SG10201502625RA - Measuring Method, Stage Apparatus, And Exposure Apparatus - Google Patents

Measuring Method, Stage Apparatus, And Exposure Apparatus

Info

Publication number
SG10201502625RA
SG10201502625RA SG10201502625RA SG10201502625RA SG10201502625RA SG 10201502625R A SG10201502625R A SG 10201502625RA SG 10201502625R A SG10201502625R A SG 10201502625RA SG 10201502625R A SG10201502625R A SG 10201502625RA SG 10201502625R A SG10201502625R A SG 10201502625RA
Authority
SG
Singapore
Prior art keywords
measuring method
stage
exposure apparatus
exposure
stage apparatus
Prior art date
Application number
SG10201502625RA
Inventor
Dai Arai
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG10201502625RA publication Critical patent/SG10201502625RA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G03F7/70725—Stages control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Transform (AREA)
  • Transmission And Conversion Of Sensor Element Output (AREA)
SG10201502625RA 2007-07-18 2008-07-16 Measuring Method, Stage Apparatus, And Exposure Apparatus SG10201502625RA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007187649 2007-07-18

Publications (1)

Publication Number Publication Date
SG10201502625RA true SG10201502625RA (en) 2015-05-28

Family

ID=40259688

Family Applications (3)

Application Number Title Priority Date Filing Date
SG2011073137A SG175598A1 (en) 2007-07-18 2008-07-16 Measuring method, stage apparatus, and exposure apparatus
SG2012053211A SG183050A1 (en) 2007-07-18 2008-07-16 Measuring method, stage apparatus, and exposure apparatus
SG10201502625RA SG10201502625RA (en) 2007-07-18 2008-07-16 Measuring Method, Stage Apparatus, And Exposure Apparatus

Family Applications Before (2)

Application Number Title Priority Date Filing Date
SG2011073137A SG175598A1 (en) 2007-07-18 2008-07-16 Measuring method, stage apparatus, and exposure apparatus
SG2012053211A SG183050A1 (en) 2007-07-18 2008-07-16 Measuring method, stage apparatus, and exposure apparatus

Country Status (9)

Country Link
US (5) US9316917B2 (en)
EP (7) EP3246755B1 (en)
JP (8) JPWO2009011356A1 (en)
KR (8) KR101843699B1 (en)
CN (7) CN104111588B (en)
HK (10) HK1201943A1 (en)
SG (3) SG175598A1 (en)
TW (7) TWI641924B (en)
WO (1) WO2009011356A1 (en)

