TWI553801B - 薄基板堆疊式封裝件結構 - Google Patents
薄基板堆疊式封裝件結構 Download PDFInfo
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- TWI553801B TWI553801B TW102129340A TW102129340A TWI553801B TW I553801 B TWI553801 B TW I553801B TW 102129340 A TW102129340 A TW 102129340A TW 102129340 A TW102129340 A TW 102129340A TW I553801 B TWI553801 B TW I553801B
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- substrate
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- 239000000758 substrate Substances 0.000 title claims description 121
- 239000008393 encapsulating agent Substances 0.000 claims description 84
- 238000000034 method Methods 0.000 claims description 20
- 238000000465 moulding Methods 0.000 claims description 10
- 239000004065 semiconductor Substances 0.000 claims description 10
- 230000008878 coupling Effects 0.000 claims description 5
- 238000010168 coupling process Methods 0.000 claims description 5
- 238000005859 coupling reaction Methods 0.000 claims description 5
- 239000000565 sealant Substances 0.000 claims description 2
- 239000013078 crystal Substances 0.000 claims 6
- 238000005538 encapsulation Methods 0.000 description 8
- 229910000679 solder Inorganic materials 0.000 description 8
- 238000005520 cutting process Methods 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 238000005553 drilling Methods 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
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Description
本發明係關於半導體封裝及用於封裝半導體器件之方法。更特定而言,本發明係關於使用薄或無核心基板之堆疊式封裝件(PoP)。
堆疊式封裝件(「PoP」)技術隨著在半導體產業中對較低成本、較高效能、增加之積體電路密度及增加之封裝密度的需求持續而變得日益風行。隨著對愈來愈小之封裝件的推進增加,晶粒與封裝件之整合(例如,系統單晶片(「SoC」)技術與記憶體技術的「預先堆疊」或整合)允許較薄的封裝件。此類預先堆疊已變成對於薄且精細間距PoP封裝件的關鍵組件。
隨著薄且精細間距PoP封裝件而出現的問題為翹曲的可能性,此係由於PoP封裝件中頂部封裝件或底部封裝件上之端子(例如,諸如焊球之球)之間的間距被減小。翹曲可由於用於封裝件(例如,基板及塗覆至基板之囊封劑)中之材料的熱特性差異而引起。頂部封裝件可歸因於頂部封裝件並未附接至抑制翹曲之任何外部組件而尤其具有翹曲問題。舉例而言,底部封裝件可附接至有助於抑制底部封裝件中之翹曲的印刷電路板。
頂部封裝件中之翹曲問題可隨著在頂部封裝件中使用薄或無核心基板而進一步增加。薄或無核心基板可具有抵抗由基板與所塗覆囊封劑之間的熱特性差異引起之效應的較低機械強度。翹曲問題可導致
PoP封裝件之失效或降低之效能及/或利用PoP封裝件之器件的可靠性問題。
