SG10201800532UA - Plasma resistant coating of porous body by atomic layer deposition - Google Patents
Plasma resistant coating of porous body by atomic layer depositionInfo
- Publication number
- SG10201800532UA SG10201800532UA SG10201800532UA SG10201800532UA SG10201800532UA SG 10201800532U A SG10201800532U A SG 10201800532UA SG 10201800532U A SG10201800532U A SG 10201800532UA SG 10201800532U A SG10201800532U A SG 10201800532UA SG 10201800532U A SG10201800532U A SG 10201800532UA
- Authority
- SG
- Singapore
- Prior art keywords
- porous body
- resistant coating
- plasma resistant
- atomic layer
- layer deposition
- Prior art date
Links
- 239000011248 coating agent Substances 0.000 title abstract 5
- 238000000576 coating method Methods 0.000 title abstract 5
- 238000000231 atomic layer deposition Methods 0.000 title abstract 4
- 239000011148 porous material Substances 0.000 abstract 5
- 238000000034 method Methods 0.000 abstract 2
- 229910009474 Y2O3—ZrO2 Inorganic materials 0.000 abstract 1
- 230000003628 erosive effect Effects 0.000 abstract 1
- 239000006104 solid solution Substances 0.000 abstract 1
Classifications
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/87—Ceramics
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
- C23C16/45525—Atomic layer deposition [ALD]
- C23C16/45527—Atomic layer deposition [ALD] characterized by the ALD cycle, e.g. different flows or temperatures during half-reactions, unusual pulsing sequence, use of precursor mixtures or auxiliary reactants or activations
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- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/0228—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition deposition by cyclic CVD, e.g. ALD, ALE, pulsed CVD
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- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
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- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Formation Of Insulating Films (AREA)
- Physical Vapour Deposition (AREA)
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US15/462,718 US10975469B2 (en) | 2017-03-17 | 2017-03-17 | Plasma resistant coating of porous body by atomic layer deposition |
US15/849,277 US10745805B2 (en) | 2017-03-17 | 2017-12-20 | Plasma resistant coating of porous body by atomic layer deposition |
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US (2) | US10975469B2 (zh) |
JP (2) | JP7093192B2 (zh) |
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CN (2) | CN108623328A (zh) |
SG (1) | SG10201800532UA (zh) |
TW (2) | TWI748046B (zh) |
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-
2017
- 2017-03-17 US US15/462,718 patent/US10975469B2/en active Active
- 2017-12-20 US US15/849,277 patent/US10745805B2/en active Active
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TWI791489B (zh) | 2023-02-11 |
TWI748046B (zh) | 2021-12-01 |
JP2018162205A (ja) | 2018-10-18 |
KR102593334B1 (ko) | 2023-10-23 |
KR102592883B1 (ko) | 2023-10-20 |
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TW201842223A (zh) | 2018-12-01 |
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JP2018168472A (ja) | 2018-11-01 |
JP7093192B2 (ja) | 2022-06-29 |
US20180265972A1 (en) | 2018-09-20 |
US20180265973A1 (en) | 2018-09-20 |
JP7296698B2 (ja) | 2023-06-23 |
KR20180106858A (ko) | 2018-10-01 |
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