WO2020089180A9 - Beschichtungsvorrichtung, prozesskammer, sowie verfahren zum beschichten eines substrats und substrat beschichtet mit zumindest einer materialschicht - Google Patents

Beschichtungsvorrichtung, prozesskammer, sowie verfahren zum beschichten eines substrats und substrat beschichtet mit zumindest einer materialschicht Download PDF

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Publication number
WO2020089180A9
WO2020089180A9 PCT/EP2019/079430 EP2019079430W WO2020089180A9 WO 2020089180 A9 WO2020089180 A9 WO 2020089180A9 EP 2019079430 W EP2019079430 W EP 2019079430W WO 2020089180 A9 WO2020089180 A9 WO 2020089180A9
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
coating
layer
process chamber
material layer
Prior art date
Application number
PCT/EP2019/079430
Other languages
English (en)
French (fr)
Other versions
WO2020089180A3 (de
WO2020089180A2 (de
Inventor
Wolfgang Braun
Jochen Mannhart
Original Assignee
MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. filed Critical MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V.
Priority to US17/290,413 priority Critical patent/US20210355576A1/en
Priority to EP19795203.9A priority patent/EP3856948A2/de
Priority to JP2021523690A priority patent/JP2022506364A/ja
Priority to KR1020217016585A priority patent/KR20210080552A/ko
Priority to CN201980087373.8A priority patent/CN113227443B/zh
Publication of WO2020089180A2 publication Critical patent/WO2020089180A2/de
Publication of WO2020089180A3 publication Critical patent/WO2020089180A3/de
Publication of WO2020089180A9 publication Critical patent/WO2020089180A9/de

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/088—Oxides of the type ABO3 with A representing alkali, alkaline earth metal or Pb and B representing a refractory or rare earth metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks

Abstract

Die vorliegende Erfindung betrifft eine Beschichtungsvorrichtung (1) zum Be- schichten eines Substrats (52) aus einem Substratmaterial (54) mit zumindest ei- ner Materialschicht (56) aus einem Schichtmaterial (58). Auch betrifft die vorlie- gende Erfindung eine Prozesskammer (10) für eine Beschichtungsvorrichtung (1) zum Beschichten eines Substrats (52) aus einem Substratmaterial (54) mit zumin- dest einer Materialschicht (56) aus einem Schichtmaterial (58). Ferner betrifft die vorliegende Erfindung ein Verfahren zum Beschichten eines Substrats (52) aus einem Substratmaterial (54) mit zumindest einer Materialschicht (56) aus einem Schichtmaterial (58) in einer Beschichtungsvorrichtung (1). Ein weiterer Aspekt der Erfindung betrifft ein Substrat (52) beschichtetet mit zumindest einer Material- schicht (56), aufweisend das Substrat (52) aus einem Substratmaterial (54), das mit zumindest einer Materialschicht (56) aus einem Schichtmaterial (58) beschich- tet ist.
PCT/EP2019/079430 2018-10-31 2019-10-28 Beschichtungsvorrichtung, prozesskammer, sowie verfahren zum beschichten eines substrats und substrat beschichtet mit zumindest einer materialschicht WO2020089180A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US17/290,413 US20210355576A1 (en) 2018-10-31 2019-10-28 Coating apparatus, process chamber, and method of coating a substrate and substrate coated with at least one material layer
EP19795203.9A EP3856948A2 (de) 2018-10-31 2019-10-28 Beschichtungsvorrichtung, prozesskammer, sowie verfahren zum beschichten eines substrats und substrat beschichtet mit zumindest einer materialschicht
JP2021523690A JP2022506364A (ja) 2018-10-31 2019-10-28 コーティング装置、処理チャンバ、基板をコーティングする方法、および少なくとも１つの材料層でコーティングされた基板
KR1020217016585A KR20210080552A (ko) 2018-10-31 2019-10-28 코팅 장치, 공정 챔버, 및 하나 이상의 재료 층으로 코팅된 기판과 기판을 코팅하는 방법
CN201980087373.8A CN113227443B (zh) 2018-10-31 2019-10-28 涂覆设备、处理腔室和涂覆基板的方法以及用至少一个材料层涂覆的基板

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102018127262.6 2018-10-31
DE102018127262.6A DE102018127262A1 (de) 2018-10-31 2018-10-31 Beschichtungsvorrichtung sowie Verfahren zum Beschichten eines Substrats

Publications (3)

Publication Number Publication Date
WO2020089180A2 WO2020089180A2 (de) 2020-05-07
WO2020089180A3 WO2020089180A3 (de) 2020-06-25
WO2020089180A9 true WO2020089180A9 (de) 2020-10-01

Family

ID=68387336

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2019/079430 WO2020089180A2 (de) 2018-10-31 2019-10-28 Beschichtungsvorrichtung, prozesskammer, sowie verfahren zum beschichten eines substrats und substrat beschichtet mit zumindest einer materialschicht

Country Status (7)

