USD1005974S1 - Gas distributor for semiconductor manufacturing apparatus - Google Patents

Gas distributor for semiconductor manufacturing apparatus Download PDF

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Publication number
USD1005974S1
USD1005974S1 US29/839,254 US202229839254F USD1005974S US D1005974 S1 USD1005974 S1 US D1005974S1 US 202229839254 F US202229839254 F US 202229839254F US D1005974 S USD1005974 S US D1005974S
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US
United States
Prior art keywords
manufacturing apparatus
semiconductor manufacturing
gas distributor
view
distributor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/839,254
Inventor
JinHo Shin
Jaehyun Kim
Jeongho Lee
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASM IP Holding BV
Original Assignee
ASM IP Holding BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASM IP Holding BV filed Critical ASM IP Holding BV
Priority to US29/839,254 priority Critical patent/USD1005974S1/en
Assigned to ASM IP HOLDING B.V. reassignment ASM IP HOLDING B.V. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KIM, JAEHYUN, LEE, JEONGHO, SHIN, JINHO
Priority to TW111305569F priority patent/TWD231990S/en
Application granted granted Critical
Publication of USD1005974S1 publication Critical patent/USD1005974S1/en
Active legal-status Critical Current
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Description

FIG. 1 is a top perspective view of a gas distributor for semiconductor manufacturing apparatus, showing our new design;
FIG. 2 is a bottom perspective view thereof;
FIG. 3 is a top view thereof;
FIG. 4 is a bottom view thereof;
FIG. 5 is a front side view thereof;
FIG. 6 is a back side view thereof;
FIG. 7 is a right side view thereof;
FIG. 8 is a left side view thereof; and,
FIG. 9 is a cross sectional view taken along line 9-9 in FIG. 3 .

Claims (1)

    CLAIM
  1. The ornamental design for a gas distributor for semiconductor manufacturing apparatus, as shown and described.
US29/839,254 2022-05-19 2022-05-19 Gas distributor for semiconductor manufacturing apparatus Active USD1005974S1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US29/839,254 USD1005974S1 (en) 2022-05-19 2022-05-19 Gas distributor for semiconductor manufacturing apparatus
TW111305569F TWD231990S (en) 2022-05-19 2022-11-11 Gas distributor for semiconductor manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/839,254 USD1005974S1 (en) 2022-05-19 2022-05-19 Gas distributor for semiconductor manufacturing apparatus

Publications (1)

Publication Number Publication Date
USD1005974S1 true USD1005974S1 (en) 2023-11-28

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ID=88840224

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/839,254 Active USD1005974S1 (en) 2022-05-19 2022-05-19 Gas distributor for semiconductor manufacturing apparatus

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US (1) USD1005974S1 (en)
TW (1) TWD231990S (en)

Citations (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
US20050056218A1 (en) * 2002-02-14 2005-03-17 Applied Materials, Inc. Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate
US20050252447A1 (en) * 2004-05-11 2005-11-17 Applied Materials, Inc. Gas blocker plate for improved deposition
US20090159002A1 (en) * 2007-12-19 2009-06-25 Kallol Bera Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
USD654882S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD655261S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD655260S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD790041S1 (en) 2016-01-08 2017-06-20 Asm Ip Holding B.V. Gas dispersing plate for semiconductor manufacturing apparatus
USD796458S1 (en) * 2016-01-08 2017-09-05 Asm Ip Holding B.V. Gas flow control plate for semiconductor manufacturing apparatus
US10604847B2 (en) * 2014-03-18 2020-03-31 Asm Ip Holding B.V. Gas distribution system, reactor including the system, and methods of using the same
USD880437S1 (en) * 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD911985S1 (en) * 2018-06-08 2021-03-02 Tokyo Electron Limited Gas introduction plate for plasma etching apparatus for etching semiconductor wafer
US11015245B2 (en) * 2014-03-19 2021-05-25 Asm Ip Holding B.V. Gas-phase reactor and system having exhaust plenum and components thereof
USD930782S1 (en) * 2019-08-22 2021-09-14 Asm Ip Holding B.V. Gas distributor
USD935572S1 (en) * 2019-05-24 2021-11-09 Asm Ip Holding B.V. Gas channel plate
US11286562B2 (en) * 2018-06-08 2022-03-29 Asm Ip Holding B.V. Gas-phase chemical reactor and method of using same
USD980813S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD980814S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD990441S1 (en) * 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate

Patent Citations (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
US20050056218A1 (en) * 2002-02-14 2005-03-17 Applied Materials, Inc. Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate
US20050252447A1 (en) * 2004-05-11 2005-11-17 Applied Materials, Inc. Gas blocker plate for improved deposition
US20090159002A1 (en) * 2007-12-19 2009-06-25 Kallol Bera Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
USD654882S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD655261S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD655260S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
US10604847B2 (en) * 2014-03-18 2020-03-31 Asm Ip Holding B.V. Gas distribution system, reactor including the system, and methods of using the same
US11015245B2 (en) * 2014-03-19 2021-05-25 Asm Ip Holding B.V. Gas-phase reactor and system having exhaust plenum and components thereof
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD796458S1 (en) * 2016-01-08 2017-09-05 Asm Ip Holding B.V. Gas flow control plate for semiconductor manufacturing apparatus
USD790041S1 (en) 2016-01-08 2017-06-20 Asm Ip Holding B.V. Gas dispersing plate for semiconductor manufacturing apparatus
USD880437S1 (en) * 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD913980S1 (en) * 2018-02-01 2021-03-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
USD911985S1 (en) * 2018-06-08 2021-03-02 Tokyo Electron Limited Gas introduction plate for plasma etching apparatus for etching semiconductor wafer
US11286562B2 (en) * 2018-06-08 2022-03-29 Asm Ip Holding B.V. Gas-phase chemical reactor and method of using same
USD935572S1 (en) * 2019-05-24 2021-11-09 Asm Ip Holding B.V. Gas channel plate
USD930782S1 (en) * 2019-08-22 2021-09-14 Asm Ip Holding B.V. Gas distributor
USD980813S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas flow control plate for substrate processing apparatus
USD980814S1 (en) * 2021-05-11 2023-03-14 Asm Ip Holding B.V. Gas distributor for substrate processing apparatus
USD990441S1 (en) * 2021-09-07 2023-06-27 Asm Ip Holding B.V. Gas flow control plate

Non-Patent Citations (3)

* Cited by examiner, † Cited by third party
Title
0020-03379 / Gas Distribution Plate / Applied Materials Amat,https://www.ebay.com/itm/303638911045?_ trkparms=amclksrc%3DITM%26aid%3D1110006%26algo%3DHOMESPLICE.SIM%26ao%3D1%26asc%3D20200818143230%26meid%3Dd7943e7af78c407ebc21806e177d8c30%26pid%3D101224%26rk%3D5%26rkt%3D5%26sd%3D272889352592,2023. (Year: 2023). *
020-31624 / Gas Distribution Plate, Windowed / Applied Materials AMAT,https://www.ebay.com/itm/304451702685?trkparms=amclksrc%3DITM%26aid%3D1110006%26algo%3DHOMESPLICE.SIM%26ao%3D1%26asc%3D251362%26meid%3D463ac8a2ca15489e8d2aecb9e9ba9576%26pid%3D101506%26rk%3D3%26rkt%3D25%26sd%3D272889352592, 2023. (Year: 2023). *
Applied Materials 0020-31493 Gas Distribution Plate, 133 Holes AMAT-CSP/ METRON,https://www.ebay.com/itm/272889352592n, 2023. (Year: 2023). *

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