Families Citing this family (49)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101843699B1 (en) * 2007-07-18 2018-03-29 가부시키가이샤 니콘 Measurement method, stage apparatus, and exposure apparatus
JP2009026862A (en) * 2007-07-18 2009-02-05 Canon Inc Optical element positioning system, projection optical system, and exposure apparatus
JP2009036637A (en) * 2007-08-01 2009-02-19 Sony Corp Displacement measuring device
US8760629B2 (en) * 2008-12-19 2014-06-24 Nikon Corporation Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
US8493547B2 (en) * 2009-08-25 2013-07-23 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
EP3731258A1 (en) * 2009-09-22 2020-10-28 EV Group E. Thallner GmbH Device for aligning two substrates
NL2006913A (en) 2010-07-16 2012-01-17 Asml Netherlands Bv Lithographic apparatus and method.
NL2007155A (en) * 2010-08-25 2012-02-28 Asml Netherlands Bv Stage apparatus, lithographic apparatus and method of positioning an object table.
JP4846051B1 (en) * 2010-11-05 2011-12-28 株式会社ナナオ Sensor unit operating mechanism and liquid crystal display device including the sensor unit operating mechanism
NL2008272A (en) * 2011-03-09 2012-09-11 Asml Netherlands Bv Lithographic apparatus.
DE102011005885A1 (en) * 2011-03-22 2012-09-27 Carl Zeiss Smt Gmbh lithography apparatus
NL2008980A (en) 2011-07-11 2013-01-14 Asml Netherlands Bv A fluid handling structure, a lithographic apparatus and a device manufacturing method.
TWI467126B (en) * 2011-11-09 2015-01-01 Zygo Corp Thermally stable optical sensor mount
JP6086070B2 (en) * 2011-12-28 2017-03-01 株式会社ニコン Encoder and drive device
JP6093965B2 (en) 2012-02-17 2017-03-15 株式会社ミツトヨ Photoelectric encoder
JP6251559B2 (en) * 2013-02-28 2017-12-20 株式会社ニューフレアテクノロジー Sample support device
JP6613895B2 (en) * 2013-10-02 2019-12-04 株式会社ニコン Encoder scale, encoder, drive device and stage device
DE112014005893B4 (en) * 2013-12-21 2023-02-16 Kla-Tencor Corporation A method of measuring positions of structures on a mask and thereby determining errors in the manufacture of masks
JP2016043453A (en) * 2014-08-25 2016-04-04 株式会社ディスコ Processing device
NL2015639A (en) 2014-11-28 2016-09-20 Asml Netherlands Bv Encoder, position measurement system and lithographic apparatus.
JP6719729B2 (en) 2015-02-23 2020-07-08 株式会社ニコン Substrate processing system, substrate processing method, and device manufacturing method
KR102574558B1 (en) 2015-02-23 2023-09-04 가부시키가이샤 니콘 Measurement device, lithography system and exposure device, and management method, superposition measurement method and device manufacturing method
KR102552792B1 (en) 2015-02-23 2023-07-06 가부시키가이샤 니콘 Measurement device, lithography system and exposure device, and device manufacturing method
JP6467065B2 (en) * 2015-03-23 2019-02-06 エーエスエムエル ネザーランズ ビー．ブイ． Lithographic apparatus and device manufacturing method
KR102584657B1 (en) * 2015-03-31 2023-10-04 가부시키가이샤 니콘 Exposure apparatus, flat-panel-display production method, device production method, and exposure method
US9630836B2 (en) 2015-09-30 2017-04-25 Mems Drive, Inc. Simplified MEMS device fabrication process
US9617142B1 (en) 2015-09-30 2017-04-11 Mems Drive, Inc. MEMS grid for manipulating structural parameters of MEMS devices
US10520834B2 (en) * 2015-09-30 2019-12-31 Nikon Corporation Movable body apparatus, exposure apparatus, manufacturing method of flat-panel display and device manufacturing method, and movement method of object
KR102472753B1 (en) * 2016-09-30 2022-11-30 가부시키가이샤 니콘 Movable body device, displacement method, exposure device, exposure method, flat-panel display manufacturing method, and device manufacturing method
WO2018065157A1 (en) * 2016-10-04 2018-04-12 Asml Netherlands B.V. Athermalization of an alignment system
US11106145B2 (en) 2016-10-17 2021-08-31 Nikon Corporation Exposure system and lithography system
WO2018141713A1 (en) 2017-02-03 2018-08-09 Asml Netherlands B.V. Exposure apparatus
NL2020269A (en) * 2017-02-10 2018-08-22 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US10600614B2 (en) * 2017-09-29 2020-03-24 Hitachi High-Technologies Corporation Stage device and charged particle beam device
DE102017217967A1 (en) * 2017-10-09 2019-04-11 Sieb & Meyer Ag Method for determining positional errors of holes and securing the drilling process
JP6493481B2 (en) * 2017-10-18 2019-04-03 株式会社ニコン Exposure apparatus and device manufacturing method
CN108010873B (en) * 2017-12-29 2024-04-19 无锡固电半导体股份有限公司 Automatic wafer expanding machine
TWI725875B (en) * 2018-01-16 2021-04-21 美商伊路米納有限公司 Structured illumination imaging system and method of creating a high-resolution image using structured light
JP7051455B2 (en) * 2018-01-16 2022-04-11 キオクシア株式会社 Manufacturing method of pattern forming device and semiconductor device
US10281268B1 (en) 2018-04-20 2019-05-07 Seagate Technology Llc Automated and accurate high-throughput slider-level flatness inspection
JP7056411B2 (en) * 2018-06-29 2022-04-19 株式会社リコー Reading device and modeling device
CN112703451A (en) * 2018-09-12 2021-04-23 西默有限公司 Measurement of body for gas discharge station
CN111380464B (en) * 2018-12-28 2021-05-07 上海微电子装备（集团）股份有限公司 Installation device and installation method of grating ruler, grating measurement system and photoetching machine
JP2020112605A (en) * 2019-01-08 2020-07-27 キヤノン株式会社 Exposure apparatus and control method of the same, and method for manufacturing article
US11450552B2 (en) * 2019-08-01 2022-09-20 Micron Technology, Inc. Methods and apparatus for adjusting surface topography of a substrate support apparatus
CN110931412B (en) * 2019-10-15 2024-02-06 北京烁科中科信电子装备有限公司 High-precision and high-efficiency silicon wafer orientation device
CN111272089B (en) * 2020-03-03 2022-06-28 中国科学院光电技术研究所 In-situ gap detection device and detection method
CN111550955A (en) * 2020-04-29 2020-08-18 合肥芯碁微电子装备股份有限公司 Temperature monitoring system
CN114351247B (en) * 2022-01-12 2023-06-27 苏州天准科技股份有限公司 Crystal pulling shaking monitoring method, storage medium, terminal and crystal pulling equipment

