TWI538046B - 氣體輸送系統之塗覆方法 - Google Patents
氣體輸送系統之塗覆方法 Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims description 39
- 239000007789 gas Substances 0.000 claims description 145
- 238000000034 method Methods 0.000 claims description 47
- 239000002243 precursor Substances 0.000 claims description 41
- 239000012530 fluid Substances 0.000 claims description 39
- 238000005260 corrosion Methods 0.000 claims description 33
- 230000007797 corrosion Effects 0.000 claims description 33
- 239000011248 coating agent Substances 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 30
- 239000000758 substrate Substances 0.000 claims description 26
- 229910001220 stainless steel Inorganic materials 0.000 claims description 21
- 239000010935 stainless steel Substances 0.000 claims description 21
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- 239000004065 semiconductor Substances 0.000 claims description 10
- DIOQZVSQGTUSAI-UHFFFAOYSA-N n-butylhexane Natural products CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 8
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 230000000873 masking effect Effects 0.000 claims description 6
- 229920002120 photoresistant polymer Polymers 0.000 claims description 6
- 238000007664 blowing Methods 0.000 claims description 5
- 229910052736 halogen Inorganic materials 0.000 claims description 5
- 150000002367 halogens Chemical class 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 239000007788 liquid Substances 0.000 claims description 4
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 claims description 2
- 239000008367 deionised water Substances 0.000 claims description 2
- 229910021641 deionized water Inorganic materials 0.000 claims description 2
- 229910017604 nitric acid Inorganic materials 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims 2
- 238000004140 cleaning Methods 0.000 claims 1
- DIOQZVSQGTUSAI-NJFSPNSNSA-N decane Chemical compound CCCCCCCCC[14CH3] DIOQZVSQGTUSAI-NJFSPNSNSA-N 0.000 claims 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 claims 1
- 230000032258 transport Effects 0.000 claims 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 7
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 5
- 239000011651 chromium Substances 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 229910052804 chromium Inorganic materials 0.000 description 4
