USD616392S1 - Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers - Google Patents

Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers Download PDF

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Publication number
USD616392S1
USD616392S1 US29/342,852 US34285209F USD616392S US D616392 S1 USD616392 S1 US D616392S1 US 34285209 F US34285209 F US 34285209F US D616392 S USD616392 S US D616392S
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US
United States
Prior art keywords
semiconductor wafers
manufacturing semiconductor
insulating cylinder
radiation fin
heat insulating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/342,852
Inventor
Izumi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Assigned to TOKYO ELECTRON LIMITED reassignment TOKYO ELECTRON LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SATO, IZUMI
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Publication of USD616392S1 publication Critical patent/USD616392S1/en
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Expired - Lifetime legal-status Critical Current

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FIG. 1 is front perspective view of a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers illustrating my new design;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a right side view thereof;
FIG. 5 is a left side view thereof;
FIG. 6 is a top plan view thereof;
FIG. 7 is a bottom plan view thereof;
FIG. 8 is a cross-sectional view thereof taken through line 88 of FIG. 6;
FIG. 9 is a cross-sectional view thereof taken through line 99 of FIG. 6; and,
FIG. 10 is a front perspective view of a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers in use.
The broken lines are shown for illustrative purposes only and form no part of the claimed design.

Claims (1)

  1. The ornamental design for a heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers, as shown and described.
US29/342,852 2009-03-06 2009-09-02 Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers Expired - Lifetime USD616392S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009004987 2009-03-06
JP2009-004987 2009-03-06

Publications (1)

Publication Number Publication Date
USD616392S1 true USD616392S1 (en) 2010-05-25

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US29/342,852 Expired - Lifetime USD616392S1 (en) 2009-03-06 2009-09-02 Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD798250S1 (en) * 2015-12-01 2017-09-26 Nuflare Technology, Inc. Heater
USD924823S1 (en) * 2018-07-19 2021-07-13 Kokusai Electric Corporation Adiabatic plate for substrate processing apparatus
USD982537S1 (en) * 2021-03-15 2023-04-04 Kokusai Electric Corporation Separator of substrate processing apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD798250S1 (en) * 2015-12-01 2017-09-26 Nuflare Technology, Inc. Heater
USD924823S1 (en) * 2018-07-19 2021-07-13 Kokusai Electric Corporation Adiabatic plate for substrate processing apparatus
USD982537S1 (en) * 2021-03-15 2023-04-04 Kokusai Electric Corporation Separator of substrate processing apparatus

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