在某些實施例中,一種用於PoP封裝件之總成系統包括一底部封裝件及一頂部封裝件。該底部封裝件可包括耦接至晶粒之基板。基板及晶粒可囊封於囊封劑中,其中晶粒之至少部分曝露於囊封劑上方。晶粒之至少一部分曝露於底部封裝件基板上之囊封劑上方。頂部封裝件可包括一基板與該基板之正面(頂部)及背面(底部)兩者上的囊封劑。因為頂部封裝件之兩側上的囊封劑,所以頂部封裝件中之熱性質可實質上得以平衡。使熱性質平衡可使頂部封裝件上之熱應力平衡,且減小或抑制頂部封裝件中之翹曲。
在某些實施例中,頂部封裝件基板之背面上之囊封劑包括凹座。在一些實施例中,基板之至少部分曝露於凹座中。在其他實施例中,基板實質上覆蓋於凹座中。在某些實施例中,當底部封裝件與頂部封裝件經耦接以形成PoP封裝件時,頂部封裝件中之凹座容納耦接至底部封裝件中之基板的晶粒(例如,晶粒之至少部分位於凹座中)。在一些實施例中,當底部封裝件耦接至頂部封裝件時,底部封裝件基板之頂部上的端子(例如,焊球)耦接至頂部封裝件基板之底部上的端子。
100‧‧‧PoP封裝件總成系統
100'‧‧‧PoP(「堆疊式封裝件」)封裝件總成系統
100"‧‧‧PoP(「堆疊式封裝件」)封裝件總成系統
102‧‧‧底部封裝件
102'‧‧‧底部封裝件
104‧‧‧頂部封裝件
104'‧‧‧頂部封裝件
104"‧‧‧頂部封裝件
106‧‧‧基板
108‧‧‧囊封劑
110‧‧‧晶粒
112‧‧‧端子
114‧‧‧端子
115‧‧‧端子
116‧‧‧基板
118‧‧‧囊封劑
120‧‧‧端子
120A‧‧‧端子
120B‧‧‧端子
122A‧‧‧虛線
122B‧‧‧虛線
124‧‧‧囊封劑
126‧‧‧凹座
126'‧‧‧凹座
500‧‧‧塑封模具
600‧‧‧PoP封裝件
本發明之方法及裝置之特徵及優點在結合隨附圖式時藉由參考根據本發明之目前較佳但仍為說明性實施例的以下詳細描述而將被更充分地瞭解,其中:圖1描繪在組裝之前的PoP(「堆疊式封裝件」)封裝件之頂部封裝件及底部封裝件的實例之橫截面表示。
圖2描繪PoP封裝件總成系統之實施例的橫截面表示。
圖3描繪在基板上塗覆囊封劑期間使用之塑封模具(mold chase)的側視圖表示。
圖4描繪PoP封裝件總成系統之替代性實施例的橫截面表示。
圖5描繪具有曝露於凹座中之基板的頂部封裝件之仰視圖表示。
圖6描繪在底部封裝件耦接至頂部封裝件時形成的PoP封裝件之實施例的橫截面表示。
雖然本發明易於進行各種修改及替代形式,但在圖式中以舉例方式展示其特定實施例,且將在本文中對其進行詳細描述。圖式可能未按比例繪製。應理解,該等圖式及對圖式之詳細描述並非意欲將本發明限於所揭示的特定形式,而正相反,意欲涵蓋屬於如由附屬申請專利範圍所界定的本發明之精神及範疇內的所有修改、等效物及替代。
圖1描繪在組裝(例如,PoP封裝件系統)之前的PoP(「堆疊式封裝件」)封裝件之頂部封裝件及底部封裝件的實例之橫截面表示。PoP封裝件總成系統100包括底部封裝件102及頂部封裝件104。底部封裝件102包括基板106與至少部分覆蓋該基板之囊封劑108。可使用端子112(例如,焊球)而使晶粒110耦接至基板106且至少部分覆蓋於囊封劑108中。端子114(例如,焊球)可耦接至基板106之上部(頂部)表面。端子115(例如,焊球)可耦接至基板106之下部(底部)表面。
頂部封裝件104包括基板116與覆蓋基板之上部(頂部)表面的囊封劑118。端子120(例如,焊球)耦接至基板116之下部(底部)表面。如圖1中所展示,頂部封裝件104可因為基板116、囊封劑118與端子120之間的不同熱特性(例如,熱膨脹係數(「CTE」)及/或收縮率)而經歷翹曲。翹曲可引起問題,諸如(但不限於),在PoP封裝件之組裝之後在底部封裝件102中之端子114與頂部封裝件104中之端子120之間的連接
失去。若基板116為相對薄之基板(例如,厚度小於約400μm)及/或基板為無核心基板(例如,由僅介電聚合物及銅跡線製成之基板),則頂部封裝件104中之翹曲問題可增加。
圖2描繪PoP(「堆疊式封裝件」)封裝件總成系統100'之實施例的橫截面表示。系統100'包括底部封裝件102'及頂部封裝件104'。在某些實施例中,底部封裝件102'包括基板106。基板106可為(例如)用於封裝件之基底基板或封裝件基板。在某些實施例中,基板106為無核心基板。在一些實施例中,基板106為具有核心之薄基板。基板106可具有小於約400μm之厚度。在一些實施例中,基板106之厚度小於約200μm或小於約100μm。
