USD615937S1 - Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers - Google Patents

Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers Download PDF

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Publication number
USD615937S1
USD615937S1 US29/342,851 US34285109F USD615937S US D615937 S1 USD615937 S1 US D615937S1 US 34285109 F US34285109 F US 34285109F US D615937 S USD615937 S US D615937S
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United States
Prior art keywords
semiconductor wafers
manufacturing semiconductor
insulating cylinder
radiation fin
heat insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
US29/342,851
Inventor
Izumi Sato
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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Assigned to TOKYO ELECTRON LIMITED reassignment TOKYO ELECTRON LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SATO, IZUMI
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Description

FIG. 1 is front, top perspective view of a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers illustrating my new design;
FIG. 2 is a rear, bottom perspective view thereof;
FIG. 3 is a front view thereof;
FIG. 4 is a rear view thereof;
FIG. 5 is a right side view thereof;
FIG. 6 is a left side view thereof;
FIG. 7 is a top plan view thereof;
FIG. 8 is a bottom plan view thereof; and,
FIG. 9 is a cross-sectional view taken through line 99 of FIG. 7.

Claims (1)

  1. The ornamental design for a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers, as shown and described.
US29/342,851 2009-03-06 2009-09-02 Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers Active USD615937S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009004986 2009-03-06
JP2009-004986 2009-03-06

Publications (1)

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USD615937S1 true USD615937S1 (en) 2010-05-18

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US29/342,851 Active USD615937S1 (en) 2009-03-06 2009-09-02 Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD786201S1 (en) * 2015-10-19 2017-05-09 Tymphany Hk Limited Heat sink for woofer
USD798250S1 (en) * 2015-12-01 2017-09-26 Nuflare Technology, Inc. Heater
USD918848S1 (en) * 2019-07-18 2021-05-11 Kokusai Electric Corporation Retainer of ceiling heater for semiconductor fabrication apparatus
USD981972S1 (en) * 2021-03-22 2023-03-28 Kokusai Electric Corporation Adiabatic plate for substrate processing appratus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD786201S1 (en) * 2015-10-19 2017-05-09 Tymphany Hk Limited Heat sink for woofer
USD798250S1 (en) * 2015-12-01 2017-09-26 Nuflare Technology, Inc. Heater
USD918848S1 (en) * 2019-07-18 2021-05-11 Kokusai Electric Corporation Retainer of ceiling heater for semiconductor fabrication apparatus
USD981972S1 (en) * 2021-03-22 2023-03-28 Kokusai Electric Corporation Adiabatic plate for substrate processing appratus

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