JPS53137673A - Device for and method of matching plate position - Google Patents

Device for and method of matching plate position

Info

Publication number
JPS53137673A
JPS53137673A JP5328778A JP5328778A JPS53137673A JP S53137673 A JPS53137673 A JP S53137673A JP 5328778 A JP5328778 A JP 5328778A JP 5328778 A JP5328778 A JP 5328778A JP S53137673 A JPS53137673 A JP S53137673A
Authority
JP
Japan
Prior art keywords
plate position
matching plate
matching
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5328778A
Other languages
English (en)
Other versions
JPS6228576B2 (ja
Inventor
Igunatousu Sumisu Henrii
Shiigumando Oosuc Suchiyuwaato
Kurifuton Furandaasu Deeru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Massachusetts Institute of Technology
Original Assignee
Massachusetts Institute of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Massachusetts Institute of Technology filed Critical Massachusetts Institute of Technology
Publication of JPS53137673A publication Critical patent/JPS53137673A/ja
Publication of JPS6228576B2 publication Critical patent/JPS6228576B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP5328778A 1977-05-03 1978-05-02 Device for and method of matching plate position Granted JPS53137673A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/793,259 US4200395A (en) 1977-05-03 1977-05-03 Alignment of diffraction gratings

Publications (2)

Publication Number Publication Date
JPS53137673A true JPS53137673A (en) 1978-12-01
JPS6228576B2 JPS6228576B2 (ja) 1987-06-22

Family

ID=25159493

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5328778A Granted JPS53137673A (en) 1977-05-03 1978-05-02 Device for and method of matching plate position

Country Status (6)

Country Link
US (1) US4200395A (ja)
JP (1) JPS53137673A (ja)
CA (1) CA1093297A (ja)
DE (1) DE2819400A1 (ja)
FR (1) FR2389928B1 (ja)
GB (1) GB1601409A (ja)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5474378A (en) * 1977-11-25 1979-06-14 Cho Lsi Gijutsu Kenkyu Kumiai Method of automatically centering mask
JPS55117240A (en) * 1979-02-27 1980-09-09 Thomson Csf Two motif array optical system and photo repeater using same system
JPS5612729A (en) * 1979-07-12 1981-02-07 Nippon Kogaku Kk <Nikon> ?alignmening device for ic projection exposure equipment
JPS5612728A (en) * 1979-07-12 1981-02-07 Nippon Kogaku Kk <Nikon> Alignmening device for ic projection exposure equipment
JPS57139774U (ja) * 1981-02-26 1982-09-01
JPS5975628A (ja) * 1982-10-25 1984-04-28 Nippon Telegr & Teleph Corp <Ntt> ２重回折格子による位置合せ法
JPS59104128A (ja) * 1982-12-06 1984-06-15 Nippon Telegr & Teleph Corp <Ntt> ２重回折格子による位置合せ法および位置合せ装置
JPS6047420A (ja) * 1983-08-26 1985-03-14 Nippon Telegr & Teleph Corp <Ntt> ２重回折格子による位置合わせ装置
JPS6052021A (ja) * 1983-08-31 1985-03-23 Canon Inc 位置検出方法
JPS60214531A (ja) * 1984-04-10 1985-10-26 Matsushita Electric Ind Co Ltd 位置合わせ方法
JPS62216231A (ja) * 1987-01-24 1987-09-22 Nippon Kogaku Kk <Nikon> アライメント装置
JPH0676207U (ja) * 1992-09-10 1994-10-28 日立テクノエンジニアリング株式会社 板状体の収納装置
JP2007180548A (ja) * 2005-12-27 2007-07-12 Asml Netherlands Bv パターンアライメント方法およびリソグラフィ装置
JP2007266601A (ja) * 2006-03-28 2007-10-11 Asml Netherlands Bv オーバーレイ測定を使用するリソグラフィ装置およびデバイス製造方法
JP2007266604A (ja) * 2006-03-29 2007-10-11 Asml Netherlands Bv オーバーレイ測定品質表示を使用するリソグラフィ装置およびデバイス製造方法
JP2008021984A (ja) * 2006-06-20 2008-01-31 Asml Netherlands Bv 角度分解したスペクトロスコピーリソグラフィの特性解析方法および装置
WO2008072502A1 (ja) * 2006-12-08 2008-06-19 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
JP2010267682A (ja) * 2009-05-12 2010-11-25 Bondtech Inc アライメント装置、アライメント方法および半導体装置
JP2019523449A (ja) * 2016-07-21 2019-08-22 エーエスエムエル ネザーランズ ビー．ブイ． ターゲットの測定方法、基板、計測装置およびリソグラフィ装置
JP2021515416A (ja) * 2018-02-27 2021-06-17 エーエスエムエル ネザーランズ ビー．ブイ． 基板上の１つ又は複数の構造の特性を算出するメトロロジ装置及び方法
JP2022523492A (ja) * 2019-01-28 2022-04-25 ケーエルエー コーポレイション モアレターゲット及びそれを用い半導体デバイスの位置ずれを計測する方法

