TWI417682B - 微細化圖案之形成方法及用於它之光阻基板處理液 - Google Patents
微細化圖案之形成方法及用於它之光阻基板處理液 Download PDFInfo
- Publication number
- TWI417682B TWI417682B TW096138818A TW96138818A TWI417682B TW I417682 B TWI417682 B TW I417682B TW 096138818 A TW096138818 A TW 096138818A TW 96138818 A TW96138818 A TW 96138818A TW I417682 B TWI417682 B TW I417682B
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- Prior art keywords
- pattern
- photoresist
- group
- treatment liquid
- poly
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims description 47
- 239000007788 liquid Substances 0.000 title claims description 45
- 238000004519 manufacturing process Methods 0.000 title description 14
- 229920002120 photoresistant polymer Polymers 0.000 claims description 92
- 238000000034 method Methods 0.000 claims description 55
- 229920003169 water-soluble polymer Polymers 0.000 claims description 22
- 125000003277 amino group Chemical group 0.000 claims description 19
- 238000011161 development Methods 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 238000012545 processing Methods 0.000 claims description 15
- 230000008569 process Effects 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 229920000642 polymer Polymers 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 6
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims description 2
- 239000011342 resin composition Substances 0.000 description 24
- 230000000694 effects Effects 0.000 description 10
- 239000002253 acid Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 230000005855 radiation Effects 0.000 description 8
- 239000000243 solution Substances 0.000 description 7
- 150000001875 compounds Chemical class 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000013461 design Methods 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 3
- 239000003431 cross linking reagent Substances 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 239000003480 eluent Substances 0.000 description 3
- 125000001183 hydrocarbyl group Chemical group 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 229920000083 poly(allylamine) Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- -1 quinonediazide compound Chemical class 0.000 description 3
- 238000007670 refining Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000035945 sensitivity Effects 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
- 239000008199 coating composition Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 239000006184 cosolvent Substances 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- CFIGCTNGOZASTA-UHFFFAOYSA-N 1-ethenylpyrazolidin-3-one Chemical compound C=CN1CCC(=O)N1 CFIGCTNGOZASTA-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- 229920001665 Poly-4-vinylphenol Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical class 0.000 description 1
- DZBUGLKDJFMEHC-UHFFFAOYSA-N benzoquinolinylidene Natural products C1=CC=CC2=CC3=CC=CC=C3N=C21 DZBUGLKDJFMEHC-UHFFFAOYSA-N 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 229940114081 cinnamate Drugs 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 125000005647 linker group Chemical group 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- IOXXVNYDGIXMIP-UHFFFAOYSA-N n-methylprop-2-en-1-amine Chemical compound CNCC=C IOXXVNYDGIXMIP-UHFFFAOYSA-N 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229920002866 paraformaldehyde Polymers 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000001302 tertiary amino group Chemical group 0.000 description 1
- WBYWAXJHAXSJNI-VOTSOKGWSA-M trans-cinnamate Chemical compound [O-]C(=O)\C=C\C1=CC=CC=C1 WBYWAXJHAXSJNI-VOTSOKGWSA-M 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 125000002256 xylenyl group Chemical class C1(C(C=CC=C1)C)(C)* 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/107—Polyamide or polyurethane
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006285312A JP5000260B2 (ja) | 2006-10-19 | 2006-10-19 | 微細化されたパターンの形成方法およびそれに用いるレジスト基板処理液 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200832087A TW200832087A (en) | 2008-08-01 |
| TWI417682B true TWI417682B (zh) | 2013-12-01 |
Family
ID=39313950
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096138818A TWI417682B (zh) | 2006-10-19 | 2007-10-17 | 微細化圖案之形成方法及用於它之光阻基板處理液 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US8101333B2 (enExample) |
| EP (1) | EP2088470B1 (enExample) |
| JP (1) | JP5000260B2 (enExample) |
