KR102589077B1 - 마스크 조립체 - Google Patents

마스크 조립체 Download PDF

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Publication number
KR102589077B1
KR102589077B1 KR1020227035015A KR20227035015A KR102589077B1 KR 102589077 B1 KR102589077 B1 KR 102589077B1 KR 1020227035015 A KR1020227035015 A KR 1020227035015A KR 20227035015 A KR20227035015 A KR 20227035015A KR 102589077 B1 KR102589077 B1 KR 102589077B1
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KR
South Korea
Prior art keywords
pellicle
pellicle frame
patterning device
frame
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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KR1020227035015A
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English (en)
Korean (ko)
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KR20220143144A (ko
Inventor
마티아스 크루이진가
마틴 마티아스 마리누스 얀센
조르제 마누엘 아제레도 리마
에릭 빌렘 보가트
데르크 세르바티우스 게르트루다 브룬스
마르크 브루인
리차드 요셉 브륄스
에로엔 데커스
폴 얀센
모하마드 레자 카말리
로날드 햄 군터 크라머
로버트 가브리엘 마리아 란스베르겐
마르티누스 헨드리쿠스 안토니우스 렌더르스
매튜 립손
에릭 로엘로프 룹스트라
요셉 에이치. 리온스
스티븐 루
게릿 반 덴 보쉬
산더 반 덴 헤이칸트
산드라 반 델 그라프
프리츠 반 델 뭴른
프리츠 반 델 ’ƒ른
제롬 프랑수아 실베인 비르질 반 루
베아트리스 루이즈 마리-요셉 카트리엔 버브러지
Original Assignee
에이에스엠엘 네델란즈 비.브이.
에이에스엠엘 홀딩 엔.브이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 에이에스엠엘 네델란즈 비.브이., 에이에스엠엘 홀딩 엔.브이. filed Critical 에이에스엠엘 네델란즈 비.브이.
Priority to KR1020237034540A priority Critical patent/KR102873584B1/ko
Publication of KR20220143144A publication Critical patent/KR20220143144A/ko
Application granted granted Critical
Publication of KR102589077B1 publication Critical patent/KR102589077B1/ko
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Regulation And Control Of Combustion (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
KR1020227035015A 2014-11-17 2015-11-16 마스크 조립체 Active KR102589077B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020237034540A KR102873584B1 (ko) 2014-11-17 2015-11-16 마스크 조립체

Applications Claiming Priority (14)

Application Number Priority Date Filing Date Title
US201462080561P 2014-11-17 2014-11-17
US62/080,561 2014-11-17
US201562108348P 2015-01-27 2015-01-27
US62/108,348 2015-01-27
US201562110841P 2015-02-02 2015-02-02
US62/110,841 2015-02-02
US201562126173P 2015-02-27 2015-02-27
US62/126,173 2015-02-27
US201562149176P 2015-04-17 2015-04-17
US62/149,176 2015-04-17
US201562183342P 2015-06-23 2015-06-23
US62/183,342 2015-06-23
PCT/EP2015/076687 WO2016079051A2 (en) 2014-11-17 2015-11-16 Mask assembly
KR1020177016691A KR102634793B1 (ko) 2014-11-17 2015-11-16 마스크 조립체

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020177016691A Division KR102634793B1 (ko) 2014-11-17 2015-11-16 마스크 조립체

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020237034540A Division KR102873584B1 (ko) 2014-11-17 2015-11-16 마스크 조립체

Publications (2)

Publication Number Publication Date
KR20220143144A KR20220143144A (ko) 2022-10-24
KR102589077B1 true KR102589077B1 (ko) 2023-10-16

Family

ID=54542272

Family Applications (7)

Application Number Title Priority Date Filing Date
KR1020227035015A Active KR102589077B1 (ko) 2014-11-17 2015-11-16 마스크 조립체
KR1020237019875A Active KR102913647B1 (ko) 2014-11-17 2015-11-16 장치
KR1020197035271A Active KR102544694B1 (ko) 2014-11-17 2015-11-16 장치
KR1020237034540A Active KR102873584B1 (ko) 2014-11-17 2015-11-16 마스크 조립체
KR1020227044822A Active KR102544701B1 (ko) 2014-11-17 2015-11-16 장치
KR1020177016716A Active KR102548823B1 (ko) 2014-11-17 2015-11-16 장치
KR1020177016691A Active KR102634793B1 (ko) 2014-11-17 2015-11-16 마스크 조립체

Family Applications After (6)

Application Number Title Priority Date Filing Date
KR1020237019875A Active KR102913647B1 (ko) 2014-11-17 2015-11-16 장치
KR1020197035271A Active KR102544694B1 (ko) 2014-11-17 2015-11-16 장치
KR1020237034540A Active KR102873584B1 (ko) 2014-11-17 2015-11-16 마스크 조립체
KR1020227044822A Active KR102544701B1 (ko) 2014-11-17 2015-11-16 장치
KR1020177016716A Active KR102548823B1 (ko) 2014-11-17 2015-11-16 장치
KR1020177016691A Active KR102634793B1 (ko) 2014-11-17 2015-11-16 마스크 조립체

Country Status (9)

Country Link
US (5) US10558129B2 (https=)
EP (4) EP3221748B1 (https=)
JP (10) JP6769954B2 (https=)
KR (7) KR102589077B1 (https=)
CN (5) CN107172884B (https=)
CA (4) CA2968159C (https=)
NL (2) NL2015796A (https=)
TW (4) TWI679491B (https=)
WO (2) WO2016079051A2 (https=)

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