TW201413890A - 薄基板堆疊式封裝件結構 - Google Patents

薄基板堆疊式封裝件結構 Download PDF

Info

Publication number
TW201413890A
TW201413890A TW102129340A TW102129340A TW201413890A TW 201413890 A TW201413890 A TW 201413890A TW 102129340 A TW102129340 A TW 102129340A TW 102129340 A TW102129340 A TW 102129340A TW 201413890 A TW201413890 A TW 201413890A
Authority
TW
Taiwan
Prior art keywords
substrate
encapsulant
package
die
recess
Prior art date
Application number
TW102129340A
Other languages
English (en)
Other versions
TWI553801B (zh
Inventor
Chih-Ming Chung
Original Assignee
Apple Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Apple Inc filed Critical Apple Inc
Publication of TW201413890A publication Critical patent/TW201413890A/zh
Application granted granted Critical
Publication of TWI553801B publication Critical patent/TWI553801B/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/315Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed the encapsulation having a cavity
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • H01L23/3121Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation
    • H01L23/3128Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed a substrate forming part of the encapsulation the substrate having spherical bumps for external connection
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/565Moulds
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/565Moulds
    • H01L21/566Release layers for moulds, e.g. release layers, layers against residue during moulding
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • H01L23/488Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
    • H01L23/498Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
    • H01L23/49811Additional leads joined to the metallisation on the insulating substrate, e.g. pins, bumps, wires, flat leads
    • H01L23/49816Spherical bumps on the substrate for external connection, e.g. ball grid arrays [BGA]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/562Protection against mechanical damage
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L24/81Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/10Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers
    • H01L25/105Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices having separate containers the devices being of a type provided for in group H01L27/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/13099Material
    • H01L2224/131Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L2224/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • H01L2224/13001Core members of the bump connector
    • H01L2224/13099Material
    • H01L2224/131Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/13138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/13147Copper [Cu] as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/16227Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the bump connector connecting to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/10All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/1011All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
    • H01L2225/1017All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support
    • H01L2225/1023All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement the lowermost container comprising a device support the support being an insulating substrate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/10All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/1011All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
    • H01L2225/1047Details of electrical connections between containers
    • H01L2225/1058Bump or bump-like electrical connections, e.g. balls, pillars, posts
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/10All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/1011All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
    • H01L2225/1076Shape of the containers
    • H01L2225/1088Arrangements to limit the height of the assembly
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2225/00Details relating to assemblies covered by the group H01L25/00 but not provided for in its subgroups
    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/10All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers
    • H01L2225/1005All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/1011All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices having separate containers the devices being of a type provided for in group H01L27/00 the containers being in a stacked arrangement
    • H01L2225/1094Thermal management, e.g. cooling
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/12Passive devices, e.g. 2 terminal devices
    • H01L2924/1204Optical Diode
    • H01L2924/12042LASER
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/14Integrated circuits
    • H01L2924/143Digital devices
    • H01L2924/1434Memory
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1532Connection portion the connection portion being formed on the die mounting surface of the substrate
    • H01L2924/1533Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate
    • H01L2924/15331Connection portion the connection portion being formed on the die mounting surface of the substrate the connection portion being formed both on the die mounting surface of the substrate and outside the die mounting surface of the substrate being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • H01L2924/1815Shape
    • H01L2924/1816Exposing the passive side of the semiconductor or solid-state body
    • H01L2924/18161Exposing the passive side of the semiconductor or solid-state body of a flip chip
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/35Mechanical effects
    • H01L2924/351Thermal stress
    • H01L2924/3511Warping

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

本發明揭示一種包括一底部封裝件之PoP(堆疊式封裝件)封裝件,該底部封裝件具有囊封於一囊封劑中之一基板與耦接至該基板之頂部的一晶粒。該晶粒之至少一部分曝露於該底部封裝件基板上之囊封劑上方。一頂部封裝件包括一基板與該基板之正面及背面兩者上的囊封劑。該頂部封裝件基板之該背面耦接至該底部封裝件基板之頂面,其中該晶粒之至少部分位於該頂部封裝件基板之該背面上之該囊封劑中的一凹座中。

