KR101607035B1 - 노광 장치 및 디바이스 제조 방법 - Google Patents

노광 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR101607035B1
KR101607035B1 KR1020147008125A KR20147008125A KR101607035B1 KR 101607035 B1 KR101607035 B1 KR 101607035B1 KR 1020147008125 A KR1020147008125 A KR 1020147008125A KR 20147008125 A KR20147008125 A KR 20147008125A KR 101607035 B1 KR101607035 B1 KR 101607035B1
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KR
South Korea
Prior art keywords
nozzle member
liquid
substrate
optical system
recovery
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Expired - Fee Related
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KR1020147008125A
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English (en)
Korean (ko)
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KR20140053386A (ko
Inventor
히데아키 하라
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가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70325—Resolution enhancement techniques not otherwise provided for, e.g. darkfield imaging, interfering beams, spatial frequency multiplication, nearfield lenses or solid immersion lenses
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Length Measuring Devices By Optical Means (AREA)
KR1020147008125A 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법 Expired - Fee Related KR101607035B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2004-089348 2004-03-25
JP2004089348 2004-03-25
PCT/JP2005/005254 WO2005093791A1 (ja) 2004-03-25 2005-03-23 露光装置及びデバイス製造方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
KR1020127025345A Division KR101441777B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020147032263A Division KR101707294B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20140053386A KR20140053386A (ko) 2014-05-07
KR101607035B1 true KR101607035B1 (ko) 2016-04-11

Family

ID=35056454

Family Applications (8)

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KR1020177003483A Expired - Fee Related KR101851511B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020137015943A Expired - Fee Related KR101504445B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020127025345A Expired - Fee Related KR101441777B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020067016062A Expired - Fee Related KR101253355B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020187010650A Ceased KR20180042456A (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020147008125A Expired - Fee Related KR101607035B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020147032263A Expired - Fee Related KR101707294B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020117025951A Expired - Fee Related KR101250155B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법

Family Applications Before (5)

Application Number Title Priority Date Filing Date
KR1020177003483A Expired - Fee Related KR101851511B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020137015943A Expired - Fee Related KR101504445B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020127025345A Expired - Fee Related KR101441777B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020067016062A Expired - Fee Related KR101253355B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020187010650A Ceased KR20180042456A (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법

Family Applications After (2)

Application Number Title Priority Date Filing Date
KR1020147032263A Expired - Fee Related KR101707294B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법
KR1020117025951A Expired - Fee Related KR101250155B1 (ko) 2004-03-25 2005-03-23 노광 장치 및 디바이스 제조 방법

Country Status (5)

Country Link
US (7) US8111373B2 (enExample)
JP (13) JP4525676B2 (enExample)
KR (8) KR101851511B1 (enExample)
TW (7) TWI402893B (enExample)
WO (1) WO2005093791A1 (enExample)

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JP4623095B2 (ja) * 2004-06-17 2011-02-02 株式会社ニコン 液浸リソグラフィレンズの流体圧力補正
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US7411658B2 (en) * 2005-10-06 2008-08-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7804577B2 (en) 2005-11-16 2010-09-28 Asml Netherlands B.V. Lithographic apparatus
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US7864292B2 (en) 2005-11-16 2011-01-04 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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JPWO2015147039A1 (ja) * 2014-03-26 2017-04-13 株式会社ニコン 移動体装置、露光装置、フラットパネルディスプレイの製造方法、及びデバイス製造方法
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RU2759334C2 (ru) 2016-09-21 2021-11-12 Нексткьюр, Инк. Антитела против siglec-15 и способы их применения
JP6506785B2 (ja) * 2017-02-02 2019-04-24 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ リソグラフィ用テンプレートの製造方法、プログラム及び基板処理装置
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CN112684665B (zh) * 2020-12-25 2024-06-25 浙江启尔机电技术有限公司 一种浸液供给回收装置
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CN114690577B (zh) * 2020-12-31 2024-10-25 上海微电子装备（集团）股份有限公司 一种管路柔性适应装置及浸没式光刻机

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JP2001190996A (ja) 2000-01-11 2001-07-17 Matsushita Electric Ind Co Ltd プリント配線板の製造装置およびそれを用いたプリント配線板の製造方法

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