TWI355709B - - Google Patents
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- TWI355709B TWI355709B TW094112783A TW94112783A TWI355709B TW I355709 B TWI355709 B TW I355709B TW 094112783 A TW094112783 A TW 094112783A TW 94112783 A TW94112783 A TW 94112783A TW I355709 B TWI355709 B TW I355709B
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- peeling
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- 238000001179 sorption measurement Methods 0.000 claims description 89
- 230000001681 protective effect Effects 0.000 claims description 37
- 239000000853 adhesive Substances 0.000 claims description 27
- 230000001070 adhesive effect Effects 0.000 claims description 27
- 235000012431 wafers Nutrition 0.000 description 61
- 206010040844 Skin exfoliation Diseases 0.000 description 57
- 238000005192 partition Methods 0.000 description 11
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000009423 ventilation Methods 0.000 description 4
- 239000002390 adhesive tape Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000032683 aging Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/6834—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used to protect an active side of a device or wafer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
- H01L2221/68395—Separation by peeling using peeling wheel
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/30—Technical effects
- H01L2924/301—Electrical effects
- H01L2924/3025—Electromagnetic shielding
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1126—Using direct fluid current against work during delaminating
- Y10T156/1132—Using vacuum directly against work during delaminating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/11—Methods of delaminating, per se; i.e., separating at bonding face
- Y10T156/1168—Gripping and pulling work apart during delaminating