Description

薄基板堆疊式封裝件結構
本發明係關於半導體封裝及用於封裝半導體器件之方法。更特定而言,本發明係關於使用薄或無核心基板之堆疊式封裝件(PoP)。
堆疊式封裝件(「PoP」)技術隨著在半導體產業中對較低成本、較高效能、增加之積體電路密度及增加之封裝密度的需求持續而變得日益風行。隨著對愈來愈小之封裝件的推進增加,晶粒與封裝件之整合(例如,系統單晶片(「SoC」)技術與記憶體技術的「預先堆疊」或整合)允許較薄的封裝件。此類預先堆疊已變成對於薄且精細間距PoP封裝件的關鍵組件。
隨著薄且精細間距PoP封裝件而出現的問題為翹曲的可能性,此係由於PoP封裝件中頂部封裝件或底部封裝件上之端子(例如,諸如焊球之球)之間的間距被減小。翹曲可由於用於封裝件(例如,基板及塗覆至基板之囊封劑)中之材料的熱特性差異而引起。頂部封裝件可歸因於頂部封裝件並未附接至抑制翹曲之任何外部組件而尤其具有翹曲問題。舉例而言,底部封裝件可附接至有助於抑制底部封裝件中之翹曲的印刷電路板。
頂部封裝件中之翹曲問題可隨著在頂部封裝件中使用薄或無核心基板而進一步增加。薄或無核心基板可具有抵抗由基板與所塗覆囊封劑之間的熱特性差異引起之效應的較低機械強度。翹曲問題可導致 PoP封裝件之失效或降低之效能及/或利用PoP封裝件之器件的可靠性問題。
在某些實施例中,一種用於PoP封裝件之總成系統包括一底部封裝件及一頂部封裝件。該底部封裝件可包括耦接至晶粒之基板。基板及晶粒可囊封於囊封劑中,其中晶粒之至少部分曝露於囊封劑上方。晶粒之至少一部分曝露於底部封裝件基板上之囊封劑上方。頂部封裝件可包括一基板與該基板之正面(頂部)及背面(底部)兩者上的囊封劑。因為頂部封裝件之兩側上的囊封劑,所以頂部封裝件中之熱性質可實質上得以平衡。使熱性質平衡可使頂部封裝件上之熱應力平衡,且減小或抑制頂部封裝件中之翹曲。
在某些實施例中,頂部封裝件基板之背面上之囊封劑包括凹座。在一些實施例中,基板之至少部分曝露於凹座中。在其他實施例中,基板實質上覆蓋於凹座中。在某些實施例中,當底部封裝件與頂部封裝件經耦接以形成PoP封裝件時,頂部封裝件中之凹座容納耦接至底部封裝件中之基板的晶粒(例如,晶粒之至少部分位於凹座中)。在一些實施例中,當底部封裝件耦接至頂部封裝件時,底部封裝件基板之頂部上的端子(例如,焊球)耦接至頂部封裝件基板之底部上的端子。
100‧‧‧PoP封裝件總成系統
100'‧‧‧PoP(「堆疊式封裝件」)封裝件總成系統
100"‧‧‧PoP(「堆疊式封裝件」)封裝件總成系統
102‧‧‧底部封裝件
102'‧‧‧底部封裝件
104‧‧‧頂部封裝件
104'‧‧‧頂部封裝件
104"‧‧‧頂部封裝件
106‧‧‧基板
108‧‧‧囊封劑
110‧‧‧晶粒
112‧‧‧端子
114‧‧‧端子
115‧‧‧端子
116‧‧‧基板
118‧‧‧囊封劑
120‧‧‧端子
120A‧‧‧端子
120B‧‧‧端子
122A‧‧‧虛線
122B‧‧‧虛線
124‧‧‧囊封劑
126‧‧‧凹座
126'‧‧‧凹座
500‧‧‧塑封模具
600‧‧‧PoP封裝件
本發明之方法及裝置之特徵及優點在結合隨附圖式時藉由參考根據本發明之目前較佳但仍為說明性實施例的以下詳細描述而將被更充分地瞭解,其中:圖1描繪在組裝之前的PoP(「堆疊式封裝件」)封裝件之頂部封裝件及底部封裝件的實例之橫截面表示。
圖2描繪PoP封裝件總成系統之實施例的橫截面表示。
圖3描繪在基板上塗覆囊封劑期間使用之塑封模具(mold chase)的側視圖表示。
圖4描繪PoP封裝件總成系統之替代性實施例的橫截面表示。
圖5描繪具有曝露於凹座中之基板的頂部封裝件之仰視圖表示。
圖6描繪在底部封裝件耦接至頂部封裝件時形成的PoP封裝件之實施例的橫截面表示。
雖然本發明易於進行各種修改及替代形式,但在圖式中以舉例方式展示其特定實施例,且將在本文中對其進行詳細描述。圖式可能未按比例繪製。應理解,該等圖式及對圖式之詳細描述並非意欲將本發明限於所揭示的特定形式,而正相反,意欲涵蓋屬於如由附屬申請專利範圍所界定的本發明之精神及範疇內的所有修改、等效物及替代。
圖1描繪在組裝(例如,PoP封裝件系統)之前的PoP(「堆疊式封裝件」)封裝件之頂部封裝件及底部封裝件的實例之橫截面表示。PoP封裝件總成系統100包括底部封裝件102及頂部封裝件104。底部封裝件102包括基板106與至少部分覆蓋該基板之囊封劑108。可使用端子112(例如,焊球)而使晶粒110耦接至基板106且至少部分覆蓋於囊封劑108中。端子114(例如,焊球)可耦接至基板106之上部(頂部)表面。端子115(例如,焊球)可耦接至基板106之下部(底部)表面。
