KR101607035B1 - 노광 장치 및 디바이스 제조 방법 - Google Patents

노광 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR101607035B1
KR101607035B1 KR1020147008125A KR20147008125A KR101607035B1 KR 101607035 B1 KR101607035 B1 KR 101607035B1 KR 1020147008125 A KR1020147008125 A KR 1020147008125A KR 20147008125 A KR20147008125 A KR 20147008125A KR 101607035 B1 KR101607035 B1 KR 101607035B1
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KR
South Korea
Prior art keywords
nozzle member
liquid
substrate
optical system
recovery
Prior art date
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Expired - Fee Related
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KR1020147008125A
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English (en)
Korean (ko)
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KR20140053386A (ko
Inventor
히데아키 하라
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가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020147008125A 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법 Expired - Fee Related KR101607035B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2004-089348 2004-03-25
JP2004089348 2004-03-25
PCT/JP2005/005254 WO2005093791A1 (ja) 2004-03-25 2005-03-23 露光装置及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020127025345A Division KR101441777B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020147032263A Division KR101707294B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20140053386A KR20140053386A (ko) 2014-05-07
KR101607035B1 true KR101607035B1 (ko) 2016-04-11

Family

ID=35056454

Family Applications (8)

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KR1020147032263A Expired - Fee Related KR101707294B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020127025345A Expired - Fee Related KR101441777B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020177003483A Expired - Fee Related KR101851511B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020147008125A Expired - Fee Related KR101607035B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020187010650A Ceased KR20180042456A (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020137015943A Expired - Fee Related KR101504445B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020117025951A Expired - Fee Related KR101250155B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020067016062A Expired - Fee Related KR101253355B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법

Family Applications Before (3)

Application Number Title Priority Date Filing Date
KR1020147032263A Expired - Fee Related KR101707294B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020127025345A Expired - Fee Related KR101441777B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020177003483A Expired - Fee Related KR101851511B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법

Family Applications After (4)

Application Number Title Priority Date Filing Date
KR1020187010650A Ceased KR20180042456A (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020137015943A Expired - Fee Related KR101504445B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020117025951A Expired - Fee Related KR101250155B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020067016062A Expired - Fee Related KR101253355B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법

Country Status (5)

Country Link
US (7) US8111373B2 (enExample)
JP (13) JP4525676B2 (enExample)
KR (8) KR101707294B1 (enExample)
TW (7) TWI486719B (enExample)
WO (1) WO2005093791A1 (enExample)

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WO2006009573A1 (en) 2004-06-17 2006-01-26 Nikon Corporation Fluid pressure compensation for immersion lithography lens
JP4565272B2 (ja) 2004-07-01 2010-10-20 株式会社ニコン 液浸リソグラフィのための動的流体制御システム
EP1796146B1 (en) 2004-09-17 2013-01-16 Nikon Corporation Exposure apparatus, exposure method, and method for manufacturing device
US7180571B2 (en) 2004-12-08 2007-02-20 Asml Netherlands B.V. Lithographic projection apparatus and actuator
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US7411658B2 (en) * 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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US7864292B2 (en) * 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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WO2015147039A1 (ja) * 2014-03-26 2015-10-01 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
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US10890748B2 (en) 2014-05-29 2021-01-12 Rarecyte, Inc. Automated substrate loading
KR102644544B1 (ko) 2016-09-21 2024-03-11 넥스트큐어 인코포레이티드 Siglec-15를 위한 항체 및 이의 사용 방법
JP6506785B2 (ja) * 2017-02-02 2019-04-24 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ リソグラフィ用テンプレートの製造方法、プログラム及び基板処理装置
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CN112684665B (zh) * 2020-12-25 2024-06-25 浙江启尔机电技术有限公司 一种浸液供给回收装置
KR102584513B1 (ko) 2020-12-31 2023-10-06 세메스 주식회사 온도 변화가 수반되는 분위기에 제공되는 기판 지지 부재의 수평 측정용 기판형 센서, 이를 이용한 수평 측정 방법 및 비일시적 컴퓨터 판독가능 매체
CN114690577B (zh) * 2020-12-31 2024-10-25 上海微电子装备（集团）股份有限公司 一种管路柔性适应装置及浸没式光刻机

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