| KR (1) | KR20090082232A (enExample) |
| CN (1) | CN101523296B (enExample) |
| MY (1) | MY149342A (enExample) |
| TW (1) | TWI417682B (enExample) |
| WO (1) | WO2008047719A1 (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5270840B2 (ja) * | 2007-01-23 | 2013-08-21 | 東京応化工業株式会社 | パターン微細化用被覆形成剤及びそれを用いた微細パターンの形成方法 |
| JP5270839B2 (ja) * | 2007-01-23 | 2013-08-21 | 東京応化工業株式会社 | パターン微細化用被覆形成剤及びそれを用いた微細パターンの形成方法 |
| JP5154395B2 (ja) * | 2008-02-28 | 2013-02-27 | 東京エレクトロン株式会社 | 半導体装置の製造方法及びレジスト塗布・現像処理システム |
| JP5306755B2 (ja) * | 2008-09-16 | 2013-10-02 | ＡｚエレクトロニックマテリアルズＩｐ株式会社 | 基板処理液およびそれを用いたレジスト基板処理方法 |
| JP5705669B2 (ja) | 2011-07-14 | 2015-04-22 | メルクパフォーマンスマテリアルズＩｐ合同会社 | 微細パターン形成用組成物およびそれを用いた微細化されたパターン形成方法 |
| JP5758263B2 (ja) * | 2011-10-11 | 2015-08-05 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ | 微細レジストパターン形成用組成物およびそれを用いたパターン形成方法 |
| CN104871289B (zh) | 2012-12-14 | 2017-10-10 | 巴斯夫欧洲公司 | 包含表面活性剂和疏水化剂的组合物在处理线间距尺寸为50nm或更低的图案化材料时避免图案崩塌的用途 |
| JP6157151B2 (ja) * | 2013-03-05 | 2017-07-05 | アーゼッド・エレクトロニック・マテリアルズ（ルクセンブルグ）ソシエテ・ア・レスポンサビリテ・リミテ | 微細レジストパターン形成用組成物およびそれを用いたパターン形成方法 |
| JP6459759B2 (ja) * | 2014-05-26 | 2019-01-30 | 信越化学工業株式会社 | パターン形成方法及びシュリンク剤 |
| KR101658066B1 (ko) * | 2014-07-24 | 2016-09-20 | 금호석유화학 주식회사 | 미세 패턴 형성용 코팅 조성물 및 이를 이용한 미세 패턴 형성 방법 |
| TWI682250B (zh) * | 2014-10-17 | 2020-01-11 | 日商東京應化工業股份有限公司 | 光阻圖型形成方法 |
| JP6455369B2 (ja) * | 2014-10-30 | 2019-01-23 | 信越化学工業株式会社 | パターン形成方法及びシュリンク剤 |
| JP6455370B2 (ja) * | 2014-10-30 | 2019-01-23 | 信越化学工業株式会社 | パターン形成方法及びシュリンク剤 |
| JP6503206B2 (ja) | 2015-03-19 | 2019-04-17 | 東京応化工業株式会社 | レジストパターン修復方法 |
| US10613435B2 (en) | 2015-03-31 | 2020-04-07 | Nissan Chemical Industries, Ltd. | Coating solution for resist pattern coating and method for forming pattern |
| JP6520753B2 (ja) * | 2016-02-19 | 2019-05-29 | 信越化学工業株式会社 | ポジ型レジスト材料、及びパターン形成方法 |
| KR101806748B1 (ko) | 2016-12-02 | 2017-12-07 | 에스케이하이닉스 주식회사 | 포토레지스트 패턴 코팅용 조성물 및 이를 이용한 미세패턴 형성 방법 |
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| JP2005148597A (ja) * | 2003-11-19 | 2005-06-09 | Tokyo Ohka Kogyo Co Ltd | パターン微細化用被覆形成剤およびそれを用いた微細パターンの形成方法 |
| JP2006011054A (ja) * | 2004-06-25 | 2006-01-12 | Shin Etsu Chem Co Ltd | リンス液及びこれを用いたレジストパターン形成方法 |
| TW200614345A (en) * | 2004-08-20 | 2006-05-01 | Tokyo Ohka Kogyo Co Ltd | Over-coating agent for forming fine patterns and a method of forming fine patterns using such agent |
| TW200628980A (en) * | 2004-10-26 | 2006-08-16 | Az Electronic Materials Usa | A composition for coating over a photoresist pattern |
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| US3700623A (en) * | 1970-04-22 | 1972-10-24 | Hercules Inc | Reaction products of epihalohydrin and polymers of diallylamine and their use in paper |
| US3833531A (en) * | 1970-04-22 | 1974-09-03 | Hercules Inc | Reaction products of epihalohydrin and polymers of diallylamine and salts thereof and their use in paper |
| US4053512A (en) * | 1976-08-02 | 1977-10-11 | American Cyanamid Company | Process for preparing poly(allyltrialkylammonium) salt flocculants |
| US4350759A (en) * | 1981-03-30 | 1982-09-21 | Polaroid Corporation | Allyl amine polymeric binders for photographic emulsions |
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| JPH0615593B2 (ja) * | 1987-01-07 | 1994-03-02 | 工業技術院長 | 含フツ素高分子化合物 |
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| US5326672A (en) * | 1992-04-23 | 1994-07-05 | Sortec Corporation | Resist patterns and method of forming resist patterns |
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- 2007-10-12 CN CN2007800383435A patent/CN101523296B/zh not_active Expired - Fee Related
- 2007-10-12 WO PCT/JP2007/069977 patent/WO2008047719A1/ja not_active Ceased
- 2007-10-12 US US12/311,725 patent/US8101333B2/en not_active Expired - Fee Related
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Also Published As
| Publication number | Publication date |
|---|---|
| US20100021700A1 (en) | 2010-01-28 |
| TW200832087A (en) | 2008-08-01 |
| EP2088470B1 (en) | 2017-10-04 |
| EP2088470A4 (en) | 2010-10-20 |
| MY149342A (en) | 2013-08-30 |
| CN101523296A (zh) | 2009-09-02 |
| JP2008102348A (ja) | 2008-05-01 |
| US8101333B2 (en) | 2012-01-24 |
| EP2088470A1 (en) | 2009-08-12 |
| KR20090082232A (ko) | 2009-07-29 |
| CN101523296B (zh) | 2012-05-30 |
| WO2008047719A1 (en) | 2008-04-24 |
| JP5000260B2 (ja) | 2012-08-15 |
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