頂部封裝件104包括基板116與覆蓋基板之上部(頂部)表面的囊封劑118。端子120(例如,焊球)耦接至基板116之下部(底部)表面。如圖1中所展示,頂部封裝件104可因為基板116、囊封劑118與端子120之間的不同熱特性(例如,熱膨脹係數(「CTE」)及/或收縮率)而經歷翹曲。翹曲可引起問題,諸如(但不限於),在PoP封裝件之組裝之後在底部封裝件102中之端子114與頂部封裝件104中之端子120之間的連接 失去。若基板116為相對薄之基板(例如,厚度小於約400μm)及/或基板為無核心基板(例如,由僅介電聚合物及銅跡線製成之基板),則頂部封裝件104中之翹曲問題可增加。
圖2描繪PoP(「堆疊式封裝件」)封裝件總成系統100'之實施例的橫截面表示。系統100'包括底部封裝件102'及頂部封裝件104'。在某些實施例中,底部封裝件102'包括基板106。基板106可為(例如)用於封裝件之基底基板或封裝件基板。在某些實施例中,基板106為無核心基板。在一些實施例中,基板106為具有核心之薄基板。基板106可具有小於約400μm之厚度。在一些實施例中,基板106之厚度小於約200μm或小於約100μm。
晶粒110可使用端子112及/或用於將晶粒耦接至基板之其他機構而耦接至基板106的上部(頂部、頂面或正面)表面。晶粒110可為(例如)半導體晶片、積體電路晶粒或覆晶晶粒。在某些實施例中,晶粒110為系統單晶片(「SoC」)。在某些實施例中,端子114耦接至基板106之頂部。端子115可耦接至基板106之下部(底部、底面或背面)表面。端子112、114及/或115可包括但不限於由(例如)焊料或銅形成之球、柱或柱狀物。
在晶粒110及端子114耦接至基板106之後,基板之頂部(例如,上部表面)可至少部分由囊封劑108覆蓋。囊封劑108可為(例如)聚合物或封膠。在某些實施例中,囊封劑108具有選定性質(例如,選定熱性質)。舉例而言,在一些實施例中,囊封劑108具有在約115℃與約190℃之間的玻璃轉化溫度(Tg)。在一些實施例中,囊封劑108在玻璃轉化溫度以下具有在約10ppm/℃與約38ppm/℃之間的熱膨脹係數(CTE),且在玻璃轉化溫度以上具有在約40ppm/℃與約145ppm/℃之間的熱膨脹係數。在一些實施例中,囊封劑108在25℃下具有在約570kgf/mm2與約2400kgf/mm2之間的模數,或在約260℃下具有在約8 kgf/mm2與約70kgf/mm2之間的模數。在某些實施例中,囊封劑108具有儘可能接近基板106之熱性質的熱性質。
在某些實施例中,如圖2中所展示,晶粒110至少部分覆蓋於囊封劑108中,且晶粒之至少一部分曝露於囊封劑上方。在某些實施例中,使用塑封模具以在基板106上形成囊封劑108。圖3描繪在基板106上塗覆囊封劑108期間使用之塑封模具500的側視圖表示。如圖3中所展示,塑封模具500具有一形狀,該形狀在塑封模具抵靠晶粒110置放時抑制囊封劑108覆蓋晶粒之頂部表面。在一些實施例中,在囊封程序期間將保護膜置放於晶粒110之頂部表面上。在晶粒與塑封模具500接觸時,保護膜可保護晶粒110不被損壞。保護膜可為(例如)聚合物膜。
在某些實施例中,如圖2中所展示,端子14至少部分由囊封劑108覆蓋。舉例而言,如圖2中所展示,端子114之至少一部分曝露於囊封劑108上方。在一些實施例中,在將囊封劑108塗覆至基板106時端子114首先由囊封劑覆蓋,且接著移除囊封劑之一部分以曝露端子之多部分。舉例而言,如2圖中所展示,可使用諸如但不限於雷射鑽孔/切除之技術而使端子114曝露於空腔中以曝露端子之多部分。在其他實施例中,使用諸如但不限於機械研磨/切割處理之扁平類型處理來曝露端子114之多部分。在一些實施例中,使用膜輔助模製(FAM)程序以形成呈模具形狀之囊封劑108,該模具形狀曝露端子114之多部分(例如,如圖2中所展示,模具形狀具有用於該等端子之空腔)。
在某些實施例中,端子114具有由虛線122B表示之高於基板106的高度,該高度高於基板上方囊封劑108之由虛線122A表示的高度。端子114可具有高於囊封劑108之高度,以確保底部封裝件102'中之端子與頂部封裝件104'中之端子(例如,端子120)之間的連接。
在某些實施例中,頂部封裝件104'包括基板116。基板116可為 (例如)用於封裝件之基底基板或封裝件基板。在某些實施例中,基板116為無核心基板。在一些實施例中,基板116為具有核心之薄基板。基板116可具有小於約400μm之厚度。在一些實施例中,基板116之厚度小於約200μm或小於約100μm。
在某些實施例中,端子120耦接至基板116之下部(底部、底面或背面)表面。端子120可包括但不限於由(例如)焊料或銅製成之球、柱或柱狀物。端子120可經對準以與底部封裝件102'中之端子114連接。
基板116之上部(頂部、頂面或正面)表面可至少部分由囊封劑118覆蓋。囊封劑118可為與囊封劑108相同的材料及/或具有類似於囊封劑108的性質。在一些實施例中,如圖2中所展示,囊封劑118實質上覆蓋基板116的整個頂部。
