JPS5612728A - Alignmening device for ic projection exposure equipment - Google Patents

Alignmening device for ic projection exposure equipment

Info

Publication number
JPS5612728A
JPS5612728A JP8746179A JP8746179A JPS5612728A JP S5612728 A JPS5612728 A JP S5612728A JP 8746179 A JP8746179 A JP 8746179A JP 8746179 A JP8746179 A JP 8746179A JP S5612728 A JPS5612728 A JP S5612728A
Authority
JP
Japan
Prior art keywords
shield plate
cyclic
alignment mark
projection exposure
exposure equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8746179A
Other languages
Japanese (ja)
Other versions
JPS6322058B2 (en
Inventor
Kyoichi Suwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Nippon Chemical Industrial Co Ltd
Original Assignee
Nippon Chemical Industrial Co Ltd
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Chemical Industrial Co Ltd, Nippon Kogaku KK filed Critical Nippon Chemical Industrial Co Ltd
Priority to JP8746179A priority Critical patent/JPS5612728A/en
Priority to US06/166,794 priority patent/US4390279A/en
Publication of JPS5612728A publication Critical patent/JPS5612728A/en
Publication of JPS6322058B2 publication Critical patent/JPS6322058B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To improve the alignment accuracy by passing through scattered light or higher diffracted light alone from the surface having a cyclic alignment mark on the wafer surface while shielding all reflected lights from the nonmarked surface by a shield plate. CONSTITUTION:The shield plate 5a is provided at the iris position in an alignment optical system of the IC projection exposure equipment extending like a belt perpendicular to the cyclic direction of the cyclic alignment mark 11 on the wafer 3 to limit the luminous flux whereby a mask alignment mark 10a is formed in the shape almost multiplifying at a factor scale of the mark 11. The shape of the shield plate 5a is such that all reflected lights from the nonmarked surface is shielded with the sheild plate 5a. The projection reflected image of the slit, for example, the diffracted light of the first order, from the marked surface passes back through the strip- shaped opening of the shield plate 5a to be measured with a light detecting element 8.
JP8746179A 1979-07-12 1979-07-12 Alignmening device for ic projection exposure equipment Granted JPS5612728A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8746179A JPS5612728A (en) 1979-07-12 1979-07-12 Alignmening device for ic projection exposure equipment
US06/166,794 US4390279A (en) 1979-07-12 1980-07-08 Alignment device in an IC projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8746179A JPS5612728A (en) 1979-07-12 1979-07-12 Alignmening device for ic projection exposure equipment

Publications (2)

Publication Number Publication Date
JPS5612728A true JPS5612728A (en) 1981-02-07
JPS6322058B2 JPS6322058B2 (en) 1988-05-10

Family

ID=13915510

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8746179A Granted JPS5612728A (en) 1979-07-12 1979-07-12 Alignmening device for ic projection exposure equipment

Country Status (1)

Country Link
JP (1) JPS5612728A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5927526A (en) * 1982-08-06 1984-02-14 Hitachi Ltd Reducing and projecting exposure
JPS59101827A (en) * 1982-12-01 1984-06-12 Canon Inc Detecting optical system
JPS63153821A (en) * 1987-10-27 1988-06-27 Nikon Corp Alignment device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154369A (en) * 1976-06-17 1977-12-22 Philips Nv Method of positioning mask pattern and apparatus therefor
JPS5332759A (en) * 1976-09-08 1978-03-28 Nippon Telegr & Teleph Corp <Ntt> Precision coordinate position detection and position control unit by composite diffration grating method
JPS53137673A (en) * 1977-05-03 1978-12-01 Massachusetts Inst Technology Device for and method of matching plate position

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154369A (en) * 1976-06-17 1977-12-22 Philips Nv Method of positioning mask pattern and apparatus therefor
JPS5332759A (en) * 1976-09-08 1978-03-28 Nippon Telegr & Teleph Corp <Ntt> Precision coordinate position detection and position control unit by composite diffration grating method
JPS53137673A (en) * 1977-05-03 1978-12-01 Massachusetts Inst Technology Device for and method of matching plate position

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5927526A (en) * 1982-08-06 1984-02-14 Hitachi Ltd Reducing and projecting exposure
JPS59101827A (en) * 1982-12-01 1984-06-12 Canon Inc Detecting optical system
JPS6348421B2 (en) * 1982-12-01 1988-09-29 Canon Kk
JPS63153821A (en) * 1987-10-27 1988-06-27 Nikon Corp Alignment device
JPH0121615B2 (en) * 1987-10-27 1989-04-21 Nikon Kk

Also Published As

Publication number Publication date
JPS6322058B2 (en) 1988-05-10

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