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1928—Differential fluid pressure delaminating means
- Y10T156/1944—Vacuum delaminating means [e.g., vacuum chamber, etc.]
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/19—Delaminating means
- Y10T156/1978—Delaminating bending means
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Dicing (AREA)
Description
1355709 九、發明說明 【發明所屬之技術領域】 本發明係關於保持在其一面黏貼有黏著薄片之板狀構 件的吸附裝置,更詳細爲關於可容易且迅速地將黏貼於板 狀構件的另一面之保護帶予以剝離之吸附裝置。 【先前技術】 習知上,表面側成爲電路面之略圓盤狀的半導體晶圓 (以下,簡單稱爲「晶圓」)爲所知悉。此晶圓一般係在 前述電路面黏貼保護帶後,藉由硏磨機等對背面側做切削 加工而來調整厚度。然後,在突出環狀框架的內側之切片 帶的黏著面側貼合晶圓的背面側之狀態,將保護帶由晶圓 的表面側加以剝離,之後,藉由將該晶圓切斷爲骰子塊狀 而形成半導k晶片。 如此,由晶圓將保護帶剝離之裝置,以如第1 2圖所示 形式.爲所知悉。該裝置係具備:將上面側當成吸附面50, 藉由吸附切片帶T而保持晶圓W之吸附裝置51 ;及將被保 持於此吸附裝置5 1之晶圓W的保護帶Η予以剝離之剝離單 元53所構成。剝離單元53係具備捲繞在省略圖示之供給捲 軸及捲取捲軸間被送出的帶狀之剝離用帶Ρ的輥輪54,介 由該輥輪54而將剝離用帶Ρ黏貼於保護帶Η之外周緣後, 一面捲取剝離用帶Ρ—面沿著保護帶Η之直徑方向而使輥 輪54轉動,藉此,保護帶Η由晶圓W被剝離。 此種裝置的問題點係如第1 2圖所示般,在將剝離用帶 -5- 1355709 P黏貼於保護帶η的外周緣時’輥輪54彈性變形’剝離用 帶Ρ及切片帶Τ黏著’在此狀態下’ 一開始保護帶Η的剝離 時,會損傷晶圓w。 因此,作爲解除前述問題之裝置,例如以專利文獻1 所揭示之形式爲所周知。在同文獻中’在前述吸附裝置的 附近位置設置有可遮蔽切片帶的黏著面側(上面側)之遮 罩板。此遮罩板係設置成在介由前述輥輪而將剝離用帶黏 貼於保護帶的外周緣時,可以防止剝離用帶黏著於切片帶 ,另外,在將保護帶剝離前後,可由吸附裝置的上方轉動 _於退避位置..... - - -- …… [專利文獻1]日本專利特開200 1 -3 1 9906號公報 1J 容 內 明 發 [發明所欲解決之課題] 但是,在專利文獻1之構造中,爲了使遮罩板移動, 構造之零件數目增加,而產生導致裝置的複雜化之不便。 而且,每次更換吸附面上的晶圓時,需要移動遮罩板而遮 蔽切片帶、使遮罩板退避於吸附裝置的外側,導致保護帶 之剝離處理所需要的時間變長之不便。 另外,對於環狀框架,藉由使用使晶圓上升之升降裝 置,將切片帶保持爲傾斜姿勢,以防止剝離用帶與保護帶 之接著的構造也爲所知悉,但是,即使藉此,也有導致升 降裝置的複雜化或晶圓之上升工程所引起的剝離處理之長 時間化的不便。 -6- 1355709 [發明目的] 本發明係著眼於此不便而提出之發明,其目的在於提 供:可達成裝置的簡化,且黏貼於板狀構件之保護帶的剝 離時,可迅速且順利地進行該剝離之吸附裝置。 [解決課題用手段] 爲了達成前述目的,本發明係一種吸附裝置,是藉由 吸附黏著薄片來保持板狀構件,該黏著薄片係被黏貼於板 狀構件的一面,且具備由該板狀構件的外周突出之平面形 狀,爲採用如下構造:包含有, 具備藉由進行特定之吸氣來吸附前述黏著薄片之吸附 面之圓盤, 沿著前述板狀構件的外周之至少一部份區域形成有溝 〇 在本發明中,可合適地採用以下構造:前述圓盤係具 備:具位於與吸附面略同一面上之區域的圓盤本體、及設 s在此圓盤本體的區域內,且形成有前述吸附面之吸附構 件, 前述吸附面係具備對應板狀構件的平面形狀之平面形 狀,且沿著吸附面之外周的圓盤本體係形成有前述溝。 另外,前述溝以採用由吸附面的面內中央部沿著連結 外周之方向,隔以特定間隔而形成多數個之構造爲佳。 另外,也可採用:前述板狀構件的另一面係介由帶狀 1355709 的剝離用帶而黏貼有可剝離之保護帶: 前述溝的延長長度係被設定爲比剝離用帶的短邊寬度 更大之構造。 