Country Link
US (1) US20210355576A1 (de)
EP (1) EP3856948A2 (de)
JP (1) JP2022506364A (de)
KR (1) KR20210080552A (de)
CN (1) CN113227443B (de)
DE (1) DE102018127262A1 (de)
WO (1) WO2020089180A2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110783459A (zh) * 2019-10-31 2020-02-11 深圳市华星光电半导体显示技术有限公司 膜层制作方法及发光器件
EP4263897A1 (de) * 2021-01-27 2023-10-25 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Thermisches laserverdampfungssystem
US20240110275A1 (en) * 2021-02-18 2024-04-04 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Method of providing a reaction chamber, reaction chamber and laser evaporation system
CN117580971A (zh) * 2021-07-01 2024-02-20 马克思-普朗克科学促进协会 化合物层的形成方法
EP4320284A1 (de) * 2021-07-28 2024-02-14 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Vorrichtung für ein thermisches verdampfungssystem und verfahren zum beschichten eines beschichtungsbereichs auf einer vorderseite eines substrats
CN117460857A (zh) * 2021-07-28 2024-01-26 马克斯·普朗克科学促进学会 涂布基板前表面上的涂层区域的方法和用于热蒸发系统的设备
CN117813416A (zh) * 2021-08-06 2024-04-02 马克斯·普朗克科学促进学会 光学元件及反应腔
WO2023174512A1 (en) * 2022-03-14 2023-09-21 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Source arrangement and tle system
WO2023241795A1 (en) * 2022-06-15 2023-12-21 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Laser system and evaporation system

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4701592A (en) * 1980-11-17 1987-10-20 Rockwell International Corporation Laser assisted deposition and annealing
JPS5842769A (ja) * 1981-09-09 1983-03-12 Tohoku Richo Kk 光ビ−ムを用いたイオンプレ−ティング装置
FR2542327B1 (de) * 1983-03-07 1986-03-07 Bensoussan Marcel
JPH0452271A (ja) * 1990-06-20 1992-02-20 Mitsubishi Electric Corp レーザ蒸着装置
JPH062115A (ja) * 1992-06-19 1994-01-11 Mitsubishi Electric Corp レーザ加工装置およびレーザ加工装置用遮蔽板の作製方法
JP3255469B2 (ja) * 1992-11-30 2002-02-12 三菱電機株式会社 レーザ薄膜形成装置
JPH06172978A (ja) * 1992-12-08 1994-06-21 Matsushita Electric Ind Co Ltd レーザーアブレーション装置
JPH06271394A (ja) * 1993-03-19 1994-09-27 Chodendo Hatsuden Kanren Kiki Zairyo Gijutsu Kenkyu Kumiai レーザ蒸着装置用ターゲット及びこれを用いた酸化物超電導体の製造方法
CA2299957C (en) * 1993-12-27 2003-04-29 Canon Kabushiki Kaisha Electron-emitting device and method of manufacturing the same as well as electron source and image-forming apparatus
US6815015B2 (en) * 1999-01-27 2004-11-09 The United States Of America As Represented By The Secretary Of The Navy Jetting behavior in the laser forward transfer of rheological systems
DE102007035166B4 (de) * 2007-07-27 2010-07-29 Createc Fischer & Co. Gmbh Hochtemperatur-Verdampferzelle mit parallel geschalteten Heizbereichen, Verfahren zu deren Betrieb und deren Verwendung in Beschichtungsanlagen
JP2009072789A (ja) * 2007-09-18 2009-04-09 Hamamatsu Photonics Kk レーザ加工装置
EP2065485B1 (de) * 2007-11-21 2011-05-18 OTB Solar B.V. Verfahren und System zur kontinuierlichen oder halbkontinuierlichen Laserunterstützen Abscheidung
JP2010003939A (ja) * 2008-06-23 2010-01-07 Fujitsu Ltd 基板の製造方法、基板の製造装置及び基板
KR101089624B1 (ko) * 2009-06-25 2011-12-06 에이피시스템 주식회사 에너지 빔의 길이 및 강도 조절이 가능한 레이저 가공 장치
JP2013079437A (ja) * 2011-09-22 2013-05-02 Fujikura Ltd レーザーアブレーションを用いた成膜方法および成膜装置
CN202861627U (zh) * 2012-09-21 2013-04-10 北京工业大学 大功率激光吸收装置
US20140227461A1 (en) * 2013-02-14 2014-08-14 Dillard University Multiple Beam Pulsed Laser Deposition Of Composite Films
US9934877B2 (en) * 2013-02-27 2018-04-03 Fondazione Istituto Italiano Di Tecnologia Nanocrystalline/amorphous composite coating for protecting metal components in nuclear plants cooled with liquid metal or molten salt
WO2014143235A1 (en) * 2013-03-14 2014-09-18 Integrated Plasmonics Corporation Ambient light assisted spectroscopy
TWI472635B (zh) * 2013-09-13 2015-02-11 Univ Nat Taiwan 脈衝雷射蒸鍍系統
CN103774097B (zh) * 2014-01-23 2015-07-01 中国科学院合肥物质科学研究院 强磁场辅助脉冲激光沉积系统
CN107109628B (zh) * 2014-08-29 2019-08-23 国立研究开发法人产业技术综合研究所 有机材料膜或有机无机复合材料膜的激光蒸镀方法、激光蒸镀装置

Also Published As

Publication number Publication date
CN113227443A (zh) 2021-08-06
WO2020089180A3 (de) 2020-06-25
US20210355576A1 (en) 2021-11-18
EP3856948A2 (de) 2021-08-04
DE102018127262A1 (de) 2020-04-30
JP2022506364A (ja) 2022-01-17
WO2020089180A2 (de) 2020-05-07
CN113227443B (zh) 2024-03-15
KR20210080552A (ko) 2021-06-30

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