SG114537A1 - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- SG114537A1 SG114537A1 SG200202132A SG200202132A SG114537A1 SG 114537 A1 SG114537 A1 SG 114537A1 SG 200202132 A SG200202132 A SG 200202132A SG 200202132 A SG200202132 A SG 200202132A SG 114537 A1 SG114537 A1 SG 114537A1
- Authority
- SG
- Singapore
- Prior art keywords
- semiconductor device
- semiconductor
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
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- H—ELECTRICITY
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- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L24/17—Structure, shape, material or disposition of the bump connectors after the connecting process of a plurality of bump connectors
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
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- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/60—Attaching or detaching leads or other conductive members, to be used for carrying current to or from the device in operation
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- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y10S438/00—Semiconductor device manufacturing: process
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Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Semiconductor Integrated Circuits (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Waveguide Aerials (AREA)
- Details Of Aerials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2001118242A JP3939504B2 (ja) | 2001-04-17 | 2001-04-17 | 半導体装置並びにその製造方法および実装構造 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG114537A1 true SG114537A1 (en) | 2005-09-28 |
Family
ID=18968664
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200202132A SG114537A1 (en) | 2001-04-17 | 2002-04-11 | Semiconductor device |
Country Status (7)
Country | Link |
---|---|
US (1) | US6639299B2 (fr) |
EP (2) | EP1251558A2 (fr) |
JP (1) | JP3939504B2 (fr) |
KR (1) | KR100885352B1 (fr) |
CN (1) | CN1320646C (fr) |
SG (1) | SG114537A1 (fr) |
TW (1) | TW544817B (fr) |
Families Citing this family (112)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8021976B2 (en) | 2002-10-15 | 2011-09-20 | Megica Corporation | Method of wire bonding over active area of a semiconductor circuit |
US6495442B1 (en) * | 2000-10-18 | 2002-12-17 | Magic Corporation | Post passivation interconnection schemes on top of the IC chips |
US7405149B1 (en) | 1998-12-21 | 2008-07-29 | Megica Corporation | Post passivation method for semiconductor chip or wafer |
US6936531B2 (en) * | 1998-12-21 | 2005-08-30 | Megic Corporation | Process of fabricating a chip structure |
US6965165B2 (en) | 1998-12-21 | 2005-11-15 | Mou-Shiung Lin | Top layers of metal for high performance IC's |
US7381642B2 (en) | 2004-09-23 | 2008-06-03 | Megica Corporation | Top layers of metal for integrated circuits |
US7271489B2 (en) | 2003-10-15 | 2007-09-18 | Megica Corporation | Post passivation interconnection schemes on top of the IC chips |
US8158508B2 (en) | 2001-03-05 | 2012-04-17 | Megica Corporation | Structure and manufacturing method of a chip scale package |
JP4824228B2 (ja) * | 2001-09-07 | 2011-11-30 | 株式会社リコー | 半導体装置 |
EP1423876B1 (fr) | 2001-09-07 | 2013-07-10 | Ricoh Company, Ltd. | Dispositif a semi-conducteur et regulateur de tension |
US7932603B2 (en) * | 2001-12-13 | 2011-04-26 | Megica Corporation | Chip structure and process for forming the same |
TW584950B (en) | 2001-12-31 | 2004-04-21 | Megic Corp | Chip packaging structure and process thereof |
TW544882B (en) | 2001-12-31 | 2003-08-01 | Megic Corp | Chip package structure and process thereof |
US6673698B1 (en) | 2002-01-19 | 2004-01-06 | Megic Corporation | Thin film semiconductor package utilizing a glass substrate with composite polymer/metal interconnect layers |
TW503496B (en) | 2001-12-31 | 2002-09-21 | Megic Corp | Chip packaging structure and manufacturing process of the same |
JP3829325B2 (ja) * | 2002-02-07 | 2006-10-04 | 日本電気株式会社 | 半導体素子およびその製造方法並びに半導体装置の製造方法 |
DE10206919A1 (de) * | 2002-02-19 | 2003-08-28 | Infineon Technologies Ag | Verfahren zur Erzeugung einer Abdeckung, Verfahren zum Herstellen eines gehäusten Bauelements |
KR100452820B1 (ko) * | 2002-07-12 | 2004-10-15 | 삼성전기주식회사 | 회로소자의 전극형성 방법, 그를 이용한 칩 패키지 및 다층기판 |
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- 2002-04-08 US US10/118,403 patent/US6639299B2/en not_active Expired - Lifetime
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- 2002-04-11 SG SG200202132A patent/SG114537A1/en unknown
- 2002-04-15 KR KR1020020020498A patent/KR100885352B1/ko not_active IP Right Cessation
- 2002-04-16 CN CNB021057494A patent/CN1320646C/zh not_active Expired - Fee Related
- 2002-04-16 EP EP02008577A patent/EP1251558A2/fr not_active Withdrawn
- 2002-04-16 EP EP03017376A patent/EP1359618A3/fr not_active Withdrawn
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US6639299B2 (en) | 2003-10-28 |
KR100885352B1 (ko) | 2009-02-26 |
TW544817B (en) | 2003-08-01 |
EP1251558A2 (fr) | 2002-10-23 |
CN1383206A (zh) | 2002-12-04 |
US20020149086A1 (en) | 2002-10-17 |
CN1320646C (zh) | 2007-06-06 |
EP1359618A3 (fr) | 2005-02-09 |
JP2002314028A (ja) | 2002-10-25 |
KR20020081089A (ko) | 2002-10-26 |
JP3939504B2 (ja) | 2007-07-04 |
EP1251558A8 (fr) | 2003-01-02 |
EP1359618A2 (fr) | 2003-11-05 |
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