進而,本發明係一種吸附裝置,是使用於剝離保護帶 之裝置,該保護帶係被黏貼於介由切片帶而被支撐於環狀 框架之晶圓的上面,也可採用如下構造:包含有, 具備藉由特定之吸氣來吸附前述切片帶,以保持晶圓 之吸附面之圓盤, 沿著前述晶圓的外周之至少一部份區域係形成有溝。 [發明效果] 如依據本發明,如由應吸附黏著薄片之吸附面進行吸 氣,由該吸附面之外側的黏著薄片與溝之間朝吸附面吸氣 。藉由此吸氣,溝的內部空間之壓力降低,重疊於溝上之 黏著薄片進入該溝內而下沈。因此,例如,在板狀構件的 另一面黏貼保護帶,利用彈性變形之輥輪而將剝離該保護 帶之剝離用帶黏貼於保護帶的外側緣時,藉由前述黏著薄 片之下沈,該黏著薄片會由剝離用帶分開,這可防止非故 意之黏著。藉此,不需要移動如習知之遮罩板或板狀構件 之構造,透過零件數目之減少,可使裝置簡化之外,可使 爲了不使剝離用帶與黏著膠帶黏著之移動遮罩板的步驟, 能達成剝離所需要之處理時間的縮短化。 另外,吸附面具備有對應板狀構件的平面形狀之平面 形狀,溝係沿著該吸附面的外周而存在,因此,可使吸附 -8 - 1355709 面和溝接近,能有效率地降低藉由前述吸氣所致之溝內的 壓力,可更確實地防止前述之黏著薄片與剝離用帶的黏著 〇 進而’由吸附面的面內中央部沿著連結外周之方向形 成有多數溝’即使在保持種種平面尺寸之板狀構件時,可 對應此而使溝位於沿著板狀構件的外周之位置,可以提升 吸附裝置的泛用性。 另外’使溝的延長長度比剝離用帶的短邊寬度更大, 因此,可在剝離用帶的短邊寬度全體使黏著薄片下沈,可 進一步確實地避免這些之黏著,能順利地進行保護帶之剝 離。 【實施方式】 以下’一面參考圖面一面說明本發明之實施形態。 [第1實施形態] 第1圖係表示使用第1實施形態之吸附裝置的剝離裝置 之槪略構造圖。在此圖中,剝離裝置10係具備:介由延伸 於第1圖中左右方向之滑塊11而可移動地被支撐之吸附裝 置12;及設置在此吸附裝置12之上方的剝離手段13而構成 〇 當成被前述吸附裝置12所支撐之板狀構件的晶圓W, 係如第2圖及第3圖所示般,形成爲略圓盤狀之同時,還介 由作爲黏著薄片之切片帶τ而被環狀框架R所支撐。具體 1355709 爲··切片帶T係在其之上面具備黏著面τι,介由此黏著面 Τ1而被黏貼於晶圓W的背面(下面)。切片帶Τ係被形成 爲比晶圓W更大的平面積,具備由晶圓W的外周突出之平 面形狀,外周側被黏貼於環狀框架R的(下面)。晶圓W 的外周與環狀框架R的內周之間係存在成爲略圆環狀之間 隙S,環狀框架R之黏著面Τ1由該間隙S露出。另一方面’ 在晶圓W的表面(上面)黏貼有保護帶Η,此保護帶Η係在 前步驟中,沿著晶圓W的外周被切斷,而形成爲與該晶圓 W略同一形狀。 -如第1圖I示-般,前述吸附裝置12係包含:士―面具I 吸附前述切片帶Τ之吸附面15的圓盤16;及由下側支撐此 圓盤16之同時,還被安裝於前述滑塊11而可左右方向移動 之支撐體17所構成。 前述圓盤16係如第2圖、第4圖及第5圖所示般,被形 成爲平面視圖略圓形之同時,具備:於上部具有凹部19Α 之有底容器狀的圓盤本體19;及設置在此圓盤本體19的區 域內,即前述凹部19Α的內側而由多孔質構件所形成之吸 附構件20:及連接於圓盤本體19的下面側之軟管21所構成 。吸附構件20係被形成爲對應晶圓W之平面形狀,即與晶 圓W略同一平面形狀,其上面被形成爲前述吸附面15。 前述圓盤本體19係於上面具備位於與吸附構件20的上 面略同一面上之區域,該區域係被設爲由下側支撐由晶圓 W的外周突出之切片帶Τ及環狀框架R之支撐面23。於此支 撐面23係設置有介由少許之間隙而與吸附面1 5的第4圖中 -10- 1355709 右端鄰接之溝24。此溝2 4係被形成爲沿著吸附面15的外周 ’即晶圓W的外周而延伸之平面視圖略圓弧狀,其之延伸 方向中間部係被設定爲在保護帶Η的剝離時之吸附裝置12 的移動方向最前端,即第4圖中最靠右。溝24的延長長度 係被設定爲比後述的剝離用帶Ρ之短邊寬度更大(參考第4 圖),另一方面,溝24的寬度wl(參考第2圖)係被設定爲 比前述間隙S之沿著晶圓W之直徑方向的寬度W2更小。另 外,溝24係如第5圖及第6圖所示般,被形成爲於沿著吸附 面1 5之直徑方向的剖面視圖爲略凹狀。 圓盤本體19之凹部19A的底部係設置有多數的通氣溝 25,這些通氣溝25係被設置爲與前述軟管21連通。