在某些實施例中,如圖2中所展示,頂部封裝件104'之底部至少部分由囊封劑124覆蓋。囊封劑124可為與囊封劑108及/或囊封劑118相同的材料,及/或具有類似於囊封劑108及/或囊封劑118的性質。在某些實施例中,凹座126形成於囊封劑124中。在一些實施例中,凹座126在囊封/模製程序期間(例如,使用設計有凹座之塑封模具空腔)形成。在其他實施例中,凹座126在囊封/模製程序之後形成。舉例而言,凹座126可使用機械研磨/切割程序或雷射鑽孔/切除程序來形成。
在某些實施例中,如圖2中所展示,在至少一些囊封劑124留於凹座中的情況下形成凹座126(例如,囊封劑124在凹座中實質上覆蓋或圍封基板116,且基板不曝露於凹座中)。在一些實施例中,頂部封裝件基板曝露於凹座中。圖4描繪PoP(「堆疊式封裝件」)封裝件總成系統100"之實施例的橫截面表示。如圖4中所展示,頂部封裝件104"包括囊封劑124與凹座126'。基板116至少部分曝露於凹座126'中。在某些實施例中,基板116實質上曝露於凹座126'中。圖5描繪具有曝露於凹座126'中之基板116的頂部封裝件104"之仰視圖表示。
在某些實施例中,凹座126(或凹座126')經設定大小以在頂部封裝件104'(或頂部封裝件104")耦接至底部封裝件102'時容納晶粒110之曝露部分。圖6描繪在底部封裝件102'耦接至頂部封裝件104'時形成之PoP封裝件600之實施例的橫截面表示。如圖6中所展示,將晶粒110容納於凹座126(或凹座126')中減小了PoP封裝件600的總厚度。
在某些實施例中,如圖2及圖4中所展示,端子120之至少一些部分曝露於囊封劑124上方。如圖6中所展示,端子120可經曝露以在頂部封裝件104'(或頂部封裝件104")耦接至底部封裝件時允許端子120與端子114之間的互連。
在一些實施例中,在將囊封劑124塗覆至基板116時端子120首先由囊封劑覆蓋,且接著移除囊封劑之一部分以曝露端子之多部分。舉例而言,可使用諸如但不限於雷射鑽孔/切除之技術而使端子120曝露於空腔中以曝露端子之多部分。展示於圖2及圖4中之端子120A描繪由空腔類型處理曝露之端子的實例。在一些實施例中,使用諸如但不限於機械研磨/切割處理之扁平類型處理來曝露端子120之多部分。展示於圖2及圖4中之端子120B描繪由扁平類型處理曝露之端子的實例。在一些實施例中,使用膜輔助模製(FAM)程序以形成呈模具形狀之囊封劑124,該模具形狀曝露端子120之多部分(例如,模具形狀具有用於端子之空腔,或為扁平的但曝露端子之多部分)。
端子114可具有高於囊封劑108之高度,以確保底部封裝件102'中之端子與頂部封裝件104'中之端子(例如,端子120)之間的連接。
如上文針對展示於圖2至圖6中之實施例所描述,除藉由囊封劑118覆蓋頂部封裝件之頂部(正面)外亦藉由囊封劑124至少部分覆蓋頂部封裝件104'(或頂部封裝件104")之底部(背面)可產生具有實質平衡之熱性質的頂部封裝件結構(例如,在頂部封裝件之背面及正面上具有囊封劑使諸如但不限於頂部封裝件中之CTE及收縮率的熱性質平 衡)。使頂部封裝件中之熱性質平衡可使頂部封裝件上之熱應力平衡,且減小或抑制頂部封裝件中之翹曲,尤其對於具有薄或無核心基板之頂部封裝件而言。減小頂部封裝件中之翹曲可改良預先堆疊,且改良具有精細間距(例如,端子之間的減小之間距)以及薄或無核心基板之PoP封裝件的可靠性。此外,將來自底部封裝件之晶粒容納於囊封劑124中之凹座126(或凹座126')中允許PoP封裝件維持減小(或薄)對總PoP封裝件厚度。
本文中所描述之實施例描述了PoP封裝件之結構及其形成方法,其中頂部封裝件在頂部封裝件之兩側上具有囊封劑。然而,熟習此項技術者將為顯而易見:本文中所描述之實施例可適用於供印刷電路板上及/或模組/系統層級總成中之表面黏著技術(SMT)使用的底部封裝件。
鑒於本描述,對於熟習此項技術者而言,本發明之各種態樣的進一步修改及替代性實施例將為顯而易見的。因而,此描述內容應被認為僅說明性的且係為了教示熟習此項技術者執行本發明之通用方式。應理解,本文中所展示並描述之本發明的形式將被視為目前較佳實施例。元件及材料可替代本文中所說明並描述之彼等元件及材料,各部分及程序可反轉,且可獨立利用本發明之某些特徵,以上所有部分對具有本發明之以上描述之益處的熟習此項技術者將為顯而易見的。在不脫離如在以下申請專利範圍中所述的本發明之精神及範疇的情況下,可對本文中描述之元件進行改變。
100‧‧‧PoP封裝件總成系統
102‧‧‧底部封裝件
104‧‧‧頂部封裝件
106‧‧‧基板
108‧‧‧囊封劑
110‧‧‧晶粒
112‧‧‧端子
114‧‧‧端子
115‧‧‧端子
116‧‧‧基板
118‧‧‧囊封劑
120‧‧‧端子

