TWD156909S - 半導體製造用反應爐之氣體分離板(一) - Google Patents

半導體製造用反應爐之氣體分離板(一)

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Publication number
TWD156909S
TWD156909S TW100301722F TW100301722F TWD156909S TW D156909 S TWD156909 S TW D156909S TW 100301722 F TW100301722 F TW 100301722F TW 100301722 F TW100301722 F TW 100301722F TW D156909 S TWD156909 S TW D156909S
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Taiwan
Prior art keywords
fan
groove
view
semiconductor substrate
sectional
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TW100301722F
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English (en)
Inventor
Manabu Honma
Katsuyuki Hishiya
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東京威力科創股份有限公司
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Publication of TWD156909S publication Critical patent/TWD156909S/zh

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Abstract

【物品用途】;本創作係一種對半導體基板表面依序供給複數反應氣體而製膜的反應爐所組裝之氣體分離板。;【創作特點】;本創作具有形狀略呈圓形之中心體,中心體周圍向外延伸設置有兩片扇形板,兩片扇形板於同一側面設置有徑向之凹溝,中心體對應於凹溝之側面形成有階梯狀之圓形凹部,且對應於圓形凹部之另一側面邊緣則形成有複數個凹口,兩扇形板形成有凹溝之一側面側邊各朝該凹口方向形成有徑向之凹槽且各扇形板於凹溝兩側各形成有一圓形穿孔,藉此以呈現出不同的視覺感受。利用本分離板以將從反應爐本體周壁複數位置所設置之氣體供應口所供應之種類不同的氣體不混合地對流於既定區域,藉由載置板的旋轉,能使半導體基板依序接觸至不同的反應氣體。;使用狀態參考剖面圖係表示本創作配置連接於半導體基板之載置板上面的狀態。A-A線剖面圖係前視圖A-A線之剖面。
TW100301722F 2010-10-21 2011-04-14 半導體製造用反應爐之氣體分離板(一) TWD156909S (zh)

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