因此, 藉由使被連接於軟管21之減壓泵(省略圖示)動作,介由 各通氣溝25,由吸附構件20的通氣溝25略全區域吸引空氣 ,可以發揮吸附力。 如第1圖所示般,前述剝離手段1 3係被設置爲利用與 保護帶Η相向之面被設爲黏著面之剝離用帶P可由晶圓W剝 離保護帶Η。此剝離手段13係被設置於吸附裝置12之上方 的同時,且具備:正面視圖形成爲橫向略L字狀之支撐板 27;及設置在此支撐板27與吸附裝置12之間,且供給剝離 用帶Ρ之供給捲輪28 ;及被支撐在支撐板27的第1圖中右側 之同時,還將由供給捲輪28所送出之剝離用帶Ρ按壓於保 護帶Η之按壓裝置29;及被支撐於支撐板27之第1圖中上 部左側之同時,還通過按壓裝置29而捲取剝離用帶Ρ之捲 取捲輪30而構成。 -11 - 1355709 由前述供給捲輪28所送出之剝離用帶P係介由被配置 於該供給捲輪28的下側之導引輥輪32而被捲繞於按壓裝置 29。按壓裝置29係具備··朝上下方向之氣缸33;及與此氣 缸33的氣缸桿33A連結’且在上下方向移動之保持構件34 :及可旋轉地被支撐於此保持構件34的下側之同時’由前 述導引輥輪32延伸之剝離用帶P被捲繞之按壓輥輪35而構 成。保持構件34設置有位在按壓輥輪35之上側之2個輥輪 36、36,介由這些輥輪36、36而被捲繞於按壓輥輪35之剝 離用帶P被引導於上方。 被捲繞於前述按壓裝置29之剝儺甩帶P係被-支提板27 所支撐,經過藉由位於前述支撐板27之背面側之電動機40 而驅動之驅動輥輪38,及被以氣.缸42所夾住之夾緊輥輪41 之間,而被捲繞於捲取捲輪30。此捲取捲輪3 0係被設置爲 可介由位於支撐板27的背面側之電動機39而可以旋轉。另 外,剝離用帶P之由供給捲輪28對捲取捲輪30之送出力量 之給予,係以電動機40所進行,由此所被送出之剝離用帶 P係藉由電動機39而被捲繞而受控制。 接著,說明依據前述剝離裝置10之保護帶Η的剝離步 驟。 首先,介由未圖示出之安裝裝置,將第2圖所示狀態 之晶圓W配置於圓盤16上,使得晶圓W的外周與吸附面15 的外周略一致。接著,使減壓泵(省略圖示)動作,藉由 吸附面15進行吸氣,吸附該吸附面15上之切片帶Τ而保持 晶圓W。此時,通過支撐面23與切片帶Τ之間,空氣被吸 -12- 1355709 引於吸附面15之同時,沿著吸附面15之溝24內的空氣也被 吸引。此溝24係一面藉由切片帶T而由上方被堵住而一面 內部的空氣被吸引,溝24的內部成爲負壓,如第5圖、第6 圖及第9圖所示般,切片帶T進入溝24內而下沈,此下沈狀 態在進彳了吸氣之間係被維持著。 如此,於吸附裝置12的吸附面15吸附切片帶T後,沿 著滑塊11而使吸附裝置12移動。然後,如第6圖所示般, 與溝24鄰接之晶圓W的外緣部(第6圖中右端部)到達按 壓裝置29之按壓輥輪35的略正下方時,吸附裝置12的移動 停止。之後,如第7圖所示般,介由氣缸33之氣缸桿33A 而使按壓輥輪35移動於下方,使被捲繞於該按壓輥輪35之 剝離用帶P與黏貼在晶圓W上之保護帶Η抵接。藉此,剝離 用帶Ρ的黏著面與保護帶Η的外緣部(第6圖中右端部)黏 著,重疊於溝24之切片帶Τ下沈如由剝離用帶Ρ退避般,即 使是彈性變形之按壓輥輪35,也得以防止剝離用帶Ρ與切 片帶Τ非故意地接著(參考第9圖)。 接著,介由滑塊11而使吸附裝置12移動於第7圖中右 方向,同時,轉動驅動輥輪38而使剝離用帶Ρ送出第7圖中 箭頭方向。此時,吸附裝置12的移動速度與剝離用帶Ρ的 送出速度被控制爲略相同。藉此,如第8圖所示般,按壓 輥輪35 —面在保護帶Η上轉動,一面沿著保護帶Η的直徑 方向黏著剝離用帶Ρ,介由按壓輥輪35而使保護帶Η被黏 著於剝離用帶Ρ之狀態下被捲取,使得保護帶Η依序由晶 圓W被剝離。 -13- 1355709 因此,如依據此種第1實施形態,藉由在圓盤本體16 設置溝24之極爲簡單的構造,只進行藉由吸附面15之通常 的吸氣,使切片帶T下沈,能避免與剝離用帶P之接著,能 順利地進行保護帶Η之剝離。 [第2實施形態] 接著,說明本發明之第2實施形態。另外’在以下之 說明中,針對與前述第1實施形態相同或同等之構造部份 ,因應需要而使用同一符號,省略或簡化說明。 第10圖及第1 1讎係表示本潑明之吸附裝置的第2實施 形態。此第2實施形態之特徵爲:在第1實施形態之吸附面 15的面內形成多數的溝44。 第2實施形態之吸附構件20係設置有位於與吸附面1 5 的外周略同心圓上之三個隔壁部45,藉由這些隔壁部45, 吸附構件20被切割爲成爲平面視圖甜甜圈形之三個圓環體 46 ;及位於最內側之隔壁部45的內方之圓盤體47。