Claims (18)

  1. 一種半導體器件封裝件總成,其包含:一第一基板,其具有至少覆蓋該第一基板之一頂部之一第一囊封劑;一晶粒,其耦接至該第一基板之該頂部,其中該晶粒至少部分囊封於該第一囊封劑中,其中該晶粒之至少一部分曝露於該第一囊封劑上方;及一第二基板,其具有至少部分覆蓋該第二基板之一頂部的一第二囊封劑及至少部分覆蓋該第二基板之一底部的一第三囊封劑;其中該第二基板之該底部耦接至該第一基板的該頂部;及其中該晶粒之至少部分位於該第三囊封劑中之一凹座中。
  2. 如請求項1之總成,其中該第一基板及該第二基板為無核心基板。
  3. 如請求項1之總成,其中該第三囊封劑在該凹座中實質上覆蓋該第二基板之該底部。
  4. 如請求項1之總成,其中該第二基板之至少一部分曝露於該凹座中。
  5. 如請求項1之總成,其進一步包含耦接至該第一基板之該頂部的一或多個第一端子,其中該等第一端子之至少一些部分曝露於該第一囊封劑上方。
  6. 如請求項1之總成,其進一步包含耦接至該第二基板之該底部的一或多個第二端子,其中該等第二端子之至少一些部分曝露於該第三囊封劑下方。
  7. 如請求項1之總成,其中該第二基板之該底部經由一或多個端子 耦接至該第一基板之該頂部。
  8. 一種半導體器件封裝件總成,其包含:一底部封裝件,其包含一第一基板與該第一基板上方之一第一囊封劑;一晶粒,其位於該第一基板上方且耦接至該第一基板,其中該晶粒至少部分囊封於該第一基板上方之該第一囊封劑中,其中該晶粒之至少一部分曝露於該第一囊封劑外部;及一頂部封裝件,其耦接至該底部封裝件,其中該頂部封裝件包含一第二基板與該第二基板上方之一第二囊封劑以及該第二基板下方的一第三囊封劑,且其中該第三囊封劑包含一凹座,該晶粒之該曝露部分的至少部分位於該凹座中。
  9. 如請求項8之總成,其中該第一基板及該第二基板厚度小於400μm。
  10. 如請求項8之總成,其中該第三囊封劑在該凹座中實質上圍封該第二基板。
  11. 如請求項8之總成,其中該第二基板之至少一部分曝露於該凹座中。
  12. 如請求項8之總成,其進一步包含一或多個端子,其中該等端子將該第一基板耦接至該晶粒。
  13. 一種用於形成一半導體器件封裝件總成之方法,其包含:將一晶粒耦接至一第一基板之一頂部表面;將該第一基板之該頂部表面囊封於一第一囊封劑中,其中該晶粒之至少一部分曝露於該第一囊封劑上方;將一第二基板之一頂部表面囊封於一第二囊封劑中;將該第二基板之一底部表面囊封於一第三囊封劑中,其中該第三囊封劑包含一凹座;及 將該第一基板之該頂部表面耦接至該第二基板之該底部表面,使得該晶粒之至少部分位於該第三囊封劑中的該凹座中。
  14. 如請求項13之方法,其進一步包含模製該第三囊封劑以形成該凹座。
  15. 如請求項13之方法,其進一步包含移除該第三囊封劑之一部分以形成該凹座。
  16. 如請求項13之方法,其進一步包含將一或多個第一端子耦接至該第一基板之該頂部表面,其中該等第一端子之至少一些部分曝露於該第一囊封劑上方。
  17. 如請求項13之方法,其進一步包含將一或多個第二端子耦接至該第二基板之該底部表面,其中該等第二端子之至少一些部分曝露於該第三囊封劑下方。
  18. 如請求項13之方法,其進一步包含將耦接至該第一基板之該頂部表面的一或多個第一端子耦接至被耦接至該第二基板之該底部表面的一或多個第二端子。
TW102129340A 2012-08-15 2013-08-15 薄基板堆疊式封裝件結構 TWI553801B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/586,375 US8546932B1 (en) 2012-08-15 2012-08-15 Thin substrate PoP structure

