 2021-05-01 大陸商汕頭市駿碼凱撒有限公司 銅微合金導線及其製備方法
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JP7783885B2 (ja) * 2021-06-25 2025-12-10 日鉄マイクロメタル株式会社 半導体装置用ボンディングワイヤ
MY197450A (en) * 2021-06-25 2023-06-19 Nippon Micrometal Corp Bonding wire for semiconductor devices
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EP4365931B1 (en) * 2022-06-24 2025-12-03 NIPPON STEEL Chemical & Material Co., Ltd. Bonding wire for semiconductor device
US12092278B2 (en) 2022-10-07 2024-09-17 Magna Electronics, Llc Generating a spotlight
US12228653B2 (en) 2022-10-07 2025-02-18 Magna Electronics, Llc Integrating a sensing system into headlight optics
EP4495982A4 (en) 2023-05-30 2025-06-18 Nippon Micrometal Corporation BOND WIRE
US12202396B1 (en) 2023-12-19 2025-01-21 Magna Electronics, Llc Line-scan-gated imaging for LiDAR headlight

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6148543A (ja) 1984-08-10 1986-03-10 Sumitomo Electric Ind Ltd 半導体素子結線用銅合金線
JP2005167020A (ja) 2003-12-03 2005-06-23 Sumitomo Electric Ind Ltd ボンディングワイヤーおよびそれを使用した集積回路デバイス
JP2009140942A (ja) * 2007-12-03 2009-06-25 Nippon Steel Materials Co Ltd 半導体装置用ボンディングワイヤ
JP2012036490A (ja) 2010-08-11 2012-02-23 Tanaka Electronics Ind Co Ltd ボールボンディング用金被覆銅ワイヤ
JP2012089685A (ja) * 2010-10-20 2012-05-10 Hitachi Cable Ltd 銅ボンディングワイヤ及び銅ボンディングワイヤの製造方法

Family Cites Families (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6120693A (ja) 1984-07-06 1986-01-29 Toshiba Corp ボンデイングワイヤ−
JPS61163194A (ja) 1985-01-09 1986-07-23 Toshiba Corp 半導体素子用ボンデイング線
JPS61234063A (ja) 1985-04-10 1986-10-18 Tanaka Denshi Kogyo Kk 半導体素子のボンデイング用銅線
JPS6297360A (ja) 1985-10-24 1987-05-06 Mitsubishi Metal Corp 半導体装置のボンデイングワイヤ用表面被覆高純度銅極細線
JPS62130249A (ja) 1985-11-29 1987-06-12 Furukawa Electric Co Ltd:The ボンデイング用銅細線
JPS62130248A (ja) 1985-11-29 1987-06-12 Furukawa Electric Co Ltd:The ボンデイング用銅細線
JPS63238232A (ja) 1987-03-25 1988-10-04 Furukawa Electric Co Ltd:The 銅細線とその製造法
JPH01290231A (ja) 1988-05-18 1989-11-22 Mitsubishi Metal Corp 半導体装置用銅合金極細線及び半導体装置
JP2714560B2 (ja) * 1988-12-24 1998-02-16 日鉱金属株式会社 ダイレクトボンディング性の良好な銅合金
JP2873770B2 (ja) 1993-03-19 1999-03-24 新日本製鐵株式会社 半導体素子のワイヤボンディング用パラジウム細線
JPH0786325A (ja) 1993-09-14 1995-03-31 Hitachi Cable Ltd 電子機器用銅線
JPH07138678A (ja) 1994-05-09 1995-05-30 Toshiba Corp 半導体装置