Family Cites Families (88)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6144429A (en) 1984-08-09 1986-03-04 Nippon Kogaku Kk <Nikon> Alignment method
US4780617A (en) 1984-08-09 1988-10-25 Nippon Kogaku K.K. Method for successive alignment of chip patterns on a substrate
JPH04211202A (en) 1990-03-19 1992-08-03 Canon Inc Reflection type diffraction grating and device by use of same deffraction grating
DE4033556A1 (en) * 1990-10-22 1992-04-23 Suess Kg Karl MEASURING ARRANGEMENT FOR X, Y, (PHI) COORDINATE TABLES
JPH05129184A (en) * 1991-10-30 1993-05-25 Canon Inc Projection aligner
JP3089802B2 (en) 1992-04-01 2000-09-18 株式会社ニコン Stage position measuring apparatus, projection exposure apparatus and projection exposure method
US5469260A (en) * 1992-04-01 1995-11-21 Nikon Corporation Stage-position measuring apparatus
JP2629109B2 (en) 1992-04-08 1997-07-09 新日本製鐵株式会社 Cutting device in waste melting furnace charging device
KR100300618B1 (en) 1992-12-25 2001-11-22 오노 시게오 EXPOSURE METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD USING THE DEVICE
JP3316833B2 (en) 1993-03-26 2002-08-19 株式会社ニコン Scanning exposure method, surface position setting device, scanning type exposure device, and device manufacturing method using the method
US6753948B2 (en) 1993-04-27 2004-06-22 Nikon Corporation Scanning exposure method and apparatus
JP3375076B2 (en) 1993-04-27 2003-02-10 株式会社ニコン Projection exposure method and apparatus, and element manufacturing method
JPH07270122A (en) * 1994-03-30 1995-10-20 Canon Inc Displacement detection device, aligner provided with said displacement detection device and manufacture of device
JPH07335529A (en) * 1994-06-09 1995-12-22 Nikon Corp Projection exposing device
US6018384A (en) 1994-09-07 2000-01-25 Nikon Corporation Projection exposure system
JP3379238B2 (en) 1994-09-08 2003-02-24 株式会社ニコン Scanning exposure equipment
US5552888A (en) 1994-12-02 1996-09-03 Nikon Precision, Inc. Apparatus for measuring position of an X-Y stage
JP3387075B2 (en) * 1994-12-12 2003-03-17 株式会社ニコン Scanning exposure method, exposure apparatus, and scanning exposure apparatus
JPH08178694A (en) * 1994-12-27 1996-07-12 Canon Inc Scale for displacement sensor
US5877843A (en) 1995-09-12 1999-03-02 Nikon Corporation Exposure apparatus
US5806193A (en) * 1995-11-09 1998-09-15 Nikon Corporation Tilt and movement apparatus using flexure and air cylinder
US6069416A (en) 1996-06-24 2000-05-30 Anorad Corporation Two-axis motor platen and method for making
US5825043A (en) 1996-10-07 1998-10-20 Nikon Precision Inc. Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
JPH11274029A (en) 1998-03-19 1999-10-08 Asahi Kasei Micro Syst Co Ltd Scanning stepper
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP3554186B2 (en) * 1998-04-08 2004-08-18 キヤノン株式会社 Exposure apparatus, device manufacturing method, and reaction force receiving method
JP3413122B2 (en) * 1998-05-21 2003-06-03 キヤノン株式会社 Positioning apparatus, exposure apparatus using the same, and device manufacturing method
JP3302926B2 (en) * 1998-07-02 2002-07-15 株式会社東芝 Inspection method for exposure equipment
US6496528B2 (en) * 1999-09-03 2002-12-17 Cymer, Inc. Line narrowing unit with flexural grating mount
JP2001102279A (en) 1999-09-27 2001-04-13 Nikon Corp Stage device and aligner
JP2001126977A (en) 1999-10-27 2001-05-11 Nikon Corp Stage system, aligner, and processing method for circuit device