Families Citing this family (108)

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US4340305A (en) * 1977-05-03 1982-07-20 Massachusetts Institute Of Technology Plate aligning
IT1125000B (it) * 1978-12-08 1986-05-14 Rca Corp Sistema automatico per l'allineamento di fotomaschere in processi di stampa a proiezione
US4422763A (en) * 1978-12-08 1983-12-27 Rca Corporation Automatic photomask alignment system for projection printing
US4332473A (en) * 1979-01-31 1982-06-01 Tokyo Shibaura Denki Kabushiki Kaisha Apparatus for detecting a mutual positional relationship of two sample members
SE440204B (sv) * 1979-04-23 1985-07-22 Svecia Silkscreen Maskiner Ab Sett och anordning att injustera ett tryck pa ett material
US4232969A (en) * 1979-05-30 1980-11-11 International Business Machines Corporation Projection optical system for aligning an image on a surface
US4345836A (en) * 1979-10-22 1982-08-24 Optimetrix Corporation Two-stage wafer prealignment system for an optical alignment and exposure machine
FR2472209A1 (fr) * 1979-12-18 1981-06-26 Thomson Csf Systeme optique d'alignement automatique de deux motifs comportant des reperes s'alignement du type reseaux, notamment en photo-repetition directe sur silicium
US4360273A (en) * 1980-02-14 1982-11-23 Sperry Corporation Optical alignment of masks for X-ray lithography
JPS56122128A (en) * 1980-02-29 1981-09-25 Telmec Co Ltd Positioning system for printing device of semiconductor or the like
US4431923A (en) * 1980-05-13 1984-02-14 Hughes Aircraft Company Alignment process using serial detection of repetitively patterned alignment marks
US4327292A (en) * 1980-05-13 1982-04-27 Hughes Aircraft Company Alignment process using serial detection of repetitively patterned alignment marks
JPS58102939A (ja) * 1981-12-15 1983-06-18 Canon Inc マスクアライナ−用マスク及びマスクアライナ−
US4620785A (en) * 1982-12-01 1986-11-04 Canon Kabushiki Kaisha Sheet-like member having alignment marks and an alignment apparatus for the same
FR2538923A1 (fr) * 1982-12-30 1984-07-06 Thomson Csf Procede et dispositif d'alignement optique de motifs dans deux plans rapproches dans un appareil d'exposition comprenant une source de rayonnement divergent
SE454439B (sv) * 1983-07-06 1988-05-02 Tetra Pak Ab Sett och anordning att med fotoelektriska medel detektera och behorighetskontrollera gjorda styrmarkeringar pa en med tryck dekorerad lopande materialbana
EP0135597B1 (de) * 1983-09-23 1987-07-22 Ibm Deutschland Gmbh Verfahren und Einrichtung zum gegenseitigen Ausrichten von Objekten
JPH0619280B2 (ja) * 1983-09-24 1994-03-16 名古屋大学長 光学式自動位置決め装置
FR2553532A1 (fr) * 1983-10-12 1985-04-19 Varian Associates Dispositif capacitif d'alignement de masque
US4631416A (en) * 1983-12-19 1986-12-23 Hewlett-Packard Company Wafer/mask alignment system using diffraction gratings