各隔壁 部45的平面形狀係被設定爲與直徑尺寸不同之各種的晶圓 W的平面形狀略相同。此處,於各圓環體46係沿著隔壁部 45的外周而形成有前述溝44,這些溝44及溝24係由吸附面 15的面內中央部沿著連結外周之方向,即吸附面15的直徑 方向,相隔特定間隔而形成。形成於各圓環體46之溝44的 延長長度及寬度係被設定爲與前述溝2 4略相同尺寸。 另外,如第1 1圖所示般,在與晶圓W重疊之位置的溝 44之內部配置有與吸附面15略面一致之塡充構件F。該塡 -14- 1355709 充構件F係設置爲對於溝44可裝脫自如,同時,在吸附面 15上保持晶圓W時’藉由溝44的形成緣部,可防止晶圓W 的第11圖中下面受到損傷。 如第11圖所示般,於圓盤本體19之各圓環體4 6與圓盤 體4 7之下側分別設置有連接於軟管48之吸氣孔49 »各軟管 48係介由未圖示出之電磁閥而分別與減壓泵連接,藉由開 關該電磁閥,各圓環體46與圓盤體47可獨立地進行吸氣之 調整。此時,在相鄰之各圓環體46及圓盤體47間,空氣的 流動係藉由隔壁部45而被遮斷。 在以上之構造中,例如如第1 0圖所示般,在吸附與最 外側之隔壁部45的平面形狀略相同之晶圓W時,首先,於 與晶圓W重疊之位置的溝44的內部設定塡充構件F (參考 第11圖)。另外,介由前述電磁閥(省略圖示)而只使最 外側之圓環體46停止吸氣,由其以外之圓環體46及圓盤體 47進行吸氣控制。 在此狀態中,將晶圓W的外周與最外側之隔壁部45略 —致,如第10圖所示之狀態的晶圓W配置於圓盤16上。藉 此,藉由進行吸氣之圓環體46及圓盤體47而吸附切片帶T ,如此保持晶圓W。此時,與第1實施形態之溝24相同’ 形成在最外側之圓環體46,且沿著晶圓W的外周之溝44內 的空氣被吸引,切片帶T進入該溝44內而下沈。 另外,晶圓W的平面形狀也可變更,例如,與第1實 施形態同樣地,設爲和吸附構件20的外周略同一尺寸’也 可設爲與最內側的隔壁部45或位於中間之隔壁部45略同一 -15- 1355709 尺寸。在此情形,在與晶圓W重疊之位置有溝44之情形’ 可於其內部設定塡充構件F之同時,使不與晶圓W重疊之 圓環體46的吸氣停止,如此做控制即可。藉此,對應種種 晶圓W之平行形狀,於沿著該晶圓W的外周之溝44內可使 切片帶T下沈。 因此,如依據此第2實施形態,即使是變更晶圓W的 平面形狀時,沿著晶圓W的外周而有某一溝24、44存在’ 可使切片帶T下沈。藉此,可以獲得與第1實施形態同樣的 效果之外,也可提高對於晶圓W的平面形狀之泛用性。 構成本發明之-最好的-構造—、方-法等,雖以-以土-之記載 所揭示,但是,本發明並不限定於此。 即本發明雖係主要關於特定之實施形態而特別圖示之 ,且做說明,但是,在不脫離本發明之技術思想及目的的 範圍內,對於以上所述之實施形態,於形狀、數量、材質 、其它之詳細構造中,該業者可加上種種之變形》 例如,前述吸附構件20可做種種之設計變更,例如, 可設爲吸附面15的面內設置進行吸氣之多數的孔之構造。 另外,前述溝24之形成位置並不限於圖示構造例,例 如,平面視圖爲環狀形成於沿著吸附面15的外周之略全區 域、分別形成在沿著吸附面15之直徑方向的剝離用帶P之 開始貼合部份與結束貼合部份之兩側等,也可形成於圓盤 本體16之支撐面23的多數處所。 進而,雖說明將前述切片帶T黏貼於環狀框架R之情 形,但是,只要切片帶T具備由晶圓W的外周突出之平面 -16- 1355709 形狀,也可省略環狀框架R。 另外,在前述第1實施形態中,雖於吸附構件20和溝 24之間存在有少許之間隙,也可形成溝24而不設置該間隙 〇 進而,前述第2實施形態之溝44、隔壁部45及圓環體 46之形成數目,可因應需要而適當增減。 另外,雖說明使吸附裝置12移動而進行保護帶Η的剝 離之情形,但是,也可以將捲繞於剝離用帶Ρ之按壓輥輪 35在保護帶Η上移動之構造代替。總之,伴隨剝離用帶Ρ 之送出,使吸附裝置12與按壓輥輪35可相對移動而設置即 可。 [產業上之利用可能性] 本發明主要係被使用於利用剝離用帶而將被黏貼於晶 圓等板狀構件之保護帶加以剝離之裝置。 【圖式簡單說明】 第1圖係使用第1實施形態之吸附裝置之剝離裝置的槪 略構造圖。 第2圖係構成吸附裝置之圓盤及被其吸附之晶圓等之 槪略斜視圖。 第3圖係沿著第2圖之A-Α線之剖面圖。· 第4圖係圓盤之平面圖。 第5圖係沿著第4圖之B-B線之剖面圖。 •17- 1355709 第6圖係剖開第1圖之一部份而觀看之重要部位放大圖 〇 第7圖係與表示由晶圓將保護帶剝離之起始狀態之第6 圖相同的放大圖。 第8圖係與表示由晶圓將保護帶剝離之中間狀態之第6 圖相同的放大圖。 第9圖係放大第7圖的一部份之說明圖。 第10圖係構成第2實施形態之吸附裝置的圓盤及被其 吸附之晶圓等之與第2圖相同的斜視圖。 ..........第1 1圖係第2實施形態之剝灕裝置之與第7圖枏同_的放- 大圖。 第1 2圖係習知例之與第9圖相同的說明圖。 【主要元件符號說明】 1 2 :吸附裝置 1 5 :吸附面 1 6 :圓盤 19 :圓盤本體 19A :凹部 2〇 :吸附構件 23 :支撐面 24 :溝 25 :通氣溝 29 :按壓裝置 -18- 1355709 33A :氣缸桿 34 :保持構件 35 :按壓輥輪 3 6 : _ 輪 44 :溝 Η :保護帶 Ρ :剝離用帶 R :環狀框架 Τ:切片帶(黏著膠帶) Τ1 :黏著面 W :晶圓(板狀構件)
Claims (1)
1355709 十、申請專利範圍 1· 一種吸附裝置,係藉由吸附黏著薄片來保持板狀構 件者,該黏著薄片係被黏貼於板狀構件的一面,且具備由 該板狀構件的外周突出之平面形狀’同時’在該板狀構件 之另一面藉由帶狀之剝離用帶而黏貼有可以剝離之保護帶 的板狀構件之上述黏著薄片者’其特徵爲:包含有’ 具備藉由進行特定之吸氣來吸附前述黏著薄片之吸附 面之圓盤; 在沿著前述板狀構件的外周之至少一部份區域’形成 有延長長度設爲大於士-述剝離用帶之短邊寬度价溝,一 一 前述圓盤係具備:具有位於與吸附面略同一面上之區 域的圓盤本體;及設置在此圓盤本體的區域內,用於形成 前述吸附面之吸附構件; 前述吸附面係具備對應於板狀構件的平面形狀之平面 形狀,在沿著上述吸附面之外周的圓盤本體形成有前述溝 2.—種吸附裝置,係藉由吸附黏著薄片來保持板狀構 件者,該黏著薄片係被黏貼於板狀構件的一面,且具備由 該板狀構件的外周突出之平面形狀,同時,在該板狀構件 之另一面藉由帶狀之剝離用帶而黏貼有可以剝離之保護帶 的板狀構件之上述黏著薄片者,其特徵爲:包含有, 具備藉由進行特定之吸氣來吸附前述黏著薄片之吸附 面之圓盤; 在沿著前述板狀構件的外周之至少一部份區域,形成 -20- 1355709 有延長長度設爲大於上述剝離用帶之短邊寬度的溝, 前述圓盤係具備:具有位於與吸附面略同一面上之區 域的圓盤本體;及設置在此圓盤本體的區域內,用於形成 前述吸附面之吸附構件; 在前述吸附面形成有沿著上述板狀構件之外周的前述 溝0 3 .如申請專利範圍第2項所記載之吸附裝置,前述溝 係由吸附面的面內中央部沿著連結外周之方向,隔開特定 間隔而形成多數個。 -21 -
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KR102069851B1 (ko) * | 2013-03-26 | 2020-01-28 | 삼성디스플레이 주식회사 | 디라미네이션 장치 및 이를 포함하는 인라인 열전사 시스템 |
KR101969092B1 (ko) * | 2013-04-10 | 2019-04-16 | 삼성디스플레이 주식회사 | 디라미네이션 장치 및 이를 포함하는 인라인 열전사 시스템 |
CN103317824A (zh) * | 2013-06-19 | 2013-09-25 | 深圳市华星光电技术有限公司 | 离型纸剥离装置 |
JP6104075B2 (ja) * | 2013-06-28 | 2017-03-29 | 日本特殊陶業株式会社 | 真空吸着装置およびその製造方法 |
JP6340249B2 (ja) * | 2014-05-28 | 2018-06-06 | 株式会社荏原製作所 | テープ貼り付け装置およびテープ貼り付け方法 |
JP2016147342A (ja) * | 2015-02-12 | 2016-08-18 | 株式会社ディスコ | 加工装置のチャックテーブル |
JP6704794B2 (ja) * | 2016-05-30 | 2020-06-03 | 株式会社ディスコ | 保護膜形成装置 |
JP2017224671A (ja) * | 2016-06-14 | 2017-12-21 | 株式会社ディスコ | 剥離装置 |