晶粒110可使用端子112及/或用於將晶粒耦接至基板之其他機構而耦接至基板106的上部(頂部、頂面或正面)表面。晶粒110可為(例如)半導體晶片、積體電路晶粒或覆晶晶粒。在某些實施例中,晶粒110為系統單晶片(「SoC」)。在某些實施例中,端子114耦接至基板106之頂部。端子115可耦接至基板106之下部(底部、底面或背面)表面。端子112、114及/或115可包括但不限於由(例如)焊料或銅形成之球、柱或柱狀物。
在晶粒110及端子114耦接至基板106之後,基板之頂部(例如,上部表面)可至少部分由囊封劑108覆蓋。囊封劑108可為(例如)聚合物或封膠。在某些實施例中,囊封劑108具有選定性質(例如,選定熱性質)。舉例而言,在一些實施例中,囊封劑108具有在約115℃與約190℃之間的玻璃轉化溫度(Tg)。在一些實施例中,囊封劑108在玻璃轉化溫度以下具有在約10ppm/℃與約38ppm/℃之間的熱膨脹係數(CTE),且在玻璃轉化溫度以上具有在約40ppm/℃與約145ppm/℃之間的熱膨脹係數。在一些實施例中,囊封劑108在25℃下具有在約570kgf/mm2與約2400kgf/mm2之間的模數,或在約260℃下具有在約8
kgf/mm2與約70kgf/mm2之間的模數。在某些實施例中,囊封劑108具有儘可能接近基板106之熱性質的熱性質。
在某些實施例中,如圖2中所展示,晶粒110至少部分覆蓋於囊封劑108中,且晶粒之至少一部分曝露於囊封劑上方。在某些實施例中,使用塑封模具以在基板106上形成囊封劑108。圖3描繪在基板106上塗覆囊封劑108期間使用之塑封模具500的側視圖表示。如圖3中所展示,塑封模具500具有一形狀,該形狀在塑封模具抵靠晶粒110置放時抑制囊封劑108覆蓋晶粒之頂部表面。在一些實施例中,在囊封程序期間將保護膜置放於晶粒110之頂部表面上。在晶粒與塑封模具500接觸時,保護膜可保護晶粒110不被損壞。保護膜可為(例如)聚合物膜。
在某些實施例中,如圖2中所展示,端子14至少部分由囊封劑108覆蓋。舉例而言,如圖2中所展示,端子114之至少一部分曝露於囊封劑108上方。在一些實施例中,在將囊封劑108塗覆至基板106時端子114首先由囊封劑覆蓋,且接著移除囊封劑之一部分以曝露端子之多部分。舉例而言,如2圖中所展示,可使用諸如但不限於雷射鑽孔/切除之技術而使端子114曝露於空腔中以曝露端子之多部分。在其他實施例中,使用諸如但不限於機械研磨/切割處理之扁平類型處理來曝露端子114之多部分。在一些實施例中,使用膜輔助模製(FAM)程序以形成呈模具形狀之囊封劑108,該模具形狀曝露端子114之多部分(例如,如圖2中所展示,模具形狀具有用於該等端子之空腔)。
在某些實施例中,端子114具有由虛線122B表示之高於基板106的高度,該高度高於基板上方囊封劑108之由虛線122A表示的高度。端子114可具有高於囊封劑108之高度,以確保底部封裝件102'中之端子與頂部封裝件104'中之端子(例如,端子120)之間的連接。
在某些實施例中,頂部封裝件104'包括基板116。基板116可為
(例如)用於封裝件之基底基板或封裝件基板。在某些實施例中,基板116為無核心基板。在一些實施例中,基板116為具有核心之薄基板。基板116可具有小於約400μm之厚度。在一些實施例中,基板116之厚度小於約200μm或小於約100μm。
在某些實施例中,端子120耦接至基板116之下部(底部、底面或背面)表面。端子120可包括但不限於由(例如)焊料或銅製成之球、柱或柱狀物。端子120可經對準以與底部封裝件102'中之端子114連接。
基板116之上部(頂部、頂面或正面)表面可至少部分由囊封劑118覆蓋。囊封劑118可為與囊封劑108相同的材料及/或具有類似於囊封劑108的性質。在一些實施例中,如圖2中所展示,囊封劑118實質上覆蓋基板116的整個頂部。
在某些實施例中,如圖2中所展示,頂部封裝件104'之底部至少部分由囊封劑124覆蓋。囊封劑124可為與囊封劑108及/或囊封劑118相同的材料,及/或具有類似於囊封劑108及/或囊封劑118的性質。在某些實施例中,凹座126形成於囊封劑124中。在一些實施例中,凹座126在囊封/模製程序期間(例如,使用設計有凹座之塑封模具空腔)形成。在其他實施例中,凹座126在囊封/模製程序之後形成。舉例而言,凹座126可使用機械研磨/切割程序或雷射鑽孔/切除程序來形成。
在某些實施例中,如圖2中所展示,在至少一些囊封劑124留於凹座中的情況下形成凹座126(例如,囊封劑124在凹座中實質上覆蓋或圍封基板116,且基板不曝露於凹座中)。在一些實施例中,頂部封裝件基板曝露於凹座中。圖4描繪PoP(「堆疊式封裝件」)封裝件總成系統100"之實施例的橫截面表示。如圖4中所展示,頂部封裝件104"包括囊封劑124與凹座126'。基板116至少部分曝露於凹座126'中。在某些實施例中,基板116實質上曝露於凹座126'中。圖5描繪具有曝露於凹座126'中之基板116的頂部封裝件104"之仰視圖表示。