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US4656347A (en) * 1984-01-30 1987-04-07 Nippon Telegraph & Telephone Public Corporation Diffraction grating position adjuster using a grating and a reflector
US4663534A (en) * 1984-03-08 1987-05-05 Canon Kabushiki Kaisha Position detecting device utilizing selective outputs of the photodetector for accurate alignment
US4596467A (en) * 1984-03-16 1986-06-24 Hughes Aircraft Company Dissimilar superimposed grating precision alignment and gap measurement systems
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FR2566930B1 (fr) * 1984-06-29 1987-01-02 Zaitsev Valentin Dispositif xy pour photorepeteur
JPH0629964B2 (ja) * 1984-09-11 1994-04-20 株式会社ニコン マーク検出方法
US4632557A (en) * 1985-01-23 1986-12-30 Harris Corporation Alignment target image enhancement for microlithography process
US4736108A (en) * 1986-07-29 1988-04-05 Santana Engineering Systems Apparatus and method for testing coplanarity of semiconductor components
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US4728193A (en) * 1986-12-11 1988-03-01 Hughes Aircraft Company Precision automatic mask-wafer alignment system
US4742233A (en) * 1986-12-22 1988-05-03 American Telephone And Telgraph Company Method and apparatus for automated reading of vernier patterns
US4815854A (en) * 1987-01-19 1989-03-28 Nec Corporation Method of alignment between mask and semiconductor wafer
US4757207A (en) * 1987-03-03 1988-07-12 International Business Machines Corporation Measurement of registration of overlaid test patterns by the use of reflected light
US4943733A (en) * 1987-05-15 1990-07-24 Nikon Corporation Projection optical apparatus capable of measurement and compensation of distortion affecting reticle/wafer alignment
JPH03386Y2 (ja) * 1987-09-10 1991-01-09
JPH0528065Y2 (ja) * 1988-03-18 1993-07-19
JPH01153976U (ja) * 1988-04-04 1989-10-24
JPH0265584U (ja) * 1988-11-09 1990-05-17
US5322747A (en) * 1989-03-22 1994-06-21 Hugle William B Method of manufacturing an optical disc
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US5217916A (en) * 1989-10-03 1993-06-08 Trw Inc. Method of making an adaptive configurable gate array
US5459340A (en) * 1989-10-03 1995-10-17 Trw Inc. Adaptive configurable gate array
US5216257A (en) * 1990-07-09 1993-06-01 Brueck Steven R J Method and apparatus for alignment and overlay of submicron lithographic features
JPH04215417A (ja) * 1990-12-14 1992-08-06 Fujitsu Ltd 露光方法
US6329104B1 (en) * 1992-03-16 2001-12-11 Holtronic Technologies, Ltd. Position alignment system for holographic lithography process
US5652426A (en) * 1993-04-19 1997-07-29 Ricoh Company, Ltd. Optical encoder having high resolution
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US6309580B1 (en) * 1995-11-15 2001-10-30 Regents Of The University Of Minnesota Release surfaces, particularly for use in nanoimprint lithography
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Cited By (34)