CN2421670Y (en) * 1999-11-30 2001-02-28 中国科学院光电技术研究所 Optical pre-alignment device of submicron photoetching machine
US6480008B2 (en) * 1999-12-03 2002-11-12 Mitutoyo Corporation Capacitive distance sensor for surface configuration determining apparatus
JP3406889B2 (en) 1999-12-03 2003-05-19 株式会社ミツトヨ Distance measuring device
JP2001313250A (en) 2000-02-25 2001-11-09 Nikon Corp Aligner, its adjusting method, and method for fabricating device using aligner
KR20010085493A (en) * 2000-02-25 2001-09-07 시마무라 기로 Exposure apparatus, method for adjusting the same, and method for manufacturing device using the exposure apparatus
US20020041377A1 (en) 2000-04-25 2002-04-11 Nikon Corporation Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
JP2002014005A (en) 2000-04-25 2002-01-18 Nikon Corp Measuring method of spatial image, measuring method of imaging characteristic, measuring device for spatial image, and exposuring device
US7561270B2 (en) * 2000-08-24 2009-07-14 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method and device manufactured thereby
US6958808B2 (en) 2000-11-16 2005-10-25 Nikon Corporation System and method for resetting a reaction mass assembly of a stage assembly
JP3762307B2 (en) * 2001-02-15 2006-04-05 キヤノン株式会社 Exposure apparatus including laser interferometer system
US6564752B2 (en) 2001-07-06 2003-05-20 Wallace H. Jerome Poultry coop unloader, and methods
US6801301B2 (en) * 2001-10-12 2004-10-05 Canon Kabushiki Kaisha Exposure apparatus
JP3890233B2 (en) * 2002-01-07 2007-03-07 キヤノン株式会社 Positioning stage apparatus, exposure apparatus, and semiconductor device manufacturing method
CN1279403C (en) * 2002-02-06 2006-10-11 Asml荷兰有限公司 Method for producing photoetching equipment and device
EP1420298B1 (en) 2002-11-12 2013-02-20 ASML Netherlands B.V. Lithographic apparatus
KR20110086130A (en) 2002-12-10 2011-07-27 가부시키가이샤 니콘 Exposure system and device producing method
KR101036114B1 (en) 2002-12-10 2011-05-23 가부시키가이샤 니콘 Exposure apparatus, exposure method and method for manufacturing device
TW586139B (en) 2003-03-17 2004-05-01 Taiwan Semiconductor Mfg Dynamic flow pattern controller for uniformity control and the method thereof
US6757113B1 (en) * 2003-03-18 2004-06-29 Lucent Technologies Inc. Optical grating mount
JP4665759B2 (en) * 2003-06-06 2011-04-06 株式会社ニコン Optical element holding device, lens barrel, exposure apparatus, and device manufacturing method
JP4164414B2 (en) * 2003-06-19 2008-10-15 キヤノン株式会社 Stage equipment
JP3862678B2 (en) * 2003-06-27 2006-12-27 キヤノン株式会社 Exposure apparatus and device manufacturing method
WO2005006416A1 (en) * 2003-07-09 2005-01-20 Nikon Corporation Linking unit, exposure apparatus and method for manufacturing device
JP2005234359A (en) * 2004-02-20 2005-09-02 Ricoh Co Ltd Optical characteristic measuring apparatus of scanning optical system, method of calibrating optical characteristic measuring apparatus of scanning optical system, scanning optical system and image forming apparatus
KR101504445B1 (en) * 2004-03-25 2015-03-19 가부시키가이샤 니콘 Exposure apparatus and method for manufacturing device
TW200605191A (en) * 2004-03-30 2006-02-01 Nikon Corp Exposure apparatus, exposure method, device manufacturing method, and surface shape detecting device
US7898642B2 (en) 2004-04-14 2011-03-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN105467775B (en) 2004-06-09 2018-04-10 株式会社尼康 Exposure device and manufacturing method
US7256871B2 (en) * 2004-07-27 2007-08-14 Asml Netherlands B.V. Lithographic apparatus and method for calibrating the same