在某些實施例中,凹座126(或凹座126')經設定大小以在頂部封裝件104'(或頂部封裝件104")耦接至底部封裝件102'時容納晶粒110之曝露部分。圖6描繪在底部封裝件102'耦接至頂部封裝件104'時形成之PoP封裝件600之實施例的橫截面表示。如圖6中所展示,將晶粒110容納於凹座126(或凹座126')中減小了PoP封裝件600的總厚度。
在某些實施例中,如圖2及圖4中所展示,端子120之至少一些部分曝露於囊封劑124上方。如圖6中所展示,端子120可經曝露以在頂部封裝件104'(或頂部封裝件104")耦接至底部封裝件時允許端子120與端子114之間的互連。
在一些實施例中,在將囊封劑124塗覆至基板116時端子120首先由囊封劑覆蓋,且接著移除囊封劑之一部分以曝露端子之多部分。舉例而言,可使用諸如但不限於雷射鑽孔/切除之技術而使端子120曝露於空腔中以曝露端子之多部分。展示於圖2及圖4中之端子120A描繪由空腔類型處理曝露之端子的實例。在一些實施例中,使用諸如但不限於機械研磨/切割處理之扁平類型處理來曝露端子120之多部分。展示於圖2及圖4中之端子120B描繪由扁平類型處理曝露之端子的實例。在一些實施例中,使用膜輔助模製(FAM)程序以形成呈模具形狀之囊封劑124,該模具形狀曝露端子120之多部分(例如,模具形狀具有用於端子之空腔,或為扁平的但曝露端子之多部分)。
端子114可具有高於囊封劑108之高度,以確保底部封裝件102'中之端子與頂部封裝件104'中之端子(例如,端子120)之間的連接。
如上文針對展示於圖2至圖6中之實施例所描述,除藉由囊封劑118覆蓋頂部封裝件之頂部(正面)外亦藉由囊封劑124至少部分覆蓋頂部封裝件104'(或頂部封裝件104")之底部(背面)可產生具有實質平衡之熱性質的頂部封裝件結構(例如,在頂部封裝件之背面及正面上具有囊封劑使諸如但不限於頂部封裝件中之CTE及收縮率的熱性質平
衡)。使頂部封裝件中之熱性質平衡可使頂部封裝件上之熱應力平衡,且減小或抑制頂部封裝件中之翹曲,尤其對於具有薄或無核心基板之頂部封裝件而言。減小頂部封裝件中之翹曲可改良預先堆疊,且改良具有精細間距(例如,端子之間的減小之間距)以及薄或無核心基板之PoP封裝件的可靠性。此外,將來自底部封裝件之晶粒容納於囊封劑124中之凹座126(或凹座126')中允許PoP封裝件維持減小(或薄)對總PoP封裝件厚度。
本文中所描述之實施例描述了PoP封裝件之結構及其形成方法,其中頂部封裝件在頂部封裝件之兩側上具有囊封劑。然而,熟習此項技術者將為顯而易見:本文中所描述之實施例可適用於供印刷電路板上及/或模組/系統層級總成中之表面黏著技術(SMT)使用的底部封裝件。
鑒於本描述,對於熟習此項技術者而言,本發明之各種態樣的進一步修改及替代性實施例將為顯而易見的。因而,此描述內容應被認為僅說明性的且係為了教示熟習此項技術者執行本發明之通用方式。應理解,本文中所展示並描述之本發明的形式將被視為目前較佳實施例。元件及材料可替代本文中所說明並描述之彼等元件及材料,各部分及程序可反轉,且可獨立利用本發明之某些特徵,以上所有部分對具有本發明之以上描述之益處的熟習此項技術者將為顯而易見的。在不脫離如在以下申請專利範圍中所述的本發明之精神及範疇的情況下,可對本文中描述之元件進行改變。
100‧‧‧PoP封裝件總成系統
102‧‧‧底部封裝件
104‧‧‧頂部封裝件
106‧‧‧基板
108‧‧‧囊封劑
110‧‧‧晶粒
112‧‧‧端子
114‧‧‧端子
115‧‧‧端子
116‧‧‧基板
118‧‧‧囊封劑
120‧‧‧端子
Claims (18)
- 一種半導體器件封裝件總成,其包含:一第一基板,其具有至少覆蓋該第一基板之一頂部之一第一囊封劑;一單一晶粒,其耦接至該第一基板之該頂部,其中該單一晶粒至少部分囊封於該第一囊封劑中,其中該單一晶粒之至少一部分曝露於該第一囊封劑上方;及一第二基板,其具有至少部分覆蓋該第二基板之一頂部的一第二囊封劑及至少部分覆蓋該第二基板之一底部的一第三囊封劑;其中該第二基板之該底部耦接至該第一基板的該頂部;其中該單一晶粒之至少部分位於該第三囊封劑中之一凹座中;及其中僅該單一晶粒存在於該半導體器件封裝件總成。
- 如請求項1之總成,其中該第一基板及該第二基板為無核心基板。
- 如請求項1之總成,其中該第三囊封劑在該凹座中實質上覆蓋該第二基板之該底部。
- 如請求項1之總成,其中該第二基板之至少一部分曝露於該凹座中。
- 如請求項1之總成,其進一步包含耦接至該第一基板之該頂部的一或多個第一端子,其中該等第一端子之至少一些部分曝露於該第一囊封劑上方。