Publications (2)

Publication Number Publication Date
TW201413890A true TW201413890A (zh) 2014-04-01
TWI553801B TWI553801B (zh) 2016-10-11

Family

ID=49004084

Family Applications (1)

Application Number Title Priority Date Filing Date
TW102129340A TWI553801B (zh) 2012-08-15 2013-08-15 薄基板堆疊式封裝件結構

Country Status (7)

Country Link
US (2) US8546932B1 (zh)
EP (1) EP2885812B1 (zh)
JP (1) JP6134795B2 (zh)
KR (1) KR101720441B1 (zh)
CN (1) CN104584209B (zh)
TW (1) TWI553801B (zh)
WO (1) WO2014028670A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI576976B (zh) * 2015-08-28 2017-04-01 欣興電子股份有限公司 無核心層封裝結構

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8546193B2 (en) * 2010-11-02 2013-10-01 Stats Chippac, Ltd. Semiconductor device and method of forming penetrable film encapsulant around semiconductor die and interconnect structure
US8546932B1 (en) * 2012-08-15 2013-10-01 Apple Inc. Thin substrate PoP structure
US8963311B2 (en) 2012-09-26 2015-02-24 Apple Inc. PoP structure with electrically insulating material between packages
TW201415602A (zh) * 2012-10-09 2014-04-16 矽品精密工業股份有限公司 封裝堆疊結構之製法
US9287317B2 (en) * 2013-01-25 2016-03-15 Samsung Electro-Mechanics Co., Ltd. Image sensor module and method of manufacturing the same
US8970024B2 (en) * 2013-03-14 2015-03-03 Taiwan Semiconductor Manufacturing Company, Ltd. Packages with molding material forming steps
US9064718B1 (en) 2014-05-07 2015-06-23 Freescale Semiconductor, Inc. Pre-formed via array for integrated circuit package
US10032652B2 (en) * 2014-12-05 2018-07-24 Advanced Semiconductor Engineering, Inc. Semiconductor package having improved package-on-package interconnection
KR102457119B1 (ko) 2015-09-14 2022-10-24 삼성전자주식회사 반도체 패키지의 제조 방법
JP2018026395A (ja) * 2016-08-08 2018-02-15 ソニーセミコンダクタソリューションズ株式会社 撮像素子パッケージおよびカメラモジュール
US10658334B2 (en) * 2016-08-18 2020-05-19 Taiwan Semiconductor Manufacturing Co., Ltd. Method for forming a package structure including a package layer surrounding first connectors beside an integrated circuit die and second connectors below the integrated circuit die
WO2018225589A1 (ja) * 2017-06-09 2018-12-13 株式会社村田製作所 電子部品モジュール
KR20190004964A (ko) * 2017-07-05 2019-01-15 삼성전자주식회사 반도체 패키지
US10096578B1 (en) * 2017-07-06 2018-10-09 Advanced Semiconductor Engineering, Inc. Semiconductor package device and method of manufacturing the same
KR102497572B1 (ko) 2018-07-03 2023-02-09 삼성전자주식회사 반도체 패키지 및 그의 제조 방법
CN111524869A (zh) * 2019-02-01 2020-08-11 矽品精密工业股份有限公司 电子结构及其制法

Family Cites Families (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6201299B1 (en) 1999-06-23 2001-03-13 Advanced Semiconductor Engineering, Inc. Substrate structure of BGA semiconductor package
US6150730A (en) 1999-07-08 2000-11-21 Advanced Semiconductor Engineering, Inc. Chip-scale semiconductor package
TWI220781B (en) 2003-04-28 2004-09-01 Advanced Semiconductor Eng Multi-chip package substrate for flip-chip and wire bonding
TWI225299B (en) 2003-05-02 2004-12-11 Advanced Semiconductor Eng Stacked flip chip package