JP3279206B2 (ja) 1996-12-16 2002-04-30 住友電気工業株式会社 難燃性樹脂組成物とそれを用いた絶縁電線、シールド電線および被覆チューブ
JP4868694B2 (ja) 2000-09-18 2012-02-01 新日鉄マテリアルズ株式会社 半導体用ボンディングワイヤ
JP2004064033A (ja) 2001-10-23 2004-02-26 Sumitomo Electric Wintec Inc ボンディングワイヤー
TWI287282B (en) 2002-03-14 2007-09-21 Fairchild Kr Semiconductor Ltd Semiconductor package having oxidation-free copper wire
KR100514312B1 (ko) 2003-02-14 2005-09-13 헤라우스오리엔탈하이텍 주식회사 반도체 소자용 본딩 와이어
EP1677345A1 (en) 2003-10-20 2006-07-05 Sumitomo Electric Industries, Ltd. Bonding wire and integrated circuit device using the same
JP4158928B2 (ja) * 2004-09-02 2008-10-01 古河電気工業株式会社 ボンディングワイヤー及びその製造方法
JP4672373B2 (ja) 2005-01-05 2011-04-20 新日鉄マテリアルズ株式会社 半導体装置用ボンディングワイヤ
JP2007012776A (ja) 2005-06-29 2007-01-18 Nippon Steel Materials Co Ltd 半導体装置用ボンディングワイヤ
WO2006073206A1 (ja) * 2005-01-05 2006-07-13 Nippon Steel Materials Co., Ltd. 半導体装置用ボンディングワイヤ
JP2006216929A (ja) * 2005-01-05 2006-08-17 Nippon Steel Corp 半導体装置用ボンディングワイヤ
KR100702662B1 (ko) * 2005-02-18 2007-04-02 엠케이전자 주식회사 반도체 패키징용 구리 본딩 와이어
JP2007019349A (ja) 2005-07-08 2007-01-25 Sumitomo Metal Mining Co Ltd ボンディングワイヤ
US8610291B2 (en) 2006-08-31 2013-12-17 Nippon Steel & Sumikin Materials Co., Ltd. Copper alloy bonding wire for semiconductor device
JP5116101B2 (ja) 2007-06-28 2013-01-09 新日鉄住金マテリアルズ株式会社 半導体実装用ボンディングワイヤ及びその製造方法
US20090127317A1 (en) 2007-11-15 2009-05-21 Infineon Technologies Ag Device and method for producing a bonding connection
JP4904252B2 (ja) * 2007-12-03 2012-03-28 新日鉄マテリアルズ株式会社 半導体装置用ボンディングワイヤ
KR101055957B1 (ko) 2007-12-03 2011-08-09 가부시키가이샤 닛데쓰 마이크로 메탈 반도체 장치용 본딩 와이어
JP4617375B2 (ja) * 2007-12-03 2011-01-26 新日鉄マテリアルズ株式会社 半導体装置用ボンディングワイヤ
KR101057271B1 (ko) 2008-01-25 2011-08-16 가부시키가이샤 닛데쓰 마이크로 메탈 반도체 장치용 본딩 와이어
TWI415707B (zh) 2008-09-01 2013-11-21 日月光半導體製造股份有限公司 銅製銲線、銲線接合結構及銲線接合方法
WO2010106851A1 (ja) * 2009-03-17 2010-09-23 新日鉄マテリアルズ株式会社 半導体用ボンディングワイヤ
CN102459668A (zh) 2009-06-24 2012-05-16 新日铁高新材料株式会社 半导体用铜合金接合线
JP5497360B2 (ja) 2009-07-30 2014-05-21 新日鉄住金マテリアルズ株式会社 半導体用ボンディングワイヤー
JP4637256B1 (ja) 2009-09-30 2011-02-23 新日鉄マテリアルズ株式会社 半導体用ボンディングワイヤー
EP2461358B1 (en) 2009-07-30 2017-10-18 Nippon Steel & Sumikin Materials Co., Ltd. Bonding wire for semiconductor
JPWO2011093038A1 (ja) 2010-01-27 2013-05-30 住友ベークライト株式会社 半導体装置
JP5550369B2 (ja) 2010-02-03 2014-07-16 新日鉄住金マテリアルズ株式会社 半導体用銅ボンディングワイヤとその接合構造