- 如請求項1之總成,其進一步包含耦接至該第二基板之該底部的一或多個第二端子,其中該等第二端子之至少一些部分曝露於 該第三囊封劑下方。
- 如請求項1之總成,其中該第二基板之該底部經由一或多個端子耦接至該第一基板之該頂部。
- 一種半導體器件封裝件總成,其包含:一底部封裝件,其包含一第一基板與該第一基板上方之一第一囊封劑;一單一晶粒,其位於該第一基板上方且耦接至該第一基板,其中該單一晶粒至少部分囊封於該第一基板上方之該第一囊封劑中,其中該單一晶粒之至少一部分曝露於該第一囊封劑外部;一頂部封裝件,其耦接至該底部封裝件,其中該頂部封裝件包含一第二基板與該第二基板上方之一第二囊封劑以及該第二基板下方的一第三囊封劑,且其中該第三囊封劑包含一凹座,該單一晶粒之該曝露部分的至少部分位於該凹座中;及其中僅該單一晶粒存在於該半導體器件封裝件總成。
- 如請求項8之總成,其中該第一基板及該第二基板厚度小於400μm。
- 如請求項8之總成,其中該第三囊封劑在該凹座中實質上圍封該第二基板。
- 如請求項8之總成,其中該第二基板之至少一部分曝露於該凹座中。
- 如請求項8之總成,其進一步包含一或多個端子,其中該等端子將該第一基板耦接至該單一晶粒。
- 一種用於形成一半導體器件封裝件總成之方法,其包含:將一單一晶粒耦接至一第一基板之一頂部表面;將該第一基板之該頂部表面囊封於一第一囊封劑中,其中該 單一晶粒之至少一部分曝露於該第一囊封劑上方;將一第二基板之一頂部表面囊封於一第二囊封劑中;將該第二基板之一底部表面囊封於一第三囊封劑中,其中該第三囊封劑包含一凹座;將該第一基板之該頂部表面耦接至該第二基板之該底部表面,使得該單一晶粒之至少部分位於該第三囊封劑中的該凹座中;及其中僅該單一晶粒存在於該半導體器件封裝件總成。
- 如請求項13之方法,其進一步包含模製該第三囊封劑以形成該凹座。
- 如請求項13之方法,其進一步包含移除該第三囊封劑之一部分以形成該凹座。
- 如請求項13之方法,其進一步包含將一或多個第一端子耦接至該第一基板之該頂部表面,其中該等第一端子之至少一些部分曝露於該第一囊封劑上方。
- 如請求項13之方法,其進一步包含將一或多個第二端子耦接至該第二基板之該底部表面,其中該等第二端子之至少一些部分曝露於該第三囊封劑下方。
- 如請求項13之方法,其進一步包含將耦接至該第一基板之該頂部表面的一或多個第一端子耦接至被耦接至該第二基板之該底部表面的一或多個第二端子。
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Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8546193B2 (en) * | 2010-11-02 | 2013-10-01 | Stats Chippac, Ltd. | Semiconductor device and method of forming penetrable film encapsulant around semiconductor die and interconnect structure |
US8546932B1 (en) * | 2012-08-15 | 2013-10-01 | Apple Inc. | Thin substrate PoP structure |
US8963311B2 (en) | 2012-09-26 | 2015-02-24 | Apple Inc. | PoP structure with electrically insulating material between packages |
TW201415602A (zh) * | 2012-10-09 | 2014-04-16 | 矽品精密工業股份有限公司 | 封裝堆疊結構之製法 |
US9287317B2 (en) * | 2013-01-25 | 2016-03-15 | Samsung Electro-Mechanics Co., Ltd. | Image sensor module and method of manufacturing the same |
US8970024B2 (en) * | 2013-03-14 | 2015-03-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Packages with molding material forming steps |
US9064718B1 (en) | 2014-05-07 | 2015-06-23 | Freescale Semiconductor, Inc. | Pre-formed via array for integrated circuit package |