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JPS5952537B2 (ja) * 1977-11-25 1984-12-20 超エル・エス・アイ技術研究組合 自動マスク合せ法
JPS5474378A (en) * 1977-11-25 1979-06-14 Cho Lsi Gijutsu Kenkyu Kumiai Method of automatically centering mask
JPS55117240A (en) * 1979-02-27 1980-09-09 Thomson Csf Two motif array optical system and photo repeater using same system
JPH0140491B2 (ja) * 1979-02-27 1989-08-29 Thomson Csf
JPH0159733B2 (ja) * 1979-07-12 1989-12-19 Nippon Kogaku Kk
JPS5612728A (en) * 1979-07-12 1981-02-07 Nippon Kogaku Kk <Nikon> Alignmening device for ic projection exposure equipment
JPS5612729A (en) * 1979-07-12 1981-02-07 Nippon Kogaku Kk <Nikon> ?alignmening device for ic projection exposure equipment
JPS6322058B2 (ja) * 1979-07-12 1988-05-10 Nippon Kogaku Kk
JPS57139774U (ja) * 1981-02-26 1982-09-01
JPS5975628A (ja) * 1982-10-25 1984-04-28 Nippon Telegr & Teleph Corp <Ntt> ２重回折格子による位置合せ法
JPS59104128A (ja) * 1982-12-06 1984-06-15 Nippon Telegr & Teleph Corp <Ntt> ２重回折格子による位置合せ法および位置合せ装置
JPS6047420A (ja) * 1983-08-26 1985-03-14 Nippon Telegr & Teleph Corp <Ntt> ２重回折格子による位置合わせ装置
JPS6355858B2 (ja) * 1983-08-26 1988-11-04 Nippon Telegraph & Telephone
JPH0145973B2 (ja) * 1983-08-31 1989-10-05 Canon Kk
JPS6052021A (ja) * 1983-08-31 1985-03-23 Canon Inc 位置検出方法
JPS60214531A (ja) * 1984-04-10 1985-10-26 Matsushita Electric Ind Co Ltd 位置合わせ方法
JPS6352455B2 (ja) * 1987-01-24 1988-10-19 Nippon Kogaku Kk
JPS62216231A (ja) * 1987-01-24 1987-09-22 Nippon Kogaku Kk <Nikon> アライメント装置
JPH0676207U (ja) * 1992-09-10 1994-10-28 日立テクノエンジニアリング株式会社 板状体の収納装置
JP4543026B2 (ja) * 2005-12-27 2010-09-15 エーエスエムエル ネザーランズ ビー．ブイ． パターンアライメント方法およびリソグラフィ装置
JP2007180548A (ja) * 2005-12-27 2007-07-12 Asml Netherlands Bv パターンアライメント方法およびリソグラフィ装置
JP4578494B2 (ja) * 2006-03-28 2010-11-10 エーエスエムエル ネザーランズ ビー．ブイ． オーバーレイ測定を使用するリソグラフィ装置およびデバイス製造方法
JP2007266601A (ja) * 2006-03-28 2007-10-11 Asml Netherlands Bv オーバーレイ測定を使用するリソグラフィ装置およびデバイス製造方法
JP2007266604A (ja) * 2006-03-29 2007-10-11 Asml Netherlands Bv オーバーレイ測定品質表示を使用するリソグラフィ装置およびデバイス製造方法
JP4578495B2 (ja) * 2006-03-29 2010-11-10 エーエスエムエル ネザーランズ ビー．ブイ． オーバーレイ測定品質表示を使用するリソグラフィ装置およびデバイス製造方法
JP4701209B2 (ja) * 2006-06-20 2011-06-15 エーエスエムエル ネザーランズ ビー．ブイ． 角度分解したスペクトロスコピーリソグラフィの特性解析方法および装置
US7898662B2 (en) 2006-06-20 2011-03-01 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
JP2008021984A (ja) * 2006-06-20 2008-01-31 Asml Netherlands Bv 角度分解したスペクトロスコピーリソグラフィの特性解析方法および装置
US8064056B2 (en) 2006-06-20 2011-11-22 Asml Netherlands B.V. Substrate used in a method and apparatus for angular-resolved spectroscopic lithography characterization
WO2008072502A1 (ja) * 2006-12-08 2008-06-19 Nikon Corporation 露光方法及び装置、並びにデバイス製造方法
JP2010267682A (ja) * 2009-05-12 2010-11-25 Bondtech Inc アライメント装置、アライメント方法および半導体装置
JP2019523449A (ja) * 2016-07-21 2019-08-22 エーエスエムエル ネザーランズ ビー．ブイ． ターゲットの測定方法、基板、計測装置およびリソグラフィ装置
JP2021515416A (ja) * 2018-02-27 2021-06-17 エーエスエムエル ネザーランズ ビー．ブイ． 基板上の１つ又は複数の構造の特性を算出するメトロロジ装置及び方法
JP2022523492A (ja) * 2019-01-28 2022-04-25 ケーエルエー コーポレイション モアレターゲット及びそれを用い半導体デバイスの位置ずれを計測する方法

Also Published As

Publication number Publication date
GB1601409A (en) 1981-10-28
DE2819400A1 (de) 1978-11-09
US4200395A (en) 1980-04-29
DE2819400C2 (ja) 1993-07-29
FR2389928B1 (ja) 1984-09-14
CA1093297A (en) 1981-01-13
FR2389928A1 (ja) 1978-12-01
JPS6228576B2 (ja) 1987-06-22

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