- 239000000356 contaminant Substances 0.000 description 4
- -1 polyethylene Polymers 0.000 description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052734 helium Inorganic materials 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 229920003023 plastic Polymers 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 125000004429 atom Chemical group 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 230000002035 prolonged effect Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052724 xenon Inorganic materials 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 229910001566 austenite Inorganic materials 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 229910001092 metal group alloy Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D5/00—Protection or supervision of installations
- F17D5/005—Protection or supervision of installations of gas pipelines, e.g. alarm
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/30—Processes for applying liquids or other fluent materials performed by gravity only, i.e. flow coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/22—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes
- B05D7/222—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to internal surfaces, e.g. of tubes of pipes
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17D—PIPE-LINE SYSTEMS; PIPE-LINES
- F17D1/00—Pipe-line systems
- F17D1/02—Pipe-line systems for gases or vapours
- F17D1/04—Pipe-line systems for gases or vapours for distribution of gas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
- H01J37/32495—Means for protecting the vessel against plasma
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/20—Deposition of semiconductor materials on a substrate, e.g. epitaxial growth solid phase epitaxy
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
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- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
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- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
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- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
- H01J2237/3341—Reactive etching
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
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Description
本發明係關於氣體輸送系統之塗覆方法。
電漿常被使用於基板的處理中,此基板如:半導體基板或被使用於製造平面顯示器的玻璃面板。舉例來說,於部分的基板製程中(例如:電漿蝕刻、化學氣相沉積、電漿輔助化學氣相沉積、物理氣相沉積等),基板會被分割成各將成為積體電路之數個晶粒或矩形區域。接著,為了在基板上形成電子元件,基板會以一連串將材料選擇性去除(蝕刻)和附加(沉積)的步驟進行處理。
在一個示範的電漿製程中,基板於蝕刻前被塗覆一層硬化乳劑薄膜(亦即光阻遮罩),然後,硬化乳劑的區域會被選擇性去除,造成部分下層的基板暴露出來。接著,將基板放置於位在一基板支撐結構上的一電漿處理系統的腔室中,該基板支撐結構包含稱為夾盤之單極或雙極電極。接著使適當的製程氣體(例如:C4F8、C4F6、CHF3、CH2F2、CF4、CH3F、C2F4、N2、O2、HBr、Ar、Xe、He、H2、NH3、SF6、BCl3、Cl2等)經由氣體輸送系統的氣體通道流入腔室中,並電離而形成電漿,以蝕刻基板的暴露區域。含鹵素的製程氣體具有很高的腐蝕性且可能損壞氣體通道的內表面。
本發明揭示一氣體輸送系統之氣體通道內表面之塗覆方法,該氣體輸送系統被配置來輸送製程氣體進入電漿處理系統的腔室內,此方法包含:(a)使抗腐蝕材料的流體前驅物流過氣體通道,並沉積一層流體前驅物,以完全塗覆氣體通道內表面;(b)去除內表面上的過量流體前驅物;(c)使流體前驅物的沉積層固化,以形成抗腐蝕材料塗層。
圖1顯示電漿處理系統100的簡化橫剖面圖。一般來說,一或多種製程氣體會透過一進氣口108,從氣體輸送系統122流入腔室102。這些製程氣體接著會被電離以形成電漿110,以處理(例如:蝕刻或沉積)基板114的暴露區域,此基板如置於一靜電夾盤116上的半導體基板或玻璃面板。噴淋頭電極104以及襯管112有助於使電漿110最佳地聚焦於基板114上。
氣體輸送系統122可包括一或多個質流控制器,此質流控制器連接於裝有電漿製程氣體(例如:C4F8、C4F6、CHF3、CH2F3、CF4、HBr、CH3F、C2F4、N2、O2、Ar、Xe、He、H2、NH3、SF6、BCl3、Cl2、WF6等)的壓縮氣體鋼瓶124a-f。氣體鋼瓶124a-f被提供局部排氣的外殼128進一步的保護著。質流控制器126可以是在半導體產業中用來量測與調節氣體到電漿處理系統之質量流量的自含式(self-contained)裝置(由一轉換器、控制閥和控制與訊號處理電子元件所組成)。氣體輸送系統122包含供製程氣體流動的氣體通道。氣體輸送系統的各式各樣元件藉由允許某些元件(例如處理室門)移動的配管及風箱部而互相連接。
在半導體廠中,為了最大化生產率與良率,在電漿處理期間需要輸送超純製程氣體。然而,因為這類氣體的高腐蝕性與易反應性本質,使得這類氣體的輸送引起特別的挑戰。
尤其,氣體輸送系統中的腐蝕現象實質上會降低基板的良率。舉例來說,在蝕刻基板的製程中,污染物可能由製程氣體的材料(例如:碳、氟、氫、氮、氧、矽、硼、氯等)、基板的材料(例如:光阻、矽、氧、氮、鋁、鈦等)、或電漿製程腔室或氣體輸送系統內部的結構材料(例如:不鏽鋼、鋁、石英等)所產生。
在半導體生產中,所製造之裝置特徵部的十分之一大小的微粒可能實質上損壞裝置。接著,為了儘量減少與消除系統污染物的可能來源,一般會精心設計與製程氣體接觸的元件。因為氣體輸送系統可能是重要的污染物來源,氣體通道通常由一組挑選的金屬所組成(例如:電拋光的不鏽鋼、銅、鋁、金屬合金等)。
舉例來說,不鏽鋼是一種鐵(Fe)基合金,具有重要合金添加物鉻(Cr)和鎳(Ni),鉻能使金屬有『不鏽』和抗腐蝕的特性,而鎳可穩定奧斯田鐵(austenite)並讓金屬無磁性且堅韌。電拋光一般來說可改善零件的表面化學,藉以強化表面鈍態氧化膜並由表面去除任何游離鐵。
一般來說,不鏽鋼包含可進一步防止「氧化」或生鏽的「鈍態」膜塗層。此膜在暴露於氧氣時迅速地形成。一旦形成此膜,金屬就成鈍態,且氧化或『生鏽』速率將大大地減緩。
儘管努力減少來自於如同電拋光、鈍化層、鏡面光滑表面光度(Ra<5密耳(mil))的製程之腐蝕,但由於長期暴露於製程氣體,仍會發生腐蝕,尤其在會定期暴露於濕氣中的特定區域,例如:接近熔接接點的部分和不鏽鋼氣體通道的部分。
腐蝕的程度和污染物的量可依很多因素而定,例如:氣體濃度和純度、溼氣含量、溫度、氣體通道材料中的局部不均勻性、系統流速、暴露時間、暴露頻率。舉例來說:例如氯化氫或溴化氫之含鹵素氣體,於溼氣位準超過數個百萬分之一(ppm)時可以腐蝕不鏽鋼。
儘管溼氣可以減少,但其一般無法完全消除。舉例來說,雖然電漿製程氣體通常以純化形式而貯存於壓縮氣體鋼瓶中,當替換鋼瓶或維修處理腔室時,濕氣都可能被引進氣體輸送系統內。
儘管不鏽鋼的真正腐蝕量趨於微小,但從腐蝕區域釋放出來的鐵與鉻,可經由不鏽鋼氣體通道中之氣體流動,而被搬運到其中半導體基板正接受處理之電漿處理室。因此,在電漿處理室中接受處理之半導體基板會發生嚴重的污染。基板上的鐵與鉻污染物之標準容忍值小於5.0x1010原子/平方公分(atoms/cm2)。因此,期望有用以避免或有效地減少不鏽鋼氣體通道的腐蝕的方法。減少氣體輸送系統中的腐蝕之一方法為,防止不鏽鋼氣體通道(例如:配管和風箱)接觸腐蝕性氣體。
一種根據此策略的方法為使用抗腐蝕的配管(例如:聚乙烯配管、聚丙烯配管、彈性玻璃配管、金屬塗覆塑膠配管、陶瓷配
管、有導電遮屏夾在兩層塑膠或電鍍鋁之間的層板配管)。