US10032652B2 (en) * | 2014-12-05 | 2018-07-24 | Advanced Semiconductor Engineering, Inc. | Semiconductor package having improved package-on-package interconnection |
TWI576976B (zh) * | 2015-08-28 | 2017-04-01 | 欣興電子股份有限公司 | 無核心層封裝結構 |
KR102457119B1 (ko) | 2015-09-14 | 2022-10-24 | 삼성전자주식회사 | 반도체 패키지의 제조 방법 |
JP2018026395A (ja) * | 2016-08-08 | 2018-02-15 | ソニーセミコンダクタソリューションズ株式会社 | 撮像素子パッケージおよびカメラモジュール |
US10658334B2 (en) * | 2016-08-18 | 2020-05-19 | Taiwan Semiconductor Manufacturing Co., Ltd. | Method for forming a package structure including a package layer surrounding first connectors beside an integrated circuit die and second connectors below the integrated circuit die |
WO2018225589A1 (ja) * | 2017-06-09 | 2018-12-13 | 株式会社村田製作所 | 電子部品モジュール |
KR20190004964A (ko) * | 2017-07-05 | 2019-01-15 | 삼성전자주식회사 | 반도체 패키지 |
US10096578B1 (en) * | 2017-07-06 | 2018-10-09 | Advanced Semiconductor Engineering, Inc. | Semiconductor package device and method of manufacturing the same |
KR102497572B1 (ko) | 2018-07-03 | 2023-02-09 | 삼성전자주식회사 | 반도체 패키지 및 그의 제조 방법 |
CN111524869A (zh) * | 2019-02-01 | 2020-08-11 | 矽品精密工业股份有限公司 | 电子结构及其制法 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008108847A (ja) * | 2006-10-24 | 2008-05-08 | Lintec Corp | 複合型半導体装置、それに用いられる半導体パッケージ及びスペーサーシート、並びに複合型半導体装置の製造方法 |
JP2012119688A (ja) * | 2010-12-02 | 2012-06-21 | Samsung Electronics Co Ltd | 積層パッケージ構造物、パッケージオンパッケージ素子、およびパッケージオンパッケージ素子製造方法 |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6201299B1 (en) | 1999-06-23 | 2001-03-13 | Advanced Semiconductor Engineering, Inc. | Substrate structure of BGA semiconductor package |
US6150730A (en) | 1999-07-08 | 2000-11-21 | Advanced Semiconductor Engineering, Inc. | Chip-scale semiconductor package |
TWI220781B (en) | 2003-04-28 | 2004-09-01 | Advanced Semiconductor Eng | Multi-chip package substrate for flip-chip and wire bonding |
TWI225299B (en) | 2003-05-02 | 2004-12-11 | Advanced Semiconductor Eng | Stacked flip chip package |