WO2011129256A1 (ja) 2010-04-14 2011-10-20 タツタ電線株式会社 ボンディングワイヤ
TW201205695A (en) 2010-07-16 2012-02-01 Nippon Steel Materials Co Ltd Bonding wire for semiconductor
JP5616739B2 (ja) 2010-10-01 2014-10-29 新日鉄住金マテリアルズ株式会社 複層銅ボンディングワイヤの接合構造
JP2012099577A (ja) 2010-10-29 2012-05-24 Sumitomo Metal Mining Co Ltd ボンディングワイヤ
CN102130067B (zh) 2010-12-31 2012-05-02 四川威纳尔特种电子材料有限公司 一种表面镀钯键合铜丝
JP5760544B2 (ja) 2011-03-17 2015-08-12 日立金属株式会社 軟質希薄銅合金線、軟質希薄銅合金撚線およびこれらを用いた絶縁電線、同軸ケーブルおよび複合ケーブル
JP6019547B2 (ja) 2011-07-21 2016-11-02 日立金属株式会社 銅ボンディングワイヤ
SG190480A1 (en) 2011-12-01 2013-06-28 Heraeus Materials Tech Gmbh 3n copper wire with trace additions for bonding in microelectronics device
SG190479A1 (en) 2011-12-01 2013-06-28 Heraeus Materials Tech Gmbh Secondary alloyed 1n copper wire for bonding in microelectronics device
JP5088981B1 (ja) 2011-12-21 2012-12-05 田中電子工業株式会社 Ｐｄ被覆銅ボールボンディングワイヤ
WO2013140745A1 (ja) 2012-03-22 2013-09-26 住友ベークライト株式会社 半導体装置及びその製造方法
KR101366688B1 (ko) 2012-04-30 2014-02-25 엠케이전자 주식회사 구리계 본딩 와이어 및 이를 포함하는 반도체 패키지
JP5159000B1 (ja) 2012-06-13 2013-03-06 田中電子工業株式会社 半導体装置接続用アルミニウム合金細線
TWM442579U (en) 2012-06-22 2012-12-01 Feng Ching Metal Corp Long-term storage bonding wire for semiconductor
CN102776408B (zh) 2012-08-16 2014-01-08 烟台一诺电子材料有限公司 一种银合金丝及其制备方法
EP2703116B1 (en) * 2012-09-04 2017-03-22 Heraeus Deutschland GmbH & Co. KG Method for manufacturing a silver alloy wire for bonding applications
JP5219316B1 (ja) * 2012-09-28 2013-06-26 田中電子工業株式会社 半導体装置接続用銅白金合金細線
JP5213146B1 (ja) * 2012-10-03 2013-06-19 田中電子工業株式会社 半導体装置接続用銅ロジウム合金細線
TW201430977A (zh) 2013-01-23 2014-08-01 賀利氏材料科技公司 用於接合應用的經塗覆線材
TWM454881U (zh) 2013-01-25 2013-06-11 風青實業股份有限公司 半導體用銲線
TWI486970B (zh) 2013-01-29 2015-06-01 莊東漢 銅基合金線材及其製造方法
EP2927956A1 (en) 2013-02-15 2015-10-07 Heraeus Materials Singapore Pte. Ltd. Copper bond wire and method of making the same
KR101513493B1 (ko) * 2013-02-19 2015-04-20 엠케이전자 주식회사 은 합금 본딩 와이어
JP5668087B2 (ja) 2013-02-22 2015-02-12 田中電子工業株式会社 半導体装置接合用銅希薄ニッケル合金ワイヤの構造
KR102229606B1 (ko) * 2013-03-14 2021-03-19 마테리온 코포레이션 초고강도 구리-니켈-주석계 합금
JP5529992B1 (ja) * 2013-03-14 2014-06-25 タツタ電線株式会社 ボンディング用ワイヤ
JP5399581B1 (ja) 2013-05-14 2014-01-29 田中電子工業株式会社 高速信号用ボンディングワイヤ
JP5546670B1 (ja) 2013-06-13 2014-07-09 田中電子工業株式会社 超音波接合用コーティング銅ワイヤの構造
JP6120693B2 (ja) * 2013-06-24 2017-04-26 株式会社三共 遊技機