TWI228806B (en) 2003-05-16 2005-03-01 Advanced Semiconductor Eng Flip chip package
TWI236109B (en) 2004-02-26 2005-07-11 Advanced Semiconductor Eng Chip package
TWI237370B (en) 2004-07-30 2005-08-01 Advanced Semiconductor Eng Chip package structure and process for fabricating the same
TWI242855B (en) 2004-10-13 2005-11-01 Advanced Semiconductor Eng Chip package structure, package substrate and manufacturing method thereof
TWI236048B (en) 2004-10-21 2005-07-11 Advanced Semiconductor Eng Method for flip chip bonding by utilizing an interposer with embeded bumps
JP4704800B2 (ja) * 2005-04-19 2011-06-22 エルピーダメモリ株式会社 積層型半導体装置及びその製造方法
US7528474B2 (en) * 2005-05-31 2009-05-05 Stats Chippac Ltd. Stacked semiconductor package assembly having hollowed substrate
US20070139012A1 (en) 2005-11-01 2007-06-21 Aerovironment, Inc. Motive power dual battery pack
JP5074738B2 (ja) * 2006-10-24 2012-11-14 リンテック株式会社 複合型半導体装置用スペーサーシート、及び複合型半導体装置の製造方法
JP5230997B2 (ja) * 2007-11-26 2013-07-10 新光電気工業株式会社 半導体装置
JP2009252916A (ja) 2008-04-04 2009-10-29 Nec Electronics Corp 多層配線基板、半導体パッケージ、および半導体パッケージの製造方法
JP5043743B2 (ja) 2008-04-18 2012-10-10 ラピスセミコンダクタ株式会社 半導体装置の製造方法
TWI368983B (en) 2008-04-29 2012-07-21 Advanced Semiconductor Eng Integrated circuit package and manufacturing method thereof
TW200947654A (en) 2008-05-12 2009-11-16 Advanced Semiconductor Eng Stacked type chip package structure and method of fabricating the same
TWI372458B (en) 2008-05-12 2012-09-11 Advanced Semiconductor Eng Stacked type chip package structure
KR101198411B1 (ko) * 2008-11-17 2012-11-07 삼성전기주식회사 패키지 온 패키지 기판
JP5340718B2 (ja) * 2008-12-24 2013-11-13 新光電気工業株式会社 電子装置の製造方法
JP5556072B2 (ja) 2009-01-07 2014-07-23 ソニー株式会社 半導体装置、その製造方法、ミリ波誘電体内伝送装置
TWI499024B (zh) 2009-01-07 2015-09-01 Advanced Semiconductor Eng 堆疊式多封裝構造裝置、半導體封裝構造及其製造方法
US8035235B2 (en) 2009-09-15 2011-10-11 Stats Chippac Ltd. Integrated circuit packaging system with package-on-package and method of manufacture thereof
KR101624973B1 (ko) 2009-09-23 2016-05-30 삼성전자주식회사 패키지 온 패키지 타입의 반도체 패키지 및 그 제조방법
US8404518B2 (en) 2009-12-13 2013-03-26 Stats Chippac Ltd. Integrated circuit packaging system with package stacking and method of manufacture thereof
TWI451539B (zh) 2010-08-05 2014-09-01 Advanced Semiconductor Eng 半導體封裝件及其製造方法
US8466567B2 (en) 2010-09-16 2013-06-18 Stats Chippac Ltd. Integrated circuit packaging system with stack interconnect and method of manufacture thereof
KR20120031697A (ko) * 2010-09-27 2012-04-04 삼성전자주식회사 패키지 적층 구조 및 그 제조 방법
KR101711479B1 (ko) 2010-10-06 2017-03-03 삼성전자 주식회사 반도체 패키지 장치 및 그의 검사 시스템
KR101711045B1 (ko) * 2010-12-02 2017-03-02 삼성전자 주식회사 적층 패키지 구조물
US8409923B2 (en) * 2011-06-15 2013-04-02 Stats Chippac Ltd. Integrated circuit packaging system with underfill and method of manufacture thereof
US8546932B1 (en) * 2012-08-15 2013-10-01 Apple Inc. Thin substrate PoP structure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI576976B (zh) * 2015-08-28 2017-04-01 欣興電子股份有限公司 無核心層封裝結構