TWI228806B (en) | 2003-05-16 | 2005-03-01 | Advanced Semiconductor Eng | Flip chip package |
TWI236109B (en) | 2004-02-26 | 2005-07-11 | Advanced Semiconductor Eng | Chip package |
TWI237370B (en) | 2004-07-30 | 2005-08-01 | Advanced Semiconductor Eng | Chip package structure and process for fabricating the same |
TWI242855B (en) | 2004-10-13 | 2005-11-01 | Advanced Semiconductor Eng | Chip package structure, package substrate and manufacturing method thereof |
TWI236048B (en) | 2004-10-21 | 2005-07-11 | Advanced Semiconductor Eng | Method for flip chip bonding by utilizing an interposer with embeded bumps |
JP4704800B2 (ja) * | 2005-04-19 | 2011-06-22 | エルピーダメモリ株式会社 | 積層型半導体装置及びその製造方法 |
US7528474B2 (en) * | 2005-05-31 | 2009-05-05 | Stats Chippac Ltd. | Stacked semiconductor package assembly having hollowed substrate |
US20070139012A1 (en) | 2005-11-01 | 2007-06-21 | Aerovironment, Inc. | Motive power dual battery pack |
JP5230997B2 (ja) * | 2007-11-26 | 2013-07-10 | 新光電気工業株式会社 | 半導体装置 |
JP2009252916A (ja) | 2008-04-04 | 2009-10-29 | Nec Electronics Corp | 多層配線基板、半導体パッケージ、および半導体パッケージの製造方法 |
JP5043743B2 (ja) | 2008-04-18 | 2012-10-10 | ラピスセミコンダクタ株式会社 | 半導体装置の製造方法 |
TWI368983B (en) | 2008-04-29 | 2012-07-21 | Advanced Semiconductor Eng | Integrated circuit package and manufacturing method thereof |
TWI372458B (en) | 2008-05-12 | 2012-09-11 | Advanced Semiconductor Eng | Stacked type chip package structure |
TW200947654A (en) | 2008-05-12 | 2009-11-16 | Advanced Semiconductor Eng | Stacked type chip package structure and method of fabricating the same |
KR101198411B1 (ko) * | 2008-11-17 | 2012-11-07 | 삼성전기주식회사 | 패키지 온 패키지 기판 |
JP5340718B2 (ja) * | 2008-12-24 | 2013-11-13 | 新光電気工業株式会社 | 電子装置の製造方法 |
JP5556072B2 (ja) | 2009-01-07 | 2014-07-23 | ソニー株式会社 | 半導体装置、その製造方法、ミリ波誘電体内伝送装置 |
TWI499024B (zh) | 2009-01-07 | 2015-09-01 | Advanced Semiconductor Eng | 堆疊式多封裝構造裝置、半導體封裝構造及其製造方法 |
US8035235B2 (en) | 2009-09-15 | 2011-10-11 | Stats Chippac Ltd. | Integrated circuit packaging system with package-on-package and method of manufacture thereof |
