JPS6468926A - Measurement of image distortion in projection optical system - Google Patents

Measurement of image distortion in projection optical system

Info

Publication number
JPS6468926A
JPS6468926A JP62226186A JP22618687A JPS6468926A JP S6468926 A JPS6468926 A JP S6468926A JP 62226186 A JP62226186 A JP 62226186A JP 22618687 A JP22618687 A JP 22618687A JP S6468926 A JPS6468926 A JP S6468926A
Authority
JP
Japan
Prior art keywords
pattern
patterns
latent images
test reticle
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62226186A
Inventor
Takechika Nishi
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62226186A priority Critical patent/JPS6468926A/en
Publication of JPS6468926A publication Critical patent/JPS6468926A/en
Application status is Pending legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70483Information management, control, testing, and wafer monitoring, e.g. pattern monitoring
    • G03F7/70591Testing optical components
    • G03F7/706Aberration measurement

Abstract

PURPOSE:To check performance of a device during its operation and to maintain high accuracy, by using a test reticle, exposing a plurality of first patterns on a resist layer, thereafter exposing only a second pattern, overlapping the second pattern on the latent images of the first patterns, and performing exposure measurement. CONSTITUTION:The pattern image of a test reticle TR is exposed at a specified region on a wafer. The shape of an opening is determined so that only a second pattern 17 of the test reticle TR is lighted. Then, the projected image of the light transmitting edge part of the second pattern is made to agree with the transferred images of rectangular patterns 14, which were exposed before. Then exposure is performed. Thereafter, the second pattern 17 is overlapped on latent images 15a, 16a, 18a and 19a corresponding to mark patterns 15, 16, 18 and 19, and exposure is performed. When one-dimensional position devaition between the latent images 16a and 17a and the like are detected, the amount of distortion at an aligning position within a projected field of view can be measured.
JP62226186A 1987-09-09 1987-09-09 Measurement of image distortion in projection optical system Pending JPS6468926A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62226186A JPS6468926A (en) 1987-09-09 1987-09-09 Measurement of image distortion in projection optical system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62226186A JPS6468926A (en) 1987-09-09 1987-09-09 Measurement of image distortion in projection optical system

Publications (1)

Publication Number Publication Date
JPS6468926A true JPS6468926A (en) 1989-03-15

Family

ID=16841236

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62226186A Pending JPS6468926A (en) 1987-09-09 1987-09-09 Measurement of image distortion in projection optical system

Country Status (1)

Country Link
JP (1) JPS6468926A (en)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006104011A1 (en) 2005-03-25 2006-10-05 Nikon Corporation Shot shape measuring method, mask
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
JP4770833B2 (en) * 2005-03-25 2011-09-14 株式会社ニコン Method of measuring the shot shape, mask
US8339614B2 (en) 2005-03-25 2012-12-25 Nikon Corporation Method of measuring shot shape and mask
EP3159738A2 (en) 2005-03-25 2017-04-26 Nikon Corporation Method of measuring shot shape and mask
WO2006104011A1 (en) 2005-03-25 2006-10-05 Nikon Corporation Shot shape measuring method, mask
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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