Also Published As

Publication number Publication date
KR101720441B1 (ko) 2017-03-27
US20140048957A1 (en) 2014-02-20
JP6134795B2 (ja) 2017-05-24
EP2885812B1 (en) 2018-07-25
US8766424B2 (en) 2014-07-01
TWI553801B (zh) 2016-10-11
KR20150038318A (ko) 2015-04-08
US8546932B1 (en) 2013-10-01
CN104584209A (zh) 2015-04-29
EP2885812A1 (en) 2015-06-24
WO2014028670A1 (en) 2014-02-20
CN104584209B (zh) 2018-01-19
JP2015525007A (ja) 2015-08-27

Similar Documents

Publication Publication Date Title
TWI553801B (zh) 薄基板堆疊式封裝件結構
TWI634628B (zh) 具有支撐構件之堆疊式半導體晶粒組件及相關之系統及方法
KR102649471B1 (ko) 반도체 패키지 및 그의 제조 방법
US8035127B2 (en) Packaging substrate structure with a semiconductor chip embedded therein
US8004072B2 (en) Packaging systems and methods
US20120112336A1 (en) Encapsulated die, microelectronic package containing same, and method of manufacturing said microelectronic package
JP5518789B2 (ja) マルチチップモジュール
KR20130123682A (ko) 반도체 패키지 및 이의 제조 방법
TWI614848B (zh) 電子封裝結構及其製法
TWI764172B (zh) 封裝結構及其製造方法
US20110062599A1 (en) Integrated circuit packaging system with package stacking and method of manufacture thereof
US20120098114A1 (en) Device with mold cap and method thereof
TWI488270B (zh) 半導體封裝件及其製法
JP3291289B2 (ja) 電子部品の製造方法
US20080290513A1 (en) Semiconductor package having molded balls and method of manufacturing the same
KR20080076092A (ko) 적층 반도체 패키지 및 이의 제조 방법
KR20070120376A (ko) 칩 스케일 패키지 제조 방법
KR101538680B1 (ko) 적층형 반도체 패키지 및 이의 제조 방법
US9184067B1 (en) Methods of mitigating defects for semiconductor packages
TW201933563A (zh) 電子封裝件及其製法
KR101096453B1 (ko) 적층 반도체 패키지
US20230079686A1 (en) Semiconductor package and method for fabricating the same
JP4823161B2 (ja) 半導体装置
JP2010141284A (ja) パッケージ基板
KR20140137535A (ko) 집적회로 패키지 제조방법