KR101624973B1 (ko) | 2009-09-23 | 2016-05-30 | 삼성전자주식회사 | 패키지 온 패키지 타입의 반도체 패키지 및 그 제조방법 |
US8404518B2 (en) | 2009-12-13 | 2013-03-26 | Stats Chippac Ltd. | Integrated circuit packaging system with package stacking and method of manufacture thereof |
TWI451539B (zh) | 2010-08-05 | 2014-09-01 | Advanced Semiconductor Eng | 半導體封裝件及其製造方法 |
US8466567B2 (en) | 2010-09-16 | 2013-06-18 | Stats Chippac Ltd. | Integrated circuit packaging system with stack interconnect and method of manufacture thereof |
KR20120031697A (ko) * | 2010-09-27 | 2012-04-04 | 삼성전자주식회사 | 패키지 적층 구조 및 그 제조 방법 |
KR101711479B1 (ko) | 2010-10-06 | 2017-03-03 | 삼성전자 주식회사 | 반도체 패키지 장치 및 그의 검사 시스템 |
US8409923B2 (en) * | 2011-06-15 | 2013-04-02 | Stats Chippac Ltd. | Integrated circuit packaging system with underfill and method of manufacture thereof |
US8546932B1 (en) * | 2012-08-15 | 2013-10-01 | Apple Inc. | Thin substrate PoP structure |
-
2012
- 2012-08-15 US US13/586,375 patent/US8546932B1/en active Active
-
2013
- 2013-08-14 EP EP13751078.0A patent/EP2885812B1/en active Active
- 2013-08-14 KR KR1020157004805A patent/KR101720441B1/ko active IP Right Grant
- 2013-08-14 CN CN201380043024.9A patent/CN104584209B/zh active Active
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- 2013-08-14 WO PCT/US2013/055018 patent/WO2014028670A1/en active Application Filing
- 2013-08-15 TW TW102129340A patent/TWI553801B/zh active
- 2013-08-29 US US14/013,244 patent/US8766424B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008108847A (ja) * | 2006-10-24 | 2008-05-08 | Lintec Corp | 複合型半導体装置、それに用いられる半導体パッケージ及びスペーサーシート、並びに複合型半導体装置の製造方法 |
JP2012119688A (ja) * | 2010-12-02 | 2012-06-21 | Samsung Electronics Co Ltd | 積層パッケージ構造物、パッケージオンパッケージ素子、およびパッケージオンパッケージ素子製造方法 |
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TW201413890A (zh) | 2014-04-01 |
EP2885812A1 (en) | 2015-06-24 |
EP2885812B1 (en) | 2018-07-25 |
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