藉由參考文獻方式併入於此之共同受讓的美國專利第7,234,222號,揭示了將塑膠套管結合或射出成形至不鏽鋼配管之內表面上的方法。
於此描述流動塗覆方法的實施例,其中一抗腐蝕材料的流體前驅物流經氣體輸送系統的氣體通道,以便沉積一層流體前驅物於氣體通道的內表面上;且使沉積的此層流體前驅物固化,以在氣體通道的內表面上形成一層抗腐蝕材料。氣體通道由熔接金屬(例如:不鏽鋼)配管、風箱、配件、凸緣、閥及其類似物等所形成。流動塗覆方法可有效地塗覆具有複雜的幾何形狀和/或小直徑的內表面(例如:風箱內表面或外徑為0.25英吋以下的配管內表面)。
一流動塗覆方法實施例包含以下步驟:(a)用適當的去污劑和/或適當的化學藥品(例如:使用10到20wt.%的硝酸3分鐘和用去離子水沖洗內表面至少5分鐘)來清除氣體輸送系統的氣體通道內表面;(b)乾燥內表面(例如:藉由吹入乾燥的氮氣或乾燥的空氣經過氣體通道,且在至少120℃溫度下的真空烤箱中烘烤氣體通道);(c)使抗腐蝕材料的流體前驅物(例如:PERMABOND製造的HL126液態高分子前驅物或甲基丙烯酸酯)流過氣體通道,並沉積一層流體前驅物以塗覆氣體通道內表面;(d)去除內表面上的過量流體前驅物(例如:藉由吹入乾燥的氮氣或乾燥的空氣到氣體通道中);(e)使流體前驅物的沉積層固化,以形成抗腐蝕材料塗層(例如:藉由在溫度至少100℃與壓力為1到10托耳(Torr)的真空烤箱內烘烤氣體通道,或將氣體通道保持在環境溫度或壓力下至少24小時)。
可以施加相同的第二塗層。合成的塗層可具有0.0014到0.0034英吋的厚度且不容易碎。
然而,如圖2所示,如果氣體通道包含被熔接於氣體通道的
其他元件(例如:配管、配件、閥、凸緣等)之風箱201,流體前驅物會積聚在風箱201之內表面的迴旋段202,並可能在迴旋段202處固化成過量的抗腐蝕材料,其可能剝落並造成微粒污染。
在延長暴露於腐蝕性氣體之後檢驗氣體輸送系統中之未塗覆不鏽鋼風箱,顯示出風箱的迴旋段沒有任何腐蝕的跡象,而其他元件及在此氣體輸送系統的元件之間的熔接接點則顯示出嚴重的腐蝕。因此,選擇性的塗覆方法,其中在氣體輸送系統的氣體通道的所有內表面上塗覆抗腐蝕物質,同時留下其中之風箱的內表面不塗覆,可以消除抗腐蝕材料積聚於風箱迴旋段中的問題。
選擇性塗覆方法的一實施例包含以下步驟:
(a)在將風箱熔接至其餘氣體通道之前,以可避免流體前驅物附著之遮蔽劑(如:光阻、油、矽烷和/或烷氧矽烷(矽烷和/或烷氧矽烷可在風箱的內表面上提供一矽烷化層))塗覆風箱的內表面;
(b)將風箱熔接至其他元件上;
(c)使流體前驅物(例如:HL126液態高分子前驅物或甲基丙烯酸酯)流過氣體通道,並沉積一層流體前驅物,以塗覆氣體通道中除了風箱內表面以外的內表面;
(d)去除過量流體前驅物(例如:藉由吹入乾燥的氮氣或乾燥的空氣到氣體通道中);
(e)使流體前驅物的沉積層固化(例如:藉由在溫度至少100℃、壓力為1到10托耳(Torr)的真空烤箱內烘烤氣體通道,或將氣體通道保持在環境溫度和壓力下至少24小時)。
(f)非必要地,去除風箱內表面的遮蔽劑。
遮蔽劑可以是光阻、油、矽烷、烷氧矽烷或其他合適的物質。流體前驅物可以是高分子HL126或甲基丙烯酸酯或其他合適的物質。遮蔽劑可以用丙酮、光阻去除劑或其他合適的材料加以去除(例如:溶解、蝕刻等)。
雖然氣體輸送系統的氣體通道內表面塗覆方法已參照具體的實施例詳細描述,熟悉本技藝者將明瞭:在不離開隨附之申請專
利範圍之情況下,可進行各種變化與修改、且可使用等效物。
100‧‧‧電漿處理系統
102‧‧‧腔室
104‧‧‧噴淋頭電極
108‧‧‧進氣口
110‧‧‧電漿
112‧‧‧襯管
114‧‧‧基板
116‧‧‧夾盤
122‧‧‧氣體輸送系統
124a、124f‧‧‧氣體鋼瓶
126‧‧‧質流控制器
128‧‧‧外殼
201‧‧‧風箱
202‧‧‧迴旋段
圖1顯示電漿處理系統的簡化橫剖面圖。
圖2顯示抗腐蝕材料之流體前驅物積聚在風箱迴旋段內。
100‧‧‧電漿處理系統
102‧‧‧腔室
104‧‧‧噴淋頭電極
108‧‧‧進氣口
110‧‧‧電漿
112‧‧‧襯管
114‧‧‧基板
116‧‧‧夾盤
122‧‧‧氣體輸送系統
124a、124f‧‧‧氣體鋼瓶
126‧‧‧質流控制器
128‧‧‧外殼
Claims (17)
- 一種氣體輸送系統之氣體通道之內表面的塗覆方法,該氣體輸送系統被配置來輸送製程氣體到於其中對半導體基板進行處理的電漿處理系統的腔室,該方法包含:(a)使抗腐蝕材料的流體前驅物流過該氣體通道,並沉積一層該流體前驅物,以塗覆該氣體通道之該內表面;(b)去除該內表面上的過量流體前驅物;及(c)使該流體前驅物沉積層固化,以形成抗腐蝕材料塗層,其中該氣體通道將製程氣體輸送到該電漿處理系統的該腔室,且其中該流體前驅物為液體。
- 如申請專利範圍第1項之氣體輸送系統之氣體通道之內表面的塗覆方法,更包含在使該流體前驅物流入之前,先清理該內表面與乾燥該內表面。
- 如申請專利範圍第2項之氣體輸送系統之氣體通道之內表面的塗覆方法,其中:藉由接觸10到20wt.%的硝酸3分鐘和用去離子水沖洗至少5分鐘,來清除氣體通道內表面;及藉由吹入乾燥的氮氣或乾燥的空氣經過該氣體通道,且在至少120℃溫度下的真空烤箱中烘烤該氣體通道,以使該內表面乾燥。
- 如申請專利範圍第1項之氣體輸送系統之氣體通道之內表面的塗覆方法,其中該氣體通道為不鏽鋼配管之形式,其具有0.25英吋以下的外徑。
- 如申請專利範圍第1項之氣體輸送系統之氣體通道之內表面的塗覆方法,其中重複步驟(a)到(c)。