KR20210116770A (ko) * | 2020-03-13 | 2021-09-28 | 삼성전자주식회사 | 펠리클 전사 장치 및 펠리클 전사 방법 |
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JPS5930631A (ja) * | 1982-08-13 | 1984-02-18 | Hitachi Ltd | 吸着保持装置 |
US5180000A (en) * | 1989-05-08 | 1993-01-19 | Balzers Aktiengesellschaft | Workpiece carrier with suction slot for a disk-shaped workpiece |
KR19990028523A (ko) * | 1995-08-31 | 1999-04-15 | 야마모토 히데키 | 반도체웨이퍼의 보호점착테이프의 박리방법 및 그 장치 |
JP2001319906A (ja) * | 2000-05-11 | 2001-11-16 | Takatori Corp | ウエハ表面保護テープの剥離装置 |
JP4739584B2 (ja) * | 2001-07-05 | 2011-08-03 | リンテック株式会社 | 剥離装置 |
JP4026680B2 (ja) * | 2001-12-07 | 2007-12-26 | 株式会社ディスコ | 板状物支持部材及びその使用方法 |
JP2003209082A (ja) * | 2002-01-15 | 2003-07-25 | Nitto Denko Corp | 保護テープの貼付方法およびその装置並びに保護テープの剥離方法 |
JP3983053B2 (ja) * | 2002-01-17 | 2007-09-26 | 日東電工株式会社 | 保護テープの切断方法およびそれを用いた保護テープ貼付装置 |
JP2004128115A (ja) * | 2002-10-01 | 2004-04-22 | Hitachi Chem Co Ltd | 減圧固定用フィルム、ウエハ保護フィルム、ダイシングフィルム及び半導体装置の製造方法 |
JP2005175384A (ja) * | 2003-12-15 | 2005-06-30 | Nitto Denko Corp | 保護テープの貼付方法及び剥離方法 |
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2005
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- 2005-04-20 EP EP05734627A patent/EP1742254A1/en not_active Withdrawn
- 2005-04-20 CN CNB2005800127251A patent/CN100437928C/zh not_active Expired - Fee Related
- 2005-04-20 US US11/578,990 patent/US7798195B2/en active Active
- 2005-04-20 KR KR1020067021007A patent/KR20070004027A/ko not_active Application Discontinuation
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JP4297829B2 (ja) | 2009-07-15 |
TW200603332A (en) | 2006-01-16 |
CN1947226A (zh) | 2007-04-11 |
CN100437928C (zh) | 2008-11-26 |
US20070169895A1 (en) | 2007-07-26 |
EP1742254A8 (en) | 2007-02-21 |
JP2005311176A (ja) | 2005-11-04 |
WO2005104201A1 (ja) | 2005-11-03 |
US7798195B2 (en) | 2010-09-21 |
EP1742254A1 (en) | 2007-01-10 |
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