KR101264939B1 (en) * 2004-09-17 2013-05-15 가부시키가이샤 니콘 Exposure apparatus, exposure method, and method for manufacturing device
KR101157003B1 (en) 2004-09-30 2012-06-21 가부시키가이샤 니콘 Projection optical device and exposure apparatus
EP1806771A4 (en) * 2004-10-08 2008-06-18 Nikon Corp Exposure device and device manufacturing method
TWI538013B (en) * 2004-11-18 2016-06-11 尼康股份有限公司 A position measuring method, a position control method, a measuring method, a loading method, an exposure method and an exposure apparatus, and a device manufacturing method
JP2006269940A (en) 2005-03-25 2006-10-05 Canon Inc Exposure device and exposure method
US20090047607A1 (en) * 2005-03-31 2009-02-19 Hiroyuki Nagasaka Exposure method, exposure apparatus and device fabricating methods
US7515281B2 (en) * 2005-04-08 2009-04-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7161659B2 (en) * 2005-04-08 2007-01-09 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
JP4410216B2 (en) 2005-05-24 2010-02-03 エーエスエムエル ネザーランズ ビー．ブイ． Two-stage lithography apparatus and device manufacturing method
JP4868113B2 (en) * 2005-06-27 2012-02-01 株式会社ニコン Support apparatus, stage apparatus, and exposure apparatus
JP2007019225A (en) * 2005-07-07 2007-01-25 Nikon Corp Reflective member structure of position measuring device, stage device and exposure device
US7348574B2 (en) * 2005-09-02 2008-03-25 Asml Netherlands, B.V. Position measurement system and lithographic apparatus
KR100869306B1 (en) * 2005-09-13 2008-11-18 에이에스엠엘 네델란즈 비.브이. Lithographic apparatus and device manufacturing method
US7362446B2 (en) * 2005-09-15 2008-04-22 Asml Netherlands B.V. Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit
JP2007115758A (en) * 2005-10-18 2007-05-10 Nikon Corp Exposure method and exposure apparatus
JP2007113939A (en) * 2005-10-18 2007-05-10 Nikon Corp Measuring device and method therefor, stage device, and exposure device and method therefor
JP2007123332A (en) * 2005-10-25 2007-05-17 Nikon Corp Stage device, exposure device and manufacturing method of device
JP4800901B2 (en) 2005-12-12 2011-10-26 矢崎総業株式会社 Voltage detection device and insulation interface
JP4715505B2 (en) 2005-12-26 2011-07-06 株式会社ニコン Exposure apparatus and device manufacturing method
WO2007077920A1 (en) * 2005-12-28 2007-07-12 Nikon Corporation Exposure device and fabrication method thereof
TWI457977B (en) * 2005-12-28 2014-10-21 尼康股份有限公司 A pattern forming method and a pattern forming apparatus, and an element manufacturing method
US7483120B2 (en) * 2006-05-09 2009-01-27 Asml Netherlands B.V. Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
EP2023378B1 (en) * 2006-05-10 2013-03-13 Nikon Corporation Exposure apparatus and device manufacturing method
US20080158531A1 (en) * 2006-11-15 2008-07-03 Nikon Corporation Exposure apparatus, exposure method, and method for producing device
US7903866B2 (en) * 2007-03-29 2011-03-08 Asml Netherlands B.V. Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object
US7804579B2 (en) * 2007-06-21 2010-09-28 Asml Netherlands B.V. Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product
KR101843699B1 (en) * 2007-07-18 2018-03-29 가부시키가이샤 니콘 Measurement method, stage apparatus, and exposure apparatus
DE102007046927A1 (en) 2007-09-28 2009-04-02 Carl Zeiss Smt Ag Calibration of a position measuring device of an optical device

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