TWM466108U (zh) 2013-07-26 2013-11-21 風青實業股份有限公司 半導體用銲線
JP5591987B2 (ja) * 2013-08-20 2014-09-17 新日鉄住金マテリアルズ株式会社 半導体装置用ボンディングワイヤ
KR101851473B1 (ko) * 2013-09-06 2018-04-23 후루카와 덴키 고교 가부시키가이샤 구리 합금 선재 및 그 제조방법
KR101582449B1 (ko) 2013-09-12 2016-01-05 엠케이전자 주식회사 은 합금 본딩 와이어 및 이를 이용한 반도체 장치
CN104593635A (zh) * 2013-11-04 2015-05-06 蔡元华 电子封装用铜键合线及其制备方法
TWI525726B (zh) 2013-11-25 2016-03-11 大亞電線電纜股份有限公司 Preparation method of package wire with skin layer and its finished product
CN105393343A (zh) 2014-01-31 2016-03-09 大自达电线株式会社 线键合及其制造方法
TWI605559B (zh) 2014-04-21 2017-11-11 新日鐵住金高新材料股份有限公司 Bonding wire for semiconductor device
CN104051080B (zh) 2014-07-03 2016-06-15 深圳市凯中和东新材料有限公司 绝缘性导线的制备方法
US9368470B2 (en) 2014-10-31 2016-06-14 Freescale Semiconductor, Inc. Coated bonding wire and methods for bonding using same
CN106489199B (zh) 2015-06-15 2019-09-03 日铁新材料股份有限公司 半导体装置用接合线
KR101670209B1 (ko) 2015-06-15 2016-10-27 닛데쓰스미킹 마이크로 메탈 가부시키가이샤 반도체 장치용 본딩 와이어
SG11201604430YA (en) 2015-07-23 2017-02-27 Nippon Micrometal Corp Bonding wire for semiconductor device
CN106463495B (zh) 2015-08-12 2020-09-04 日铁新材料股份有限公司 半导体装置用接合线
JP6002300B1 (ja) 2015-09-02 2016-10-05 田中電子工業株式会社 ボールボンディング用パラジウム（Ｐｄ）被覆銅ワイヤ
JP6047214B1 (ja) 2015-11-02 2016-12-21 田中電子工業株式会社 ボールボンディング用貴金属被覆銅ワイヤ

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6148543A (ja) 1984-08-10 1986-03-10 Sumitomo Electric Ind Ltd 半導体素子結線用銅合金線
JP2005167020A (ja) 2003-12-03 2005-06-23 Sumitomo Electric Ind Ltd ボンディングワイヤーおよびそれを使用した集積回路デバイス
JP2009140942A (ja) * 2007-12-03 2009-06-25 Nippon Steel Materials Co Ltd 半導体装置用ボンディングワイヤ
JP2012036490A (ja) 2010-08-11 2012-02-23 Tanaka Electronics Ind Co Ltd ボールボンディング用金被覆銅ワイヤ
JP2012089685A (ja) * 2010-10-20 2012-05-10 Hitachi Cable Ltd 銅ボンディングワイヤ及び銅ボンディングワイヤの製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP3131113A4

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021184484A (ja) * 2016-06-20 2021-12-02 日鉄マイクロメタル株式会社 半導体装置用銅合金ボンディングワイヤ
JP7174816B2 (ja) 2016-06-20 2022-11-17 日鉄マイクロメタル株式会社 半導体装置用銅合金ボンディングワイヤ
US12300658B2 (en) 2016-06-20 2025-05-13 Nippon Micrometal Corporation Copper alloy bonding wire for semiconductor devices
US10950571B2 (en) * 2017-02-22 2021-03-16 Nippon Steel Chemical & Material Co., Ltd. Bonding wire for semiconductor device

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