- 如申請專利範圍第1項之氣體輸送系統之氣體通道之內表面的塗覆方法,其中該塗層為抗含鹵素製程氣體者。
- 如申請專利範圍第1項之氣體輸送系統之氣體通道內表面的塗覆方法,其中該抗腐蝕材料塗層之厚度為0.0014到0.0034英吋。
- 一種氣體輸送系統之氣體通道之內表面的塗覆方法,該氣體輸送系統被配置來輸送製程氣體到電漿處理系統的腔室,該方法包含:(a)使抗腐蝕材料的流體前驅物流過該氣體通道,並沉積一層該流體前驅物,以塗覆該氣體通道之該內表面;(b)去除該內表面上的過量流體前驅物;及(c)使該流體前驅物沉積層固化,以形成抗腐蝕材料塗層,其中:該流體前驅物包含一或多個甲基丙烯酸酯;藉由吹入乾燥的氮氣或乾燥的空氣到該氣體通道中,以去除過量流體前驅物;及藉由在溫度為至少100℃及壓力為1到10托耳(Torr)的真空烤箱內烘烤該氣體通道,或者藉由將該氣體通道保持在環境溫度及壓力下至少24小時,以使該流體前驅物沉積層固化。
- 一種氣體輸送系統之氣體通道之內表面的塗覆方法,該氣體輸送系統被配置來輸送製程氣體到電漿處理系統的腔室,該方法包含:(a)使抗腐蝕材料的流體前驅物流過該氣體通道,並沉積一層該流體前驅物,以塗覆該氣體通道之該內表面;(b)去除該內表面上的過量流體前驅物;及(c)使該流體前驅物沉積層固化,以形成抗腐蝕材料塗層,其中該氣體通道為不鏽鋼配管之形式,其具有0.25英吋以下的外徑,且其中將至少一不鏽鋼風箱熔接至該不鏽鋼配管。
- 如申請專利範圍第9項之氣體輸送系統之氣體通道之內表面的塗覆方法,更包含:在將該風箱熔接至該配管之前,以防止該流體前驅物之附著的遮蔽劑塗覆該風箱的內表面;及非必要的,在該固化步驟之後,去除該風箱之該內表面的該遮蔽劑。
- 如申請專利範圍第10項之氣體輸送系統之氣體通道之內表面的塗覆方法,其中該遮蔽劑為光阻、油、矽烷和/或烷氧矽烷。
- 一種氣體輸送系統,被配置來輸送製程氣體進入於其中對半導體基板進行處理的電漿處理系統的腔室內,該氣體輸送系統包含其內表面塗覆有一層抗腐蝕材料塗層的氣體通道,該塗層為藉由將沉積於該內表面上的一層流體前驅物加以固化所形成,其中該流體前驅物為液體。
- 如申請專利範圍第12項之氣體輸送系統,其中該氣體通道為不鏽鋼配管之形式,其具有0.25英吋以下的外徑。
- 如申請專利範圍第12項之氣體輸送系統,其中該塗層為抗含鹵素製程氣體者。
- 一種氣體輸送系統,被配置來輸送製程氣體進入電漿處理系統的腔室內,該氣體輸送系統包含其內表面塗覆有一抗腐蝕材料塗層的氣體通道,該抗腐蝕材料塗層為藉由將沉積於該內表面上的一層流體前驅物加以固化所形成,該氣體輸送系統更包含至少一個熔接至不鏽鋼配管上之不鏽鋼風箱,該不鏽鋼配管中具有有該氣體通道,且該風箱之內表面並未由該塗層加以塗覆。
- 一種電漿處理系統,包含一氣體輸送系統,該氣體輸送系統被配置來輸送製程氣體進入該電漿處理系統的腔室內,該氣體輸送系統包含其內表面塗覆有一抗腐蝕材料塗層的氣體通道,該抗腐蝕材料塗層為藉由將沉積於該內表面上的一層流體前驅物加以固化所形成,其中該氣體輸送系統輸送含鹵素製程氣體進入電漿處理系統的腔室中,且將該製程氣體激發成電漿,以處理被支撐於該腔室中之各半導體基板。
- 如申請專利範圍第16項之電漿處理系統,其中該基板係藉由電漿加以蝕刻。
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- 2011-04-15 JP JP2013506134A patent/JP5855644B2/ja active Active
- 2011-04-15 CN CN201180020177.2A patent/CN102859033B/zh active Active
- 2011-04-15 WO PCT/US2011/000683 patent/WO2011133207A2/en active Application Filing
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Also Published As
Publication number | Publication date |
---|---|
US9689533B2 (en) | 2017-06-27 |
KR20130093515A (ko) | 2013-08-22 |
US20140366968A1 (en) | 2014-12-18 |
CN102859033B (zh) | 2015-06-03 |
SG184948A1 (en) | 2012-11-29 |
WO2011133207A2 (en) | 2011-10-27 |
US20110259519A1 (en) | 2011-10-27 |
JP5855644B2 (ja) | 2016-02-09 |
SG10201503199PA (en) | 2015-06-29 |
JP2013529379A (ja) | 2013-07-18 |
US8852685B2 (en) | 2014-10-07 |
KR101787139B1 (ko) | 2017-10-18 |
CN102859033A (zh) | 2013-01-02 |
TW201209910A (en) | 2012-03-01 |
WO2011133207A3 (en) | 2012-02-23 |
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